Patents by Inventor John Holland
John Holland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230054699Abstract: A tunable edge sheath (TES) system includes a coupling ring configured to couple to a bottom surface of an edge ring that surrounds a wafer support area within a plasma processing chamber. The TES system includes an annular-shaped electrode embedded within the coupling ring. The TES system includes a plurality of radiofrequency signal supply pins coupled to the electrode within the coupling ring. Each of the plurality of radiofrequency signal supply pins extends through a corresponding hole formed through a bottom surface of the coupling ring. The TES system includes a plurality of radiofrequency signal filters respectively connected to the plurality of radiofrequency supply pins. Each of the plurality of radiofrequency signal filters is configured to provide a high impedance to radiofrequency signals used to generate a plasma within the plasma processing chamber.Type: ApplicationFiled: January 30, 2021Publication date: February 23, 2023Inventors: Alexei Marakhtanov, Felix Kozakevich, Bing Ji, Ranadeep Bhowmick, John Holland
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Patent number: 11580224Abstract: A computer-implemented method includes monitoring, by a power monitor on a computer device, for a peripheral device connection. The peripheral device connection connecting a peripheral device to an input/output port of the computer device. The input/output port is configured to provide power from a power supply of the computer device to the peripheral device. In response to the monitoring for the peripheral device connection identifying the peripheral device connection, the method includes determining, by the power monitor, a device type and a negotiated power of the peripheral device as connected. The power monitor determines whether the negotiated power of the peripheral device as connected matches expected power information. In response to determining the negotiated power of the peripheral device does not match the expected power information, the power monitor takes action on the computer device.Type: GrantFiled: December 10, 2020Date of Patent: February 14, 2023Assignee: Target Brands, Inc.Inventors: Kyle Shattuck, Brian Souder, John Holland, Adam Lesperance, Jerome Odegaard
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Publication number: 20230039721Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: ApplicationFiled: October 5, 2022Publication date: February 9, 2023Inventors: Jon MCCHESNEY, Saravanapriyan SRIRAMAN, Richard A. MARSH, Alexander Miller PATERSON, John HOLLAND
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Publication number: 20230007885Abstract: A method for achieving uniformity in an etch rate is described. The method includes receiving a voltage signal from an output of a match, and determining a positive crossing and a negative crossing of the voltage signal for each cycle of the voltage signal. The negative crossing of each cycle is consecutive to the positive crossing of the cycle. The method further includes dividing a time interval of each cycle of the voltage signal into a plurality of bins. For one or more of the plurality of bins associated with the positive crossing and one or more of the plurality of bins associated with the negative crossing, the method includes adjusting a frequency of a radio frequency generator to achieve the uniformity in the etch rate.Type: ApplicationFiled: February 8, 2021Publication date: January 12, 2023Inventors: Alexei Marakhtanov, Felix Leib Kozakevich, Ranadeep Bhowmick, Bing Ji, John Holland
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Patent number: 11500477Abstract: The present disclosure provides systems and methods that include or otherwise leverage an artificial intelligence system and/or provide user interface mechanisms particularly suited for interacting and/or interfacing with an artificial intelligence system. A computing system can include a camera, a light-emitting device, and an artificial intelligence system that comprises one or more machine-learned models. The computing system can include a processor and one or more non-transitory computer-readable media that stores instructions that, when executed, cause the processor to obtain an image of a scene captured by the camera; generate an attention output that describes at least one region of the scene that includes a subject of a processing operation performed by the artificial intelligence system; and control the light-emitting device to emit light onto or adjacent a region of the scene that includes the subject of the processing operation performed by the artificial intelligence system.Type: GrantFiled: July 2, 2018Date of Patent: November 15, 2022Assignee: GOOGLE LLCInventors: Robert Marchant, David Matthew Jones, Henry John Holland, Alexander George Hulme, Fiona Paula O'Leary, Julie Mareva Arrive
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Patent number: 11495441Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: GrantFiled: October 29, 2020Date of Patent: November 8, 2022Assignee: Lam Research CorporationInventors: Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, Alexander Miller Paterson, John Holland
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Publication number: 20220254616Abstract: Systems and methods for cleaning an edge ring pocket are described herein. One of the methods includes providing one or more process gases to a plasma chamber, supplying a low frequency (LF) radio frequency (RF) power to an edge ring that is located adjacent to a chuck of the plasma chamber. The LF RF power is supplied while the one or more process gases are supplied to the plasma chamber to maintain plasma within the plasma chamber. The supply of the LF RF power increases energy of plasma ions near the edge ring pocket to remove residue in the edge ring pocket. The LF RF power is supplied during the time period in which a substrate is not being processed within the plasma chamber.Type: ApplicationFiled: July 22, 2020Publication date: August 11, 2022Inventors: Eric Hudson, Scott Briggs, John Holland, Alexei Marakhtanov, Felix Leib Kozakevich, Kenneth Lucchesi
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Publication number: 20220199366Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized. The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.Type: ApplicationFiled: March 9, 2022Publication date: June 23, 2022Inventors: Ranadeep Bhowmick, John Holland, Felix Leib Kozakevich, Bing Ji, Alexei Marakhtanov
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Patent number: 11335539Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized. The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.Type: GrantFiled: September 28, 2018Date of Patent: May 17, 2022Assignee: Lam Research CorporationInventors: Ranadeep Bhowmick, John Holland, Felix Leib Kozakevich, Bing Ji, Alexei Marakhtanov
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Publication number: 20220005674Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.Type: ApplicationFiled: September 21, 2021Publication date: January 6, 2022Inventors: Aaron T. RADOMSKI, Benjamin J. GITLIN, Larry J. FISK, II, Mariusz OLDZIEJ, Aaron M. BURRY, Jonathan W. SMYKA, Alexei MARAKHTANOV, Bing JI, Felix Leib KOZAKEVICH, John HOLLAND, Ranadeep BHOWMICK
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Patent number: 11158488Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.Type: GrantFiled: June 26, 2019Date of Patent: October 26, 2021Assignees: MKS Instruments, Inc., Lam Research CorporationInventors: Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron M. Burry, Jonathan W. Smyka, Alexei Marakhtanov, Bing Ji, Felix Leib Kozakevich, John Holland, Ranadeep Bhowmick
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Publication number: 20210319980Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.Type: ApplicationFiled: September 28, 2018Publication date: October 14, 2021Inventors: Ranadeep Bhowmick, John Holland, Felix Leib Kozakevich, Bing Ji, Alexei Marakhtanov
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Publication number: 20210182395Abstract: A computer-implemented method includes monitoring, by a power monitor on a computer device, for a peripheral device connection. The peripheral device connection connecting a peripheral device to an input/output port of the computer device. The input/output port is configured to provide power from a power supply of the computer device to the peripheral device. In response to the monitoring for the peripheral device connection identifying the peripheral device connection, the method includes determining, by the power monitor, a device type and a negotiated power of the peripheral device as connected. The power monitor determines whether the negotiated power of the peripheral device as connected matches expected power information. In response to determining the negotiated power of the peripheral device does not match the expected power information, the power monitor takes action on the computer device.Type: ApplicationFiled: December 10, 2020Publication date: June 17, 2021Inventors: Kyle Shattuck, Brian Souder, John Holland, Adam Lesperance, Jerome Odegaard
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Publication number: 20210154981Abstract: This specification generally relates to aqueous compositions for preparing UV stable fire-resistant interlayers. It also relates to UV stable fire-resistant glazing laminates comprising such interlayers, the use of such glazing laminates in construction, and constructions comprising such glazings. An example aqueous composition comprises a mixed alkali metal silicate of general formula SiO2.M2O, where M is K or Na, and other organic and inorganic additives. Glazings with interlayers made with such aqueous compositions are simple to prepare and demonstrate good UV stability and fire-protection properties.Type: ApplicationFiled: November 20, 2020Publication date: May 27, 2021Inventors: Richard Ainsworth, Vincent Crook, John Holland, Saminu Magami, Catherine Norris
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Patent number: 11002008Abstract: Fire resistant glazing units, processes for the manufacture of such fire resistant glazing units, the use of fire resistant glazing units in construction, and constructions comprising such glazing units. A fire resistant glazing unit may include two panes of glass which are arranged together with a seal to enclose a fire-resistant interlayer. The seal is adapted to breach in the event of a fire causing increased pressure between the panes, releasing pressure before it can build up and cause a pane to break in an unfavourable manner.Type: GrantFiled: February 11, 2019Date of Patent: May 11, 2021Assignee: PYROGUARD UK LTD.Inventors: Vincent Crook, John Holland
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Publication number: 20210050188Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: ApplicationFiled: October 29, 2020Publication date: February 18, 2021Inventors: Jon MCCHESNEY, Saravanapriyan SRIRAMAN, Richard A. MARSH, Alexander Miller PATERSON, John HOLLAND
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Patent number: 10916409Abstract: Systems and methods for active control of radial etch uniformity are described. One of the methods includes generating a radio frequency (RF) signal having a fundamental frequency and generating another RF signal having a harmonic frequency. The harmonic frequency, or a phase, or a parameter level, or a combination thereof of the other RF signal are controlled to control harmonics of RF plasma sheath within a plasma chamber to achieve radial etch uniformity.Type: GrantFiled: June 18, 2018Date of Patent: February 9, 2021Assignee: Lam Research CorporationInventors: Alexei Marakhtanov, Felix Leib Kozakevich, John Holland, Bing Ji, Kenneth Lucchesi
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Publication number: 20200411289Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.Type: ApplicationFiled: June 26, 2019Publication date: December 31, 2020Inventors: Aaron T. RADOMSKI, Benjamin J. GITLIN, Larry J. FISK, II, Mariusz OLDZIEJ, Aaron M. BURRY, Jonathan W. SMYKA, Alexei MARAKHTANOV, Bing JI, Felix Leib KOZAKEVICH, John HOLLAND, Ranadeep BHOWMICK
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Patent number: 10861708Abstract: Systems and methods for applying three or more states for achieving a high aspect ratio dielectric etch operation are described. In one of the methods, a middle state is introduced between a high state and a low state. The middle state is applied to both a source radio frequency (RF) generator and a bias radio frequency (RF) generator. During the middle state, RF power is maintained to be between a high amount of RF power associated with the high state and a low amount of RF power associated with the low state to achieve the high aspect ratio dielectric etch.Type: GrantFiled: November 21, 2019Date of Patent: December 8, 2020Assignee: Lam Research CorporationInventors: Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric Hudson, Felix Leib Kozakevich, John Holland, Alexei Marakhtanov, Bradford J. Lyndaker
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Publication number: 20200365378Abstract: Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. In addition, the securing of the edge ring to the support ring secures the edge ring to the plasma chamber because the support ring is secured to an insulator ring, which is connected to an insulator wall of the plasma chamber. Moreover, the support ring and the edge ring are pulled down vertically using one or more clasp mechanisms during the processing of the substrate and are pushed up vertically using the clasp mechanisms to remove the edge ring and the support ring from the plasma chamber.Type: ApplicationFiled: December 15, 2017Publication date: November 19, 2020Inventors: Michael C. Kellogg, Adam Mace, Alexei Marakhtanov, John Holland, Zhigang Chen, Felix Kozakevich, Alexander Matyushkin