Patents by Inventor Il-Kwang Yang
Il-Kwang Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10622228Abstract: Disclosed are a substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; and a heat dissipating member including a contact surface being in thermal contact with the second temperature region. The heat dissipating member further includes an opening corresponding to the first temperature region. The heat dissipating member formed in a ring shape, in which the opening is surrounded with the contact surface, and the contact surface of the heat dissipating member makes thermal contact with the lower surface of the susceptor.Type: GrantFiled: December 29, 2016Date of Patent: April 14, 2020Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Dong-Keun Lee, Kyung-Jin Chu, Sung-Tae Je, Il-Kwang Yang
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Patent number: 10593545Abstract: A substrate processing method in which processes with respect to substrates are performed comprises: stacking the substrates on a substrate holder disposed in a staking space formed within a lower chamber through a passage formed in a side of the lower chamber, exhausting the stacking space through an auxiliary exhaust port connected to the stacking space, moving the substrate holder into an external reaction tube closing an opened upper side of the lower chamber to provide a process space in which the processes are performed, and supplying a reaction gas into the process space using a supply nozzle connected to the process space and exhausting the process space using an exhaust nozzle connected to the process space and an exhaust port connected to the exhaust nozzle.Type: GrantFiled: February 7, 2017Date of Patent: March 17, 2020Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 10192760Abstract: A substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit are provided. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; a heat dissipating member including a contact surface being in thermal contact with the second temperature region; and a reflecting member disposed approximately in parallel with one surface of the susceptor to reflect heat emitted from the susceptor toward the susceptor.Type: GrantFiled: October 26, 2015Date of Patent: January 29, 2019Assignee: Eugene Technology Co., Ltd.Inventors: Dong-Keun Lee, Kyung-Jin Chu, Sung-Tae Je, Il-Kwang Yang
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Patent number: 9953850Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: April 24, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9875895Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: January 23, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9869019Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to substrates is performed includes a lower chamber having an opened upper portion, the lower chamber having a passage, through which the substrates are accessible, in a side thereof, an external reaction tube closing the opened upper portion of the lower chamber to provide a process space in which the process is performed, a substrate holder on which the one or more substrates are vertically stacked, the substrate holder being movable between a stacking position at which the substrates are stacked within the substrate holder and a process position at which the process with respect to the substrates is performed, a gas supply unit supplying a reaction gas into the process space, and a processing unit disposed outside the external reaction tube to activate the reaction gas, thereby performing the process with respect to the substrates.Type: GrantFiled: November 23, 2012Date of Patent: January 16, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9758870Abstract: A substrate processing apparatus includes a main chamber having a process space in which a process with respect to a substrate is performed, a heater disposed in the process space to heat the substrate placed on an upper portion thereof, and a cooling ring around the heater, the cooling ring having a plurality of cooling gas passages spaced apart at a predetermined distance around the heater to allow a refrigerant supplied from the outside to selectively flow therein.Type: GrantFiled: December 18, 2013Date of Patent: September 12, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Sung-Tae Je, Il-Kwang Yang, Jae-Ho Lee, Kyong-Hun Kim, Myung-In Kim, Yang-Sik Shin
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Publication number: 20170148649Abstract: A substrate processing method in which processes with respect to substrates are performed comprises: stacking the substrates on a substrate holder disposed in a staking space formed within a lower chamber through a passage formed in a side of the lower chamber, exhausting the stacking space through an auxiliary exhaust port connected to the stacking space, moving the substrate holder into an external reaction tube closing an opened upper side of the lower chamber to provide a process space in which the processes are performed, and supplying a reaction gas into the process space using a supply nozzle connected to the process space and exhausting the process space using an exhaust nozzle connected to the process space and an exhaust port connected to the exhaust nozzle.Type: ApplicationFiled: February 7, 2017Publication date: May 25, 2017Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: IL-KWANG YANG, SUNG-TAE JE, BYOUNG-GYU SONG, YONG-KI KIM, KYONG-HUN KIM, YANG-SIK SHIN
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Patent number: 9644895Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing an inner space in which a process with respect to a substrate is performed, a heating plate on which the substrate is placed, the heating plate being fixedly disposed within the chamber, a heater spaced from a lower portion of the heating plate to heat the heating plate, and a lift module lifting the heater.Type: GrantFiled: April 3, 2013Date of Patent: May 9, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin
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Publication number: 20170110347Abstract: Disclosed are a substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; and a heat dissipating member including a contact surface being in thermal contact with the second temperature region. The heat dissipating member further includes an opening corresponding to the first temperature region. The heat dissipating member formed in a ring shape, in which the opening is surrounded with the contact surface, and the contact surface of the heat dissipating member makes thermal contact with the lower surface of the susceptor.Type: ApplicationFiled: December 29, 2016Publication date: April 20, 2017Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Dong-Keun LEE, Kyung-Jin CHU, Sung-Tae JE, IL-KWANG YANG
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Patent number: 9620395Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus in which processes with respect to substrates are performed includes a lower chamber having an opened upper side, the lower chamber including a passage allowing the substrates to pass therethrough in a side thereof, an external reaction tube closing the opened upper side of the lower chamber to provide a process space in which the processes are performed, a substrate holder on which the one ore more substrates are vertically stacked, the substrate holder being movable between a stacking position in which the substrates are stacked within the substrate holder and a process position in which the processes with respect to the substrates are performed, and a gas supply unit disposed inside the external reaction tube to supply a reaction gas into the process space, the gas supply unit forming a flow of the reaction gas having different phase differences in a vertical direction.Type: GrantFiled: November 16, 2012Date of Patent: April 11, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9593415Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: March 14, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9593418Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.Type: GrantFiled: November 23, 2012Date of Patent: March 14, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9564294Abstract: According to one embodiment of the present invention, a plasma treatment apparatus comprises: a chamber having an inner space in which processes for an object to be treated are performed; and an antenna which is arranged to cover the side part of the chamber, and which forms electric fields in said inner space to generate plasma from the source gas supplied in the inner space. The antenna includes a helical antenna which is formed into a helical shape from one side of the chamber toward the other side of the chamber along a first rotation direction, and which has a current flowing in the first rotation direction; an extension antenna which is connected to one end of the helical antenna positioned at said one side of the chamber, and which has a current flowing in the direction opposite to the first rotation direction; and a connection antenna for interconnecting the extension antenna and the helical antenna.Type: GrantFiled: October 26, 2009Date of Patent: February 7, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Sang Ho Woo, Il Kwang Yang, Byung Gyu Song
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Patent number: 9416451Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber where processes with respect to a substrate are carried out, a substrate support on which the substrate is placed, the substrate support being disposed within the chamber, and an antenna disposed in an upper portion of the chamber to form an electric field within the chamber. The antenna includes a first antenna and a second antenna, which are disposed in rotational symmetry with respect to a preset center. The first antenna includes a first inner antenna and a first intermediate antenna which respectively have semi-circular shapes and first and second radii and are respectively disposed on one side and the other side with respect to the preset center line and a first connection antenna connecting the first inner antenna to the first intermediate antenna.Type: GrantFiled: October 6, 2011Date of Patent: August 16, 2016Assignee: Eugene Technology Co., Ltd.Inventors: Sung Tae Je, Il Kwang Yang, Byung Gyu Song, Song Hwan Park
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Patent number: 9368380Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.Type: GrantFiled: February 17, 2014Date of Patent: June 14, 2016Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin
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Publication number: 20160049317Abstract: A substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit are provided. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; a heat dissipating member including a contact surface being in thermal contact with the second temperature region; and a reflecting member disposed approximately in parallel with one surface of the susceptor to reflect heat emitted from the susceptor toward the susceptor.Type: ApplicationFiled: October 26, 2015Publication date: February 18, 2016Inventors: Dong-Keun LEE, Kyung-Jin CHU, Sung-Tae JE, Il-Kwang YANG
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Publication number: 20160013086Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.Type: ApplicationFiled: February 17, 2014Publication date: January 14, 2016Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang YANG, Byoung-Gyu SONG, Kyeong-Hun KIM, Yong-ki KIM, Yang-Sik SHIN
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Publication number: 20150380284Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed, hot-wire heaters disposed in a sidewall of the process chamber, the hot-wire heaters being disposed around the inner space to heat the substrate, and a cooling tube in which a refrigerant supplied from the outside flows, the cooling tube being disposed between the hot-wire heaters along the sidewall of the process chamber.Type: ApplicationFiled: February 17, 2014Publication date: December 31, 2015Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang YANG, Byoung-Gyu SONG, Kyong-Hun KIM, Yong-Ki KIM, Yang-Sik SHIN
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Publication number: 20150369539Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed and a tube type heater disposed around the inner space in a sidewall of the process chamber, the tube type heater having a passage through which a refrigerant supplied from the outside flows.Type: ApplicationFiled: February 17, 2014Publication date: December 24, 2015Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang YANG, Byoung-Gyu SONG, kyong-Hun KIM, Yong-Ki KIM, Yang-Sik SHIN