Patents by Inventor Jean M. J. Fréchet

Jean M. J. Fréchet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5306561
    Abstract: Polymer particles having a hydrophobic core and various surface functional groups, particularly hydrophilic and chiral surface functional groups, are produced by adding a non-emulsified functional polymerizable monomer to the aqueous phase of a dispersion of soluble polymer particles which have previously been swollen with an emulsified-monomer and polymerizing the monomers. Preferably the particles are uniform macroporous beads.
    Type: Grant
    Filed: February 20, 1992
    Date of Patent: April 26, 1994
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Ken Hosoya
  • Patent number: 5214105
    Abstract: Novel styrene derivatives are disclosed of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon group, and R.sub.3 is --OH, Cl, or a group of the formula --OR.sub.4 or ##STR2## wherein R.sub.4 represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon groups. The functionalized styrene monomers I as well as polymers and copolymers incorporating such monomer units are useful as initiators, or precursors thereof, for the polymerization of isobutylene under cationic conditions to give graft copolymers containing both styrenic and isobutylenic units. These copolymers have commercial applications such as rubbers, coatings, and luricants.
    Type: Grant
    Filed: October 11, 1991
    Date of Patent: May 25, 1993
    Assignee: University of Ottawa
    Inventor: Jean M. J. Frechet
  • Patent number: 5210148
    Abstract: Novel styrene derivatives are disclosed of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon group, and R.sub.3 is --OH, Cl, or a group of the formula --OR.sub.4 or ##STR2## wherein R.sub.4 represents a saturated aliphatic hydrocarbon group or a n aromatic hydrocarbon group. The functionalized styrene monomers I as well as polymers and copolymers incorporating such monomer units are useful as initiators, or precursors thereof, for the polymerization of isobutylene under cationic conditions to give graft copolymers containing both styrenic and isobutylenic units. These copolymers have commercial applications such as rubbers, coatings, and lubricants.
    Type: Grant
    Filed: November 13, 1991
    Date of Patent: May 11, 1993
    Assignee: University of Ottawa
    Inventor: Jean M. J. Frechet
  • Patent number: 5139696
    Abstract: Novel thermotropic liquid crystal complexes are produced by hydrogen bonding, essentially along the long axes, of two different thermotropic mesogenic compounds. The resultant new mesogenic complexes so produced exhibit mesogenic behavior not only over an expanded temperature range than both of the parent compounds, but also at a higher temperature than for either compound individually. This invention is applicable to both nematic and smectic mesogens.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: August 18, 1992
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Takashi Kato
  • Patent number: 5130343
    Abstract: A process for producing macroporous polymer beads from a multiphase emulsion using soluble polymer particles as the primary porogen is disclosed. The beads produced are of uniform size and shape.
    Type: Grant
    Filed: March 13, 1991
    Date of Patent: July 14, 1992
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Frantisek Svec, Ken Hosoya
  • Patent number: 5084522
    Abstract: Novel styrene derivatives are disclosed of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon group, and R.sub.3 is --OH, Cl, or a group of the formula --OR.sub.4 or ##STR2## wherein R.sub.4 represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon group. The functionalized styrene monomers I as well as polymers and copolymers incorporating such monomer units are useful as initiators, or precursors thereof, for the polymerization of isobutylene under cationic conditions to give graft copolymers containing both styrenic and isobutylenic units. These copolymers have commercial applications such as rubbers, coatings, and lubricants.
    Type: Grant
    Filed: February 5, 1988
    Date of Patent: January 28, 1992
    Assignee: University of Ottawa
    Inventor: Jean M. J. Frechet
  • Patent number: 5041516
    Abstract: Dendritic macromolecules and a novel convergent process for producing the same are disclosed. The convergent process enables the accurate control and design of the surface functionality of the macromolecule.
    Type: Grant
    Filed: June 21, 1989
    Date of Patent: August 20, 1991
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Craig J. Hawker, Athena E. Philippides
  • Patent number: 5037574
    Abstract: Novel thermotropic liquid crystal complexes are produced by hydrogen bonding, essentially along the long axes, of two different thermotropic mesogenic compounds. The resultant new mesogenic complexes so produced exhibit mesogenic behavior not only over an expanded temperature range than both of the parent compounds, but also at a higher temperature than for either compound individually. This invention is applicable to both nematic and smectic mesogens.
    Type: Grant
    Filed: May 19, 1989
    Date of Patent: August 6, 1991
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Jean M. J. Frechet, Takashi Kato
  • Patent number: 4939070
    Abstract: The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permit deep UV imaging, can be used to produce resist structures having thermal stability at temperatures greater than about 160.degree. C., and are sufficiently resistant to excessive crosslinking when heated to temperatures ranging from about 160.degree. C. to about 250.degree. C. that they remain soluble in common lithographic developers and strippers.The present invention also discloses resists comprising substituted polyvinyl benzoates which, after imaging, exhibit unexpectedly high thermal stability, in terms of plastic flow.
    Type: Grant
    Filed: July 7, 1988
    Date of Patent: July 3, 1990
    Inventors: William R. Brunsvold, Ming-Fea Chow, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet, George J. Hefferon, Hiroshi Ito, Nancy E. Iwamoto, Carlton G. Willson
  • Patent number: 4921923
    Abstract: Oligomeric condensation products of certain diketones and phenols can be end-capped with a vinylbenzyl moiety and certain other moieties, especially alkyl groups, to afford thermosetting resins particularly valuable in making laminated circuit boards. Resins prepared by the reaction of 1 molar proportion of diacetylbenzene with from 3.5 to 4.0 molar proportions of phenol and end-capped with from 50 to 100% vinylbenzyl groups with the remainder being alkyls of 1 through 11 carbon atoms are particularly useful.
    Type: Grant
    Filed: November 18, 1988
    Date of Patent: May 1, 1990
    Assignee: Allied Signal Inc.
    Inventors: Joseph J. Zupancic, Jean M. J. Frechet, Andrew M. Zweig, Jeffrey P. Conrad
  • Patent number: 4824920
    Abstract: The resins resulting from converting dicyclopentadiene-phenol adducts to their corresponding vinylbenzyl ethers are an excellent matrix in which to embed fibers to produce a composite. Such resins, especially as a blend of materials with varying molecular weight distribution, are amorphous materials whose glass transition temperature is well under the curing temperature, and whose solubility permits solutions with high solids content so as to afford coatings with high resin content. The extensively crosslinked polymer resulting from therma, photochemical, or free radical initiated polymerization has excellent thermal and electrical properties for use in multilayer circuit boards.
    Type: Grant
    Filed: November 30, 1987
    Date of Patent: April 25, 1989
    Assignee: Allied-Signal Inc.
    Inventors: Joseph J. Zupancic, Jeffrey P. Conrad, James A. Wrezel, Andrew M. Zweig, Jean M. J. Frechet
  • Patent number: 4816498
    Abstract: Oligomeric condensation products of certain dialdehydes and phenols can be end-capped with a vinylbenzyl moiety and certain other moieties, especially alkyl groups, to afford thermosetting resins particularly valuable in making laminated circuit boards. Resins prepared by the reaction of 1 molar proportion of glyoxal with from 3 to 4 molar proportions of phenol and end-capped with from 50 to 85% vinylbenzyl groups with the remainder being alkyls of 1 through 11 carbon atoms are particularly useful.
    Type: Grant
    Filed: November 30, 1987
    Date of Patent: March 28, 1989
    Assignee: Allied-Signal Inc.
    Inventors: Joseph J. Zupancic, Jean M. J. Frechet, Andrew M. Zweig, Jeffery P. Conrad
  • Patent number: 4801517
    Abstract: An electrostatographic imagining member and an electrophotographic imaging process for using the imaging member are disclosed in which the imaging member comprises a substrate and at least one electroconductive layer, the imaging member comprising a polymeric arylamine compound represented by the formula: ##STR1## wherein: n is between about 5 and 5,000,m is 0 or 1,Z is selected from certain specified aromatic and fused ring groups,Ar is selected from certain specified aromatic groups,R is selected from certain specified alkyl groups,Ar' is selected from certain specified aromatic groups, andR' and R" are independently selected from certain specified alkylene groups.
    Type: Grant
    Filed: June 10, 1987
    Date of Patent: January 31, 1989
    Assignee: Xerox Corporation
    Inventors: Jean M. J. Frechet, Sylvie Gauthier, William W. Limburg, Rafik O. Loutfy, Dasarao K. Murti, John W. Spiewak
  • Patent number: 4800152
    Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
    Type: Grant
    Filed: March 16, 1987
    Date of Patent: January 24, 1989
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Jean M. J. Frechet, Robert J. Twieg, Carlton G. Willson
  • Patent number: 4657845
    Abstract: A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.
    Type: Grant
    Filed: January 14, 1986
    Date of Patent: April 14, 1987
    Assignee: International Business Machines Corporation
    Inventors: Jean M. J. Frechet, Hiroshi Ito, Scott A. MacDonald, Carlton G. Willson
  • Patent number: 4491628
    Abstract: Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
    Type: Grant
    Filed: August 23, 1982
    Date of Patent: January 1, 1985
    Assignee: International Business Machines Corporation
    Inventors: Hiroshi Ito, Carlton G. Willson, Jean M. J. Frechet