Abstract: Disclosed is a heterojunction semiconductor flexible substrate in which an epitaxial oxide thin film layer is hetero-bonded to a thinned silicon substrate using a metal layer, a manufacturing method thereof, and the heterojunction semiconductor flexible substrate can be applied to sensor, actuator, transducer, or micro electro mechanical systems (MEMS) device using high functionality of the epitaxial oxide thin film layer of high quality as well as an electronic and/or optical device.

Abstract: The present invention relates to an ultra-high strength steel sheet and to a method for manufacturing same and, more specifically, to a steel sheet having excellent elongation and hole expansion ratio, as well as excellent strength, and to a method for manufacturing same. A steel sheet comprises, by weight: 0.15 to 0.25% of carbon (C), 1.5 to 2.5% of manganese (Mn), 1.0 to 2.0% of silicon (Si), 0.1% or less of phosphorus (P), 0.03% or less of sulfur(S), and 0.01 to 0.1% of aluminum (Al) with a remainder of iron (Fe) and other unavoidable impurities.

Abstract: A semiconductor substrate with oxide single crystal heterostructures, to which a sacrificial layer, an epitaxy functional oxide thin film having a perovskite structure and a metal layer are grown on an oxide single crystal substrate, prepared another metal layer on a semiconductor substrate, and bonded the metal layer of the oxide single crystal substrate to the metal layer of the semiconductor substrate to be face each other, and separated the oxide single crystal substrate by selectively etching and removing only the sacrificial layer after the bonding.

Abstract: A piezoelectric material composition includes a first material doped with 2 mol % to 3 mol % of Mn based on 100 mol % of the total composition, and represented by [Formula 1] as (1?x)Pb(Mg2/3Nb1/3)O3-xPbTiO3 wherein the x is 0.21 to 0.25. A method for preparing a piezoelectric material composition includes: mixing MgNb2O6 and PbO, TiO2, and MnO2 to form a first material doped with Mn and represented by Formula 1 above; mixing the first material and a second material in a solvent to prepare a slurry; tape-casting the slurry to form a piezoelectric sheet; laminating the piezoelectric sheet; and sintering the piezoelectric sheet in an oxygen atmosphere.

Abstract: The method for area-selective growth of a noble metal thin film using atomic layer deposition comprises: a first step of preparing a substrate having a growth area and non-growth area showing a difference in nucleation delay, where the non-growth area generates a noble metal nucleus relatively late compared to the growth area during cycles of repeated atomic layer deposition; a second step of supplying a noble metal precursor and adsorbing the noble metal precursor to the growth area and the non-growth area of the substrate; a third step of converting the noble metal precursor into a noble metal atomic layer by supplying an oxidizing agent; and a step of growing a noble metal thin film in the growth area by repeating a combination of the second and third steps.

Abstract: The present invention relates to a layered structure of a TiO2 thin film having a rutile crystal structure, a method for forming a TiO2 thin film having a rutile crystal structure, and a method for manufacturing a capacitor using the same, which are capable of achieving both deposition of rutile TiO2 at a temperature of 400° C. or less and miniaturization of a device by depositing rutile TiO2 using a material having structural consistency with rutile TiO2, while preventing a material having structural consistency with rutile TiO2 from remaining between a substrate and rutile TiO2.

Abstract: The present invention relates to a capacitor and a method for manufacturing the same that can improve a dielectric property and a leakage current property of the capacitor by enabling the deposition of a crystalline dielectric film under a low process temperature of 500° C. or lower simultaneously with fundamentally blocking the generation of interfacial oxides when depositing oxides having a perovskite crystal structure through atomic layer deposition (ALD). The capacitor according to the present invention is characterized by comprising a lower electrode having a structure in which a platinum ultra-thin film layer is laminated on a ruthenium thin film layer; a dielectric film laminated on the platinum ultra-thin film layer; and an upper electrode laminated on the dielectric film.

Abstract: The present invention relates to a method for area-selective growth of a noble metal thin film using atomic layer deposition, which can increase the growth thickness of a thin film with a high selectivity by inducing the generation of volatile noble metal oxides and suppressing the growth of the thin film in non-growth areas in depositing a noble metal thin film on the growth area of a substrate using nucleation delay.

Abstract: The present invention relates to a transparent anode active material having excellent light transmittance and electrical conductivity characteristics and a manufacturing method thereof, and a lithium ion battery and an all-solid-state lithium thin-film battery based on the same and having excellent charge/discharge capacity and charge/discharge rate, wherein the transparent anode active material according to the present invention is characterized by comprising a material of the following Chemical Formula 1: AgxSiOyN wherein x is 0<x?0.8 and y is 0<y?1.

Abstract: The present invention relates to a heterojunction semiconductor substrate having excellent dielectric properties, a method of manufacturing the same, and an electronic device using the same. The present invention provides a heterojunction semiconductor substrate with improved interlayer adhesion, low leakage current, and excellent dielectric properties that maintain strength in a ferroelectric fatigue experiment by interposing a metal layer and a conductive metal oxide layer on a semiconductor substrate to form an epitaxial oxide thin film layer composed of perovskite piezoelectric oxide. The heterojunction semiconductor substrate can be applied to sensors, actuators, transducers, or MEMS devices that use the high functionality of the high-quality epitaxial oxide thin film layer, including applications in electronic and optical devices.

Abstract: Disclosed is a heterojunction semiconductor flexible substrate in which an epitaxial oxide thin film layer is hetero-bonded to a thinned silicon substrate using a metal layer, a manufacturing method thereof, and the heterojunction semiconductor flexible substrate can be applied to sensor, actuator, transducer, or micro electro mechanical systems (MEMS) device using high functionality of the epitaxial oxide thin film layer of high quality as well as an electronic and/or optical device.

Abstract: Proposed is a self-resonance tuning piezoelectric energy harvester with broadband frequency, including: a piezoelectric beam which is extended along a horizontal direction; a fixing member which fixes opposite ends of the piezoelectric beam; and a mobile mass which the piezoelectric beam passes through, and which is capable of self-movement along the piezoelectric beam through a through-hole which has a free space in addition to a space which the piezoelectric beam passes through, wherein as the mobile mass moves to a position of the piezoelectric beam, generated displacement of a piezoelectric beam is increased, and as the generated displacement becomes greater than the free space, the mobile mass is fixed to a position of a piezoelectric beam at which resonance will occur.

Abstract: Disclosed herein is a smart wearable lens mounted with an all-solid-state thin film secondary battery including a flexible substrate, a cathode current collector, a cathode, a solid electrolyte, an anode, and an anode current collector. The smart wearable lens mounted with the all-solid-state thin film secondary battery may be stably and continuously supplied with power and has a low self-discharge rate. In addition, the smart wearable lens may minimize aversion when humans are wearing the smart wearable lens and be suitably used for a curved lens, especially a micro-lens such as a contact lens.

Abstract: Disclosed is a transparent anode thin film comprising a transparent anode active material layer, wherein the transparent anode active material layer comprises a Si-based anode active material having a composition represented by the following [Chemical Formula 1]: SiNx??[Chemical Formula 1] (wherein 0<x?1.5).

Abstract: Disclosed is a method of manufacturing an epitaxy oxide thin film of enhanced crystalline quality, and an epitaxy oxide thin film manufactured thereby according to the present invention. With respect to the manufacturing method of the epitaxy oxide thin film, which epitaxially grows an orientation film with an oxide capable of being oriented to (001), (110), and (111) on a single crystal Si substrate, because time required for raising a temperature of the orientation film up to an annealing temperature at room temperature is extremely minimized, thermal stress arising from the large difference in thermal expansion coefficients between the substrate and the orientation film is controlled, so crystalline quality of the epitaxy oxide thin film can be enhanced. Moreover, various epitaxial functional oxides are integrated into the thin film of enhanced crystalline quality so that a novel electronic device can be embodied.

Abstract: A semiconductor substrate with oxide single crystal heterostructures, to which a sacrificial layer, an epitaxy functional oxide thin film having a perovskite structure and a metal layer are grown on an oxide single crystal substrate, prepared another metal layer on a semiconductor substrate, and bonded the metal layer of the oxide single crystal substrate to the metal layer of the semiconductor substrate to be face each other, and separated the oxide single crystal substrate by selectively etching and removing only the sacrificial layer after the bonding.

Abstract: A method of manufacturing an electrode layer and a method of manufacturing a capacitor using the same are provided. The method of manufacturing the electrode layer includes performing a first sub-cycle sequentially providing a tin precursor and an oxygen source on a substrate, performing a second sub-cycle sequentially providing a tin precursor, a tantalum precursor, and an oxygen source on the substrate on which the first sub-cycle is performed, and repeating a cycle including the first sub-cycle and the second sub-cycle to form a tantalum-doped tin oxide layer on the substrate. A tantalum concentration in the tantalum-doped tin oxide layer is determined by the tin precursor provided in the second sub-cycle.

Abstract: The present disclosure provides a transparent thin film heater including: a metal layer; and a transparent conductive oxide layer, wherein the transparent conductive oxide layer includes a composition represented by the following Chemical Formula 1 and is doped with nitrogen: ZnxSn1?xO2??[Chemical Formula 1] wherein 0<x?0.12.

Abstract: Provided is a self-resonance tuning piezoelectric energy harvester. The self-resonance tuning piezoelectric energy harvester includes a piezoelectric beam which extends along a horizontal direction, a fixing element which fixes two ends of the piezoelectric beam, and a mass which is connected to the piezoelectric beam movably along the piezoelectric beam, wherein the mass includes a through-hole through which the piezoelectric beam passes, and makes the movement through the through-hole. According to the principle of continuous movement to the resonance position, the mass of the self-resonance tuning piezoelectric energy harvester induces the piezoelectric beam to generate displacement to the maximum and maximize the electricity production capacity of the piezoelectric energy harvester.

Abstract: Proposed is a self-resonance tuning piezoelectric energy harvester with broadband frequency, including: a piezoelectric beam which is extended along a horizontal direction; a fixing member which fixes opposite ends of the piezoelectric beam; and a mobile mass which the piezoelectric beam passes through, and which is capable of self-movement along the piezoelectric beam through a through-hole which has a free space in addition to a space which the piezoelectric beam passes through, wherein as the mobile mass moves to a position of the piezoelectric beam, generated displacement of a piezoelectric beam is increased, and as the generated displacement becomes greater than the free space, the mobile mass is fixed to a position of a piezoelectric beam at which resonance will occur.