Patents by Inventor Jeffrey W. Elam

Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140255798
    Abstract: A cathode includes a carbon material having a surface, the surface having a first thin layer of an inert material and a first catalyst overlaying the first thin layer, the first catalyst including metal or metal oxide nanoparticles, wherein the cathode is configured for use as the cathode of a lithium-air battery.
    Type: Application
    Filed: March 6, 2013
    Publication date: September 11, 2014
    Applicant: UCHICAGO ARGONNE LLC
    Inventors: Khalil Amine, Jun Lu, Peng Du, Yu Lei, Jeffrey W. Elam
  • Publication number: 20140235436
    Abstract: A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.
    Type: Application
    Filed: April 30, 2014
    Publication date: August 21, 2014
    Applicant: Argonne National Laboratory
    Inventors: Jeffrey W. Elam, Christopher L. Marshall, Joseph A. Libera, James A. Dumesic, Yomaira J. Pagan-Torres
  • Publication number: 20140220244
    Abstract: A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.
    Type: Application
    Filed: February 7, 2014
    Publication date: August 7, 2014
    Applicant: UChicago Argonne LLC
    Inventors: Anil U. Mane, Joseph Libera, Jeffrey W. Elam
  • Publication number: 20140183369
    Abstract: Large-area, flat-panel photo-detectors with sub-nanosecond time resolution based on microchannel plates are provided. The large-area, flat-panel photo-detectors enable the economic construction of sampling calorimeters with, for example, enhanced capability to measure local energy deposition, depth-of-interaction, time-of-flight, and/or directionality of showers. In certain embodiments, sub-nanosecond timing resolution supplies correlated position and time measurements over large areas. The use of thin flat-panel viewing radiators on both sides of a radiation-creating medium allows simultaneous measurement of Cherenkov and scintillation radiation in each layer of the calorimeter. The detectors may be used in a variety of applications including, for example, medical imaging, security, and particle and nuclear physics.
    Type: Application
    Filed: November 26, 2013
    Publication date: July 3, 2014
    Applicant: The University of Chicago
    Inventors: Henry Frisch, Jean-Francois Genat, Herve Grabas, Chien-Min Kao, Chin-Tu Chen, Heejong Kim, Fukun Tang, Jeffrey W. Elam, Anil U. Mane
  • Patent number: 8741386
    Abstract: Methods and systems are provided for synthesis and deposition of chalcogenides (including Cu2ZnSnS4). Binary compounds, such as metal sulfides, can be deposited by alternating exposures of the substrate to a metal cation precursor and a chalcogen anion precursor with purge steps between.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: June 3, 2014
    Assignee: Uchicago Argonne, LLC
    Inventors: Elijah J. Thimsen, Shannon C. Riha, Alex B. F. Martinson, Jeffrey W. Elam, Michael J. Pellin
  • Patent number: 8741800
    Abstract: A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: June 3, 2014
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Christopher L. Marshall, Joseph A. Libera, James A. Dumesic, Yomaira J. Pagan-Torres
  • Publication number: 20140093645
    Abstract: Methods and systems are provided for synthesis and deposition of chalcogenides (including Cu2ZnSnS4). Binary compounds, such as metal sulfides, can be deposited by alternating exposures of the substrate to a metal cation precursor and a chalcogen anion precursor with purge steps between.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 3, 2014
    Inventors: Elijah J. THIMSEN, Shannon C. RIHA, Alex B.F. MARTINSON, Jeffrey W. ELAM, Michael J. PELLIN
  • Publication number: 20140053779
    Abstract: The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.
    Type: Application
    Filed: August 22, 2012
    Publication date: February 27, 2014
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Alex B. F. Martinson, Joseph A. Libera, Jeffrey W. Elam, Shannon C. Riha
  • Patent number: 8628727
    Abstract: The present invention relates to compositions, devices and methods for detecting microorganisms (e.g., anthrax). In particular, the present invention provides portable, surface-enhanced Raman biosensors, and associated substrates, and methods of using the same, for use in rapidly detecting and identifying microorganisms (e.g., anthrax).
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: January 14, 2014
    Assignee: Northwestern University
    Inventors: Richard P. Van Duyne, Xiaoyu Zhang, Jing Zhao, Alyson V. Whitney, Jeffrey W. Elam, George C. Schatz, Peter C. Stair, Shengli Zou, Matthew Young, Olga Lyandres
  • Publication number: 20140004381
    Abstract: An article and method of manufacture of a composite material. The method includes providing a starting scaffold with interfacial porosity, performing an infiltration step to fill the porosity and form a bond to the scaffold with an interface layer and forming an overlayer integrally coupled to the interface layer.
    Type: Application
    Filed: June 28, 2012
    Publication date: January 2, 2014
    Inventors: Jeffrey W. ELAM, Angel Yanguas-Gil
  • Publication number: 20130335190
    Abstract: A method and article of manufacture of intermixed tunable resistance composite materials. A conducting material and an insulating material are deposited by such methods as ALD or CVD to construct composites with intermixed materials which do not have structure or properties like their bulk counterparts.
    Type: Application
    Filed: June 15, 2012
    Publication date: December 19, 2013
    Inventors: Jeffrey W. ELAM, Anil U. Mane
  • Publication number: 20130330815
    Abstract: The present invention relates to compositions, devices and methods for detecting microorganisms (e.g., anthrax). In particular, the present invention provides portable, surface-enhanced Raman biosensors, and associated substrates, and methods of using the same, for use in rapidly detecting and identifying microorganisms (e.g., anthrax).
    Type: Application
    Filed: August 28, 2007
    Publication date: December 12, 2013
    Applicant: Northwestern University
    Inventors: Richard P. Van Duyne, Xiaoyu Zhang, Jing Zhao, Alyson V. Whitney, Jeffrey W. Elam, George C. Schatz, Peter C. Stair, Shengli Zou, Matthew Young, Olga Lyandres
  • Patent number: 8604440
    Abstract: Large-area, flat-panel photo-detectors with sub-nanosecond time resolution based on microchannel plates are provided. The large-area, flat-panel photo-detectors enable the economic construction of sampling calorimeters with, for example, enhanced capability to measure local energy deposition, depth-of-interaction, time-of-flight, and/or directionality of showers. In certain embodiments, sub-nanosecond timing resolution supplies correlated position and time measurements over large areas. The use of thin flat-panel viewing radiators on both sides of a radiation-creating medium allows simultaneous measurement of Cherenkov and scintillation radiation in each layer of the calorimeter. The detectors may be used in a variety of applications including, for example, medical imaging, security, and particle and nuclear physics.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: December 10, 2013
    Assignee: The University of Chicago
    Inventors: Henry Frisch, Jean-Francois Genat, Hervé Grabas, Chien-Min Kao, Chin-Tu Chen, Heejong Kim, Fukun Tang, Jeffrey W. Elam, Anil U. Mane
  • Publication number: 20130280546
    Abstract: A method and article of manufacture of intermixed tunable resistance composite materials containing at least one of W:Al2O3, Mo:Al2O3 or M:Al2O3 where M is a conducting compound containing either W or Mo. A conducting material and an insulating material are deposited by such methods as ALD or CVD to construct composites with intermixed materials which do not have structure or properties like their bulk counterparts.
    Type: Application
    Filed: March 14, 2013
    Publication date: October 24, 2013
    Inventors: Jeffrey W. Elam, Anil U. Mane
  • Publication number: 20130256265
    Abstract: Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.
    Type: Application
    Filed: May 24, 2013
    Publication date: October 3, 2013
    Applicant: UChicago Argonne LLC
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng
  • Publication number: 20130223469
    Abstract: Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.
    Type: Application
    Filed: February 29, 2012
    Publication date: August 29, 2013
    Inventors: Thomas Proslier, Nicholas G. Becker, Michael J. Pellin, Jeffrey Klug, Jeffrey W. Elam
  • Patent number: 8518179
    Abstract: Systems and methods for producing crystalline materials by atomic layer deposition, allowing for high control of localized doping. Such materials may be fibers or films suitable for use in optoelectronics and lasers.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: August 27, 2013
    Assignee: UChicago Argonne, LLC
    Inventors: Thomas Proslier, Nicholas G. Becker, Michael J. Pellin, Jeffrey Klug, Jeffrey W. Elam
  • Patent number: 8518845
    Abstract: A nanoporous catalytic membrane which displays several unique features Including pores which can go through the entire thickness of the membrane. The membrane has a higher catalytic and product selectivity than conventional catalysts. Anodic aluminum oxide (AAO) membranes serve as the catalyst substrate. This substrate is then subjected to Atomic Layer Deposition (ALD), which allows the controlled narrowing of the pores from 40 nm to 10 nm in the substrate by deposition of a preparatory material. Subsequent deposition of a catalytic layer on the inner surfaces of the pores reduces pore sizes to less than 10 nm and allows for a higher degree of reaction selectivity. The small pore sizes allow control over which molecules enter the pores, and the flow-through feature can allow for partial oxidation of reactant species as opposed to complete oxidation. A nanoporous separation membrane, produced by ALD is also provided for use in gaseous and liquid separations.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: August 27, 2013
    Assignee: UChicago Argonne, LLC
    Inventors: Michael J. Pellin, John N. Hryn, Jeffrey W. Elam
  • Publication number: 20130082219
    Abstract: A method for forming a transparent conducting oxide product layer. The method includes use of precursors, such as tetrakis-(dimethylamino) tin and trimethyl indium, and selected use of dopants, such as SnO and ZnO for obtaining desired optical, electrical and structural properties for a highly conformal layer coating on a substrate. Ozone was also input as a reactive gas which enabled rapid production of the desired product layer.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Inventors: Jeffrey W. Elam, Anil U. Mane
  • Patent number: 8318248
    Abstract: Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: November 27, 2012
    Assignee: Uchicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Joseph A. Libera, Michael J. Pellin, Peter C. Stair