Abstract: A cell voltage measuring apparatus of a battery pack comprises a plurality of multiplexers connected corresponding to each cell group of the battery pack and operated to output a voltage signal of each cell in each cell group based on a reference potential applied from a corresponding cell group; a plurality of floating capacitors connected corresponding to each cell in each cell group and on which the voltage of each cell is charged and held; a switching means for enabling the voltage of each cell to be charged and held on each corresponding floating capacitor; and a controller for controlling the switching means per each cell group to enable the voltage of each cell to be charged and held on each corresponding floating capacitor and controlling each multiplexer to measure the cell voltage held on each floating capacitor of each cell group connected to each corresponding multiplexer.

Abstract: A silencer installed in a fuel cell system includes a plurality of expansion chambers connected to a predetermined apparatus of the fuel cell system, wherein the plurality of expansion chambers serially reduces acoustic noise of air discharged from the predetermined apparatus and a resonator connected to an expansion chamber of the plurality of expansion chambers, wherein the resonator reduces acoustic noise received from the expansion chamber in another frequency band, which is different from a frequency band of the acoustic noise reduced by the plurality of expansion chambers, where one of the plurality of expansion chambers comprises an inlet pipe which receives air from the predetermined apparatus, another of the plurality of expansion chambers comprises an outlet pipe which discharges air flowed into the plurality of expansion chambers, and an intermediate pipe is disposed between the plurality of expansion chambers.

Abstract: Disclosed is an apparatus for waking up a multi-BMS of a battery pack. The apparatus for waking up a multi-BMS of a battery pack according to the present disclosure transmits a wakeup signal outputted from a master BMS to N slave BMSs to wake up the N slave BMSs managing each battery module in the battery pack, and an isolator is connected on a series line used to the wakeup signal, and turns on by the wakeup signal outputted from the master BMS and enables N-1 transistors each connected on the series line to turn on. According to the present disclosure, the signal for waking up the plurality of slave BMSs may be transmitted by using a small number of isolators. Therefore, the BMS or the battery pack may reduce in costs.

Abstract: Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that together provide a securing surface for the reflective reticle. The mobile portion may alter a height of the securing surface relative to the fixed portion.

Abstract: A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: A silencer installed in a fuel cell system includes a plurality of expansion chambers connected to a predetermined apparatus of the fuel cell system, wherein the plurality of expansion chambers serially reduces acoustic noise of air discharged from the predetermined apparatus and a resonator connected to an expansion chamber of the plurality of expansion chambers, wherein the resonator reduces acoustic noise received from the expansion chamber in another frequency band, which is different from a frequency band of the acoustic noise reduced by the plurality of expansion chambers, where one of the plurality of expansion chambers comprises an inlet pipe which receives air from the predetermined apparatus, another of the plurality of expansion chambers comprises an outlet pipe which discharges air flowed into the plurality of expansion chambers, and an intermediate pipe is disposed between the plurality of expansion chambers.

Abstract: A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: Disclosed is a battery pack system to supply current necessary to operate an external device, including a battery module including battery cells which can be charged and discharged, a temperature sensor, an auxiliary power unit to supply a charge and discharge pulse current to the battery module, and a controller to connect the auxiliary power unit to the battery module so that the charge and discharge pulse current is supplied to the battery module when a measured temperature (Tbat) of the battery module is less than a set temperature (Tcrit) based on information detected by the temperature sensor before the battery module is electrically connected to the external device and to interrupt the supply of the charge and discharge pulse current to the battery module when the temperature of the battery module becomes equal to or greater than the set temperature (Tcrit) and an operating method of the same.

Abstract: Disclosed is a battery cell voltage measuring apparatus and method. The battery cell voltage measuring apparatus comprises a plurality of floating capacitors provided corresponding to a plurality of cells contained in a battery pack; a plurality of switching units provided corresponding to each cell of the battery pack and switchable into a charge mode or a measurement mode; and a cell voltage detector for measuring the voltage of each cell by switching each switching unit into a charge mode to charge the voltage of each cell on each corresponding floating capacitor and time-differentially switching each switching unit into a measurement mode to apply the cell voltage charged on the floating capacitor between a reference potential and a common cell voltage measuring line.

Abstract: A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.

Abstract: A cell voltage measuring apparatus of a battery pack comprises a plurality of multiplexers connected corresponding to each cell group of the battery pack and operated to output a voltage signal of each cell in each cell group based on a reference potential applied from a corresponding cell group; a plurality of floating capacitors connected corresponding to each cell in each cell group and on which the voltage of each cell is charged and held; a switching means for enabling the voltage of each cell to be charged and held on each corresponding floating capacitor; and a controller for controlling the switching means per each cell group to enable the voltage of each cell to be charged and held on each corresponding floating capacitor and controlling each multiplexer to measure the cell voltage held on each floating capacitor of each cell group connected to each corresponding multiplexer.

Abstract: Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that together provide a securing surface for the reflective reticle. The mobile portion may alter a height of the securing surface relative to the fixed portion.

Abstract: Provided are a method of measuring focal variations of a photolithography apparatus and a method of fabricating a semiconductor device using the method. The method of measuring the focal variations of the photolithography apparatus includes loading a photomask and a wafer into the photolithography apparatus. The photomask has an optical pattern, and the wafer has a photoresist layer on a top surface thereof. An image of the optical pattern is transferred to the photoresist layer using ultraviolet (UV) light. The photoresist layer is baked. The photoresist layer is inspected. Inspection results of the photoresist layer are analyzed. The inspection of the photoresist layer includes irradiating light for measurement to the entire surface of the wafer. Light reflected and diffracted by the wafer is collected to form an optical image. The analysis of the inspection results of the photoresist layer includes analyzing optical information on the optical image.

Abstract: Provided is a monitoring system using an unmanned air vehicle communicated based on a WiMAX communication scheme. The monitoring system includes an air vehicle and a relay unit. The air vehicle includes a photographing unit for capturing on-scene image information of a current flying area, and a global positioning system (GPS) receiver for receiving GPS information of the current flying area. The air vehicle transmits the on-scene image information and the GPS information, wirelessly. The relay unit remotely controls the air vehicle by receiving a travel command signal having information on a destination of the air vehicle, wirelessly transmits the travel command signal to the air vehicle based on the WiMAX communication scheme, and wirelessly receives the on-scene image information and the GPS information from the air vehicle based on the WiMAX communication scheme.

Abstract: Disclosed is a battery cell voltage measuring apparatus and method. The battery cell voltage measuring apparatus comprises a plurality of floating capacitors provided corresponding to a plurality of cells contained in a battery pack; a plurality of switching units provided corresponding to each cell of the battery pack and switchable into a charge mode or a measurement mode; and a cell voltage detector for measuring the voltage of each cell by switching each switching unit into a charge mode to charge the voltage of each cell on each corresponding floating capacitor and time-differentially switching each switching unit into a measurement mode to apply the cell voltage charged on the floating capacitor between a reference potential and a common cell voltage measuring line.

Abstract: A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.