Abstract: A flip-flop may include a first master stage for latching data, a second slave stage for latching data, and an input multiplexer circuit receiving, as input, data to be latched in the flip-flop. The multiplexer may have single clock phase. The first master stage may be clocked based upon a clock phase, whereas the second stage may be clocked based upon another clock phase.

Abstract: A flip-flop may include a first master stage for latching data, a second slave stage for latching data, and an input multiplexer circuit receiving, as input, data to be latched in the flip-flop. The multiplexer may have single clock phase. The first master stage may be clocked based upon a clock phase, whereas the second stage may be clocked based upon another clock phase.

Abstract: An integrated circuit memory of the read-only memory type includes at least one memory cell. Each memory cell includes a storage transistor realized in a semiconductor substrate and presenting a source connected to a reference potential, a gate connected to an electrically conductive word line, and a drain connected to an electrically conductive bit line by an optional connection depending on whether the memory cell is assigned the value 0 or 1. The storage transistor of each memory cell includes a gate formed on the substrate, in the form of a window whose inner contour delimits a central drain region in the substrate, and whose outer contour delimits at least one source region in the substrate.

Abstract: The invention concerns a capacitor whereof one first electrode consists of a highly doped active region (D) of a semiconductor component (T) formed on one side of a surface of a semiconductor body, and whereof the second electrode consists of a conductive region (BR) coated with insulation (IL) formed beneath said active region and embedded in the semiconductor body.

Abstract: A semiconductor device includes several assembled integrated-circuit chips. A main integrated-circuit chip has at least one cavity in which electrical contacts are provided. A secondary integrated-circuit chip includes an edge which engages in the cavity of the main chip and has electrical contacts. When the secondary integrated-circuit chip is inserted into the cavity, the electrical contacts of the main chip and the electrical contacts of the secondary chip are placed so as to be in contact with one another.

Abstract: A one-time programmable, dual-bit memory device comprises one MOS storage transistor having a semiconductor substrate, first and second active regions formed under the surface of the substrate being separated by a part of the substrate forming a channel region, a gate formed on the surface of the said substrate in line with the channel region and whose respective distal ends are aligned with a part of the first active region and with a part of the second active region, respectively, which gate is permanently held at ground potential, and a gate oxide layer running between the gate and the surface of the substrate. The intact or broken down state between the gate and the first active region determines a stored value of a first bit, and the intact or broken down state between the gate and the second active region determines a stored value of a second bit.

Abstract: An integrated circuit including an assembly of functional blocks and an interconnection network formed of at least N levels of conductive tracks separated by conductive via levels, the interconnection network including a power supply network comprising a first assembly of substantially parallel rails placed at the N-th track level, and a second assembly of substantially parallel rails placed at the (N?1)-th track level under the first rail assembly, the rails of the first assembly being non-parallel to those of the second assembly, the power supply network further including, for each functional block, a third assembly of power supply rails placed at the (N?2)-th track level above the elements of the considered block, and in which the rails of the second assembly form an acute angle smaller than 80° with the rails of each third rail assembly.

Abstract: A static memory device includes at least one memory cell with two cross-coupled CMOS inverters to be connected to first and second voltages. The substrate of the NMOS transistor of a first CMOS inverter is electrically insulated from the substrate of the NMOS transistor of the second CMOS inverter. The two substrates can be biased with the first voltage. A clear flash controller flash clears the cells for temporarily bring the bias of the substrate of the NMOS transistor of the first CMOS inverter to the second voltage.

Abstract: A semiconductor cell includes, within a substrate region, four active zones that are mutually laterally isolated, the first active zone to be connected to a first voltage, the second active zone, of an opposite type of conductivity to that of the first active zone, to be connected to a second voltage, the third and fourth active zones being mutually connected via an electrically conducting connection external to the substrate. The value of the binary data item is defined by an implantation of a chosen type in a predetermined part of the substrate region or in the third and fourth active zones.

Abstract: A storage circuit using a dual-access memory includes means for alternately activating one access, then the other, with a maximum frequency equal to twice the maximum possible frequency of activation of a given access. At least two successive activations of the means control operations of the same type, either reading or writing operations.

Abstract: A memory circuit with an error correcting system comprising an address bus (102), an input data bus (108), and an output data bus (115), the circuit comprising a memory having an address bus (113), a data bus (114) and an error correcting circuit comprising an encoder (107). A first address register (104) is connected to the input address bus of the circuit for successively storing addresses corresponding to memory write operations only. A second data register (105) is connected to the input data bus of the circuit (108) for storing data transmitted to the encoder (107). Circuits make it possible to introduce a one-cycle shift into the memory writes, without modifying reads, giving the encoder more time to compute error correcting codes.

Abstract: A semiconductor device includes several assembled integrated-circuit chips. A main integrated-circuit chip has at least one cavity in which electrical contacts are provided. A secondary integrated-circuit chip includes an edge which engages in the cavity of the main chip and has electrical contacts. When the secondary integrated-circuit chip is inserted into the cavity, the electrical contacts of the main chip and the electrical contacts of the secondary chip are placed so as to be in contact with one another.

Abstract: A random access memory cell includes a pair of complementary bit lines, a bistable circuit including first and second complementary read/write terminals, and two storage nodes. The first storage node is provided by a first nMos transistor and a first pMos transistor, and the second storage node is provided by a second nMos transistor and a second pMos transistor. A first switch transistor is connected between the first terminal and one of the lines of the bit line pair, and a second switch transistor is connected between the second terminal and the other line (BL) of the bit line pair. The two nMos transistors of the bistable circuit have different threshold voltages.

Abstract: An integrated circuit including an assembly of functional blocks and an interconnection network formed of at least N levels of conductive tracks separated by conductive via levels, the interconnection network including a power supply network comprising a first assembly of substantially parallel rails placed at the N-th track level, and a second assembly of substantially parallel rails placed at the (N?1)-th track level under the first rail assembly, the rails of the first assembly being non-parallel to those of the second assembly, the power supply network further including, for each functional block, a third assembly of power supply rails placed at the (N—2)-th track level above the elements of the considered block, and in which the rails of the second assembly form an acute angle smaller than 80° with the rails of each third rail assembly.

Abstract: A memory cell includes a bipolar transistor buried in a first part of the substrate and a dielectric region formed from a dielectric material capable of being subject to irreversible breakdown in the presence of a breakdown voltage difference applied thereto. This dielectric region is disposed on top of the substrate and has a first surface in electrical contact with a first electrode of the transistor, and a second surface opposite to the first. A programming circuit applies a breakdown voltage difference between the second surface of the dielectric region and the control electrode of the transistor so as to make the p-n junction of the transistor, formed between the first electrode and the control electrode, conduct.

Abstract: An integrated electronic circuit comprises active components disposed on the surface of a substrate and connected by electrical connections disposed within a metallization level. A dielectric material situated between the surface of the substrate and the metallization level, or in the metallization level, has a locally higher value of dielectric permittivity so as to selectively increase a capacitance between certain portions of the active components or of the connections. An electrical state of the circuit in operation is then stabilized, thanks to a higher electrical charge carried by the portions of the active components or of the connections whose capacitance is enhanced. The circuit can be a static random access memory cell.

Abstract: A static memory device includes at least one memory cell with two cross-coupled CMOS inverters to be connected to first and second voltages. The substrate of the NMOS transistor of a first CMOS inverter is electrically insulated from the substrate of the NMOS transistor of the second CMOS inverter. The two substrates can be biased with the first voltage. A clear flash controller flash clears the cells for temporarily bring the bias of the substrate of the NMOS transistor of the first CMOS inverter to the second voltage.

Abstract: The invention concerns a capacitor whereof one first electrode consists of a highly doped active region (D) of a semiconductor component (T) formed on one side of a surface of a semiconductor body, and whereof the second electrode consists of a conductive region (BR) coated with insulation (IL) formed beneath said active region and embedded in the semiconductor body.

Abstract: A semiconductor cell includes, within a substrate region, four active zones that are mutually laterally isolated, the first active zone to be connected to a first voltage, the second active zone, of an opposite type of conductivity to that of the first active zone, to be connected to a second voltage, the third and fourth active zones being mutually connected via an electrically conducting connection external to the substrate. The value of the binary data item is defined by an implantation of a chosen type in a predetermined part of the substrate region or in the third and fourth active zones.

Abstract: A method of repairing a defect in an integrated electronic circuit caused by an incorrect lithographic mask includes the formation of an electrical isolation between two conducting parts of the circuit. The electrical isolation is obtained by at least partly filling, with an electrically insulating material, a volume hollowed out beforehand which would otherwise, and incorrectly, form an electrical connection between the two conducting parts. To do this, a mask having an aperture revealing the hollowed out volume is formed on the circuit, and the mask used to direct the filling of the electrically insulating material and correction of the lithography defined defect.