Abstract: An apparatus for sensing particulate matter in a fluid includes a substrate; and an integrated circuit electrically connected to the substrate, the integrated circuit including a photodetector. The apparatus includes a filter assembly including a particle filter aligned with the photodetector, and a filter housing for the particle filter, the filter housing defining a flow path for fluid through the particle filter. The apparatus includes a light source electrically connected to the substrate and positioned to illuminate the particle filter.

Abstract: A method of forming an isolation region is provided that in one embodiment substantially reduces divot formation. In one embodiment, the method includes providing a semiconductor substrate, forming a first pad dielectric layer on an upper surface of the semiconductor substrate and forming a trench through the first pad dielectric layer into the semiconductor substrate. In a following process sequence, the first pad dielectric layer is laterally etched to expose an upper surface of the semiconductor substrate that is adjacent the trench, and the trench is filled with a trench dielectric material, wherein the trench dielectric material extends atop the upper surface of the semiconductor substrate adjacent the trench and abuts the pad dielectric layer.

Abstract: A method of forming an isolation region is provided that in one embodiment substantially reduces divot formation. In one embodiment, the method includes providing a semiconductor substrate, forming a first pad dielectric layer on an upper surface of the semiconductor substrate and forming a trench through the first pad dielectric layer into the semiconductor substrate. In a following process sequence, the first pad dielectric layer is laterally etched to expose an upper surface of the semiconductor substrate that is adjacent the trench, and the trench is filled with a trench dielectric material, wherein the trench dielectric material extends atop the upper surface of the semiconductor substrate adjacent the trench and abuts the pad dielectric layer.

Abstract: Disclosed is an apparatus which has the capability of cleaning a waste or used filter assembly with a broad spectrum of chemical agents in an automated fashion. The cleaning apparatus comprises a cleaner vessel for accommodating the filter assembly to carry out triethylene glycol cleaning, sodium hydroxide cleaning, nitric acid cleaning and water washing in a predetermined cleaning sequence. First to fourth reservoirs communicate with the cleaner vessel through their corresponding pipelines to feed such chemical detergent liquids as triethylene glycol solution, sodium hydroxide solution, nitric acid solution and pure water into the vessel. The detergent liquids will circulate within the cleaning vessel by means of a stream generator, whereby the filter assembly can be cleaned to a higher degree of detergency.