Patents by Inventor John Donohue
John Donohue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8736825Abstract: A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100 nm to about 3000 nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen.Type: GrantFiled: September 16, 2011Date of Patent: May 27, 2014Assignee: Newport CorporationInventors: Razvan Ciocan, John Donohue, Arkady Feldman, Zhuoyun Li
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Publication number: 20140021335Abstract: The disclosure relates to a photodetector system including a multi-junction detector having a first junction configured to generate a first current when irradiated with a first optical radiation component within a first spectral range, and at least a second junction configured to generate a second current when irradiated with a second optical radiation component within a second spectral range that is different than the first spectral range. The photodetector system also comprises a microprocessor adapted to generate a first indication related to a first characteristic of the first optical radiation component based on the first current, and generate a second indication related to a second characteristic of the second optical radiation component based on the second current.Type: ApplicationFiled: August 31, 2011Publication date: January 23, 2014Applicant: NEWPORT CORPORATIONInventors: Razvan Ciocan, Domenic Assalone, John Donohue, Dae Han, Zhuoyun Li
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Publication number: 20130223217Abstract: A window regulator for improving the performance of communications networks is described. In a communications network, data is sent downstream from a sender to a receiver, and acknowledgements are sent back upstream. When data is received at the receiver, the data is placed in a buffer and an acknowledgement of receipt may be sent. If no acknowledgement is received by a sender after a certain period of time, the sender retransmits the data. The receiver communicates how much data the receiver is willing to receive at any given time by sending an advertised window to the sender. The window regulator sets the size of the advertised window based on measurements of capacity in the network to improve the amount and rate of data sent downstream while avoiding loss of data and subsequent retransmissions.Type: ApplicationFiled: February 24, 2012Publication date: August 29, 2013Applicant: SYCAMORE NETWORKS, INC.Inventors: William M. TURNER, John DONOHUE
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Publication number: 20120010854Abstract: A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100 nm to about 3000 nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen.Type: ApplicationFiled: September 16, 2011Publication date: January 12, 2012Applicant: NEWPORT CORPORATIONInventors: Razvan Ciocan, John Donohue, Arkady Feldman, Zhuoyun Li
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Patent number: 7972483Abstract: A method for material processing utilizing a material processing system to perform a process. The method performs a process (510), measures a scan of data (520), and transforms the data scan (530) into a signature (540) including at least one spatial component. The scan of data (530) can include a process performance parameter such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. The signature (540) can be stored (550), and compared with either a previously acquired signature or with an ideal signature (560). If at least one spatial component substantially deviates from the reference spatial component, then a process fault has potentially occurred. If the cumulative deviation of all spatial components or a select group of components substantially deviates from a reference set of spatial components, then a process fault has potentially occurred.Type: GrantFiled: December 31, 2002Date of Patent: July 5, 2011Assignee: Tokyo Electron LimitedInventors: John Donohue, Hongyu Yue
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Patent number: 7557591Abstract: The present invention describes a system and method for monitoring a material film within a plasma processing device. The system includes a plasma reactor formed by a reactor wall and an electrode, a RF generator to couple electrical energy to the electrode, an electrical measurement device for measuring an electrical property of the plasma processing device, and a controller coupled to the electrical measurement device and programmed to determine a state of a film on the reactor wall based on the measured electrical property.Type: GrantFiled: March 28, 2003Date of Patent: July 7, 2009Assignee: Tokyo Electron LimitedInventor: John Donohue
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Publication number: 20060231526Abstract: The present invention describes a system and method for monitoring a material film within a plasma processing device. The plasma processing device comprises a plasma reactor formed by a reactor wall and an electrode, a RF generator to couple electrical energy to the electrode, an impedance match network to maximize the transfer of electrical energy from the RF generator to the plasma through the electrode, and an electrical measurement device for measuring an electrical property of the plasma processing device. The present invention further provides a method of monitoring the state of the wall film comprising the steps of energizing the electrode by coupling electrical energy from the RF generator through the impedance match network to the electrode and forming a plasma, measuring an electrical property between the RF generator and the electrode, and determining a state of the film on the reactor wall, wherein the determining includes correlating an electrical property with the state of the wall film.Type: ApplicationFiled: March 28, 2003Publication date: October 19, 2006Inventor: John Donohue
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Publication number: 20050115824Abstract: A method for material processing utilizing a material processing system to perform a process. The method performs a process (510), measures a scan of data (520), and transforms the data scan (530) into a signature (540) including at least one spatial component. The scan of data (530) can include a process performance parameter such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. The signature (540) can be stored (550), and compared with either a previously acquired signature or with an ideal signature (560). If at least one spatial component substantially deivates from the reference spatial component, then a process fault has potentially occurred. If the cumulative deviation of all spatial components or a select group of components substantially deviates from a reference set of spatial components, then a process fault has potentially occurred.Type: ApplicationFiled: December 31, 2002Publication date: June 2, 2005Inventors: John Donohue, Hongyu Yue
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Publication number: 20050118812Abstract: A method for material processing utilizing a material processing system (1) to perform a process. The method a process, measures a scan of data, and transforms the data scan into a signature including at least one spatial component. The scan of data can include a process performance parameter (14) such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. A relationship can be determined between the measured signature and a set of at least one controllable process parameter (12) using multivariate analysis, and this relationship can be utilized to improve the scan of data corresponding to a process performance parameter. For example, utilizing this relationship to minimize the spatial components of the scan of data can affect an improvement in the process uniformity.Type: ApplicationFiled: December 31, 2002Publication date: June 2, 2005Applicant: TOKYO ELECRON LIMITEDInventors: John Donohue, Hongyu Yue
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Patent number: 5324702Abstract: Compositions comprising certain metal-containing materials distributed interactively on a deboronated HAMS-1B crystalline borosilicate molecular sieve which are useful for catalytically oxidizing or oxidatively dehydrogenating organic compounds such as alkanes, aromatics, and alkyl-substituted aromatics are described. Alkanes are oxidatively dehydrogenated to olefins, and an aromatic compound such as benzene can be oxidized by nitric and/or nitrous oxide to largely phenol or largely nitrobenzene depending upon the oxidation temperature. When the compound is a methylaromatic, oxidation produces an aromatic aldehyde. Alkyl groups larger than methyl oxidatively dehydrogenate to alkenyl groups.Type: GrantFiled: December 16, 1992Date of Patent: June 28, 1994Assignee: Amoco CorporationInventors: Jin S. Yoo, Mark S. Kleefisch, John A. Donohue
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Patent number: 4962258Abstract: Gallium-containing, crystalline silicate molecular sieves in which substantially all of the gallium occupies molecular sieve lattice positions or is intimately associated with the crystal lattice of the silicate sieve when composited into a silica matrix are shown to form catalyst compositions having superior properties for the catalytic, liquid-phase isomerization of a xylene-containing stream containing a minor amount of ethylbenzene to a product mixture rich in paraxylene.Type: GrantFiled: December 15, 1988Date of Patent: October 9, 1990Assignee: Amoco CorporationInventors: Jeffrey A. Amelse, John A. Donohue, Nancy A. Kutz, Judith B. Melville, Brian L. Slusar
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Patent number: 4710524Abstract: A radiation stabilized and sterilized, flexible article is comprised of a semi-crystalline polymer having a crystalline content of from twenty percent to ninety percent. This polymer has been irradiated with a sterilizing amount of high energy radiation while having incorporated therein radiation stabilizing amounts of a hindered piperidine compound a benzophenone precursor sufficient to render the article substantially resistant to radiolysis while retaining its flexibility.A method for sterilizing and radiation stabilizing a semi-crystalline polymer is also part of the present invention.Type: GrantFiled: August 5, 1985Date of Patent: December 1, 1987Assignee: Becton, Dickinson and CompanyInventor: John Donohue
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Patent number: 4582925Abstract: 2,2',6,6'-Tetramethyl-4,4'-dicarboxylic acid is prepared by the oxidation of bimesityl and derivatives of the dicarboxylic acid are used in the preparation of polyesters of high molecular weight.Type: GrantFiled: May 15, 1981Date of Patent: April 15, 1986Assignee: Standard Oil Company (Indiana)Inventor: John A. Donohue
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Patent number: 4547518Abstract: N-(1-Substituted-4,5-dihydro-1H-pyrazol-4-yl)benzamides having the general formula: ##STR1## wherein R is loweralkyl, cycloalkyl or phenylloweralkyl and R.sub.1 is selected from hydroxy, cyano, nitro, amino, methylamino, dimethylamino, halo, trifluoromethyl, loweralkyl, loweralkoxy, sulfamoyl or acetamido, and when n is more than 1 up to 3, R.sub.1 can be the same or different, are disclosed as having gastrokinetic and anti-emetic utility in animals and pharmaceutical compositions therefor. A process for preparing the compounds by oxidation of 1,2-disubstituted-N-(4-pyrazolidinyl)benzamides with a metal hypochlorite is disclosed.Type: GrantFiled: April 6, 1984Date of Patent: October 15, 1985Assignee: A. H. Robins Company, IncorporatedInventors: Lennox B. Turnbull, John A. Donohue, Gunnar E. Jagdmann, Jr.
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Patent number: 4457814Abstract: Terephthalic acid, as the sodium salt, is electrochemically reduced to sodium p-hydroxymethylbenzoate wherein the catholyte comprises a soluble sodium salt and pH of the catholyte is controlled within limits to obtain good circuit efficiency and little or no by-products.Type: GrantFiled: July 29, 1983Date of Patent: July 3, 1984Assignee: Standard Oil Company (Indiana)Inventor: John A. Donohue
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Patent number: 4447645Abstract: Disclosed is a process for purification of p-hydroxymethylbenzoic acid containing 4-carboxybenzaldehyde, p-toluic acid and terephthalic acid impurities.Type: GrantFiled: November 30, 1982Date of Patent: May 8, 1984Assignee: Standard Oil Company (Indiana)Inventors: John A. Donohue, James O. Knobloch, Bruce Petty-Weeks, Steven A. Cerefice
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Patent number: 4431797Abstract: An electrochemical process is disclosed for the preparation of high molecular weight copolymers of poly(p-methylenebenzoate) and poly(alkyleneterephthalate) wherein ammonia is used in the electrolysis step. The ammonium salts thus formed are removed by heat decomposition. Copolymers are prepared from the resulting electrolysis product.Type: GrantFiled: November 30, 1982Date of Patent: February 14, 1984Assignee: Standard Oil Company (Indiana)Inventors: Edward E. Paschke, John A. Donohue
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Patent number: 4402805Abstract: Terephthalic acid is electrochemically reduced to p-hydroxymethylbenzoic acid and 4-carboxybenzaldehyde content is decreased by a process in a two-compartment electrolysis cell in which (a) the cathode is solid and metal with a mercury amalgam surface and with a hydrogen overvoltage which is greater than the potential for the reduction of terephthalic acid to p-hydroxymethylbenzoic acid, (b) the separating diaphragm is a cation exchange membrane, (c) the catholyte comprises a solution of terephthalic acid, ammonia, an ammonium salt and a soluble salt of mercury, (d) the temperature of the catholyte is between 0.degree. C. and 100.degree. C., (e) the current density is within the range of 1 to 200 A/dm.sup.Type: GrantFiled: March 15, 1982Date of Patent: September 6, 1983Assignee: Standard Oil Company IndianaInventor: John A. Donohue
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Patent number: 4381229Abstract: Terephthalic acid is electrochemically reduced to p-hydroxymethylbenzoic acid in a process in an electrolysis cell in which (a) the cathode is solid and metal with an amalgam of mercury surface and has a hydrogen overvoltage which is greater than the potential for the reduction of terephthalic acid to p-hydroxymethylbenzoic acid, and, (b) sufficient mercury is added of a mercury compound to maintain the process.Type: GrantFiled: November 9, 1981Date of Patent: April 26, 1983Assignee: Standard Oil Company (Indiana)Inventor: John A. Donohue
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Patent number: 4289870Abstract: A polyester comprising units of a dicarboxylic acid component and dihydroxy component wherein said dicarboxylic acid component comprises non-vicinal benzene dicarboxylate moieties and said dihydroxy component comprises 2,2',6,6'-tetramethylbiphenyl-4,4'-diol moieties.Type: GrantFiled: October 3, 1979Date of Patent: September 15, 1981Assignee: Standard Oil Company (Indiana)Inventors: John A. Donohue, Edward E. Paschke