Abstract: A silicate glass that is tough and scratch resistant. The toughness is increased by minimizing the number of non-bridging oxygen atoms in the glass. In one embodiment, the silicate glass is an aluminoborosilicate glass in which ?15 mol %?(R2O+R?O?Al2O3?ZrO2)?B2O3?4 mol %, where R is one of Li, Na, K, Rb, and Cs, and R? is one of Mg, Ca, Sr, and Ba.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature.

Abstract: Methods are disclosed for treating zircon-containing forming structures, e.g., zircon isopipes, with one or more treatment glass compositions in which defect-causing reactions between the zircon of the forming structure and molten glass are suppressed at the delivery temperature of the treatment glass. The treatment compositions can be used during start-up of a forming structure, between runs of the same production glass on a given forming structure, and/or when transitioning between runs of two production glasses on a given forming structure. The treatment compositions can be used with production glasses that are ion-exchangeable.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Abstract: Ion exchangeable boroaluminosilicate glasses having high levels of intrinsic scratch resistance are provided. The glasses include the network formers SiO2, B2O3, and Al2O3, and at least one of Li2O, Na2O, and K2O. When ion exchanged these glasses may have a Knoop scratch initiation threshold of at least about 40 Newtons (N). These glasses may also be used to form a clad layer for a glass laminate in which the core layer has a coefficient of thermal expansion that is greater than that of the clad glass.

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least 10 kilogram force (kgf).

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Abstract: A silicate glass that is tough and scratch resistant. The toughness is increased by minimizing the number of non-bridging oxygen atoms in the glass. In one embodiment, the silicate glass is an aluminoborosilicate glass in which ?15 mol %?(R2O+R?O—Al2O3—ZrO2)—B2O3?4 mol %, where R is one of Li, Na, K, Rb, and Cs, and R? is one of Mg, Ca, Sr, and Ba.

Abstract: Alkali-doped boroaluminosilicate glasses are provided. The glasses include the network formers SiO2, B2O3, and Al2O3. The glass may, in some embodiments, have a Young's modulus of less than about 65 GPa and/or a coefficient of thermal expansion of less than about 40×10?7/° C. The glass may be used as a cover glass for electronic devices, a color filter substrate, a thin film transistor substrate, or an outer clad layer for a glass laminate.

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least 10 kilogram force (kgf).

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least 10 kilogram force (kgf).

Abstract: A glass that is down-drawable and ion exchangeable. The glass has a temperature T35kp which the viscosity is 35 kilopoise. T35kp is less than the breakdown temperature Tbreakdown of zircon.

Abstract: The present disclosure relates to glass articles for use as a touchscreen substrate for use in a portable electronic device, particularly comprising an alkali-free aluminosilicate glass exhibiting a high damage threshold of at least 1000 gf, as measured by the lack of the presence of median/radial cracks when a load is applied to the glass using a Vickers indenter, a scratch resistance of at least 900 gf, as measured by the lack of the presence of lateral cracks when a load is applied by a moving Knoop indenter and a linear coefficient of thermal expansion (CTE) over the temperature range 0-300° C. which satisfies the relationship: 25×10-7/° C.?CTE?40×10-7/° C.

Abstract: Alkali-free phosphoboroaluminosilicate glasses are provided. The glasses include the network formers SiO2, B2O3, and at least one of Al2O3 and P2O5. The glass may, in some embodiments, have a Young's modulus of less than about 78 GPa and/or a coefficient of thermal expansion, averaged over a temperature range from about 20° C. to about 300° C., of less than about 38×10?7/° C. The glass may be used as a cover glass for electronic devices or as an outer clad layer for a glass laminate.

Abstract: Fusion-formable sodium-containing aluminosilicate and boroaluminosilicate glasses are described. The glasses are particularly useful for controlled release of sodium—useful in semiconductor applications, such as thin film photovoltaics where the sodium required to optimize cell efficiency is to be derived from the substrate glass.

Abstract: Described herein are aluminoborosilicate glass compositions that are substantially alkali-free and exhibit desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs). The glass compositions can be formed into glass sheets by, for example, the float process. When used as substrates, the glass sheets exhibit dimensional stability during processing and damage resistance during cutting.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature.

Abstract: Methods are disclosed for treating zircon-containing forming structures, e.g., zircon isopipes, with one or more treatment glass compositions in which defect-causing reactions between the zircon of the forming structure and molten glass are suppressed at the delivery temperature of the treatment glass. The treatment compositions can be used during start-up of a forming structure, between runs of the same production glass on a given forming structure, and/or when transitioning between runs of two production glasses on a given forming structure. The treatment compositions can be used with production glasses that are ion-exchangeable.

Abstract: Ion exchangeable glass compositions that develop concentration profiles and stress profiles that have higher magnitudes of concentration and compressive stress profiles than those provided by the error function (erfc)-shaped compressive stress profile for similar surface concentrations of stress-inducing components such as K+ or K2O and stresses. The advantaged stress profile is the result of a glass composition that is low in K2O (or potassium) in the base glass prior to ion exchange. A glass comprising lower amounts of K+ or K2O has a stronger dependence of diffusivity on concentration, leading to a non-erfc-shaped concentration profile. Several glass compositions that contain low amounts of K+ or K2O exhibit this beneficial effect, whereas other glasses containing higher amounts of K+ or K2O do not exhibit this effect.