Patents by Inventor Johan Hendrik Klootwijk

Johan Hendrik Klootwijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200301269
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Application
    Filed: June 10, 2020
    Publication date: September 24, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN
  • Patent number: 10712657
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Grant
    Filed: July 4, 2016
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Hendrik Klootwijk, Wilhelmus Theodorus Anthonius Johannes Van Den Einden
  • Publication number: 20200033305
    Abstract: A 3D gas chromatography (GC) column development is possible by assembly of two parts each being substrates formed by gas tight materials. One part may be a silicon substrate with a snake shaped flow channel structure and the other part may be a glass plate. Both are coated with a column packing comprising polubutadiene, which is also able to glue or bond both parts together, thereby sealing the flow channel, thus forming a GC column. The column packaging can be composed in all kinds of polarity from very hydrophobic till very hydrophilic. In this way the column packing can be tuned on resolution for particular molecules which are interesting to detect, e.g. Octane. The invention is advantageous for micro GC columns.
    Type: Application
    Filed: March 20, 2018
    Publication date: January 30, 2020
    Inventors: Lucas Johannes Anna Maria BECKERS, Johan Hendrik KLOOTWIJK
  • Patent number: 10422892
    Abstract: The present invention relates to a photon counting X-ray detector and detection method that effectively suppress polarization even under high flux conditions.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: September 24, 2019
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Antonius Johannes Maria Nellissen, Frank Verbakel, Johan Hendrik Klootwijk, Herfried Karl Wieczorek
  • Patent number: 10302590
    Abstract: An integrated circuit sensor array includes a semiconductor substrate; an insulating layer over the substrate; and a first transistor on the insulating layer. The first transistor includes an exposed functionalized channel region in between a source region and a drain region for sensing an analyte in a medium. The integrated circuit sensor array also includes a second transistor formed on the insulating layer, where the second transistor includes an exposed channel region between source and drain regions for sensing a potential of the medium. Further, a voltage bias generator is conductively coupled to the semiconductor substrate for providing the transistors with a bias voltage, the voltage bias generator being responsive to the second transistor.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: May 28, 2019
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marleen Mescher, Pascal De Graaf, Bout Marcelis
  • Publication number: 20190056654
    Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
    Type: Application
    Filed: October 11, 2016
    Publication date: February 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mária PÉTER, Erik Achilles ABEGG, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Maxim Aleksandrovich NASALEVICH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN
  • Publication number: 20180373170
    Abstract: Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.
    Type: Application
    Filed: December 2, 2016
    Publication date: December 27, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul JANSSEN, Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Alexandar Nikolov ZDRAVKOV
  • Patent number: 10126263
    Abstract: A device for detecting a concentration of a substance in a fluid sample includes a substrate; an insulating layer arranged on the substrate; and a plurality of individually electrically addressable semiconducting nanowires arranged on the insulating layer. Each one of the plurality of nanowires is covered by an insulating material and arranged for sensing of the substance through an electrical characteristic of the nanowire. The device further includes a sample compartment for providing the fluid sample in contact with each of the plurality of nanowires. For each of the plurality of nanowires, at least one of the cross sectional dimension, the insulator thickness and the type of insulating material is selected such that each of the nanowires has a different detection range, and such that the dynamic range of the device is higher than the dynamic range of each of the individual nanowires.
    Type: Grant
    Filed: October 7, 2013
    Date of Patent: November 13, 2018
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marcel Mulder
  • Publication number: 20180203345
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Application
    Filed: July 4, 2016
    Publication date: July 19, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN
  • Patent number: 10008958
    Abstract: The present invention relates to a method of manufacturing a capacitive micro-machined transducer (100), in particular a CMUT, the method comprising depositing a first electrode layer (10) on a substrate (1), depositing a first dielectric film (20) on the first electrode layer (10), depositing a sacrificial layer (30) on the first dielectric film (20), the sacrificial layer (30) being removable for forming a cavity (35) of the transducer, depositing a second dielectric film (40) on the sacrificial layer (30), and depositing a second electrode layer (50) on the second dielectric film (40), wherein the first dielectric film (20) and/or the second dielectric film (40) comprises a first layer comprising an oxide, a second layer comprising a high-k material, and a third layer comprising an oxide, and wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (100), in particular a CMUT, manufactured by such method.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 26, 2018
    Assignee: Koninklijke Philips N.V.
    Inventors: Peter Dirksen, Ruediger Mauczok, Koray Karakaya, Johan Hendrik Klootwijk, Bout Marcelis, Marcel Mulder
  • Publication number: 20180079132
    Abstract: The invention provides a method for printing a 3D printed object (100), the 3D printed object (100) comprising a first type of printed material (1120) having electrically conductive properties and a second type of printed material (2120) having electrically insulating properties, wherein the method comprises: (I) providing printable material (110), wherein the printable material (110) has electrically insulating properties and wherein the printable material (110) is convertible by heat to a material (1110,1120) having electrically conductive properties; (II) printing with a 3D printer (500) said printable material (110) to generate printed material (120); and (III) subjecting to heat part of the printed material (120) after deposition; to provide said 3D printed object (100).
    Type: Application
    Filed: February 19, 2016
    Publication date: March 22, 2018
    Inventors: Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Abraham Rudolf BALKENENDE, Elise Claude Valentine TALGORN
  • Patent number: 9911884
    Abstract: A device for adaptable wavelength conversion and a device for energy conversion are described. The device for adaptable wavelength conversion comprises at least one layer comprising a wavelength converting material and arranged to receive and re-emit a light beam. the device is further arranged to manipulate the at least one layer to operate in a closed state, in which a surface of the at least one layer is substantially covered with the wavelength converting material and to operate in an open state, in which the surface of the at least one layer is substantially uncovered with the wavelength converting material. The device for adaptable wavelength conversion can be applied in combination with a solar cell or photovoltaic cell thereby enabling the solar cell to receive radiation having a suitable spectrum under varying lighting conditions.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: March 6, 2018
    Assignee: PHILIPS LIGHTING HOLDING B.V.
    Inventors: Rogier Adrianus Henrica Niessen, Willem Franke Pasveer, Johan Hendrik Klootwijk
  • Patent number: 9823218
    Abstract: Integrated circuit (100) comprising a semiconductor substrate (110); an insulating layer (120) over said substrate; an first transistor (140) on said insulating layer, said first transistor comprising an exposed channel region (146) in between a source region (142a, 142b) and a drain region (144); and a voltage waveform generator (150) conductively coupled to the semiconductor substrate for providing the first transistor with a bias voltage during a signal acquisition period, wherein the voltage waveform generator is arranged to generate an alternating bias voltage waveform (300) comprising a periodically increasing amplitude. A sensing apparatus including such an integrated circuit and a sensing method using such an integrated circuit are also disclosed.
    Type: Grant
    Filed: October 7, 2013
    Date of Patent: November 21, 2017
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marleen Mescher, Manuel Eduardo Alarcon-Rivero, Nico Maris Adriaan De Wild
  • Patent number: 9607606
    Abstract: The present invention relates to a method of manufacturing a capacitive micro-machined transducer (100), in particular a CMUT, the method comprising depositing a first electrode layer (10) on a substrate (1), depositing a first dielectric film (20) on the first electrode layer (10), depositing a sacrificial layer (30) on the first dielectric film (20), the sacrificial layer (30) being removable for forming a cavity (35) of the transducer, depositing a second dielectric film (40) on the sacrificial layer (30), depositing a second electrode layer (50) on the second dielectric film (40), and patterning at least one of the deposited layers and films (10, 20, 30, 40, 50), wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (100), in particular a CMUT, manufactured by such method.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: March 28, 2017
    Assignee: KONINKIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marcel Mulder, Nico Maris Adriaan De Wild, Koray Karakaya, Cornelius Antonius Van Den Huevel
  • Patent number: 9423375
    Abstract: An integrated circuit (100) comprising a substrate (110); an insulating layer (120) over said substrate; and a first nanowire element (140a) and a second nanowire element (140b) adjacent to said first nanowire element on said insulating layer; wherein the first nanowire element is arranged to be exposed to a medium comprising an analyte of interest, and wherein the second nanowire element is shielded from said medium by a shielding layer (150) over said second nanowire element. A sensing apparatus including such an IC, a sensing method using such an IC and a method of manufacturing such an IC are also disclosed.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: August 23, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johan Hendrik Klootwijk, Marleen Mescher, Manuel Eduardo Alarcon-Rivero, Nico Maris Adriaan De Wild
  • Patent number: 9417207
    Abstract: A method of selectively sensing the concentration of a target gas in polluted ambient air comprises the steps of: —providing a target gas sensor (220) sensitive to the target gas; —providing a first gas flow derived from the ambient air, from which first flow the target gas is substantially removed; —providing a second gas flow derived from the ambient air, substantially comprising the same target gas concentration as the ambient air; —exposing the target gas sensor to the first gas flow during a first time interval, and obtaining from the sensor a first output signal (Smf); —exposing the target gas sensor to the second gas flow during a second time interval not overlapping with the first time interval, and obtaining a second output signal (Smu); —calculating the difference (S?) between the first and the second output signals; calculating the concentration of the target gas from the calculated signal difference (S?).
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: August 16, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johan Marra, Johan Hendrik Klootwijk, Jacobus Bernardus Giesbers, Nico Maris Adriaan De Wild, Marcel Bulder, Rogier Adrianus Henrica Niessen, Peter Van Der Linde
  • Patent number: 9372399
    Abstract: An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: June 21, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Martinus Bernardus Van Der Mark, Vadim Yevgenyevich Banine, Andre Bernardus Jeunink, Johan Frederik Dijksman, Sander Frederik Wuister, Emiel Andreas Godefridus Peeters, Johan Hendrik Klootwijk, Roelof Koole, Christianus Martinus Van Heesch, Ruediger Guenter Mauczok, Jacobus Bernardus Giesbers
  • Publication number: 20160136583
    Abstract: Disclosed is a method of manufacturing a partially freestanding two-dimensional crystal film (16, 16?), the method comprising providing a substrate (10) carrying a catalyst layer (14) for forming the two-dimensional crystal layer on a first surface; forming the two-dimensional crystal film on the catalyst layer; covering at least the two-dimensional crystal film with a protective layer (18); etching a cavity (24) in a second surface of the substrate, the second surface being opposite to the first surface, said cavity terminating on the catalyst layer; etching the exposed part of the catalyst layer from the cavity; and removing the protective layer, thereby obtaining a two-dimensional crystal film that is freestanding over said cavity. A device manufactured in this manner is also disclosed.
    Type: Application
    Filed: April 21, 2014
    Publication date: May 19, 2016
    Inventors: KAMAL ASADI, JOHAN HENDRIK KLOOTWIJK
  • Publication number: 20160003770
    Abstract: Device (100) for detecting a concentration of a substance in a fluid sample, the device comprising: a substrate (102); an insulating layer (104) arranged on the substrate (102); a plurality of individually electrically addressable semiconducting nanowires (106, 108, 110) arranged on the insulating layer (104), each one of the plurality of nanowires being covered by an insulating material (202, 204, 206) and arranged for sensing of the substance through an electrical characteristic of the nanowire; and a sample compartment (118) for providing the fluid sample in contact with each of the plurality of nanowires; wherein for each of the plurality of nanowires (106, 108, 110), at least one of cross sectional dimension, insulator thickness and type of insulating material is selected such that each of the nanowires has a different detection range, and such that the dynamic range of the device is higher than the dynamic range of each of the individual nanowires.
    Type: Application
    Filed: October 7, 2013
    Publication date: January 7, 2016
    Inventors: Johan Hendrik KLOOTWIJK, Marcel MULDER
  • Patent number: 9231496
    Abstract: The present invention relates to a method of manufacturing a capacitive micro-machined transducer (100), in particular a CMUT, the method comprising depositing a first electrode layer (10) on a substrate (1), depositing a first dielectric film (20) on the first electrode layer (10), depositing a sacrificial layer (30) on the first dielectric film (20), the sacrificial layer (30) being removable for forming a cavity (35) of the transducer, depositing a second dielectric film (40) on the sacrificial layer (30), and depositing a second electrode layer (50) on the second dielectric film (40), wherein the first dielectric film (20) and/or the second dielectric film (40) comprises a first layer comprising an oxide, a second layer comprising a high-k material, and a third layer comprising an oxide, and wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (100), in particular a CMUT, manufactured by such method.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: January 5, 2016
    Assignee: Koninklijke Philips N.V.
    Inventors: Peter Dirksen, Ruediger Mauczok, Koray Karakaya, Johan Hendrik Klootwijk, Bout Marcelis, Marcel Mulder