Abstract: A chamber for plasma processing a substrate. The chamber includes one or more chamber walls defining a plasma processing region and an RF transmitting device configured to transmit RF energy to the plasma processing region. The RF transmitting device comprises a first coil portion and a second coil portion connected in parallel. Each of the first coil portion and the second coil portion is a half turn coil and the voltage at an input of the first coil portion and the voltage at an input of the second coil portion are about the same.

Abstract: A system of various messaging, personal convenience, and organizational products, each taking the form of a component or module, and all of which are securable to one another in such a manner that a user is provided with a wide array of possible customizable configuration options. The components are interconnected by fasteners, such as clips, secured to adjacent walls that project rearwardly from a front surface of each of the components.

Abstract: Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.

Abstract: A method for determining the relative position of two points using an inertial navigation system is described. The method comprises estimating position error states and a position solution with an INS at a first position, estimating position error states and a position solution with the INS at a second position, and returning the INS to the first position. Estimates of the first and second position error states are adjusted based on correlations developed during a transition returning the INS from the second position to the first position.

Abstract: Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.

Abstract: For use in a color filter inkjet printing system that may be part of a flat panel display manufacturing system, methods and apparatus for adjusting a pixel fill profile are provided. The methods include application of, and the apparatus are adapted to apply, pressurized gas to at least one ink-filled pixel well on a substrate having a plurality of pixel wells. Numerous other aspects are provided.

Abstract: Apparatus and methods are provided for forming a pixel matrix. The methods include coating a substrate with a pixel matrix material, coating the pixel matrix material with an ink-phobic material, and forming pixel wells in the pixel matrix material and the ink-phobic material. A system for forming a pixel matrix is provided that includes a patterning tool including a laser ablation system operable to form pixel wells in pixel matrix material coated with ink-phobic material. The laser ablation system is operable to form pixel wells in pixel matrix material coated with ink-phobic material in an oxygenated environment so that the sidewalls of the pixel matrix are made to be ink-philic. The invention also includes a pixel well structure in which the top surfaces of the pixel well is ink-phobic and the surfaces of the sidewalls are ink-philic. Numerous other aspects are provided.

Abstract: An endoluminal delivery system is provided having an endoluminal prosthesis sized to fit through a body lumen in a first unexpanded state, where a second state is an expanded relative to the first state. At least one delivery capsule is incorporated to the outer wall of the endoluminal prosthesis, where each one of the delivery capsules has a predetermined delivery pressure. There is at least one reactant in the delivery capsule, where the endoluminal prosthesis is expanded from the first state to the second state to expand the endoluminal prosthesis against the body lumen and induce the predetermined delivery pressure to the delivery capsule, and deliver the reactants to the body lumen according to desired positioning and timing. At least one containment band incorporated to the outer wall of the endoluminal prosthesis and positioned near the delivery capsules to localize the reactants.

Abstract: The present invention generally provides a sputtering apparatus and method in which a sputtering target has a plurality of target sections bonded to a common backing plate. Each segment can be bonded to the common backing plate using a different bonding material. One target segment can be bonded to the backing plate using electrically conductive bonding material while another section is bonded to the backing plate using electrically insulating bonding material. Additionally, each different target section can be separately biased.

Abstract: The present invention generally provides a method for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber.

Abstract: The present invention generally provides an apparatus for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber.

Abstract: The present invention provides a novel class of transcriptional corepressor polypeptides having an amino acid sequence which comprises at least one LXXLL nuclear receptor interacting NR box motif wherein L is leucine and X is any amino acid residue, and which are operably interactable with a nuclear receptor to actively repress transcription of DNA. The corepressor is widely expressed in fetal and adult tissues and attenuates agonist-activated nuclear receptor signaling by multiple mechanisms. Also provided are methods and uses for the novel class of transcriptional corepressors to repressing transcription in a cell.

Abstract: The present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly whose shape can be distorted to adjust the magnetic field strength in the processing region of the deposition chamber to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more magnetron regions and magnetron actuators that are used to increase and more evenly distribute the magnetic field strength throughout the processing region of the processing chamber during processing.

Abstract: A method for depositing tree or more layers on two or more substrates using various chambers in a substrate processing system is provided. In addition, the invention provides substrate transfer methods and suitable substrate processing systems to maximize the throughput of the substrate processing systems and minimizing system footprint. The movements of a transfer robot in the substrate processing system are specifically configured for scheduling two or more process chambers in order to transfer multiple substrates and exchange the substrates between two chambers of the substrate processing system.

Abstract: A method for making a film stack containing one or more metal-containing layers and a substrate processing system for forming the film stack on a substrate are provided. The substrate processing system includes at least one transfer chamber coupled to at least one load lock chamber, at least one first physical vapor deposition (PVD) chamber configured to deposit a first material layer on a substrate, and at least one second PVD chamber for in-situ deposition of a second material layer over the first material layer within the same substrate processing system without breaking the vacuum or taking the substrate out of the substrate processing system to prevent surface contamination, oxidation, etc. The substrate processing system is configured to provide high throughput and compact footprint for in-situ sputtering of different material layers in designated PVD chambers.

Abstract: Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.

Abstract: A diffuser for delivering one or more process gasses to a reaction region inside a chamber. The diffuser includes a first plate having a first coefficient of thermal expansion and a second plate coupled to the first plate. The second plate has a second coefficient of thermal expansion that is less than the first coefficient of thermal expansion.

Abstract: The invention provides methods, systems, and drivers for controlling an inkjet printing system and manufacturing display objects. The system may include a print controller including one or more drivers, at least one print head coupled to the drivers, a stage controller coupled to the print controller, one or more motors coupled to the stage controller, encoders coupled to the motors and the stage controller, and a host coupled to the stage controller and the print controller. The host is adapted to transfer pattern parameter data to the print controller, and the print controller is adapted to use the pattern parameter data to trigger the at least one print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction by the at least one motor under the direction of the stage controller in response to a command from the host.

Abstract: A resonator and method of designing a resonator including a cavity having an effective length that exceeds ?/8 such that a standing wave having an anti-node will form in the cavity. First and second necks each having first ends are attached to and in fluid communication with the cavity, the first neck being positioned adjacent the anti-node and thereby operable to interfere with said standing wave.