Patents by Inventor Jeffrey W. Elam

Jeffrey W. Elam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120241411
    Abstract: A plasma etch resist material modified by an inorganic protective component via sequential infiltration synthesis (SIS) and methods of preparing the modified resist material. The modified resist material is characterized by an improved resistance to a plasma etching or related process relative to the unmodified resist material, thereby allowing formation of patterned features into a substrate material, which may be high-aspect ratio features. The SIS process forms the protective component within the bulk resist material through a plurality of alternating exposures to gas phase precursors which infiltrate the resist material. The plasma etch resist material may be initially patterned using photolithography, electron-beam lithography or a block copolymer self-assembly process.
    Type: Application
    Filed: March 22, 2012
    Publication date: September 27, 2012
    Inventors: Seth B. Darling, Jeffrey W. Elam, Yu-Chih Tseng, Qing Peng
  • Patent number: 8258398
    Abstract: A heterojunction photovoltaic cell. The cell includes a nanoporous substrate, a transparent conducting oxide disposed on the nanoporous substrate, a nanolaminate film deposited on the nanoporous substrate surface, a sensitizer dye disposed on a wide band gap semiconducting oxide and a redox shuttle positioned within the layer structure.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: September 4, 2012
    Assignee: UChicago Argonne, LLC
    Inventors: Michael J. Pellin, Jeffrey W. Elam, Ulrich Welp, Alex B. F. Martinson, Joseph T. Hupp
  • Publication number: 20120213946
    Abstract: Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 23, 2012
    Inventors: Jeffrey W. Elam, Angel Yanguas-Gil
  • Publication number: 20120187305
    Abstract: A multi-component tunable resistive coating and methods of depositing the coating on the surfaces of a microchannel plate (MCP) detector. The resistive coating composed of a plurality of alternating layers of a metal oxide resistive component layer and a conductive component layer composed of at least one of a metal, a metal nitride and a metal sulfide. The coating may further include an emissive layer configured to produce a secondary electron emission in response to a particle interacting with the MCP and a neutron-absorbing layer configured to respond to a neutron interacting with the MCP.
    Type: Application
    Filed: January 21, 2011
    Publication date: July 26, 2012
    Inventors: Jeffrey W. Elam, Anil U. Mane, Qing Peng
  • Patent number: 8148293
    Abstract: Highly uniform cluster based nanocatalysts supported on technologically relevant supports were synthesized for reactions of top industrial relevance. The Pt-cluster based catalysts outperformed the very best reported ODHP catalyst in both activity (by up to two orders of magnitude higher turn-over frequencies) and in selectivity. The results clearly demonstrate that highly dispersed ultra-small Pt clusters precisely localized on high-surface area supports can lead to affordable new catalysts for highly efficient and economic propene production, including considerably simplified separation of the final product. The combined GISAXS-mass spectrometry provides an excellent tool to monitor the evolution of size and shape of nanocatalyst at action under realistic conditions. Also provided are sub-nanometer gold and sub-nanometer to few nm size-selected silver catalysts which possess size dependent tunable catalytic properties in the epoxidation of alkenes.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 3, 2012
    Assignee: UChicago Argonne, LLC
    Inventors: Stefan Vajda, Michael J. Pellin, Jeffrey W. Elam, Christopher L. Marshall, Randall A. Winans, Karl-Heinz Meiwes-Broer
  • Patent number: 8143189
    Abstract: Highly uniform cluster based nanocatalysts supported on technologically relevant supports were synthesized for reactions of top industrial relevance. The Pt-cluster based catalysts outperformed the very best reported ODHP catalyst in both activity (by up to two orders of magnitude higher turn-over frequencies) and in selectivity. The results clearly demonstrate that highly dispersed ultra-small Pt clusters precisely localized on high-surface area supports can lead to affordable new catalysts for highly efficient and economic propene production, including considerably simplified separation of the final product. The combined GISAXS-mass spectrometry provides an excellent tool to monitor the evolution of size and shape of nanocatalyst at action under realistic conditions. Also provided are sub-nanometer gold and sub-nanometer to few nm size-selected silver catalysts which possess size dependent tunable catalytic properties in the epoxidation of alkenes.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: March 27, 2012
    Assignee: UChicago Argonne, LLC
    Inventors: Stefan Vajda, Michael J. Pellin, Jeffrey W. Elam, Christopher L. Marshall, Randall A. Winans, Karl-Heinz Meiwes-Broer
  • Publication number: 20120021898
    Abstract: A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.
    Type: Application
    Filed: July 22, 2010
    Publication date: January 26, 2012
    Inventors: Jeffrey W. Elam, Christopher L. Marshall, Joseph A. Libera, James A. Dumesic, Yomaira J. Pagan-Torres
  • Patent number: 8012860
    Abstract: A method for producing a product of a functionalized nanocomposition colloidal material using atomic layer deposition to coat the colloidal material. The ALD layer comprises an inorganic material which enables improved optical and electrical properties for the nanocomposite.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: September 6, 2011
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Philippe Guyot-Sionnest
  • Publication number: 20110210259
    Abstract: A method and system for providing a micro-channel plate detector. An anodized aluminum oxide membrane is provided and includes a plurality of nanopores which have an Al coating and a thin layer of an emissive oxide material responsive to incident radiation, thereby providing a plurality of radiation sensitive channels for the micro-channel plate detector.
    Type: Application
    Filed: February 22, 2011
    Publication date: September 1, 2011
    Inventors: Jeffrey W. Elam, Hsien-Hau Wang, Michael J. Pellin, Karen Byrum, Henry J. Frisch, Seon W. Lee
  • Publication number: 20110206846
    Abstract: A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.
    Type: Application
    Filed: September 30, 2010
    Publication date: August 25, 2011
    Inventors: Jeffrey W. ELAM, Joseph A. Libera
  • Patent number: 7972569
    Abstract: A catalyst includes a carrier body and a catalytic portion carried by the carrier body. The catalytic portion includes a plurality of distinct layers of catalytic material, which layers may be deposited through atomic layer deposition techniques. The catalyst may have a selectivity for the conversion of alkanes to alkenes of over 50%. The catalyst may be incorporated in a reactor such as a fluidized bed reactor or a single pass reactor.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: July 5, 2011
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Michael J. Pellin, Joseph A. Libera, Peter C. Stair, Gerry Zajac, Steven A. Cohen
  • Publication number: 20110045969
    Abstract: Highly uniform cluster based nanocatalysts supported on technologically relevant supports were synthesized for reactions of top industrial relevance. The Pt-cluster based catalysts outperformed the very best reported ODHP catalyst in both activity (by up to two orders of magnitude higher turn-over frequencies) and in selectivity. The results clearly demonstrate that highly dispersed ultra-small Pt clusters precisely localized on high-surface area supports can lead to affordable new catalysts for highly efficient and economic propene production, including considerably simplified separation of the final product. The combined GISAXS-mass spectrometry provides an excellent tool to monitor the evolution of size and shape of nanocatalyst at action under realistic conditions. Also provided are sub-nanometer gold and sub-nanometer to few nm size-selected silver catalysts which possess size dependent tunable catalytic properties in the epoxidation of alkenes.
    Type: Application
    Filed: August 26, 2010
    Publication date: February 24, 2011
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Stefan Vajda, Michael J. Pellin, Jeffrey W. Elam, Christopher L. Marshall, Randall A. Winans, Karl-Heinz Meiwes-Broer
  • Publication number: 20100300524
    Abstract: A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N,N?-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H2S) to prepare a Cu2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.
    Type: Application
    Filed: May 14, 2010
    Publication date: December 2, 2010
    Inventors: Alex MARTINSON, Jeffrey W. Elam, Michael J. Pellin
  • Patent number: 7713907
    Abstract: The invention provides a method for depositing catalytic clusters on a surface, the method comprising confining the surface to a controlled atmosphere; contacting the surface with catalyst containing vapor for a first period of time; removing the vapor from the controlled atmosphere; and contacting the surface with a reducing agent for a second period of time so as to produce catalyst-containing nucleation sites.
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: May 11, 2010
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Michael J. Pellin, Peter C. Stair
  • Patent number: 7709056
    Abstract: A method and system for preparing a light transmitting and electrically conductive oxide film. The method and system includes providing an atomic layer deposition system, providing a first precursor selected from the group of cyclopentadienyl indium, tetrakis (dimethylamino) tin and mixtures thereof, inputting to the deposition system the first precursor for reaction for a first selected time, providing a purge gas for a selected time, providing a second precursor comprised of an oxidizer, and optionally inputting a second precursor into the deposition system for reaction and alternating for a predetermined number of cycles each of the first precursor, the purge gas and the second precursor to produce the oxide film.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: May 4, 2010
    Assignee: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Alex B. F. Martinson, Michael J. Pellin, Joseph T. Hupp
  • Publication number: 20100075827
    Abstract: A nanoporous catalytic membrane which displays several unique features Including pores which can go through the entire thickness of the membrane. The membrane has a higher catalytic and product selectivity than conventional catalysts. Anodic aluminum oxide (AAO) membranes serve as the catalyst substrate. This substrate is then subjected to Atomic Layer Deposition (ALD), which allows the controlled narrowing of the pores from 40 nm to 10 nm in the substrate by deposition of a preparatory material. Subsequent deposition of a catalytic layer on the inner surfaces of the pores reduces pore sizes to less than 10 nm and allows for a higher degree of reaction selectivity. The small pore sizes allow control over which molecules enter the pores, and the flow-through feature can allow for partial oxidation of reactant species as opposed to complete oxidation. A nanoporous separation membrane, produced by ALD is also provided for use in gaseous and liquid separations.
    Type: Application
    Filed: November 2, 2009
    Publication date: March 25, 2010
    Inventors: Michael J. Pellin, John N. Hryn, Jeffrey W. Elam
  • Publication number: 20090315016
    Abstract: A method for producing a product of a functionalized nanocomposition colloidal material using atomic layer deposition to coat the colloidal material. The ALD layer comprises an inorganic material which enables improved optical and electrical properties for the nanocomposite.
    Type: Application
    Filed: June 16, 2009
    Publication date: December 24, 2009
    Inventors: Jeffrey W. ELAM, Philippe Guyot-Sionnest
  • Publication number: 20090304920
    Abstract: Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.
    Type: Application
    Filed: June 4, 2009
    Publication date: December 10, 2009
    Inventors: Jeffrey W. ELAM, Joseph A. Libera, Michael J. Pellin, Peter C. Stair
  • Patent number: 7625840
    Abstract: A nanoporous catalytic membrane which displays several unique features including pores which can go through the entire thickness of the membrane. The membrane has a higher catalytic and product selectivity than conventional catalysts. Anodic aluminum oxide (AAO) membranes serve as the catalyst substrate. This substrate is then subjected to Atomic Layer Deposition (ALD), which allows the controlled narrowing of the pores from 40 nm to 10 nm in the substrate by deposition of a preparatory material. Subsequent deposition of a catalytic layer on the inner surfaces of the pores reduces pore sizes to less than 10 nm and allows for a higher degree of reaction selectivity. The small pore sizes allow control over which molecules enter the pores, and the flow-through feature can allow for partial oxidation of reactant species as opposed to complete oxidation. A nanoporous separation membrane, produced by ALD is also provided for use in gaseous and liquid separations.
    Type: Grant
    Filed: September 14, 2004
    Date of Patent: December 1, 2009
    Assignee: UChicago Argonne, LLC.
    Inventors: Michael J. Pellin, John N. Hryn, Jeffrey W. Elam
  • Publication number: 20090233790
    Abstract: Highly uniform cluster based nanocatalysts supported on technologically relevant supports were synthesized for reactions of top industrial relevance. The Pt-cluster based catalysts outperformed the very best reported ODHP catalyst in both activity (by up to two orders of magnitude higher turn-over frequencies) and in selectivity. The results clearly demonstrate that highly dispersed ultra-small Pt clusters precisely localized on high-surface area supports can lead to affordable new catalysts for highly efficient and economic propene production, including considerably simplified separation of the final product. The combined GISAXS-mass spectrometry provides an excellent tool to monitor the evolution of size and shape of nanocatalyst at action under realistic conditions. Also provided are sub-nanometer gold and sub-nanometer to few nm size-selected silver catalysts which possess size dependent tunable catalytic properties in the epoxidation of alkenes.
    Type: Application
    Filed: March 12, 2009
    Publication date: September 17, 2009
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Stefan Vajda, Michael J. Pellin, Jeffrey W. Elam, Christopher L. Marshall, Randall A. Winans, Karl-Heinz Meiwes-Broer