Abstract: This disclosure is a low power plasma system monitor method, which can be used to monitor the uniformity of the low power plasma system. A deposition process is performed on a testing substrate to form a metal film on the testing substrate. The resistance of the metal film on the testing substrate is measured to generate a plurality of first sheet resistance values. A testing pretreatment process is performed on the testing substrate through the low power plasma system to form a testing passivation on the metal film of the testing substrate. The resistance of the testing substrate after the testing pretreatment process is measured to generate a plurality of second sheet resistance values. Then the first sheet resistance values and the second sheet resistance values are analyzed to know the uniformity of the low power plasma system.

Abstract: A bonding machine with movable suction modules includes a first cavity, a second cavity, a pressing unit, a carrier, and a plurality of movable suction modules. The first cavity is configured to be connected to the second cavity to form a closed space therebetween. The pressing unit is arranged in the first cavity, and the carrier is arranged in the second cavity. The pressing unit faces the carrier and is configured to bond a substrate placed on the carrier. The movable suction modules are arranged in a plurality of setting grooves on a bearing surface of the carrier for absorbing and flattening the substrate placed on the bearing surface. The movable suction modules is displaceable along the bearing surface and continuously absorb and flatten a substrate in a process of aligning the substrate, to help improve accuracy of substrate alignment.

Abstract: A method of forming package structure is provided. The method includes the following steps. A dielectric layer is formed on the first die and the second die. A bridge is placed to electrically connected to the first die and the second die, wherein the dielectric layer is spaced apart from the bridge. An encapsulant is formed on the dielectric layer and laterally encapsulating the bridge. A redistribution layer structure is formed over the encapsulant and the bridge. A top surface of the bridge is in contact with the RDL structure.

Abstract: An atomic layer deposition apparatus for powders is disclosed. The atomic layer deposition apparatus includes a vacuum chamber, a shaft sealing device, and a driving unit. The shaft sealing device includes an outer tube and an inner tube, wherein the inner tube extends from an accommodating space of the outer tube to a reaction space of the vacuum chamber, forming a protruding tube part in the reaction space. The driving unit drives the vacuum chamber to rotate through the outer tube to agitate the powders in the reaction space. The ratio between the protruding tube part and the reaction space is within a specific range, so that a non-reactive gas delivered to the reaction space blows the powders around in the reaction space and spreads the powders to various areas of the reaction space to form a thin film with a uniform thickness on the surface of the powders.

Abstract: A method of making a semiconductor device includes patterning a photoresist on a substrate to form a plurality of openings. A first opening has a first width, a second opening has a second width, smaller than the first width, and a third opening is between the first opening and the second opening and has a third width, different from the first width and the second width. The width is measured in a direction parallel to a top surface of the substrate. The method further includes plating a first conductive material into each opening of the plurality of openings in the photoresist. Plating the first conductive material includes plating of the first conductive material to a first height in the first opening, plating the first conductive material to a second height in the second opening, and plating the first conductive material to a third height in the third opening.

Abstract: The disclosure is a separation method of bonded substrates. The bonded substrate is placed on a breathable plate of a debonding device to separate a wafer and a carrier substrate of the bonded substrate, and the wafer is placed on the breathable plate. A robot arm moves the wafer and the breathable plate to a cleaning device for cleaning, and then moves the wafer and the breathable plate to a relay device. Clamping units of the relay device clamp the breathable plate, and a bernoulli arm sucks the wafer and separates the wafer and the breathable plate, and then the robot arm transports the wafer and the breathable plate to a storage device respectively. The disclosure can automatically debond and clean the bonded substrate, and automatically move the wafer from the breathable plate, which can avoid the fragmentation of wafer.

Abstract: An atomic layer deposition apparatus for coating on fine powders is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit. The shaft sealing device includes an outer tube and an inner tube arranged in an accommodating space of the outer tube. The driving unit drives the vacuum chamber to rotate through the outer tube to agitate the fine powders in a reaction space of the vacuum chamber. An air extraction line and an air intake line are arranged in a connection space of the inner tube. The air extraction line is used to extract gas from the reaction space. The air intake line is used to transport non-reactive gas to the reaction space to blow the fine powders around in the reaction space and precursor gas to the reaction space to form thin films with uniform thickness on the surface of the fine powders.

Abstract: A powder atomic layer deposition apparatus for blowing powders is disclosed. The powder atomic layer deposition apparatus includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit drives the vacuum chamber to rotate through the shaft sealing device. The shaft sealing device includes an outer tube and an inner tube, wherein the inner tube is arranged in an accommodating space of the outer tube. At least one air extraction line and at least one air intake line are located in the inner tube, wherein the air intake line extends from the inner tube into a reaction space within the vacuum chamber, and is used to transport the a non-reactive gas to the reaction space to blow the powders around in the reaction space.

Abstract: The invention provides a deposition equipment with a shielding mechanism, which includes a reaction chamber, a carrier, a cover ring and a shielding mechanism. The shielding mechanism includes a first bearing arm, a second bearing arm, a first shielding plate and a second shielding plate. The first and second shielding plates are respectively placed on the first and second bearing arms. There are corresponding alignment units between the lower surface of the first and second shielding plates and the upper surface the carrier, so that the first and second shielding plates can be aligned with the carrier. There is also a corresponding alignment unit between the upper surface of the first and second shielding plates and the lower surface the cover ring, so that the cover ring can be aligned with the first and second shielding plates to define a cleaning space in the reaction chamber.

Abstract: A thin-film-deposition equipment with shielding device, which includes a reaction chamber, a carrier, a shielding device and two optical sensors. The carrier and a portion of the shielding device are disposed within the reaction chamber. The shielding device includes two shield members, and at least one driver interconnecting to drive the two shield members to sway in opposite directions and switch between an open state and a shielding state. Each of the two shield members is disposed with a shield protrusion and a sensing region adjacent to each other. The shield protrusion is for shielding the sensing region from contaminants, thereby the optical sensors can accurately detect locations of the shield members.

Abstract: A method includes dispensing sacrificial region over a carrier, and forming a metal post over the carrier. The metal post overlaps at least a portion of the sacrificial region. The method further includes encapsulating the metal post and the sacrificial region in an encapsulating material, demounting the metal post, the sacrificial region, and the encapsulating material from the carrier, and removing at least a portion of the sacrificial region to form a recess extending from a surface level of the encapsulating material into the encapsulating material.

Abstract: The present disclosure provides a thin-film-deposition equipment with shielding device, which includes a reaction chamber, a carrier and a shielding device, wherein a portion of the shielding device and the carrier are disposed within the reaction chamber. The shielding device includes a first-shield member, a second-shield member and a driver. The driver interconnects the first-shield member and the second-shield member, for driving the first-shield member and the second-shield member to move in opposite directions. During a deposition process, the driver swings the shield members away from each other into an open state. During a cleaning process, the driver swings the shield members toward each other into a shielding state for covering the carrier, such that to prevent polluting the carrier during the process of cleaning the thin-film-deposition equipment.

Abstract: A substrate-bonding device includes a carrier, three first aligning units, three second aligning units, a pressing plate, and two flat-edge aligners. A carrying surface of the carrier is provided with a placement area for placing a first substrate provided with a flat edge thereon. The first aligning units, the second aligning units and the flat edge aligners are disposed around the placement area. The first aligning units are configured to align the first substrate and to support a second substrate provided with a second flat edge. The second aligning units are configured to align the second substrate. The flat edge aligners are configured to contact the first and the second flat edges, to position and align the first and the second substrates. The pressing plate is disposed to face the placement area for pressing the first and second substrates. The flat edge aligners move along with the pressing plate.

Abstract: Disclosed is a powder atomic layer deposition equipment with a quick release function, comprising a vacuum chamber, a shaft sealing device, and a driving unit connected to the shaft sealing device. The vacuum chamber is connected to the shaft sealing device, and an enclosed space is formed between the vacuum chamber and the shaft sealing device. At least one air extraction line is located in the shaft sealing device and fluidly connected to the enclosed space, the air extraction line being used in pumping gas out from the enclosed space to fix the vacuum chamber to the shaft sealing device so that the drive unit rotates the vacuum chamber via the shaft sealing device to facilitate the formation of a uniform thin film on powder surface. When the pumping stops, the vacuum chamber can be quickly released from the shaft sealing device to improve the process efficiency and convenience of use.

Abstract: A package structure is provided. The package structure includes a first die and a second die, a dielectric layer, a bridge, an encapsulant, and a redistribution layer structure. The dielectric layer is disposed on the first die and the second die. The bridge is electrically connected to the first die and the second die, wherein the dielectric layer is spaced apart from the bridge. The encapsulant is disposed on the dielectric layer and laterally encapsulating the bridge. The redistribution layer structure is disposed over the encapsulant and the bridge. A top surface of the bridge is in contact with the RDL structure.

Abstract: A device includes an interposer, which includes a substrate having a top surface. An interconnect structure is formed over the top surface of the substrate, wherein the interconnect structure includes at least one dielectric layer, and metal features in the at least one dielectric layer. A plurality of through-substrate vias (TSVs) is in the substrate and electrically coupled to the interconnect structure. A first die is over and bonded onto the interposer. A second die is bonded onto the interposer, wherein the second die is under the interconnect structure.

Abstract: A semiconductor device has a conductive via laterally separated from the semiconductor, an encapsulant between the semiconductor device and the conductive via, and a mark. The mark is formed from characters that are either cross-free characters or else have a overlap count of less than two. In another embodiment the mark is formed using a wobble scan methodology. By forming marks as described, defects from the marking process may be reduced or eliminated.

Abstract: Some embodiment structures and methods are described. A structure includes an integrated circuit die at least laterally encapsulated by an encapsulant, and a redistribution structure on the integrated circuit die and encapsulant. The redistribution structure is electrically coupled to the integrated circuit die. The redistribution structure includes a first dielectric layer on at least the encapsulant, a metallization pattern on the first dielectric layer, a metal oxide layered structure on the metallization pattern, and a second dielectric layer on the first dielectric layer and the metallization pattern. The metal oxide layered structure includes a metal oxide layer having a ratio of metal atoms to oxygen atoms that is substantially 1:1, and a thickness of the metal oxide layered structure is at least 50 ?. The second dielectric layer is a photo-sensitive material. The metal oxide layered structure is disposed between the metallization pattern and the second dielectric layer.

Abstract: A semiconductor device includes a first substrate and a second substrate. The semiconductor device includes a plurality of conductive pillars between the first and second substrates. The plurality of conductive pillars includes a first conductive pillar having a first width, wherein the first width is substantially uniform along an entire first height of the first conductive pillar, a second conductive pillar having a second width, wherein the second width is substantially uniform along an entire second height of the second conductive pillar, the first width is different from the second width, and the entire first height is equal to the entire second height, and a third conductive pillar having a third width, wherein the third width is substantially uniform along an entire third height of the third conductive pillar, and the third conductive pillar is between the first conductive pillar and the second conductive pillar in the first direction.

Abstract: Some embodiments of the present disclosure provide a semiconductor device. The semiconductor device includes: a bottom package; wherein an area of a contact surface between the conductor and the through via substantially equals a cross-sectional area of the through via, and the bottom package includes: a molding compound; a through via penetrating through the molding compound; a die molded in the molding compound; and a conductor on the through via. An associated method of manufacturing the semiconductor device is also disclosed.