Patents by Inventor John W. Lane

John W. Lane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110178628
    Abstract: Embodiments of the present invention generally relate to methods of controlling gas flow in etching chambers. The methods generally include splitting a single process gas supply source into multiple inputs of separate process chambers, such that each chamber processes substrates under uniform processing conditions. The method generally includes using a mass flow controller as a reference for calibrating a flow ratio controller. A span correction factor may be determined to account for the difference between the actual flow and the measured flow through the flow ratio controller. The span correction factors may be used to determine corrected set points for each channel of the flow controller using equations provided herein. Furthermore, the set points of the flow ratio controller may be made gas-independent using additional equations provided herein.
    Type: Application
    Filed: January 6, 2011
    Publication date: July 21, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Mariusch Gregor, John W. Lane
  • Patent number: 7981288
    Abstract: A fluid treatment device including a source of electrical voltage having a first and second terminal, a pulse generator connected to the first terminal and the second terminal and outputting a pulsed voltage wave signal between a third terminal and a fourth terminal, at least one coil positioned adjacent at least one fluid conduit, being electrically connected to the third and fourth terminals and at least one capacitor also being electrically connected to the third and fourth terminals to form a first circuit with an inductance L, a capacitance C and a resonant frequency. The pulse generator is arranged to generate a pulsed voltage wave with a frequency approximately equal to the resonant frequency. A further circuit element is arranged to cause the voltage pulse reaching the coil to repeatedly, alternate between a period of pulsed voltage at the frequency and a period of zero voltage, with each period extending for a time in a range of approximately 2 to 33 milliseconds.
    Type: Grant
    Filed: November 21, 2005
    Date of Patent: July 19, 2011
    Assignee: Evapco, Inc.
    Inventors: Wilson E. Bradley, John W. Lane
  • Patent number: 7850786
    Abstract: Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: December 14, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Patent number: 7798388
    Abstract: The present invention relates to a method of diffusion bonding of steel and steel alloys, to fabricate a fluid delivery system of the kind which would be useful in semiconductor processing and in other applications which require high purity fluid handling.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: September 21, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Patent number: 7704364
    Abstract: A fluid treatment device includes an AC power source connected to first, second and third conductors. A electromagnetic field generating device is positioned adjacent to a fluid conduit, electrically connected to the first and third conductors to form a first circuit. A second electromagnetic field generating device is positioned adjacent to a second fluid conduit, electrically connected to the second and third electrical conductors to form a second circuit. A circuit element in the first circuit initiates a high frequency electromagnetic field at said first electromagnetic field generating device during a first half of the AC wave form in the first circuit, and a circuit element in the second circuit initiates a high frequency electromagnetic field at said first electromagnetic field generating device during a second half of the AC wave form in the second circuit.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: April 27, 2010
    Assignee: Evapco, Inc.
    Inventors: Richard P. Merrill, John W. Lane
  • Publication number: 20090266139
    Abstract: A method and apparatus that solve the problem of accurate measurement of gas flow so that the delivery of gases in semiconductor processing may be performed with greater confidence and accuracy by performing real-time characterization of a lead-line for mass flow controller (MFC) flow verification are provided. In one embodiment a mass flow verifier (MFV) provides rate of rise information to a controller via a digital interface without correcting for lead-line influences. After receiving the rate of rise data from the tool host computer computes a gas mass correction factor in real-time based on at least one of the following: MFC temperature sensor data, lead-line temperature sensor data, lead-line pressure transducer data, and lead-line volume. The rate of rise data and gas mass correction factor are used to compute accurate mass flow. The accurate mass flow information may be used to calibrate the MFC.
    Type: Application
    Filed: April 22, 2009
    Publication date: October 29, 2009
    Applicant: APPLIED MATERIALS, INC
    Inventors: Mariusch Gregor, John W. Lane
  • Patent number: 7569142
    Abstract: An apparatus and method for treating dirty water or other liquids containing particles of varying size includes a magnetic treatment unit and a centrifugal separator through which the liquid flows as a stream in sequence. The magnetic treatment unit causes very small sized particles to agglomerate, nucleate or otherwise to be amassed into larger particles which are then more easily separated by the centrifugal separator.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: August 4, 2009
    Assignee: Clearwater Systems Corporation
    Inventor: John W. Lane
  • Patent number: 7559527
    Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Grant
    Filed: April 19, 2007
    Date of Patent: July 14, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Patent number: 7524413
    Abstract: A method and apparatus for treating a fluid to destroy, remove, or reduce undesirable agents, such as microorganisms, particles or ions, contained in the fluid and/or to inhibit the formation of scale are disclosed. The invention includes an apparatus for treating a fluid to destroy, remove, or reduce undesirable agents, such as microorganisms, particles, or ions, contained in the fluid and/or to inhibit the formation of scale. The apparatus can include an open fluid directional means or conduit. The preferred open fluid directional means is a conduit manufactured of resilient, corrosion-resistant material. The apparatus is attached to a power source and has a controller means. The controller means is desirably a microprocessor and can include a switching means for regulating the current to the apparatus. However, simpler circuits and components can be used for the controller means. The apparatus includes a field generating means. The field generating means forms a treatment field.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: April 28, 2009
    Assignee: Clearwater Systems Corporation
    Inventors: Kenneth E. Wittmer, Walter F. J. Crewson, John W. Lane
  • Publication number: 20090072009
    Abstract: The present invention relates to diffusion bonding of patterned sheets to form a fluid flow handling structure, and to a method of preventing bonding between a load distribution block and a plate set of stacked sheets during the diffusion bonding process.
    Type: Application
    Filed: October 21, 2008
    Publication date: March 19, 2009
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20090057375
    Abstract: The present invention relates to a method of diffusion bonding sheets of patterned material to fabricate a fluid delivery system; and particularly relates to a method of improving the interior surface roughness of fluid flow conduits formed within the diffusion bonded fluid delivery system structure.
    Type: Application
    Filed: October 21, 2008
    Publication date: March 5, 2009
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20090039057
    Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Application
    Filed: October 14, 2008
    Publication date: February 12, 2009
    Inventors: Mark Crockett, John W. Lane, Micahel J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Publication number: 20080296351
    Abstract: The present invention relates to a method of diffusion bonding of steel and steel alloys, to fabricate a fluid delivery system of the kind which would be useful in semiconductor processing and in other applications which require high purity fluid handling.
    Type: Application
    Filed: May 31, 2007
    Publication date: December 4, 2008
    Inventors: Mark Crockett, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Publication number: 20080296354
    Abstract: The present invention relates to stainless steel sheets which would be useful in semiconductor processing and in other applications which require high purity fluid handling. The invention also relates to a method of selecting and processing such sheets.
    Type: Application
    Filed: May 31, 2007
    Publication date: December 4, 2008
    Inventors: MARK CROCKETT, John W. Lane, Vincent Kirchhoff, Marcel E. Josephson, Hong P. Gao, Bhaswan Manjunath
  • Patent number: 7459003
    Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: December 2, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Patent number: 7448276
    Abstract: A diffusion bonded space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The disclosure includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. A capacitive dual electrode pressure sensor which is integrated into a multilayered substrate is described. The pressure sensor may be used as a gage relative to atmospheric pressure if desired for a particular application.
    Type: Grant
    Filed: August 23, 2006
    Date of Patent: November 11, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Patent number: 7217368
    Abstract: An apparatus and method for treating dirty water or other liquids containing particles of varying size includes a magnetic treatment unit and a centrifugal separator through which the liquid flows as a stream in sequence. The magnetic treatment unit causes very small sized particles to agglomerate, nucleate or otherwise to be amassed into larger particles which are then more easily separated by the centrifugal separator.
    Type: Grant
    Filed: December 3, 2002
    Date of Patent: May 15, 2007
    Assignee: Clearwater Systems Corporation
    Inventor: John W. Lane
  • Publication number: 20040119038
    Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Application
    Filed: July 12, 2003
    Publication date: June 24, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Michael J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Publication number: 20030116506
    Abstract: An apparatus and method for treating dirty water or other liquids containing particles of varying size includes a magnetic treatment unit and a centrifugal separator through which the liquid flows as a stream in sequence. The magnetic treatment unit causes very small sized particles to agglomerate, nucleate or otherwise to be amassed into larger particles which are then more easily separated by the centrifugal separator.
    Type: Application
    Filed: December 3, 2002
    Publication date: June 26, 2003
    Applicant: Clearwater Systems, LLC
    Inventor: John W. Lane
  • Patent number: 5980066
    Abstract: Overlapping lenses for use in a light fixture provided to project a beam of light in a first beam shape having a first cross-sectional geometry. A first lens device is supported in the fixture and movable into a position to interrupt the beam of light for selecting beam shape by altering the first projected beam shape from the first cross-sectional geometry to a second cross-sectional geometry different from the first geometry. The first lens device includes at least one lenticular lens element having lens lenticules oriented in a first direction. A second lens device, separate from the first device, is supported in the fixture and movable into a position to interrupt the beam of light for selecting beam shape by altering the second projected beam shape from the second cross-sectional geometry to a third cross-sectional geometry different from the first and second geometries.
    Type: Grant
    Filed: June 4, 1997
    Date of Patent: November 9, 1999
    Assignee: High End Systems, Inc.
    Inventors: Richard S. Belliveau, John W. Lane, II