Abstract: A system and method of providing error detection and correction capability in an IC using redundant logic cells and an embedded field programmable gate array (FPGA). The system and method provide error correction (EC) to enable a defective logic function implemented within an IC chip design to be replaced, wherein at least one embedded FPGA is provided in the IC chip to perform a logic function. If a defective logic function is identified in the IC design, the embedded FPGA is programmed to correctly perform the defective logic function. All inputs in an input cone of logic of the defective logic function are identified and are directed into the embedded FPGA, such that the embedded FPGA performs the logic function of the defective logic function.

Abstract: An electrical wiring structure and method of designing thereof. The method identifies at least one wire pair having a first wire and a second wire. The second wire is already tri-stated or can be tri-stated. The wire pair may have a same-direction switching probability per clock cycle that is no less than a predetermined or user-selected minimum same-direction switching probability. Alternatively, the wire pair may have an opposite-direction switching probability per clock cycle that is no less than a predetermined or user-selected minimum opposite-direction switching probability. The first wire and the second wire satisfy at least one mathematical relationship involving: a spacing between the first wire and the second wire; and a common run length of the first wire and the second wire.

Abstract: An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit design of the integrated circuit, the photomask level design comprising a multiplicity of integrated circuit element shapes; (b) designating regions of the photomask level design between adjacent integrated circuit element shapes, the designated regions large enough to require placement of fill shapes between the adjacent integrated circuit elements based on fill shape rules, the fill shapes not required for the operation of the integrated circuit; and (c) placing one or more monitor structure shapes of a monitor structure in at least one of the designated regions, the monitor structure not required for the operation of the integrated circuit.

Abstract: Disclosed is a method and system for inserting redundant paths into an integrated circuit. Particularly, the invention provides a method for identifying a single via in a first path connecting two elements, determining if an alternate route is available for connecting the two elements (other than a redundant via), and for inserting a second path into the available alternate route. The combination of the first and second paths provides greater redundancy than inserting a redundant via alone. More importantly, such redundant paths provide for redundancy when congestion prevents a redundant via from being inserted adjacent to the single via. An embodiment of the method further comprises removing the single via and any redundant wire segments, if all of the additional vias used to form the second path can be made redundant.

Abstract: In a first aspect, an inventive apparatus for imaging a chip on a wafer includes a combined diamond chip image and kerf image having a plurality of sloped sides. The combined diamond chip image and kerf image includes a diamond chip image comprising a plurality of chip image rows that are parallel to at least one diagonal of the diamond chip image, and includes a kerf image adjacent to the diamond chip image. The kerf image comprises at least one kerf image row that is parallel to the at least one diagonal of the diamond chip image. The apparatus further includes a blocking material extending from the combined diamond chip image and kerf image to at least a periphery of an exposure field of a stepper. In a second aspect the imaging apparatus comprises an n-sided polygon-shaped combined chip image and kerf image. Also provided are inventive methods of manufacturing chips, and wafers manufactured in accordance with the inventive methods.

Abstract: A method for implementing defect inspection of an integrated circuit includes configuring a power bus grid structure on a first metal interconnect level, the power bus grid structure including a first plurality of wire pairs. The first plurality of wire pairs is arranged in a manner such that a first wire in each of the first plurality of wire pairs is electrically coupled to conductive structures beneath the first metal interconnect level, and a second wire in each of the first plurality of wire pairs is initially electrically isolated from the conductive structures beneath the first metal interconnect level. The first wire in each of the first plurality of wire pairs is biased to a known voltage, and a charge contrast inspection is performed between the first wire and the second wire of each of the first plurality of wire pairs.

Abstract: Disclosed is a shielded clock tree that has one or more clock signal buffers and clock signal splitters, with clock signal wiring connecting the clock signal buffers to the clock signal splitters. Shielding is adjacent the clock signal wiring, where ground wiring connects the shielding to ground. The shielding comprises shield wires positioned adjacent and parallel to the clock signal wiring. The invention provides switches in the ground wiring, and these switches are connected to, and controlled by, a test controller.

Abstract: An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit design of the integrated circuit, the photomask level design comprising a multiplicity of integrated circuit element shapes; (b) designating regions of the photomask level design between adjacent integrated circuit element shapes, the designated regions large enough to require placement of fill shapes between the adjacent integrated circuit elements based on fill shape rules, the fill shapes not required for the operation of the integrated circuit; and (c) placing one or more monitor structure shapes of a monitor structure in at least one of the designated regions, the monitor structure not required for the operation of the integrated circuit.

Abstract: An integrated circuit has a power grid and a set of independently switchable voltage islands, together with a system and method for measuring the voltage and history of the voltage on the power grid to determine the correct time to allow a large capacitive load (such as a voltage island) to be switched on to or off the power grid.

Abstract: A method is disclosed for designing scan chains in an integrated circuit chip with specific parameter sensitivities to identify fabrication process defects causing test fails and chip yield loss. The composition of scan paths in the integrated circuit chip is biased to allow them to also function as on-product process monitors. The method adds grouping constraints that bias scan chains to have common latch cell usage where possible, and also biases cell routing to constrain scan chain routing to given restricted metal layers for interconnects. The method assembles a list of latch design parameters which are sensitive to process variation or integrity, and formulates a plan for scan chain design which determines the number and the length of scan chains. A model is formulated of scan chain design based upon current state of yield and process integrity, wherein certain latch designs having dominant sensitivities are chosen for specific ones of the scan chains on the chip.

Abstract: A circuit layout methology is provided for eliminating the extra processing time and file-space requirements associated with the optical proximity correction (OPC) of a VLSI design. The methodology starts with the design rules for a given manufacturing technology and establishes a new set of layer-specific grid values. A layout obeying these new grid requirements leads to a significant reduction in data preparation time, cost, and file size. A layout-migration tool can be used to modify an existing layout in order to enforce the new grid requirements.

Abstract: A structure and associated method of processing data on a semi-conductor device comprising an input island, a processing island, and an output island formed on the semiconductor device. The input island is adapted to accept a specified amount of data and enable a means for providing a first specified voltage for powering the processing island after accepting the specified amount of data. The processing island is adapted to receive and process the specified amount of data from the input island upon powering the processing island by the first specified voltage. The output island is adapted to be powered by a second specified voltage. The processing island is further adapted to transmit the processed data to the output island upon said powering by the second specified voltage. The first specified voltage is adapted to be disabled thereby removing power from processing island upon completion of transmission of the processed data to the output island.

Abstract: A multiple supply gate array structure facilitated by the provision of a shared n-well and an isolated n-well is described. The gate array structure allows implementation of a single voltage circuit or a multiple voltage circuit. In addition, the gate array structure allows metal reprogram to provide standard logic functions, or special logic functions such as a buffer function for a signal crossing a voltage island boundary. Other special logic functions may include, for example, a level-shifter function or a fence-hold function.

Abstract: A method and system for designing a test structure. The method including: defining and placing test circuit pins in an integrated circuit design; routing one or more fat wires, each fat wire routed between a set of the test circuit pins; processing each fat wire into a continuous wire and one or more corresponding wire segments adjacent to the continuous wire, the continuous wire separated from the one or more corresponding wire segments by a space; and connecting the continuous wire and the one or more wire segments to circuit elements of a defect monitor scan chain, the circuit elements previously inserted into the integrated circuit design.

Abstract: A method for defect diagnosis of semiconductor chip. The method comprises the steps of (a) identifying M design structures and N physical characteristics of the circuit design, wherein M and N are positive integers, wherein each design structure of the M design structures is testable as to pass or fail, and wherein each physical characteristic of the N physical characteristics is present in at least one design structure of the M design structures; (b) for each design structure of the M design structures of the circuit design, determining a fail rate and determining whether the fail rate is high or low; and (c) if every design structure of the M design structures in which a physical characteristic of the N physical characteristics is present has a high fail rate, then flagging the physical characteristic as being likely to contain at least a defect.

Abstract: Disclosed is a shielded clock tree that has one or more clock signal buffers and clock signal splitters, with clock signal wiring connecting the clock signal buffers to the clock signal splitters. Shielding is adjacent the clock signal wiring, where ground wiring connects the shielding to ground. The shielding comprises shield wires positioned adjacent and parallel to the clock signal wiring. The invention provides switches in the ground wiring, and these switches are connected to, and controlled by, a test controller.

Abstract: A method for implementing defect inspection of an integrated circuit includes configuring a power bus grid structure on a first metal interconnect level, the power bus grid structure including a first plurality of wire pairs. The first plurality of wire pairs is arranged in a manner such that a first wire in each of the first plurality of wire pairs is electrically coupled to conductive structures beneath the first metal interconnect level, and a second wire in each of the first plurality of wire pairs is initially electrically isolated from the conductive structures beneath the first metal interconnect level. The first wire in each of the first plurality of wire pairs is biased to a known voltage, and a charge contrast inspection is performed between the first wire and the second wire of each of the first plurality of wire pairs.

Abstract: Disclosed is a shielded clock tree that has one or more clock signal buffers and clock signal splitters, with clock signal wiring connecting the clock signal buffers to the clock signal splitters. Shielding is adjacent the clock signal wiring, where ground wiring connects the shielding to ground. The shielding comprises shield wires positioned adjacent and parallel to the clock signal wiring. The invention provides switches in the ground wiring, and these switches are connected to, and controlled by, a test controller.

Abstract: A circuit and a method for monitoring defects in an integrated circuit chip. The circuit including a defect monitor portion and a sense element portion, the defect monitor portion either coupled to inputs of sense elements arranged in a chain or coupled between sense elements and forming portions of the chain.

Abstract: An electrical wiring structure and method of designing thereof. The method identifies at least one wire pair having a first wire and a second wire. The second wire is already tri-stated or can be tri-stated. The wire pair may have a same-direction switching probability per clock cycle that is no less than a predetermined or user-selected minimum same-direction switching probability. Alternatively, the wire pair may have an opposite-direction switching probability per clock cycle that is no less than a predetermined or user-selected minimum opposite-direction switching probability. The first wire and the second wire satisfy at least one mathematical relationship involving: a spacing between the first wire and the second wire; and a common run length of the first wire and the second wire.