Abstract: A vibration generating system (100) for elastography equipment and a control method thereof, elastography equipment, a method for controlling the vibration generating system (100) for elastography equipment, a method for operating the elastography equipment, and a corresponding computer-readable medium. The vibration generating system (100) for elastography equipment comprises: a control unit (1), a pressure source (2), a pressure regulating unit (3), and a vibration transmitting unit (4). The pressure regulating unit (3) is in fluidic communication with the pressure source (2) and the vibration transmitting unit (4), respectively. The vibration transmitting unit (4) is used to transmit vibration according to a pressure acting thereon. The control unit (1) is coupled with the pressure regulating unit (3). The control unit (1) is configured to obtain a control parameter by using a look-up table module (12) according to inputted elastography conditions, so as to control the pressure regulating unit (3).

Abstract: Techniques for identifying representative patients from a patient group are provided. Based on an outcome of interest, one or more patients can be grouped according to phenotyping features associated with the outcome of interest. Additionally, in response to grouping the one or more patients, a representative patient of the one or more patients can be determined based on values associated with the phenotyping features.

Abstract: The present disclosure discloses a shower head with a spray gun function and relates to the technical field of bathroom products. The shower head includes a shower head shell, the shower head shell, a surface cover water-outflowing body and a water distribution mechanism, and a hollow installing inner cavity is formed by the surface cover water-outflowing body and the shower head shell. By adopting the above technical solution, the present disclosure has functions of spray gun water outflowing and shower head water outflowing, water outflowing is switched by pressing a button, and thus the shower head is convenient to use and more suitable for meeting using demands of a consumer.

Abstract: An airway status evaluation apparatus includes a respiration monitoring unit, a data processing unit, an inflation/deflation unit, and an inflation/deflation control unit. The data processing unit is electrically connected to the respiration monitoring unit, collects a respiration parameter of a patient from the respiration monitoring unit when a cuff meets an evaluation state, and evaluates an airway status of the patient according to the respiration parameter. The inflation/deflation control unit is connected to the inflation/deflation unit and controls the inflation/deflation unit to inflate and deflate the cuff so as to enable the cuff to meet an evaluation state. In the present disclosure, inflation and deflation of the cuff are implemented in a full-automatic or semi-automatic control manner, the respiration parameter can be automatically monitored, and the evaluation result is automatically calculated, thereby achieving the automatic evaluation for the airway status of a patient.

Abstract: A metal brush layer is provided. The metal brush layer includes a polymer backbone including at least one grafting unit, G, attached to the polymer backbone, and a plurality of metal-containing moieties, M, attached to the polymer backbone.

Abstract: A photolithography patterning stack and method for repairing defects in the stack. The stack includes an organic planarization layer, a hardmask layer, and a plurality of patterned photoresist lines in contact with the hardmask layer. A plurality of trenches is situated between the plurality of patterned photoresist lines. Each trench exposes a portion of the hardmask layer. A repairing layer is formed in contact with and only bonded to surfaces of the plurality of patterned photoresist lines. The method includes forming a photolithographic patterning stack. The stack includes at least a hardmask layer formed on one or more underlayers and a photoresist layer formed in contact with the hardmask layer. The photoresist layer is patterned into a plurality of patterned portions. A repairing layer is formed in contact with and only bonded to surfaces of each patterned portion of the plurality of portions.

Abstract: The present invention provides a composition for 3D printing, a process for preparing the same and an article thereof. By the solidifying method of UV irradiation, 3D printing is implemented. During said implementation, there is no need of high temperature heating, thus energy consumption is reduced, and there is no need for special solvent, thus harm to the environment is reduced. Meanwhile, the present invention uses micro-nano powder as the main material and polymer resin as adhesive, and at the same time, adds irradiation sensitizer. After electron beam irradiation, the polymer resin forms three-dimensional crosslinked network, thereby the strength, heat resistance and chemical resistance are improved after resin adhesion.

Abstract: The invention relates to a bicycle frame made by injection molding pellets of a long glass fibre reinforced polypropylene composition having a core containing glass fibres and an impregnating agent and a sheath of polypropylene surrounding said core, wherein the pellets have an average length of at least 1 mm, the amount of the glass fibers is 10 to 70 wt % with respect to the composition and the polypropylene has a flexural modulus determined according to ASTM D790A of at least 1000 N/mm2.

Abstract: The present invention relates to a polymer composition, comprising a polypropylene and a stabilizing additive mixture, wherein said stabilizing additive mixture comprises: i) a thioether compound according to Formula I, ii) a Hindered Amine Light Stabilizer (HALS) comprising a substituted amine group; and iii) an inorganic acid scavenger. The present invention further relates to an article comprising said polymer composition, and the use of said polymer composition for the housing for antennas for wireless communication.

Abstract: A method of forming cut conductive lines is provided. The method includes forming a trough in a dielectric cover layer over a plurality of electrical contacts. The method further includes filling the trough with a planarization layer, and forming a plurality of vias in the planarization layer and the dielectric cover layer, wherein each of the plurality of vias is aligned with one of the plurality of electrical contacts. The method further includes removing the planarization layer, and forming a sacrificial via plug in each of the plurality of vias in the dielectric cover layer. The method further includes forming a fill layer in the trough, and forming a planarization layer opening through the fill layer, wherein the planarization layer opening is positioned between two adjacent sacrificial via plugs. The method further includes forming a separator in the planarization layer opening.

Abstract: An encoding method and apparatus for screen sharing, a storage medium, and an electronic device. The encoding method includes: capturing an original screen video to be encoded, the original screen video including a plurality of frames of screen images; reading image feature parameters of the plurality of frames of screen images in the original screen video; determining video encoding parameters for the original screen video according to the image feature parameters; acquiring screen display resolution of a screen sharing object; and encoding the original screen video according to the video encoding parameters and with reference to the screen display resolution of the screen sharing object. The technical solution according to the embodiments of the disclosure can increase efficiency of encoding for screen sharing.

Abstract: A method of making an adhesion layer of an extreme ultraviolet (EUV) stack is presented. The method includes grafting an ultraviolet (UV) sensitive polymer brush on a hardmask, the polymer brush including a UV cleavable unit, depositing EUV resist over the polymer brush, exposing the EUV resist to remove the EUV resist in exposed areas by applying a developer, and flooding the exposed area with a UV light and a solvent developer to remove exposed portions of the polymer brush.

Abstract: A self-priming resist may be formed from a first random copolymer forming a resist and a polymer brush having the general formula poly(A-r-B)-C-D, wherein A is a first polymer unit, B is a second polymer unit, wherein A and B are the same or different polymer units, C is a cleavable unit, D is a grafting group and r indicates that poly(A-r-B) is a second random copolymer formed from the first and second polymer units. The first random copolymer may be the same or different from the second random polymer. The self-priming resist can create a one-step method for forming an adhesion layer and resist by using the resist/brush blend.

Abstract: Embodiments of the present invention are directed to resist underlayer surface modifications. In a non-limiting embodiment of the invention, a photoresist patterning stack includes a resist underlayer on a substrate. The resist underlayer includes a surface modification having one or more moieties. The moieties can include acid quencher moieties that limit acid diffusion during a post exposure bake. The acid quencher moieties can include a tert-butoxycarbonyl protecting group (tBOC)-blocked amine that can be copolymerized with an acid generating underlayer. The moieties can also include base-catalyzed crosslinking moieties selected such that base-catalyzed crosslinking can occur upon exposure to a predetermined developer. The base-catalyzed crosslinking moieties can include an acetal group and the predetermined developer can include tetramethylammonium hydroxide (TMAH).

Abstract: According to the embodiments provided herein, a method for sputtering a TCO material onto a substrate includes process conditions that produce a textured topography at the interfaces of various layers. The textured topography can include an average roughness from about 5 to about 40 nm. The process conditions can include providing oxygen in the sputtering environment at a flow rate of from 0 to about 30 sccm; or heating the substrate to at least 200; or increasing the magnetic field strength to above 40 mT. The textured topography creates interfacial transition areas which have hybrid physical properties compared to their constituent materials.

Abstract: A thin-wall bearing, including an outer ring and an inner ring. The inner ring surface of the outer ring is provided with an outer ring raceway, and the outer ring surface of the inner ring is provided with an inner ring raceway. A steel ball and a cage for installing the steel ball are arranged between the outer ring raceway and the inner ring raceway. A plurality of screw holes are evenly distributed in a circle around the side wall of the outer ring, and knurled screws are provided in the screw holes, respectively. The fit between the knurled screw and the screw hole 10-?9 is to be N6/h5. The radial clearance of the thin-wall bearing is greater than or equal to 0.01 but less than or equal to 0.09. A processing method of the thin-wall bearing.

Abstract: A method of making an adhesion layer of an extreme ultraviolet (EUV) stack is presented. The method includes grafting an ultraviolet (UV) sensitive polymer brush on a hardmask, the polymer brush including a UV cleavable unit, depositing EUV resist over the polymer brush, exposing the EUV resist to remove the EUV resist in exposed areas by applying a developer, and flooding the exposed area with a UV light and a solvent developer to remove exposed portions of the polymer brush.

Abstract: Techniques for selective CD shrink for source and drain contact trench to optimize FET device performance are provided. In one aspect, a semiconductor FET device includes: at least one gate; source and drains on opposite sides of the at least one gate; recesses in the source and drains; and metal contacts disposed over the source and drains and in the recesses, wherein the metal contacts are in direct contact with a bottom and sidewalls of each of the recesses in both a first direction and a second direction, wherein the first direction is perpendicular to the at least one gate, and wherein the second direction is parallel to the at least one gate. A method of forming a semiconductor FET device is also provided.

Abstract: A dataset regarding a plurality of applications is obtained. A set of parameters is determined from the dataset, comprising at least a sample performance trajectory, a risk factor, and a performance outcome. A maximum likelihood of each performance outcome is determined using a likelihood function, the likelihood function being a mixture model of a trajectory model and an outcome model. The set of parameters is updated according to the maximum likelihood of each performance outcome. A performance trajectory model is built according to the updated set of parameters. The plurality of applications is then grouped into subgroups according to the performance trajectory model, each subgroup containing one or more applications, and each of the one or more applications in a given subgroup having a same or similar trajectory to each other. An alert associated with the applications in at least one of subgroups may be generated.

Abstract: The invention relates to a bicycle frame made by injection molding pellets of a long glass fibre reinforced polypropylene composition having a core containing glass fibres and an impregnating agent and a sheath of polypropylene surrounding said core, wherein the pellets have an average length of at least 1 mm, the amount of the glass fibers is 10 to 70 wt % with respect to the composition and the polypropylene has a flexural modulus determined according to ASTM D790A of at least 1000 N/mm2.