Patents by Inventor Jeong-Sun Moon

Jeong-Sun Moon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12130507
    Abstract: A reconfigurable optical frequency selective structure having embedded therein: (a) an array of optical antennas for picking up propagating radiation in a visible or infrared frequency region and achieving preferential absorption of electromagnetic energy at a target wavelength k within the region, (b) an array of optical mesa structures of sub-wavelength scale including a phase-change material, the array of optical antennas being disposed atop the array of optical mesa structures respectively; (c) a metal ground plane disposed beneath the array of optical mesa structures, the array of optical mesa structures standing above the ground plane or an interfacial layer and being separated from one another to inhibit parasitic capacitance coupling therebetween; and (d) a plurality of heaters for selectively heating any one of the array of optical mesa structures to cause the phase change material in the selected optical mesa structure to change from an amorphous state, wherein the antenna atop the selected mesa
    Type: Grant
    Filed: May 31, 2023
    Date of Patent: October 29, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: David Chow, Joseph Jensen, Jeong-Sun Moon, Kyung-Ah Son, Ryan Quarfoth
  • Patent number: 12116662
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Grant
    Filed: August 18, 2022
    Date of Patent: October 15, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo, Richard M. Kremer, Ryan G. Quarfoth, Jack A. Crowell, Mariano J. Taboada, Joshua M. Doria, Terry B. Welch
  • Publication number: 20240234556
    Abstract: A transition metal dichalcogenide (TMD) transistor includes a substrate, an n-type two-dimensional (2D) TMD layer, a metal source electrode, a metal drain electrode, and a gate dielectric. The substrate has a top portion that is an insulating layer, and the n-type 2D TMD layer is on the insulating layer. The metal source electrode, the metal drain electrode, and the gate dielectric are on the n-type 2D TMD layer. The metal gate electrode is on top of the gate dielectric and is between the metal source electrode and the metal drain electrode.
    Type: Application
    Filed: October 19, 2022
    Publication date: July 11, 2024
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO
  • Patent number: 11988907
    Abstract: An electric field-controlled refractive index tunable device includes a phase change correlated transition metal oxide layer, and E-field responsive charge dopants. The E-field responsive charge dopants either accumulate in the phase change correlated transition metal oxide layer or are depleted from the phase change correlated transition metal oxide layer in response to an E-field applied to the phase change correlated transition metal oxide layer.
    Type: Grant
    Filed: March 25, 2021
    Date of Patent: May 21, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo, Richard M. Kremer, Ryan G. Quarfoth
  • Publication number: 20240136429
    Abstract: A transition metal dichalcogenide (TMD) transistor includes a substrate, an n-type two-dimensional (2D) TMD layer, a metal source electrode, a metal drain electrode, and a gate dielectric. The substrate has a top portion that is an insulating layer, and the n-type 2D TMD layer is on the insulating layer. The metal source electrode, the metal drain electrode, and the gate dielectric are on the n-type 2D TMD layer. The metal gate electrode is on top of the gate dielectric and is between the metal source electrode and the metal drain electrode.
    Type: Application
    Filed: October 18, 2022
    Publication date: April 25, 2024
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO
  • Patent number: 11953801
    Abstract: A solid state optical beam steering device including a body of electro-optical material wherein the body of electro-optical material comprises any material of a class of hydrogen-doped phase-change metal oxide and wherein the body has a first face and a second face opposite the first face, a first transparent resistive sheet on the first face of the body of electro optic material, wherein the first transparent resistive sheet has a first side and a second side, and a transparent conductor on the second face of the body of electro optic material, wherein the transparent conductor is coupled to the second side of the first transparent resistive sheet.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: April 9, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: Richard Kremer, Kyung-Ah Son, Jeong-Sun Moon, Ryan Quarfoth
  • Patent number: 11808937
    Abstract: A method of providing a spatial light modulator comprising: providing a substrate; providing a first phase change material cell on the substrate, the first phase change material cell comprising: a first electrical heater on the substrate; a first optical reflector layer on the electrical heater; and a first phase change material layer on the optical reflector layer; and providing at least a second phase change material cell on the substrate, the second phase change material cell comprising: a second electrical heater on the substrate; a second optical reflector layer on the second electrical heater; a second phase change material layer on the second optical reflector layer; and providing a light absorber layer between the first phase change material cell and the second phase change material cell.
    Type: Grant
    Filed: October 27, 2021
    Date of Patent: November 7, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo, Kyung-Ah Son, Kangmu Lee
  • Patent number: 11788183
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: October 17, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo, Richard M. Kremer, Ryan G. Quarfoth, Jack A. Crowell, Mariano J. Taboada, Joshua M. Doria, Terry B. Welch
  • Patent number: 11764271
    Abstract: A method of fabricating a gate with a mini field plate includes forming a dielectric passivation layer over an epitaxy layer on a substrate, coating the dielectric passivation layer with a first resist layer, etching the first resist layer and the dielectric passivation layer to form a first opening in the dielectric passivation layer, removing the first resist layer; and forming a tri-layer gate having a gate foot in the first opening, the gate foot having a first width, a gate neck extending from the gate foot and extending for a length over the dielectric passivation layer on both sides of the first opening, the gate neck having a second width wider than the first width of the gate foot, and a gate head extending from the gate neck, the gate head having a third width wider than the second width of the gate neck.
    Type: Grant
    Filed: March 2, 2022
    Date of Patent: September 19, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Joel C. Wong, Jeong-Sun Moon, Robert M. Grabar, Michael T. Antcliffe
  • Patent number: 11569367
    Abstract: A field effect transistor includes a substrate, a passivation layer on the substrate forming a passivated substrate, wherein the passivation layer is inert to XeF2, and a graphene lateral heterostructure field effect transistor (LHFET) on the passivated substrate.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: January 31, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo
  • Publication number: 20220389561
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Application
    Filed: August 18, 2022
    Publication date: December 8, 2022
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO, Richard M. KREMER, Ryan G. QUARFOTH, Jack A. CROWELL, Mariano J. TABOADA, Joshua M. DORIA, Terry B. WELCH
  • Patent number: 11493824
    Abstract: A solid state electrically variable focal length lens includes a plurality of concentric rings of electro-optical material, wherein the electro-optical material comprises any material of a class of hydrogen-doped phase-change metal oxide and wherein each respective concentric ring further includes a transparent resistive sheet on a first face of the respective concentric ring, wherein the transparent resistive sheet extends along the first face, and a first voltage coupled between a first end and a second end of the transparent resistive sheet, wherein the first voltage may be varied to select an optical beam deflection angle.
    Type: Grant
    Filed: March 2, 2021
    Date of Patent: November 8, 2022
    Assignee: HRL LABORATORIES, LLC
    Inventors: Richard Kremer, Kyung-Ah Son, Jeong-Sun Moon, Ryan G. Quarfoth
  • Publication number: 20220308419
    Abstract: A solid state electrically variable focal length lens includes a plurality of concentric rings of electro-optical material, wherein the electro-optical material comprises any material of a class of hydrogen-doped phase-change metal oxide and wherein each respective concentric ring further includes a transparent resistive sheet on a first face of the respective concentric ring, wherein the transparent resistive sheet extends along the first face, and a first voltage coupled between a first end and a second end of the transparent resistive sheet, wherein the first voltage may be varied to select an optical beam deflection angle.
    Type: Application
    Filed: March 2, 2021
    Publication date: September 29, 2022
    Applicant: HRL Laboratories, LLC
    Inventors: Richard KREMER, Kyung-Ah SON, Jeong-Sun MOON, Ryan G. QUARFOTH
  • Patent number: 11404541
    Abstract: A HEMT comprising: a substrate; a channel layer coupled to the substrate; a source electrode coupled to the channel layer; a drain electrode coupled to the channel layer; and a gate electrode coupled to the channel layer between the source electrode and the drain electrode; wherein the channel layer comprises: at least a first GaN layer; and a first graded AlGaN layer on the first GaN layer, the Al proportion of the first graded AlGaN layer increasing with the distance from the first GaN layer.
    Type: Grant
    Filed: July 11, 2020
    Date of Patent: August 2, 2022
    Assignee: HRL LABORATORIES, LLC
    Inventors: Jeong-sun Moon, Fevzi Arkun
  • Publication number: 20220190123
    Abstract: A method of fabricating a gate with a mini field plate includes forming a dielectric passivation layer over an epitaxy layer on a substrate, coating the dielectric passivation layer with a first resist layer, etching the first resist layer and the dielectric passivation layer to form a first opening in the dielectric passivation layer, removing the first resist layer; and forming a tri-layer gate having a gate foot in the first opening, the gate foot having a first width, a gate neck extending from the gate foot and extending for a length over the dielectric passivation layer on both sides of the first opening, the gate neck having a second width wider than the first width of the gate foot, and a gate head extending from the gate neck, the gate head having a third width wider than the second width of the gate neck.
    Type: Application
    Filed: March 2, 2022
    Publication date: June 16, 2022
    Applicant: HRL Laboratories, LLC
    Inventors: Joel C. WONG, Jeong-Sun MOON, Robert M. GRABAR, Michael T. ANTCLIFFE
  • Patent number: 11314109
    Abstract: A spatial light modulator cell and arrays of spatial light modulator cells are disclosed. The spatial light modulator cells can comprise a phase change material (PCM) having a first side and a second side; an optical reflector configured to reflect an optical beam passing from the first side to the second side; and a PCM heater thermal conductively coupled to the PCM, wherein thermal modulation of the PCM modulates a phase of the PCM which varies light transmission through the PCM. Methods of making spatial light modulator cells and arrays are also disclosed.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: April 26, 2022
    Assignee: URL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Adour V. Kabakian, David H. Chow, Richard M. Kremer
  • Patent number: 11302786
    Abstract: A method of fabricating a gate with a mini field plate includes forming a dielectric passivation layer over an epitaxy layer on a substrate, coating the dielectric passivation layer with a first resist layer, etching the first resist layer and the dielectric passivation layer to form a first opening in the dielectric passivation layer, removing the first resist layer, and forming a tri-layer gate having a gate foot in the first opening, a gate neck extending from the gate foot, and a gate head extending from the gate neck. The gate foot has a first width, and the gate neck has a second width that is wider than the first width. The gate neck extends for a length over the dielectric passivation layer on both sides of the first opening. The gate head has a third width wider than the second width of the gate neck.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: April 12, 2022
    Assignee: HRL Laboratories LLC
    Inventors: Joel C. Wong, Jeong-Sun Moon, Robert M. Grabar, Michael T. Antcliffe
  • Patent number: 11231635
    Abstract: A vertical directional coupler or switch comprising a lower and an upper waveguide, integrated with an optical phase change material disposed between the lower and upper waveguides to control a directional of optical coupling between the lower and upper waveguides.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: January 25, 2022
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Ryan G. Quarfoth, Kangmu Lee
  • Patent number: 11222959
    Abstract: A Field Effect Transistor (FET) device and a method for manufacturing it are disclosed. The FET device contains a graphene layer, a composite gate dielectric layer disposed above the graphene layer, wherein the composite gate layer is passivated with fluorine, and a metal gate disposed above the composite gate dielectric layer. The method disclosed teaches how to manufacture the FET device.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: January 11, 2022
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo
  • Patent number: 11187891
    Abstract: A spatial light modulator includes a substrate, a phase change material cell on the substrate, the phase change material cell including an electrical heater on the substrate, an optical reflector layer on the electrical heater, and a phase change material layer on the optical reflector layer.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: November 30, 2021
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo, Kyung-Ah Son, Kangmu Lee