Abstract: The invention is related to an examining test paper which comprises an upper substrate, a lower substrate, an upper insulation sheet, a lower insulation sheet and a separator. Each of the upper and lower substrates comprises surface, a notch, a connection area, a reaction area, and an electrode layer. The notch is recessed on a proximal end. The connection area is adjacent to the notch. The reaction area and the electrode layer are defined on the surface. The upper and lower insulation sheets are respectively connected to the upper and lower substrates, and each comprises an upper surface, a lower surface, and a permeation portion. The separator is connected to the upper and lower insulation sheets and comprises two permeation portions corresponding to the permeation portions of the upper and lower insulation sheets, respectively.

Abstract: A lower electrode plate receives radiofrequency power. A first upper plate is positioned parallel to and spaced apart from the lower electrode plate. A grounded second upper plate is positioned next to the first upper plate. A dielectric support provides support of a workpiece within a region between the lower electrode plate and the first upper plate. A purge gas is supplied at a central location of the first upper plate. A process gas is supplied to a periphery of the first upper plate. The dielectric support positions the workpiece proximate and parallel to the first upper plate, such that the purge gas flows over a top surface of the workpiece so as to prevent the process gas from flowing over the top surface of the workpiece, and so as to cause the process gas to flow around a peripheral edge of the workpiece and below the workpiece.

Abstract: A valve assembly is provided herein. The valve assembly may include a valve stem coupled to a coil spring and an impact dampening tappet partially enclosing the spring and valve stem and in contact with a cam, the impact dampening tappet including an exterior metal layer having a cam contacting surface and an interior elastomeric layer traversing at least a portion of the interior surface of the exterior metal layer.

Abstract: A bicycle frame assembly is formed of a head tube, a seat tube, a linking member, and a support holder. The linking member includes a first part, two second parts, and two positioning parts. The first part is connected with the seat tube. The two positioning parts are spaced from each other and extend in an interval toward the head tube from the first part to jointly form a limiting portion therebetween. The two second parts are connected with the head tube and located between the head tube and the two positioning parts. The support holder is movably mounted to the limiting portion relative to the linking member for accommodating a portable part or accessory. Therefore, the present invention facilitates that the rider can take or put the portable part or accessory from or into the support holder with his or her natural riding posture.

Abstract: Methods and systems to perform a computer task in a reduced power consumption state, including to virtualize physical resources with respect to an operating environment and service environment, to exit the operating environment and enter the service environment, to place a first set of one or more of the physical resources in a reduced power consumption state, and to perform a task in the service environment utilizing a processor and a second set of one or more of the physical resources. A physical resource may be assigned to an operating environment upon an initialization of the operating environment, and re-assigned to the service environment to be utilized by the service environment while other physical resources are placed in a reduced power consumption state.

Abstract: Embodiments may provide a valve train for an engine including a valve stem configured for reciprocating movement to open and close a port in a combustion chamber of the engine. The valve train may also include an elastomeric element coupled with the valve stem, and a mass may be coupled with the elastomeric element and able to move relative to the valve stem.

Abstract: Embodiments may provide a valve seat insert including a valve seat face. A circumferential contact surface for contacting a cylinder head may be located radially outside and at least partially axially offset from the valve seat face. A discontinuity may be located radially between the valve seat face and the cylinder head and at least partially axially aligned with the valve seat face.

Abstract: Systems and methods, including computer software implementations, involve identifying a first set of device capabilities associated with an electronic device. The first set of device capabilities include one or more device capabilities. A description of the first set of device capabilities is provided to a remote source, and a first device profile identifier is received from the remote source. The first device profile identifier is associated with the first set of device capabilities. The first device profile identifier is stored on the electronic device, and the received first device profile identifier is included in a communication to the remote source.

Abstract: Methods and apparatus for more efficiently cleaning a substrate having a notch in a plasma processing chamber configured for bevel edge cleaning. A notched plasma exclusion ring an inner periphery and an outer periphery is provided. The notched plasma exclusion ring has a ring notch formed at its outer periphery. The notched plasma exclusion ring has a notch apex dimension that is at least as large as a notch apex dimension of the substrate notch and a notch opening dimension that is at least as large as a notch opening dimension of the substrate notch. Methods for obtaining misalignment data and for subsequently rotate substrates to more efficiently clean the substrate notch are also disclosed.

Abstract: A valve assembly is provided herein. The valve assembly may include a valve stem coupled to a coil spring and an impact dampening tappet partially enclosing the spring and valve stem and in contact with a cam, the impact dampening tappet including an exterior metal layer having a cam contacting surface and an interior elastomeric layer traversing at least a portion of the interior surface of the exterior metal layer.

Abstract: A frame assembly capable of self-stretching fabric evenly has an outer frame, a demountable inner frame mounted in the outer frame and a positioning mechanism with retaining flaps and engaging sections disposed between the inner frame and the outer frame. A patterned fabric covers a front of the inner frame and is wrapped on an outer annular surface of the inner frame. The inner frame is then pushed into the outer frame, so the fabric is held between the outer frame and the inner frame, and is stretched and evenly smoothed by the positioning mechanism of the frame assembly. When the inner frame is pushed out of outer frame, the fabric can be changed and replaced with another fabric with a different pattern. Therefore, replacing the fabrics on the frame assembly is easy and the fabrics are not damaged.

Abstract: An apparatus for etching a bevel edge of a substrate includes a bevel etch chamber and a controller including non-transitory computer readable media. The computer readable media includes computer readable code for providing a cleaning gas comprising at least one of a CO2 or CO, computer readable code for forming a cleaning plasma from the cleaning gas, and computer readable code for cleaning the bevel edge with the cleaning plasma, including computer readable code for placing the gas distribution plate at a close distance from a top surface of the substrate such that the cleaning plasma is not formed between the gas distribution plate and the substrate during the bevel edge cleaning, the bevel edge exposed to the cleaning plasma including at least an edge portion of a top surface at an edge of the substrate.

Abstract: A method and apparatus for processing a bevel edge is provided. A substrate is placed in a bevel processing chamber and a passivation layer is formed on the substrate only around a bevel region of the substrate using a passivation plasma confined in a peripheral region of the bevel processing chamber. The substrate may undergo a subsequent semiconductor process, during which the bevel edge region of the substrate is protected by the passivation layer. Alternatively, the passivation layer may be patterned using a patterning plasma formed in an outer peripheral region of the processing chamber, the patterning plasma being confined by increasing plasma confinement. The passivation layer on outer edge portion of the bevel region is removed, while the passivation layer on an inner portion of the bevel region is maintained. The bevel edge of the substrate may be cleaned using the patterned passivation layer as a protective mask.

Abstract: A conductive substrate structure includes a substrate unit, a conductive pad unit, and a conductive layer unit. The substrate unit has a top surface, a bottom surface, two opposite lateral surfaces, and a front surface. The conductive pad unit has at least two first conductive pads separated from each other and disposed on the top surface, and at least two second conductive pads separated from each other and disposed on the bottom surface. The conductive layer unit has at least two first conductive layers formed on the front surface and respectively electrically connected to two front sides of the two first conductive pads, and at least two second conductive layers respectively formed on the two opposite lateral surfaces and respectively electrically connected to two opposite lateral sides of the two second conductive pads. The two first conductive layers are respectively electrically connected with the two second conductive layers.

Abstract: A tent having two joints, multiple frames and a fly. The frames are mounted on the joints and are classified into a stationary frame, a supporting frame and at least one pivoting frame. The frames cooperate to define a parking space for receiving a cycle when unfolding. The fly covers the frames and the parking space. The frames are capable of folding and overlapping one another to facilitate carrying and storage of the tent.

Abstract: A method for etching a bevel edge of a substrate is provided. A patterned photoresist mask is formed over the etch layer. The bevel edge is cleaned comprising providing a cleaning gas comprising at least one of a CO2, CO, CxHy, H2, NH3, CxHyFz and a combination thereof, forming a cleaning plasma from the cleaning gas, and exposing the bevel edge to the cleaning plasma. Features are etched into the etch layer through the photoresist features and the photoresist mask is removed.

Abstract: Systems and methods, including computer software implementations, involve identifying a first set of device capabilities associated with an electronic device. The first set of device capabilities include one or more device capabilities. A description of the first set of device capabilities is provided to a remote source, and a first device profile identifier is received from the remote source. The first device profile identifier is associated with the first set of device capabilities. The first device profile identifier is stored on the electronic device, and the received first device profile identifier is included in a communication to the remote source.

Abstract: Methods, systems and program products for hiding the presentation of a first input field that would obscure the presentation of a distinct second input field on a display device. User input directed to the second input field is accepted and provided the first input field instead of to the second input field. The contents of the first input field are copied to the second input field. The presentation of the second input field is updated on the display device to include the copied contents.

Abstract: A semiconductor device and manufacturing method thereof are disclosed. The device comprises a semiconductor die, a passivation layer, a wiring redistribution layer (RDL), an Ni/Au layer, and a solder mask. The semiconductor die comprises a top metal exposed in an active surface thereof. The passivation layer overlies the active surface of the semiconductor die, and comprises a through passivation opening overlying the top metal. The wiring RDL, comprising an Al layer, overlies the passivation layer, and electrically connects to the top metal via the passivation opening. The solder mask overlies the passivation layer and the wiring RDL, exposing a terminal of the wiring RDL.

Abstract: A tent having two joints, multiple frames and a fly. The frames are mounted on the joints and are classified into a stationary frame, a supporting frame and at least one pivoting frame. The frames cooperate to define a parking space for receiving a cycle when unfolding. The fly covers the frames and the parking space. The frames are capable of folding and overlapping one another to facilitate carrying and storage of the tent.