Patents by Inventor Jin-Ho Ju

Jin-Ho Ju has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160085150
    Abstract: A photoresist composition includes an alkali soluble resin, a photosensitive compound, a first solvent having a boiling point of less than 200° C., and a second solvent having a boiling point of equal to or greater than 200° C.
    Type: Application
    Filed: February 20, 2015
    Publication date: March 24, 2016
    Inventors: Jeong Won KIM, Kwang Woo PARK, Seung Bo SHIM, Jun Hyuk WOO, Jin Ho JU
  • Patent number: 9293475
    Abstract: A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: March 22, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Seung-Bo Shim, Dong-Hyun Yu, Jin-Ho Ju
  • Publication number: 20160062200
    Abstract: A thin film transistor array substrate. The thin film transistor array substrate includes a stacked structure of: a light permeable substrate having a trench; a light blocking layer partially or entirely accommodated in the trench; a gate wiring formed on the light blocking layer; a semiconductor pattern layer formed on the gate wiring; and a data wiring formed on the semiconductor pattern layer.
    Type: Application
    Filed: January 26, 2015
    Publication date: March 3, 2016
    Inventors: Yang Ho Jung, Hoon Kang, Chul Won Park, Koichi Sugitani, Jin Ho Ju
  • Publication number: 20160033857
    Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
    Type: Application
    Filed: June 26, 2015
    Publication date: February 4, 2016
    Inventors: Yong Son, Min Kang, Bong-Yeon Kim, Hyun-Joo Lee, Hyang-Shik Kong, Jin-Ho Ju, Kyoung-Sik Kim, Seung-Hwa Baek
  • Patent number: 9239518
    Abstract: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: January 19, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jin Ho Ju, Seung Bo Shim, Jun Gi Kim, Yang-Ho Jung, Hyang-Shik Kong, Byung-Uk Kim, Jin-Sun Kim, Tae-Hoon Yeo, Hyoc-Min Youn, Sang-Hoon Lee
  • Publication number: 20150378224
    Abstract: A display panel is provided. A plurality of thin-film transistors is disposed on a substrate. A plurality of data lines is disposed on the substrate. Each data line is connected to each thin-film transistor. A plurality of color filters is disposed on the substrate. Each color filter is disposed between two adjacent data lines. A plurality of black matrices is disposed on the substrate. Each black matrix overlaps each data line. A liquid crystal layer is disposed on the plurality of color filters. The liquid crystal layer includes a flat area having a substantially flat surface and a stepped area having a stepped height. The stepped area is adjacent to an edge of the flat area.
    Type: Application
    Filed: December 24, 2014
    Publication date: December 31, 2015
    Inventors: Koichi SUGITANI, Hoon KANG, Chul-Won PARK, Yang-Ho JUNG, Jin-Ho JU
  • Patent number: 9224763
    Abstract: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.
    Type: Grant
    Filed: August 17, 2011
    Date of Patent: December 29, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Min Kang, Jong Kwang Lee, Sang Hee Jang, Jin Ho Ju
  • Publication number: 20150353767
    Abstract: A method of manufacturing a display apparatus and a display apparatus manufactured by using (utilizing) the method.
    Type: Application
    Filed: October 13, 2014
    Publication date: December 10, 2015
    Inventors: Koichi Sugitani, Hoon Kang, Jae-Sung Kim, Jin-Ho Ju, Jin-Young Choi
  • Patent number: 9188851
    Abstract: A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 ?m to about 10.8 ?m.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: November 17, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun Hyuk Woo, Min Kang, Bong-Yeon Kim, Jeong Won Kim, Jin Ho Ju, Tae Gyun Kim, Chul Won Park, Hyun Joo Lee
  • Patent number: 9176383
    Abstract: A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: November 3, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jeong-Won Kim, Ki-Hyun Cho, Kwang-Woo Park, Chul-Won Park, Jin-Ho Ju, Dong-Min Kim, Eun Jeagal
  • Publication number: 20150301452
    Abstract: A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.
    Type: Application
    Filed: September 30, 2014
    Publication date: October 22, 2015
    Inventors: Jeong-Min Park, Jun Chun, Ji-Hyun Kim, Sung-Kyun Park, Jung-Soo Lee, Ki-Hyun Cho, Jin-Ho Ju, Chang-Ik Lee, Se-Tae Oh, Deok-Man Kang
  • Patent number: 9136284
    Abstract: A thin film transistor array panel according to an exemplary embodiment of the present invention includes: an insulation substrate; a thin film transistor disposed on the insulation substrate, wherein the thin film transistor includes a first electrode; a first contact hole pattern having a first width, wherein the first contact hole pattern exposes a portion of the first electrode, and a first contact hole to expose the portion of the first electrode, wherein an inner sidewall of the first contact hole pattern constitutes a first portion of the first contact hole.
    Type: Grant
    Filed: June 11, 2013
    Date of Patent: September 15, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sung Kyun Park, Jeong Min Park, Jung-Soo Lee, Jin Ho Ju
  • Patent number: 9134603
    Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
    Type: Grant
    Filed: April 4, 2013
    Date of Patent: September 15, 2015
    Assignees: SAMSUNG DISPLAY CO., LTD., INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
    Inventors: Min Kang, Bong-Yeon Kim, Jeong Won Kim, Hyang-Shik Kong, Jin Ho Ju, Kyoung Sik Kim, Seung Hwa Baek, Jun Hyuk Woo, Hyun Joo Lee
  • Publication number: 20150253601
    Abstract: A method of manufacturing a liquid crystal display panel. The method includes: preparing a substrate; forming a sacrificial pattern including a negative photoresist material on the substrate; forming a loop portion to cover top and side surfaces of the sacrificial pattern and to expose one side surface of the sacrificial pattern; forming a cavity defined as a predetermined region in the loop portion by performing a strip process on the exposed side surface of the sacrificial pattern by using (utilizing) a strip solution and removing the sacrificial pattern; forming a liquid crystal layer by injecting liquid crystal in the cavity; and forming a blocking member to cover a surface of the cavity into which the liquid crystal is injected.
    Type: Application
    Filed: October 6, 2014
    Publication date: September 10, 2015
    Inventors: Pil-Soon Hong, Gwui-Hyun Park, Jin-Ho Ju
  • Patent number: 9128313
    Abstract: A method of manufacturing a liquid crystal display includes disposing a gate electrode and a light blocking member on a substrate, disposing a source electrode and a drain electrode on the gate electrode to form a thin film transistor, disposing a data line on the light blocking member, disposing an organic layer on the thin film transistor and the data line, exposing a first convex part of the organic layer to light in a first area corresponding to the thin film transistor during an exposure process, and exposing a second convex part of the organic layer to the light in a second area corresponding to the data line during the exposure process using a mask. The mask includes a first transflective part aligned with the first area and a second transflective part aligned with the second area during the exposure process.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: September 8, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seung Bo Shim, Jun Gi Kim, Yang-Ho Jung, Jin Ho Ju, Jun Hong Park
  • Publication number: 20150241774
    Abstract: A photoresist composition may include a novolak resin, a diazide-based photo-sensitizer, and a solvent. The novolak resin may be prepared by a condensation reaction of a monomer mixture including a cresol mixture, xylenol, and salicylaldehyde. Methods of manufacturing a display substrate using the photoresist composition are also provided.
    Type: Application
    Filed: October 28, 2014
    Publication date: August 27, 2015
    Inventors: Jeong-Won KIM, Jin-Ho JU, Dong-Min KIM, Seung-Ki KIM, Kwang-Woo PARK, Sun-Mi HAHM
  • Publication number: 20150241622
    Abstract: A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.
    Type: Application
    Filed: September 17, 2014
    Publication date: August 27, 2015
    Inventors: Yang-Ho JUNG, Hoon KANG, Chul-Won PARK, Jin-Ho JU
  • Publication number: 20150228732
    Abstract: A thin film transistor substrate includes a gate electrode on a base substrate, an active pattern on the gate electrode, a source electrode on a first end of the active pattern, a drain electrode on a second end of the active pattern, an organic insulation layer on the source electrode and the drain electrode, and a transparent electrode contacting the drain electrode through a contact opening in the organic insulation layer. The drain electrode is spaced from the source electrode. The organic insulation layer includes a first thickness portion around the contact opening and a second thickness portion adjacent to the first thickness portion. The second thickness portion has a thickness greater than that of the first thickness portion.
    Type: Application
    Filed: December 18, 2014
    Publication date: August 13, 2015
    Inventors: Ki-Hyun Cho, Sung-Kyun Park, Ji-Hyun Kim, Jeong-Min Park, Jung-Soo Lee, Jun Chun, Jin-Ho Ju
  • Publication number: 20150212422
    Abstract: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
    Type: Application
    Filed: April 2, 2015
    Publication date: July 30, 2015
    Inventors: Jeong Won KIM, Jin Ho JU, Jong Kwang LEE, Min KANG, Tae Gyun KIM
  • Patent number: 9093535
    Abstract: A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: July 28, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyang-Shik Kong, Seung-Bo Shim, Jin-Ho Ju, Jun-Gi Kim