Patents by Inventor Johannes Hubertus Josephina Moors
Johannes Hubertus Josephina Moors has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9363879Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: GrantFiled: November 4, 2014Date of Patent: June 7, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
-
Patent number: 9207548Abstract: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.Type: GrantFiled: July 30, 2009Date of Patent: December 8, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors
-
Patent number: 9164403Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.Type: GrantFiled: December 8, 2010Date of Patent: October 20, 2015Assignee: ASML Netherlands B.V.Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
-
Publication number: 20150077729Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: ApplicationFiled: November 4, 2014Publication date: March 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
-
Patent number: 8980009Abstract: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.Type: GrantFiled: March 7, 2013Date of Patent: March 17, 2015Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Dirk Heinrich Ehm, Arnold Storm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin te Sligte
-
Patent number: 8946661Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.Type: GrantFiled: November 27, 2012Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
-
Patent number: 8928855Abstract: A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.Type: GrantFiled: April 15, 2009Date of Patent: January 6, 2015Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dirk Heinrich Ehm
-
Publication number: 20140375974Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.Type: ApplicationFiled: January 10, 2013Publication date: December 25, 2014Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
-
Patent number: 8901521Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: GrantFiled: August 25, 2008Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
-
Publication number: 20140253894Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.Type: ApplicationFiled: August 23, 2012Publication date: September 11, 2014Applicant: ASML Netherland B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Hermanus Johannes Maria Kreuwel, Vadim Yevgenyevich Banine, Andrei Mikhailovich Yakunin, Johannes Hubertus Josephina Moors, Olav Waldimir Frijns, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Uwe Bruno Heini Stamm
-
Publication number: 20140085619Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.Type: ApplicationFiled: December 21, 2011Publication date: March 27, 2014Applicant: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin
-
Patent number: 8610089Abstract: A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.Type: GrantFiled: April 17, 2012Date of Patent: December 17, 2013Assignees: ASML Netherlands B.V., Stichting Nationaal Lucht—en RuimtevaartlaboratoriumInventors: Sjoerd Nicolaas Lambertus Donders, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner
-
Publication number: 20130327955Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.Type: ApplicationFiled: November 27, 2012Publication date: December 12, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
-
Patent number: 8585224Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).Type: GrantFiled: February 10, 2013Date of Patent: November 19, 2013Assignees: Carl Zeiss SMT GmbH, ASML Netherlands b.V.Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
-
Patent number: 8547551Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.Type: GrantFiled: March 27, 2009Date of Patent: October 1, 2013Assignee: ASML Netherlands B.V.Inventors: Anastasius Jacobus Anicetus Bruinsma, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Abraham Veefkind, Peter Gerhardus Wihelmus Bussink, Egbert Anne Martijn Brouwer
-
Patent number: 8507882Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.Type: GrantFiled: August 19, 2009Date of Patent: August 13, 2013Assignee: ASML Netherlands B.V.Inventors: Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors
-
Patent number: 8477285Abstract: An optical assembly is mounted in a projection exposure apparatus (101) for EUV microlithography and includes at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) arranged to be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) configured to clean the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (po) for performing an exposure operation with the projection exposure apparatus (101). As a result, optical elements having respective optical surfaces arranged to be impinged upon by a useful beam bundle can be cleaned reliably of foreign particles.Type: GrantFiled: December 20, 2010Date of Patent: July 2, 2013Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Dirk Heinrich Ehm, Arnoldus Jan Storm, Johannes Hubertus Josephina Moors, Almut Czap, Mona Nagel, Jacques Cor Johan van der Donck, Jetske Karina Stortelder, Marijn Sandtke, Maria Isabel Catalina Caballero, Luigi Scaccabarozzi
-
Patent number: 8476167Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.Type: GrantFiled: February 3, 2011Date of Patent: July 2, 2013Assignee: ASML Netherlands B.V.Inventors: Hubert Adriaan Van Mierlo, Erik Leonardus Ham, Hendricus Johannes Maria Meijer, Hendrik Antony Johannes Neerhof, Joost Jeroen Ottens, Johannes Adrianus Petrus Leijtens, Marco Le Kluse, Jan Hopman, Johannes Hubertus Josephina Moors
-
Patent number: 8446560Abstract: A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.Type: GrantFiled: February 19, 2009Date of Patent: May 21, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Hubertus Josephina Moors, Norbertus Benedictus Koster, Erik Roelo Loopstra, Martin Frans Pierre Smeets, Antonius Theodorus Wilhelmus Kempen
-
Patent number: 8445873Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.Type: GrantFiled: May 23, 2012Date of Patent: May 21, 2013Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm