Patents by Inventor Jong-Won Hong
Jong-Won Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11945744Abstract: Disclosed are a method and apparatus for reusing wastewater. The method for reusing wastewater disclosed herein includes: generating a mixed wastewater by mixing multiple types of wastewater (S20); performing a first purification by passing the mixed wastewater through a flocculation-sedimentation unit (S40); performing a second purification by passing an effluent of the flocculation-sedimentation unit through a membrane bioreactor (MBR) (S60); performing a third purification by passing an effluent of the MBR through a reverse-osmosis membrane unit (S80); and reusing an effluent of the reverse-osmosis membrane unit as cooling water or industrial water (S100).Type: GrantFiled: April 14, 2023Date of Patent: April 2, 2024Assignees: SAMSUNG ENGINEERING CO., LTD., SAMSUNG ELECTRONICS CO., LTDInventors: Seok Hwan Hong, Dae Soo Park, Seung Joon Chung, Yong Xun Jin, Jae Hyung Park, Jae Hoon Choi, Jae Dong Hwang, Jong Keun Yi, Su Hyoung Cho, Kyu Won Hwang, June Yurl Hur, Je Hun Kim, Ji Won Chun
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Patent number: 11912282Abstract: A method for generating a magnetic field, a method for detecting a lane by using a magnetic field, and a vehicle using same are disclosed. According to the present invention, magnetic fields outputted from lanes coated with road-marking paint containing magnetic particles are detected with a magnetic sensor attached to a vehicle, and a plurality of lanes can be detected on the basis of the detected magnetic fields.Type: GrantFiled: July 29, 2019Date of Patent: February 27, 2024Assignee: Jeongseok Chemical CorporationInventors: Jong-Ill Hong, Yong-Hyun Kim, Young-Gil Ma, Dae-Won Kim
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Publication number: 20200390433Abstract: The present invention relates to a retractor for spinal surgery, which allows an operator to obtain a maximum surgical view with a minimal incision by easily widening a skin incision site of a patient while minimizing the surgical incision area. To this end, the retractor for spinal surgery includes: a first retractor body, which has a semi-cylindrical shape and in which a space is formed to accommodate a plurality of sleeves, and simultaneously, a lower end thereof is inserted into a skin incision site; a second retractor body, which has the same shape as that of the first retractor body and is rotatably coupled to the first retractor body, and thereby accommodate the sleeves along with the first retractor body; and a pair of hinge units, which are mounted on an upper part of the first retractor body and the second retractor body, and in which an end of the first retractor body and an end of the second retractor body are hinged together by a connecting pin.Type: ApplicationFiled: September 6, 2019Publication date: December 17, 2020Applicant: Solco Biomedical Co., Ltd.Inventors: Hwi Geun Yu, Jong Won Hong
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Patent number: 10121660Abstract: A method of fabricating a semiconductor device includes forming a metal film including Cu on a substrate, forming a protective film on the metal film, forming a hard mask including TaOx, where x is 2.0 to 2.5, on the protective film, forming a hard mask pattern by patterning the hard mask, and forming a metal wiring by patterning the metal film, using the hard mask pattern as an etching mask.Type: GrantFiled: February 9, 2017Date of Patent: November 6, 2018Assignee: Samsung Electronics Co., Ltd.Inventors: So Young Lee, Hyun Su Kim, Jong Won Hong
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Publication number: 20180053687Abstract: A method of fabricating a semiconductor device includes forming a metal film including Cu on a substrate, forming a protective film on the metal film, forming a hard mask including TaOx, where x is 2.0 to 2.5, on the protective film, forming a hard mask pattern by patterning the hard mask, and forming a metal wiring by patterning the metal film, using the hard mask pattern as an etching mask.Type: ApplicationFiled: February 9, 2017Publication date: February 22, 2018Inventors: So Young LEE, Hyun Su KIM, Jong Won HONG
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Patent number: 9793347Abstract: A semiconductor device includes a substrate, a conductive pattern, a side spacer, and an air gap. The substrate includes an interlayer insulating layer and a trench penetrating the interlayer insulating layer. The conductive pattern is disposed within the trench of the substrate. The side spacer is disposed within the trench. The side spacer covers an upper side surface of the conductive pattern. The air gap is disposed within the trench. The air gap is bounded by a sidewall of the trench, the side spacer, and a lower side surface of the conductive pattern. A level of a bottom surface of the conductive pattern is lower than a level of bottom surfaces of the side spacer.Type: GrantFiled: November 3, 2015Date of Patent: October 17, 2017Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Woo-Jin Lee, Sang-Hoon Ahn, Gil-Heyun Choi, Jong-Won Hong
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Patent number: 9777364Abstract: An organic layer deposition apparatus, and a method of manufacturing an organic light-emitting display device using the organic layer deposition apparatus. The organic layer deposition apparatus includes: an electrostatic chuck that fixedly supports a substrate that is a deposition target; a deposition unit including a chamber maintained at a vacuum and an organic layer deposition assembly for depositing an organic layer on the substrate fixedly supported by the electrostatic chuck; and a first conveyor unit for moving the electrostatic chuck fixedly supporting the substrate into the deposition unit, wherein the first conveyor unit passes through inside the chamber, and the first conveyor unit includes a guide unit having a receiving member for supporting the electrostatic chuck to be movable in a direction.Type: GrantFiled: June 10, 2016Date of Patent: October 3, 2017Assignee: Samsung Display Co., Ltd.Inventors: Seok-Rak Chang, Myeng-Woo Nam, Hee-Cheol Kang, Jong-Heon Kim, Jong-Won Hong, Uno Chang
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Patent number: 9754826Abstract: A semiconductor device includes a metal pattern filling a trench formed through at least a portion of an insulating interlayer on a substrate and including copper, and a wetting improvement layer pattern in the metal pattern including at least one of tantalum, tantalum nitride, titanium, titanium nitride, ruthenium, cobalt and manganese.Type: GrantFiled: May 16, 2016Date of Patent: September 5, 2017Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Won Hong, Hei-Seung Kim, Kyoung-Hee Nam, In-Sun Park, Jong-Myeong Lee
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Patent number: 9534288Abstract: A deposition apparatus includes: a transfer unit including a first transfer unit and a second transfer unit, wherein the first transfer unit transfers, in a first direction, a moving unit to which a substrate is detachably fixed, and the second transfer unit transfers, in an opposite direction of the first direction, the moving unit from which the substrate is separated, and a deposition unit including a deposition assembly wherein the deposition assembly deposits a material on the substrate spaced apart from the deposition assembly while the first transfer unit transfers the substrate which is fixed to the moving unit, wherein the first transfer unit includes a first support unit that supports both ends of the moving unit in the first direction, and a second support unit that supports a side of the moving unit opposite to a side close to the deposition assembly.Type: GrantFiled: August 28, 2013Date of Patent: January 3, 2017Assignee: Samsung Display Co., Ltd.Inventors: Young-Mook Choi, Jong-Won Hong
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Patent number: 9512515Abstract: An organic layer deposition apparatus, and a method of manufacturing an organic light-emitting display device using the organic layer deposition apparatus. The organic layer deposition apparatus includes: an electrostatic chuck that fixedly supports a substrate that is a deposition target; a deposition unit including a chamber maintained at a vacuum and an organic layer deposition assembly for depositing an organic layer on the substrate fixedly supported by the electrostatic chuck; and a first conveyer unit for moving the electrostatic chuck fixedly supporting the substrate into the deposition unit, wherein the first conveyer unit passes through inside the chamber, and the first conveyer unit includes a guide unit having a receiving member for supporting the electrostatic chuck to be movable in a direction.Type: GrantFiled: June 8, 2012Date of Patent: December 6, 2016Assignee: Samsung Display Co., Ltd.Inventors: Seok-Rak Chang, Myeng-Woo Nam, Hee-Cheol Kang, Jong-Heon Kim, Jong-Won Hong, Uno Chang
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Publication number: 20160293472Abstract: An organic layer deposition apparatus, and a method of manufacturing an organic light-emitting display device using the organic layer deposition apparatus. The organic layer deposition apparatus includes: an electrostatic chuck that fixedly supports a substrate that is a deposition target; a deposition unit including a chamber maintained at a vacuum and an organic layer deposition assembly for depositing an organic layer on the substrate fixedly supported by the electrostatic chuck; and a first conveyor unit for moving the electrostatic chuck fixedly supporting the substrate into the deposition unit, wherein the first conveyor unit passes through inside the chamber, and the first conveyor unit includes a guide unit having a receiving member for supporting the electrostatic chuck to be movable in a direction.Type: ApplicationFiled: June 10, 2016Publication date: October 6, 2016Inventors: Seok-Rak Chang, Myeng-Woo Nam, Hee-Cheol Kang, Jong-Heon Kim, Jong-Won Hong, Uno Chang
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Patent number: 9453282Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.Type: GrantFiled: March 9, 2015Date of Patent: September 27, 2016Assignee: Samsung Display Co., Ltd.Inventors: Jong-Won Hong, Seok-Rak Chang, Chang-Mog Jo, Young-Mook Choi, Jae-Kwang Ryu
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Publication number: 20160260635Abstract: A semiconductor device includes a metal pattern filling a trench formed through at least a portion of an insulating interlayer on a substrate and including copper, and a wetting improvement layer pattern in the metal pattern including at least one of tantalum, tantalum nitride, titanium, titanium nitride, ruthenium, cobalt and manganese.Type: ApplicationFiled: May 16, 2016Publication date: September 8, 2016Applicant: Samsung Electronics Co., Ltd.Inventors: Jong-Won HONG, Hei-Seung KIM, Kyoung-Hee NAM, In-Sun PARK, Jong-Myeong LEE
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Patent number: 9355851Abstract: A semiconductor device includes a metal pattern filling a trench formed through at least a portion of an insulating interlayer on a substrate and including copper, and a wetting improvement layer pattern in the metal pattern including at least one of tantalum, tantalum nitride, titanium, titanium nitride, ruthenium, cobalt and manganese.Type: GrantFiled: August 17, 2012Date of Patent: May 31, 2016Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Won Hong, Hei-Seung Kim, Kyoung-hee Nam, In-sun Park, Jong-Myeong Lee
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Publication number: 20160056235Abstract: A semiconductor device includes a substrate, a conductive pattern, a side spacer, and an air gap. The substrate includes an interlayer insulating layer and a trench penetrating the interlayer insulating layer. The conductive pattern is disposed within the trench of the substrate. The side spacer is disposed within the trench. The side spacer covers an upper side surface of the conductive pattern. The air gap is disposed within the trench. The air gap is bounded by a sidewall of the trench, the side spacer, and a lower side surface of the conductive pattern. A level of a bottom surface of the conductive pattern is lower than a level of bottom surfaces of the side spacer.Type: ApplicationFiled: November 3, 2015Publication date: February 25, 2016Inventors: WOO-JIN LEE, SANG-HOON AHN, GIL-HEYUN CHOI, JONG-WON HONG
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Publication number: 20160011139Abstract: An apparatus for reading identification information of a biosensor is provided, including a biosensor sensing unit detecting the biosensor, a light-emitting unit emitting light on an identification information recording unit when the biosensor sensing unit detects the biosensor, the identification information recording unit having the identification information of the biosensor recorded thereon, a light-receiving unit that receives the light emitted from the light-emitting unit, and reflected or refracted by or passing through the identification information recording section and an identification information reading unit analyzing the light received by the light-receiving unit and reading the identification information of the biosensor.Type: ApplicationFiled: January 30, 2015Publication date: January 14, 2016Applicant: INFOPIA CO., LTD.Inventors: Byeong-woo BAE, Sung-dong LEE, Hong-seong SUK, Jina YOO, Ki-won LEE, Jong-won HONG, Duck-sung NAM
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Patent number: 9214381Abstract: A semiconductor device includes a substrate, a conductive pattern, a side spacer, and an air gap. The substrate includes an interlayer insulating layer and a trench penetrating the interlayer insulating layer. The conductive pattern is disposed within the trench of the substrate. The side spacer is disposed within the trench. The side spacer covers an upper side surface of the conductive pattern. The air gap is disposed within the trench. The air gap is bounded by a sidewall of the trench, the side spacer, and a lower side surface of the conductive pattern. A level of a bottom surface of the conductive pattern is lower than a level of bottom surfaces of the side spacer.Type: GrantFiled: January 28, 2014Date of Patent: December 15, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Woo-Jin Lee, Sang-Hoon Ahn, Gil-Heyun Choi, Jong-Won Hong
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Patent number: 9180458Abstract: A biosensor is provided, including an identification information recording unit having identification information of the biosensor recorded thereon, where the identification information recording unit is a color tag that is attached on the biosensor and indicates the identification information by color, chroma of color, or arrangement pattern of colors.Type: GrantFiled: September 14, 2006Date of Patent: November 10, 2015Assignee: Infopia Co., Ltd.Inventors: Byeong-woo Bae, Sung-dong Lee, Hong-seong Suk, Jina Yoo, Ki-won Lee, Jong-won Hong, Duck-sung Nam
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Publication number: 20150176131Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.Type: ApplicationFiled: March 9, 2015Publication date: June 25, 2015Inventors: Jong-Won Hong, Seok-Rak Chang, Chang-Mog JO, Young-Mook Choi, Jae-Kwang Ryu
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Patent number: 9044756Abstract: An apparatus for reading identification information of a biosensor is provided, including a biosensor sensing unit detecting the biosensor, a light-emitting unit emitting light on an identification information recording unit when the biosensor sensing unit detects the biosensor, the identification information recording unit having the identification information of the biosensor recorded thereon, a light-receiving unit that receives the light emitted from the light-emitting unit, and reflected or refracted by or passing through the identification information recording section, and an identification information reading unit analyzing the light received by the light-receiving unit and reading the identification information of the biosensor.Type: GrantFiled: August 17, 2012Date of Patent: June 2, 2015Assignee: Infopia Co., Ltd.Inventors: Byeong-woo Bae, Sung-dong Lee, Hong-seong Suk, Jina Yoo, Ki-won Lee, Jong-won Hong, Duck-sung Nam