Patents by Inventor James J. Alwan

James J. Alwan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6620496
    Abstract: A method for removing a surface protrusion projecting from a layer of a first material deposited on a surface of a substrate. In accordance with one embodiment of the invention, a layer of a second material is applied on the layer of first material. A sufficient quantity of the second material is removed to expose the surface protrusion. The first material exposed through the surface protrusion is then removed.
    Type: Grant
    Filed: November 16, 2001
    Date of Patent: September 16, 2003
    Assignee: Micron Technology, Inc.
    Inventors: Craig M. Carpenter, James J. Alwan
  • Patent number: 6592419
    Abstract: A process for fabricating a flat panel display having a faceplate and a baseplate comprises creating an electric field between the faceplate and the baseplate to temporarily attract the faceplate to the baseplate and attaching the baseplate and faceplate to each other while the electric field is present. Capacitor(s) are formed on the faceplate and/or baseplate of a flat panel display such that a portion of the capacitor(s) is formed on the faceplate and is aligned with the pixel matrix and/or a portion of the capacitor(s) is formed on the baseplate and is aligned with the cathode member. The first and second portions of the capacitor(s) are energized to opposite polarity voltages, and an electric field is generated which attracts and aligns the two portions of the capacitor(s) to each other. When the two portions of the capacitor(s) are aligned and attracted to each other, the pixel matrix and cathode assembly are inherently aligned with each other.
    Type: Grant
    Filed: October 22, 2001
    Date of Patent: July 15, 2003
    Assignee: Micron Technology, Inc.
    Inventor: James J. Alwan
  • Patent number: 6586144
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: July 1, 2003
    Assignee: Micron Technology, Inc.
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Patent number: 6573023
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Grant
    Filed: December 10, 1999
    Date of Patent: June 3, 2003
    Assignee: Micron Technology, Inc.
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Publication number: 20030085650
    Abstract: The disclosed method for forming a field emission display includes forming a cathode and an anode, forming a plurality of photoresist posts over the cathode, and coating the posts with a coating material. The coating material forms sidewalls around the posts. The photoresist posts may then be removed from within the sidewalls. The anode may then be fitted onto the sidewalls so that the sidewalls function as spacers in the field emission display.
    Type: Application
    Filed: December 16, 2002
    Publication date: May 8, 2003
    Applicant: Micron Technology, Inc.
    Inventors: David A. Cathey, James J. Alwan
  • Patent number: 6558570
    Abstract: A method for polishing a grid of a field emission display (FED) with a polishing slurry contain very small particle of colloidal particles of amorphous silica in an alkaline medium. The method results in highly selective planarization well-suited for chemical-mechanical polishing (CMP) of the grid for the self-aligned CMP-FED fabrication process. An FED grid made according to this method is also disclosed.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: May 6, 2003
    Assignee: Micron Technology, Inc.
    Inventors: James J. Alwan, Craig M. Carpenter
  • Patent number: 6537728
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: March 25, 2003
    Assignee: Micron Technology, Inc.
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Publication number: 20030048513
    Abstract: An optical transceiver such as used, for example, in a wireless optical network (WON), includes multiple laser sources including a first laser source configured to transmit a first output channel beam having a first optical characteristic and at least a second laser source configured to transmit a second output channel beam having a second optical characteristic; multiple detectors including a first detector configured to detect a first input channel beam having the first optical characteristic and at least a second detector configured to detect a second input channel beam having the second optical characteristic; and multiple apertures including a first aperture through which the first output channel beam and the second input channel beam pass and a second aperture through which the second output channel beam and the first input channel beam pass.
    Type: Application
    Filed: November 1, 2002
    Publication date: March 13, 2003
    Inventors: Scott H. Bloom, Victor J. Chan, James J. Alwan
  • Publication number: 20030022076
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Application
    Filed: September 23, 2002
    Publication date: January 30, 2003
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Patent number: 6507329
    Abstract: A semiconductor device for use in field emission displays includes a substrate formed from a semiconductor material, glass, soda lime, or plastic. A first layer of a conductive material is formed on the substrate. A second layer of microcrystalline silicon is formed on the first layer. This layer has characteristics that do not fluctuate in response to conditions that vary during the operation of the field emission display, particularly the varying light intensity from the emitted electrons or from the ambient. One or more cold-cathode emitters are formed on the second layer.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: January 14, 2003
    Assignee: Micron Technology, Inc.
    Inventors: David A. Cathey, Jr., Kevin W. Tjaden, Behnam Moradi, John K. Lee, James J. Alwan
  • Patent number: 6458515
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: October 1, 2002
    Assignee: Micron Technology, Inc.
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Patent number: 6425791
    Abstract: A field emission device is disclosed having a buffer layer positioned between an underlying cathode conductive layer and an overlying resistor layer. The buffer layer consists of substantially undoped amorphous silicon. Any pinhole defects or discontinuities that extend through the resistor layer terminate at the buffer layer, thereby preventing the problems otherwise caused by pinhole defects. In particular, the buffer layer prevents breakdown of the resistor layer, thereby reducing the possibility of short circuiting. The buffer layer further reduces the risk of delamination of various layers or other irregularities arising from subsequent processing steps. Also disclosed are methods of making and using the field emission device having the buffer layer.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: July 30, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Kanwal K. Raina, James J. Alwan
  • Publication number: 20020098700
    Abstract: A method for polishing a grid of a field emission display (FED) with a polishing slurry contain very small particle of colloidal particles of amorphous silica in an alkaline medium. The method results in highly selective planarization well-suited for chemical-mechanical polishing (CMP) of the grid for the self-aligned CMP-FED fabrication process. An FED grid made according to this method is also disclosed.
    Type: Application
    Filed: August 7, 2001
    Publication date: July 25, 2002
    Inventors: James J. Alwan, Craig M. Carpenter
  • Publication number: 20020089727
    Abstract: A system and method for use with an optical communication beam of light is disclosed. The system allows the beam of light to operate at an adequate power level that provides a robust optical link while minimizing any safety risk to humans. Such a system includes multiple operating modes which control the power output of the beam of light. In the normal mode, the beam of light operates at a selected power level which provides a desired signal to noise ratio. Once a blocking occurs, the beam of light enters a power reduction mode to prevent harm to the blocking object. An acquisition and recovery mode is then employed to reestablish the blocked communication link.
    Type: Application
    Filed: August 28, 2001
    Publication date: July 11, 2002
    Inventors: James J. Alwan, Victor Jim Chan, Scott Harris Bloom, Glenn Claude Hoiseth, Scott Platenberg, Raymond Dennis Rogers
  • Patent number: 6409835
    Abstract: In one aspect, the invention includes a method of forming a layer of particulates on a substrate, comprising: a) fastening a first substrate to a second substrate; b) while the first substrate is fastened to the second substrate, submerging at least a portion of the first substrate in a liquid; c) suspending particulates on an upper surface of the liquid; d) moving the submerged first substrate relative to the suspended particulates to form a layer of the particulates supported on the first substrate; and e) removing the first substrate from the second substrate.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: June 25, 2002
    Assignee: Micron Technology, Inc.
    Inventor: James J. Alwan
  • Publication number: 20020076620
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Application
    Filed: December 10, 1999
    Publication date: June 20, 2002
    Inventors: JOHN MICHIELS, DAVID WELLS, ERIC J. KNAPPENBERGER, JAMES J. ALWAN
  • Patent number: 6407499
    Abstract: A method for removing a surface protrusion projecting from a layer of a first material deposited on a surface of a substrate. In accordance with one embodiment of the invention, a layer of a second material is applied on the layer of first material. A sufficient quantity of the second material is removed to expose the surface protrusion. The first material exposed through the surface protrusion is then removed.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: June 18, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Craig M. Carpenter, James J. Alwan
  • Publication number: 20020072291
    Abstract: A process for fabricating a flat panel display having a faceplate and a baseplate comprises creating an electric field between the faceplate and the baseplate to temporarily attract the faceplate to the baseplate and attaching the baseplate and faceplate to each other while the electric field is present. Capacitor(s) are formed on the faceplate and/or baseplate of a flat panel display such that a portion of the capacitor(s) is formed on the faceplate and is aligned with the pixel matrix and/or a portion of the capacitor(s) is formed on the baseplate and is aligned with the cathode member. The first and second portions of the capacitor(s) are energized to opposite polarity voltages, and an electric field is generated which attracts and aligns the two portions of the capacitor(s) to each other. When the two portions of the capacitor(s) are aligned and attracted to each other, the pixel matrix and cathode assembly are inherently aligned with each other.
    Type: Application
    Filed: October 22, 2001
    Publication date: June 13, 2002
    Inventor: James J. Alwan
  • Patent number: 6392334
    Abstract: A process for fabricating a flat panel display having a faceplate and a baseplate comprises creating an electric field between the faceplate and the baseplate to temporarily attract the faceplate to the baseplate and attaching the baseplate and faceplate to each other while the electric field is present. Capacitor(s) are formed on the faceplate and/or baseplate of a flat panel display such that a portion of the capacitor(s) is formed on the faceplate and is aligned with the pixel matrix and/or a portion of the capacitor(s) is formed on the baseplate and is aligned with the cathode member. The first and second portions of the capacitor(s) are energized to opposite polarity voltages, and an electric field is generated which attracts and aligns the two portions of the capacitor(s) to each other. When the two portions of the capacitor(s) are aligned and attracted to each other, the pixel matrix and cathode assembly are inherently aligned with each other.
    Type: Grant
    Filed: October 13, 1998
    Date of Patent: May 21, 2002
    Assignee: Micron Technology, Inc.
    Inventor: James J. Alwan
  • Publication number: 20020058455
    Abstract: A method for removing a surface protrusion projecting from a layer of a first material deposited on a surface of a substrate. In accordance with one embodiment of the invention, a layer of a second material is applied on the layer of first material. A sufficient quantity of the second material is removed to expose the surface protrusion. The first material exposed through the surface protrusion is then removed.
    Type: Application
    Filed: November 16, 2001
    Publication date: May 16, 2002
    Inventors: Craig M. Carpenter, James J. Alwan