Abstract: A composition for promoting the proliferation of hematopoietic stem cells, which contains mushroom extracts, and more particularly to a composition and functional food for promoting the proliferation of hematopoietic stem cells, which contain, as active ingredients, an Inonotus Obliquus extract, a Ganoderma Luciderm extract, a Phellinus Linteus extract, and plant extracts promoting the immune activity-enhancing effects of these mushroom extracts. The composition and functional food assists in enhancing immune activity by significantly promoting the proliferation of hematopoietic stem cells, and shows positive effects on the increase in anticancer activity, anti-inflammatory activity and cell activity, the regeneration of damaged tissue and the prevention of cardiovascular diseases, through the proliferation of hematopoietic stem cells and the enhancement of immune activity.

Abstract: An embryonic stem cell line derived from a nucleus-transferred oocyte prepared by transferring a nucleus of a human somatic cell into an enucleated human oocyte may differentiate into various desired cell types.

Abstract: Disclosed herein are a cloned canine and a production method thereof. The method comprises the steps of enucleating the oocyte of a canine to prepare an enucleated recipient oocyte, conducting nuclear transfer into the enucleated oocyte using a canine somatic cell as a nuclear donor cell under optimized conditions so as to prepare a nuclear transfer embryo, and transferring the nuclear transfer embryo into the oviduct of a surrogate mother. The present invention provides a method for producing cloned canines and thus, can contribute to the development of studies in veterinary medicine, anthropology and medical science such as the propagation of superior canines, the conservation of rare or nearly extinct canines, xenotransplantation and disease animal models.

Abstract: The present invention relates to a method for isolating and culturing adult stem cells derived from human amniotic membrane in high yield, and more particularly to a method for obtaining a large amount of adult stem cells, the method comprising obtaining amniotic epithelial cells from human amniotic tissue in high yield by treatment with dithiothreitol (DTT) and a low concentration of trypsin and culturing the amniotic epithelial cells in a medium containing a Rho-associated kinase inhibitor. The human amniotic epithelial cell-derived stem cells are easily extracted compared to existing therapeutic stem cells such as umbilical cord blood stem cells and bone marrow stem cells, the yield and proliferation thereof are significantly increased by DTT treatment, the addition of the ROCK inhibitor or the replacement of medium. Thus, the method can be used to efficiently prepare adult stem cells.

Abstract: The present invention provides methods of cleaning a semiconductor device by removing contaminants, such as particles and/or etching by-products, from a structure of a semiconductor device using a first cleaning solution including a mixture of ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2) and deionized (DI) water, and a second cleaning solution including ozone (O3) water. The present invention also provides methods of manufacturing a semiconductor device using these methods of cleaning the semiconductor device.

Abstract: A method according to some embodiments of the invention includes defining an active region by forming a trench device isolation region on an integrated substrate, forming a mask pattern that exposes a channel sub-region of the active region and the trench device isolation region adjacent to the channel sub-region, etching the trench device isolation region, which is exposed by the mask pattern, to be recessed to a first depth using the mask pattern as an etch mask, etching the channel sub-region to form a gate trench having a second depth that is deeper than the first depth using the mask pattern as an etch mask, and forming a recess gate that fills the gate trench.

Abstract: Example embodiments of the present invention relate to methods of treating and removing a photoresist pattern and a method of manufacturing a semiconductor device using the same. Other example embodiments of the present invention relate to a method of treating a photoresist pattern and a method of removing a photoresist pattern formed using a photoresist composition suitable for argon fluoride (ArF). In a method of removing a photoresist pattern, an ozone vapor including a water vapor and an ozone gas may be provided onto the photoresist pattern to remove a hydrophobic group from a photoresist resin included in the photoresist pattern. A cleaning solution may be provided to make the photoresist pattern water-soluble. A cleaning process may be performed on the photoresist pattern to remove the photoresist pattern. The photoresist pattern may be effectively removed without an increased processing time and/or damage to a substrate.

Abstract: Provided is a method for producing a cloned dog by enucleating an oocyte of a dog to produce an enucleated oocyte, transferring a somatic cell of the dog into the enucleated oocyte, carrying out electrofusion under optimized conditions to produce a nuclear transfer embryo, and transferring the nuclear transfer embryo into its surrogate mother. The method has the effect of producing a cloned dog with high efficiency, and thus can contribute to the development of studies in veterinary medicine, anthropology and medical science, such as the propagation of superior species, xenotransplantation and diseased animal models. In addition, the present invention has the effect of exactly researching production properties of the cloned dog by producing a female cloned dog for the first time, rather than the conventional male cloned dog.

Abstract: The present invention provides methods of cleaning a semiconductor device by removing contaminants, such as particles and/or etching by-products, from a structure of a semiconductor device using a first cleaning solution including a mixture of ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2) and deionized (DI) water, and a second cleaning solution including ozone (O3) water. The present invention also provides methods of manufacturing a semiconductor device using these methods of cleaning the semiconductor device.

Abstract: An ultrasonic transducer device for a humidifier, the humidifier having a vaporizing chamber for producing water vapor or mist, the ultrasonic transducer device comprises: a transducer holder having a central opening formed in a longitudinal direction of the transducer holder and a flange portion disposed at a periphery of the transducer holder, the transducer formed of synthetic resin or plastic materials; an ultrasonic transducer disposed at the central opening of the transducer holder; a support member formed of metal and having an upper planar section and a side section extending vertically from the upper planar section, the upper planar section defining an opening therein for coupling with the flange portion of the transducer holder; and a heat discharge plate having heat discharging fins and coupled with the support member, the heat discharge plate coupled with a circuit board for discharging heat in the circuit board.

Abstract: A method according to some embodiments of the invention includes defining an active region by forming a trench device isolation region on an integrated substrate, forming a mask pattern that exposes a channel sub-region of the active region and the trench device isolation region adjacent to the channel sub-region, etching the trench device isolation region, which is exposed by the mask pattern, to be recessed to a first depth using the mask pattern as an etch mask, etching the channel sub-region to form a gate trench having a second depth that is deeper than the first depth using the mask pattern as an etch mask, and forming a recess gate that fills the gate trench.

Abstract: A method according to some embodiments of the invention includes defining an active region by forming a trench device isolation region on an integrated substrate, forming a mask pattern that exposes a channel sub-region of the active region and the trench device isolation region adjacent to the channel sub-region, etching the trench device isolation region, which is exposed by the mask pattern, to be recessed to a first depth using the mask pattern as an etch mask, etching the channel sub-region to form a gate trench having a second depth that is deeper than the first depth using the mask pattern as an etch mask, and forming a recess gate that fills the gate trench.

Abstract: An embryonic stem cell line derived from a nucleus-transferred oocyte prepared by transferring a nucleus of a human somatic cell into an enucleated human oocyte may differentiate into various desired cell types.

Abstract: An ultrasonic transducer device for a humidifier, the humidifier having a vaporizing chamber for producing water vapor or mist, the ultrasonic transducer device comprises: a transducer holder having a central opening formed in a longitudinal direction of the transducer holder and a flange portion disposed at a periphery of the transducer holder, the transducer formed of synthetic resin or plastic materials; an ultrasonic transducer disposed at the central opening of the transducer holder; a support member formed of metal and having an upper planar section and a side section extending vertically from the upper planar section, the upper planar section defining an opening therein for coupling with the flange portion of the transducer holder; and a heat discharge plate having heat discharging fins and coupled with the support member, the heat discharge plate coupled with a circuit board for discharging heat in the circuit board.

Abstract: A water supply device for a humidifier having a water tank for retaining water and a vaporizing chamber for producing water vapor with the water supplied from the water tank, is disclosed in which the water supply device comprises a water tube for supplying the water from the water tank to the vaporizing chamber of the humidifier, the water tube formed of synthetic resin or glass material, and a heating coil disposed around the water tube connected to a electric source for heating the water to a predetermined degree. The water supply device preferably further includes an insulation material wound around the water tube and the heating coil, and a connecting elbow member for securely connecting each end of the water tube to the water chamber and the water tank, respectively.

Abstract: A water supply device for a humidifier having a water tank for retaining water and a vaporizing chamber for producing water vapor with the water supplied from the water tank, is disclosed in which the water supply device comprises a water tube for supplying the water from the water tank to the vaporizing chamber of the humidifier, the water tube formed of synthetic resin or glass material, and a heating coil disposed around the water tube connected to a electric source for heating the water to a predetermined degree. The water supply device preferably further includes an insulation material wound around the water tube and the heating coil, and a connecting elbow member for securely connecting each end of the water tube to the water chamber and the water tank, respectively.

Abstract: Example embodiments of the present invention relate to methods of treating and removing a photoresist pattern and a method of manufacturing a semiconductor device using the same. Other example embodiments of the present invention relate to a method of treating a photoresist pattern and a method of removing a photoresist pattern formed using a photoresist composition suitable for argon fluoride (ArF). In a method of removing a photoresist pattern, an ozone vapor including a water vapor and an ozone gas may be provided onto the photoresist pattern to remove a hydrophobic group from a photoresist resin included in the photoresist pattern. A cleaning solution may be provided to make the photoresist pattern water-soluble. A cleaning process may be performed on the photoresist pattern to remove the photoresist pattern. The photoresist pattern may be effectively removed without an increased processing time and/or damage to a substrate.

Abstract: In a method of removing a photoresist pattern from a substrate without deteriorating a lower electrode or increasing processing time, ozone gas may be provided onto a substrate on which a photoresist pattern may be formed. An oxidation-decomposition process may be carried out using the ozone gas, to thereby decompose the photoresist pattern on the substrate. The decomposed photoresist pattern may be dissolved into water and removed from the substrate in a rinsing process. Accordingly, a photoresist pattern in an opening having a relatively high aspect ratio may be sufficiently removed from a substrate without deteriorating the lower electrode or increasing processing time.

Abstract: The present invention relates to a variable region of the monoclonal antibody against the S-surface antigen of hepatis B virus and a gene encoding the same, a recombinant vector containing the said gene, and a transformant obtained from the said recombinant vector.

Abstract: The present invention relates to a variable region of the monoclonal antibody against the S-surface antigen of hepatitis B virus and a gene encoding the same, a recombinant vector containing the gene, and a transformant obtained from the recombinant vector.