Abstract: A liquid crystal display including: a first insulating substrate; a plurality of color filters disposed on the first insulating substrate; a light blocking member disposed on the color filters; a second insulating substrate facing the first insulating substrate; and a spacer disposed between the first insulating substrate and the second insulating substrate. The spacer includes a main column spacer and a sub-column spacer spaced apart from each other by a predetermined distance, a protrusion protruding toward the second insulating substrate by stacking at least one sub-color filter on the color filter, the main column spacer is disposed on the protrusion, and the light blocking member and the spacer are made of the same material.

Abstract: A display device may include the following elements: a first transistor including a gate electrode, a source electrode, and drain electrode; a gate line electrically connected to the gate electrode; a data line electrically connected to the source electrode; a common electrode; a passivation layer overlapping the common electrode; a first pixel electrode electrically connected to the drain electrode and positioned between the common electrode and the passivation layer; a first liquid crystal layer, which is positioned between the common electrode and the first pixel electrode; a second transistor electrically connected to the gate line; a second pixel electrode electrically connected to the second transistor; a second liquid crystal layer positioned between the common electrode and the second pixel electrode; and a supporting member positioned between the common electrode and the passivation layer and positioned between the first liquid crystal layer and the second liquid crystal layer.

Abstract: A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.

Abstract: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

Abstract: A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent, (R1)nSi(R2)4-n ??[Chemical Formula 1] Si(R3)4 ??[Chemical Formula 2] wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, Ras may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.

Abstract: According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.

Abstract: A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.

Abstract: A liquid crystal display includes: a substrate; a thin film transistor disposed on the substrate; a pixel electrode disposed on the thin film transistor; and a roof layer facing the pixel electrode, wherein a plurality of microcavities are formed between the pixel electrode and the roof layer, each microcavity includes liquid crystal materials, a partition wall is formed between the microcavities, and the roof layer includes a dry film.

Abstract: A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.

Abstract: A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.

Abstract: A liquid crystal display device includes: an insulating substrate, a thin film transistor positioned on the insulating substrate, a pixel electrode connected to the thin film transistor, a pillar portion positioned on the pixel electrode, a common electrode positioned on the pillar portion, a liquid crystal layer filling in a cavity positioned between the pixel electrode, the pillar portion, and the common electrode and containing liquid crystal molecules, and a roof layer and an overcoat positioned on the common electrode, wherein a cross section of the cavity in a column direction is reversely tapered.

Abstract: A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

Abstract: A thin film transistor array panel according to an exemplary embodiment of the present invention has a first gate insulting layer and a second gate insulating layer disposed on the first gate insulating layer. The gate electrode of the present invention is formed in an opening of the first gate insulating layer with the same height as that of the gate electrode. Therefore, the second gate insulating layer formed on the gate electrode and the first gate insulating layer renders a flat surface without a step. This may reduce or eliminate any defects caused by the step around gate electrodes, such as source electrode and/or drain electrode cracks.

Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

Abstract: A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.

Abstract: In a display panel, a thin film transistor is connected to a gate line and a data line, and includes a gate electrode, a semiconductor pattern, a source electrode and a drain electrode. An organic pattern makes contact with a side surface of the data line and a side surface of the thin film transistor, and the organic pattern overlaps pixel areas of the display panel. A first passivation layer is on the data line, the thin film transistor and the organic pattern. A common electrode is on the first passivation layer, and the common electrode overlaps the pixel areas. A second passivation layer covers the common electrode. A pixel electrode is on the second passivation layer, the pixel electrode overlaps the common electrode, and the pixel electrode is electrically connected to the drain electrode through a first contact hole and the data line through a second contact hole.

Abstract: A display device with a simplified manufacturing method is presented. The display device includes: a substrate; a thin film transistor formed on the substrate; a pixel electrode connected to the thin film transistor; a roof layer formed to be separated from the pixel electrode via a plurality of microcavities on the pixel electrode; a liquid crystal layer filling the microcavities; and an encapsulation layer formed on the roof layer and sealing the microcavities, wherein the roof layer includes a partition positioned between the plurality of microcavities, and the partition has a width decreases with increasing distance from the substrate.

Abstract: A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.

Abstract: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

Abstract: A display panel includes a substrate, a thin-film transistor (TFT) disposed on the substrate, a first electrode electrically connected to the thin-film transistor, a roof layer disposed on the first electrode and a liquid crystal layer. The roof layer includes an organic insulating material, and defines a cavity that overlaps the first electrode. The liquid crystal layer is disposed in the cavity and is in direct contact with the roof layer.