Patents by Inventor In Sub HWANG
In Sub HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8682746Abstract: Improved approaches to intelligently refer users of one online media store to another online store are disclosed. The inter-store referral can permit a user of an online media store, such as an online media store that offers digital media assets for purchase, to easily access related information, such as event information, from another online store. According to another aspect, improved approaches to access and present event information are disclosed.Type: GrantFiled: October 1, 2007Date of Patent: March 25, 2014Assignee: Apple Inc.Inventors: Ellis M. Verosub, Mark Miller, Yoon Sub Hwang, Joseph M. Rossell
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Patent number: 8650561Abstract: Localizing display of applications for download, the method including receiving from a developer and ingesting into an online store an application localized in different languages, including a designated default language, determining a local language of a user desiring to download the application from the online store, presenting to the user an interface to download a version of the application in the user's local language if the application is available in the user's local language, and presenting to the user an interface to download the version of the application in the designated default language if the application is unavailable in the user's local language. In the case of people who speak more than one language, determining a local language of a user further includes determining one or more secondary local languages and/or assigning an order of priority to the secondary languages.Type: GrantFiled: July 10, 2008Date of Patent: February 11, 2014Assignee: Apple Inc.Inventors: Sam Gharabally, Ricardo Cortes, David Makower, Yoon Sub Hwang
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Publication number: 20130214199Abstract: The present invention relates to a CMP slurry composition for polishing tungsten comprising a abrasive and a polishing chemical, wherein the abrasive comprises colloidal silica dispersed in ultra-pure water, and the polishing chemical comprises hydrogen peroxide, ammonium persulfate and iron nitrate. The slurry composition is not discolored and has good etching selectivity, so as to be applied to a CMP process.Type: ApplicationFiled: July 6, 2012Publication date: August 22, 2013Applicant: UBPRECISION CO., LTD.Inventors: Jea-Gun Park, Jin-Hyung Park, Jae-Hyung Lim, Jong-Young Cho, Ho Choi, Hee-Sub Hwang
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Patent number: 8439664Abstract: An injection molding machine to prevent a molded piece from being separated from a mold after molds are disassembled from each other includes a first mold, a second mold assembled with the first mold to form a cavity, and a binding device or a pressing device to get a molded piece held in the first mold when the first mold and the second mold are disassembled from each other.Type: GrantFiled: September 23, 2011Date of Patent: May 14, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Sang Hak Kim, Han Sub Hwang
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Publication number: 20130032572Abstract: The present invention relates to slurry for polishing crystalline phase-change materials and to a method for producing a phase-change device using the same. The slurry for polishing crystalline phase-change materials according to one embodiment of the present invention comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water. In addition, the method for producing a phase-change device according to one embodiment of the present invention comprises the following steps: preparing a substrate; forming a crystalline phase-change material film on the substrate; and removing the phase-change material film through a chemical-mechanical polishing process using slurry for polishing phase-change materials, which comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water.Type: ApplicationFiled: February 1, 2011Publication date: February 7, 2013Applicant: IUCF-HYUInventors: Jea Gun Park, Un Gyu Paik, Jin Hyung Park, Hao Cui, Jong Young Cho, Hee Sub Hwang, Jae Hyung Lim, Ye Hwan Kim
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Publication number: 20130019234Abstract: Disclosed herein are systems, methods, and non-transitory computer-readable storage media for associating an application that was pre-installed on a computer with a user account on an online store. A system configured to practice the method presents an application available for download, receives a request to download the application to a computing device, determines that the application is a pre-installed application, presents an authorization prompt configured to request user authorization to link the application with a user account, receives the user authorization, generates a unique hardware identifier associated with the computing device, determines that the application is linkable based upon the unique hardware identifier, and links the adoptable application with the user account when the adoptable application is linkable.Type: ApplicationFiled: September 29, 2011Publication date: January 17, 2013Applicant: Apple Inc.Inventors: Pedraum R. Pardehpoosh, Craig M. Federighi, Daniel I. Feldman, Gregory T. Quirk, Jack R. Matthew, Jackie Lee-Kang, Jean-Pierre Ciudad, Monika E. Gromek, Thomas K. Burkholder, Daniel Emil Pu, Sam Gharabally, Ellis Marshall Verosub, Yoon Sub Hwang
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Publication number: 20130019237Abstract: Disclosed herein are systems, methods, and non-transitory computer-readable storage media for associating an application for installation on a computer with a user account on an online store. A system configured to practice the method presents an application available for download, receives from a client device a software adoption request including an identifier associated with a user account and a proof of entitlement associated with a software package or the user account, verifies the proof of entitlement by comparing the proof of entitlement to a database, and if the proof of entitlement is verified, adopts the software package as part of the user account.Type: ApplicationFiled: March 30, 2012Publication date: January 17, 2013Applicant: Apple Inc.Inventors: Pedraum R. Pardehpoosh, Craig M. Federighi, Daniel I. Feldman, Gregory T. Quirk, Jack R. Matthew, Jackie Lee-Kang, Jean-Pierre Ciudad, Monika E. Gromek, Thomas K. Burkholder, Daniel Emil Pu, Sam Gharabally, Ellis Marshall Verosub, Yoon Sub Hwang
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Publication number: 20130019233Abstract: Disclosed herein are systems, methods, and non-transitory computer-readable storage media for associating an application that was pre-installed on a computer with a user account on an online store. A system configured to practice the method presents an application available for download, receives a request to download the application to a computing device, determines that the application is a pre-installed application, presents an authorization prompt configured to request user authorization to link the application with a user account, receives the user authorization, generates a unique hardware identifier associated with the computing device, determines that the application is linkable based upon the unique hardware identifier, and links the adoptable application with the user account when the adoptable application is linkable.Type: ApplicationFiled: July 12, 2011Publication date: January 17, 2013Applicant: Apple Inc.Inventors: Pedraum R. Pardehpoosh, Craig M. Federighi, Daniel I. Feldman, Gregory T. Quirk, Jack R. Matthew, Jackie Lee-Kang, Jean-Pierre Ciudad, Monika E. Gromek, Thomas K. Burkholder, Daniel Emil Pu, Sam Gharabally, Ellis Marshall Verosub, Yoon Sub Hwang
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Publication number: 20120190201Abstract: Provided are a multi-selective polishing slurry composition and a semiconductor element production method using the same. A silicon film provided with element patterns is formed on the uppermost part of a substrate having a first region and a second region. The element pattern density on the first region is higher than the element pattern density on the second region. Formed in sequence on top of the element patterns are a first silicon oxide film, a silicon nitride film and a second silicon oxide film. The substrate is subjected to chemical-mechanical polishing until the silicon film is exposed, by using a polishing slurry composition containing a polishing agent, a silicon nitride film passivation agent and a silicon film passivation agent.Type: ApplicationFiled: July 9, 2010Publication date: July 26, 2012Inventors: Jea-Gun Park, Un-Gyu Paik, Jin-Hyung Park, Hao Cui, Jong-Young Cho, Hee-Sub Hwang, Jae-Hyung Lim, Ye-Hwan Kim
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Publication number: 20120013044Abstract: An injection molding machine to prevent a molded piece from being separated from a mold after molds are disassembled from each other includes a first mold, a second mold assembled with the first mold to form a cavity, and a binding device or a pressing device to get a molded piece held in the first mold when the first mold and the second mold are disassembled from each other.Type: ApplicationFiled: September 23, 2011Publication date: January 19, 2012Applicant: Samsung Electronics Co., LtdInventors: Sang Hak KIM, Han Sub HWANG
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Patent number: 8057720Abstract: An injection molding machine to prevent a molded piece from being separated from a mold after molds are disassembled from each other includes a first mold, a second mold assembled with the first mold to form a cavity, and a binding device or a pressing device to get a molded piece held in the first mold when the first mold and the second mold are disassembled from each other.Type: GrantFiled: March 4, 2009Date of Patent: November 15, 2011Assignee: SAMSUNG Electronics Co., Ltd.Inventors: Sang Hak Kim, Han Sub Hwang
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Patent number: 7943448Abstract: Embodiments relate to a semiconductor device and a method for manufacturing the same. According to embodiments, a semiconductor device may include an LDD which may include a space having a first width and may be formed in a semiconductor substrate, a channel area which may be formed in the semiconductor substrate within a space having a first width, a gate insulating layer which has a width wider than the first width and may be formed on an upper side of the channel area on the semiconductor substrate, a gate which may be formed with the first width on the gate insulating layer, and a spacer including a first spacer formed at both sides of the gate insulating layer and a second spacer formed at sidewalls of the gate.Type: GrantFiled: December 12, 2006Date of Patent: May 17, 2011Assignee: Dongbu HiTek Co., Ltd.Inventor: Mun Sub Hwang
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Patent number: 7824980Abstract: A semiconductor device and a method for manufacturing the same includes forming a poly-gate including a first poly-gate portion and a second poly-gate portion on and/or over a semiconductor substrate, forming a trench having a predetermined depth in the poly-gate, implanting dopant ions into the entire surface of the semiconductor substrate and the poly-gate including the trench, forming a contact barrier layer to cover a portion of the poly-gate including the trench while exposing an upper surface of the remaining portion of the poly-gate on which a contact will be formed, and forming a contact on the exposed upper surface of the poly-gate.Type: GrantFiled: October 17, 2008Date of Patent: November 2, 2010Assignee: Dongbu HiTek Co., Ltd.Inventor: Mun-Sub Hwang
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Publication number: 20100148306Abstract: Disclosed are a capacitor and a method of manufacturing the same. The capacitor includes a plurality of polysilicon electrodes spaced apart from each other at a predetermined distance on a substrate, a dielectric layer between the polysilicon electrodes and having an air layer or void therein, a silicide on each polysilicon electrode, and a conductive contact electrically connected to the silicide.Type: ApplicationFiled: December 8, 2009Publication date: June 17, 2010Inventor: Mun Sub HWANG
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Patent number: 7670134Abstract: An injection molding apparatus capable of minimizing cracks at the corners of a mold is provided. The injection molding apparatus includes first and second molds that mate with each other to define a molding cavity, a stationary member that supports the first mold, a movable member that supports the second mold and moves backwards and forwards together with the second mold, and a plurality of pressing members installed around the first mold so as to press a periphery of the first mold toward the molding cavity by a pressing force of the movable member when the first mold is mated with the second mold.Type: GrantFiled: October 18, 2007Date of Patent: March 2, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Han Sub Hwang, Sung Ki Min, Sang Hun Lee, Jong Won Lee
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Publication number: 20100011354Abstract: Disclosed herein are systems, methods, and computer readable-media for localizing display of applications for download, the method including receiving from a developer and ingesting into an online store an application localized in different languages, including a designated default language, determining a local language of a user desiring to download the application from the online store, presenting to the user an interface to download a version of the application in the user's local language if the application is available in the user's local language, and presenting to the user an interface to download the version of the application in the designated default language if the application is unavailable in the user's local language. In one aspect, a list of all available localized versions is presented to the user. In another aspect, statistics about when the user desires an unavailable localized version are recorded and reported to the developer.Type: ApplicationFiled: July 10, 2008Publication date: January 14, 2010Applicant: Apple Inc.Inventors: Sam Gharabally, Ricardo Cortes, David Makower, Yoon Sub Hwang
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Publication number: 20090275188Abstract: Disclosed is a slurry for polishing a phase change material. The slurry includes an abrasive, an alkaline polishing promoter and deionized water. Due to the use of the abrasive and the alkaline polishing promoter, the pH of the slurry is adjusted, the polishing rate of the phase change material is improved, and the polishing selectivity of the phase change material to an underlying insulating layer is increased. Further disclosed is a method for patterning a phase change material using the slurry.Type: ApplicationFiled: March 27, 2009Publication date: November 5, 2009Inventors: Jea Gun Park, Un Gyu Paik, Jin Hyung Park, Hee Sub Hwang, Hao Cui, Jong Young Cho, Woong Jun Hwang, Ye Hwan Kim
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Publication number: 20090276332Abstract: An improved system and method for submitting, distributing and/or managing digital products with respect to a product distribution system are disclosed. The submission of digital products to the product distribution system can operate to electronically submit not only the digital products but also product information, developer information and distribution parameters. The product distribution system can present the digital products for distribution at an online product distribution site in accordance with the distribution parameters. The online product distribution site can present potential purchasers with product information and/or developer information prior to any purchase.Type: ApplicationFiled: September 26, 2008Publication date: November 5, 2009Inventors: Sam Gharabally, Yoon Sub Hwang, Mark Miller, Andrew Wadycki
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Publication number: 20090256281Abstract: An injection molding machine to prevent a molded piece from being separated from a mold after molds are disassembled from each other includes a first mold, a second mold assembled with the first mold to form a cavity, and a binding device or a pressing device to get a molded piece held in the first mold when the first mold and the second mold are disassembled from each other.Type: ApplicationFiled: March 4, 2009Publication date: October 15, 2009Applicant: Samsung Electronics Co., LtdInventors: Sang Hak KIM, Han Sub Hwang
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Publication number: 20090159990Abstract: A semiconductor device and/or a method of manufacturing the same that may include: Forming a gate insulating film over a semiconductor substrate in a gate region. Forming a first gate pattern over the gate insulating film. Forming a second gate pattern over the first gate pattern, such that the second gate pattern is wider than the first gate pattern. Forming sidewall spacers at both sides of the first gate pattern and the second gate pattern, such that spaces are formed between the sidewall spacers and the first gate pattern below the second gate pattern.Type: ApplicationFiled: December 14, 2008Publication date: June 25, 2009Inventors: Hyung-Jin Park, Mun-Sub Hwang