Patents by Inventor Isao Imamura

Isao Imamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6291545
    Abstract: A fluorine-containing epoxy resin composition at least contains: a fluorine-containing epoxy resin composition at least containing: a component (a) in an amount of from 5 to 80 parts by weight; a component (b) in an amount of from 5 to 40 parts by weight; and a component (c) in an amount of from 5 to 80 parts by weight, wherein the component (a) comprises a polyfunctional epoxy resin having two or more epoxy groups in one molecule and not containing F and Si; the component (b) comprises an epoxy compound having a perfluoro group at a terminal; and the component (c) comprises a compound containing in one molecule two or more of one kind or two or more kinds selected from an epoxy group, an alcohol group, a carboxylic acid group, and an amine group. The fluorine-containing epoxy resin composition is suitably usable for treating a specified surface of a member or device so as to impart a liquid repellent property thereto.
    Type: Grant
    Filed: April 4, 1997
    Date of Patent: September 18, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventor: Isao Imamura
  • Publication number: 20010008907
    Abstract: A fluorine-containing epoxy resin composition at least contains: a fluorine-containing epoxy resin composition at least containing: a component (a) in an amount of from 5 to 80 parts by weight; a component (b) in an amount of from 5 to 40 parts by weight; and a component (c) in an amount of from 5 to 80 parts by weight, wherein the component (a) comprises a polyfunctional epoxy resin having two or more of epoxy groups in one molecule and not containing F and Si; the component (b) comprises an epoxy compound having a perfluoro group at a terminal; and the component (c) comprises a compound containing in one molecule two or more of one kind or two or more kinds selected from an epoxy group, an alcohol group, a carboxylic acid group, and an amine group. The fluorine-containing epoxy resin composition is suitably usable for treating a specified surface of a member or device so as to impart a liquid repellent property thereto.
    Type: Application
    Filed: April 4, 1997
    Publication date: July 19, 2001
    Inventor: ISAO IMAMURA
  • Patent number: 6123863
    Abstract: A process for producing a liquid-jet recording head comprises the steps of providing a solid layer of a photosensitive material in a pattern of a liquid path on a substrate, providing at least a portion of a liquid path forming material on the substrate having the solid layer, and removing the solid layer from the substrate, wherein the solid layer is removed by use of at least one of methyl lactate, ethyl lactate, and butyl lactate, or a solvent which contains as a main component at least one of methyl lactate, ethyl lactate, and butyl lactate.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: September 26, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiko Shimomura, Isao Imamura, Shoji Shiba
  • Patent number: 5983486
    Abstract: A process for producing an ink jet head comprising a liquid-discharge energy generating element for discharging a liquid, a discharge opening, a liquid-flow path, and a substrate for holding the liquid-discharge energy generating element, the process comprises the steps of: preparing the substrate; providing on the substrate the liquid-discharge energy generating element; providing a solid layer with a convex shape on the surface of the substrate where the liquid-discharge energy generating element has been provided and at the part where the liquid-flow path and the discharge opening are to be provided, the solid layer being formed of a resin capable of being dissolved away; applying on the substrate provided with the solid layer a curable material in a thickness larger than the thickness of the solid layer, to cover the solid layer; curing the curable material; evenly removing the cured material until the convex portion of the solid layer is laid bare; and dissolving away the solid layer to form the liquid-f
    Type: Grant
    Filed: March 7, 1996
    Date of Patent: November 16, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiko Shimomura, Shoji Shiba, Isao Imamura, Kenji Aono
  • Patent number: 5980026
    Abstract: A process for producing an ink jet head comprises the steps of providing a substrate provided with a liquid discharge energy-generating portion, forming a photosensitive resin layer on the substrate, patterning the photosensitive resin layer into a liquid flow path pattern to form a solid layer for forming a liquid flow path on the substrate, covering the solid layer with a liquid flow path wall construction material composed of a curable resin on the substrate, curing the liquid flow path wall construction material, and removing the solid layer by dissolution to form a liquid flow path, wherein the liquid flow path wall construction material comprises an epoxy resin composition containing an epoxy addition-modified aromatic amine curing agent.
    Type: Grant
    Filed: June 12, 1996
    Date of Patent: November 9, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isao Imamura, Akihiko Shimomura
  • Patent number: 5808644
    Abstract: A method for manufacturing an ink jet recording head which includes a plurality of ejection outlets for ejecting ink; discrete ink passages communicating with respective ejection outlets; a common liquid passage communicating with the discrete ink passages for supplying ink thereto; a liquid chamber for supplying the ink to the common ink passages; and a filter. The filter includes plural projections between the common liquid passage and the liquid chamber, for preventing foreign matter from entering the discrete liquid passages. Adjacent projections define a liquid passing area having a size smaller than that of the ejection outlets.
    Type: Grant
    Filed: November 7, 1996
    Date of Patent: September 15, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isao Imamura, Tadayoshi Inamoto
  • Patent number: 5770271
    Abstract: The invention provides a method for treating the surface of a plastic base comprising the step of applying a coating solution containing a material selected from the group consisting of alumina sol, silanol, and perhydropolysilazane represented by the following general formula (I), on the surface of the base, ##STR1## forming a surface modification layer by drying and curing the coating solution at a temperature which does not form a ceramic from the material, and then forming an ink-repellent layer on the surface modification layer.
    Type: Grant
    Filed: September 4, 1996
    Date of Patent: June 23, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventor: Isao Imamura
  • Patent number: 5763141
    Abstract: A manufacturing method for manufacturing a liquid jet recording head comprises the steps of: forming a solid layer having a pattern of a liquid path communicating with a discharge port through which a liquid is discharged on a substrate; coating the solid layer with a curable material including a micro-capsuled curing agent; curing the curable material by mixing the micro-capsuled curing agent into a main agent of the curable material; and forming a wall of the liquid path comprised of the cured curable material and the substrate by removing the solid layer.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: June 9, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiko Shimomura, Isao Imamura
  • Patent number: 5738911
    Abstract: A process for producing a liquid-jet recording head comprising a liquid-discharging orifice, a liquid path communicating to the orifice, and a liquid ejecting energy-generating element for generating an energy to be utilized for ejecting the liquid, which comprises the steps of pouring, into the liquid path, a solution containing a perhydropolysilazane represented by the formula (I): ##STR1## to allow the solution to attach onto the wall of the liquid path, and after attachment of the solution, heating the solution to form a hydrophilic layer comprising baked perhydropolysilazane on the wall of the liquid path.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: April 14, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isao Imamura, Akihiko Shimomura
  • Patent number: 5663752
    Abstract: An ink jet head having a plurality of ink flow path walls forming a plurality of ink pathways by joining said plurality of ink flow path walls to a substrate for an ink jet head, said plurality of ink flow path walls being tightly bonded to said substrate without being debonded even in the case of continuously operating the ink jet head over a long period of time using highly alkaline ink.
    Type: Grant
    Filed: November 28, 1994
    Date of Patent: September 2, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isao Imamura, Akihiko Shimomura, Shoji Shiba
  • Patent number: 5524784
    Abstract: A method for producing an ink jet head substrate with an ink passage communicated to an ink discharge opening comprises the steps of exposing a positive type photosensitive resin on a substrate according to the pattern of the ink passage and developing part of the resin according to the pattern of the ink passage. The remaining resin matching the pattern of the ink passage is then further exposed and developed and the resulting gap in the pattern is filled with material for forming the ink passage. The rest of the resin is then removed to form the ink passage which, because of the multiple exposing and developing steps, provides an ink jet head with an ink passage of high precision.
    Type: Grant
    Filed: June 24, 1993
    Date of Patent: June 11, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shoji Shiba, Isao Imamura
  • Patent number: 5443942
    Abstract: A resist removing process and an apparatus therefor which markedly improve the resist removing efficiency by a resist removing liquid by jetting the resist removing liquid and a gas to the resist while mixing them or by alternately jetting the resist removing liquid and the gas to the resist, wherein uniformity relative to removal of the resist by the resist removing liquid is secured at an extremely high level.
    Type: Grant
    Filed: July 17, 1992
    Date of Patent: August 22, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventor: Isao Imamura
  • Patent number: 5290667
    Abstract: In the preparation of a ink jet recording head by coating positive photoresist containing naphthoquinone diazide on a substrate, patterning the positive photoresist, then coating a photocurable material for liquid path formation, photocuring said material and dissolving the patterned photoresist thereby forming liquid paths, the patterned positive photoresist is subjected to flush exposure and degassing prior to the coating of the liquid path forming material in order to discharge the bubbles from the photoresist and to prevent eventual deformation of said material by the migrating bubbles generated from the positive photoresist.
    Type: Grant
    Filed: December 1, 1992
    Date of Patent: March 1, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shoji Shiba, Masashi Miyagawa, Isao Imamura, Akio Kashiwazaki
  • Patent number: 5224971
    Abstract: In a typical method of separating isotopes, a linear material is fed between electrodes arranged in a vacuum vessel. Joule heat is generated by supplying a current to the linear material. A vapor flow is produced by heating and evaporating the linear material. Only a specific isotope in the vapor flow is selectively ionized by radiating a laser beam on the vapor flow. The ionized isotope is separated by using at least one of electric and magnetic fields. A typical isotope separating apparatus includes a vacuum vessel, a material feeder, a power source system, a laser optical system, and an ion separating unit. The material feeder feeds a linear material containing a plurality of types of isotopes between electrodes in the vacuum vessel. The power source system supplies a current to the linear material to heat and evaporate it.
    Type: Grant
    Filed: June 21, 1991
    Date of Patent: July 6, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hidetoshi Mukaida, Hitomi Yamamoto, Motohisa Abe, Isao Imamura, Kazunori Shioda