Patents by Inventor Johannes Hubertus Josephina Moors

Johannes Hubertus Josephina Moors has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210026258
    Abstract: A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 gm, desirably less than 1 gm.
    Type: Application
    Filed: March 11, 2019
    Publication date: January 28, 2021
    Inventors: Marcus Adrianus Van De Kerkhof, Johannes Hubertus Josephina Moors
  • Patent number: 10222702
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
  • Patent number: 10001709
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: June 19, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Antonius Johannes Josephus Van Dijsseldonk, Wilhelmus Petrus De Boeij
  • Patent number: 9897930
    Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.
    Type: Grant
    Filed: July 22, 2009
    Date of Patent: February 20, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin
  • Publication number: 20180031979
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Application
    Filed: January 21, 2016
    Publication date: February 1, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
  • Publication number: 20170160646
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 8, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich BANINE, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Antonius Johannes Josephus Van Dijsseldonk, Wilhelmus Petrus De Boeij
  • Patent number: 9632419
    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: April 25, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns, Hermanus Kreuwel, Johannes Hubertus Josephina Moors, Uwe Bruno Heini Stamm, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Andrei Mikhailovich Yakunin
  • Publication number: 20170097579
    Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.
    Type: Application
    Filed: October 7, 2016
    Publication date: April 6, 2017
    Inventors: Yuri Johannes Gabriel VAN DE VIJVER, Johannes Hubertus Josephina MOORS, Wendelin Johanna Maria VERSTEEG, Peter Gerardus JONKERS
  • Patent number: 9594306
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: March 14, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin
  • Patent number: 9529283
    Abstract: A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: December 27, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Leonid Aizikovitch Sjmaenok
  • Patent number: 9411238
    Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: August 9, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
  • Patent number: 9363879
    Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
  • Patent number: 9207548
    Abstract: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: December 8, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors
  • Patent number: 9164403
    Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
    Type: Grant
    Filed: December 8, 2010
    Date of Patent: October 20, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
  • Publication number: 20150077729
    Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
    Type: Application
    Filed: November 4, 2014
    Publication date: March 19, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
  • Patent number: 8980009
    Abstract: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: March 17, 2015
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Arnold Storm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin te Sligte
  • Patent number: 8946661
    Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: February 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
  • Patent number: 8928855
    Abstract: A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.
    Type: Grant
    Filed: April 15, 2009
    Date of Patent: January 6, 2015
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dirk Heinrich Ehm
  • Publication number: 20140375974
    Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.
    Type: Application
    Filed: January 10, 2013
    Publication date: December 25, 2014
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
  • Patent number: 8901521
    Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski