Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.

Abstract: Disclosed are an endosurgical operating device and an endoscopic device comprising same. The endosurgical operating device of the present invention comprises: an operating tube installed in the insertion part of the endoscope that is to be inserted into the body; an operating plate which is inserted and installed in the operating tube and which has at least one needle having a pointed tip; a drive unit for driving the operating plate such that a plurality of needles protrude from the end of the operating tube and are inserted into the internal tissue or endothelial surface; and a power supply unit electrically connected to the plurality of needles. According to the present invention, an endothelial adsorption means for adsorbing the epithelial layer of the endothelium is provided to enable the plurality of needles to easily reach the lower tissue of the epithelial layer, thus maximizing the effects of treating the endothelium using the plurality of needles.

Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.

Abstract: Embodiments of dermalogical cell treatment are described generally herein. Other embodiments may be described and claimed.

Abstract: Embodiments of dermalogical cell treatment are described generally herein. Other embodiments may be described and claimed.

Abstract: A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.

Abstract: A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.

Abstract: A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.

Abstract: Disclosed are a robot cleaner and a self testing method thereof. The robot cleaner performs a self test when being initially operated or when required by a user. This may prevent malfunctions or breakdowns of the robot cleaner. Furthermore, the robot cleaner senses states of components and sensors mounted therein, and performs a self test based on characteristics, output values, etc. of the components and the sensors. This may prevent accidents or errors which may occur as the robot cleaner operates.

Abstract: Provided is a power measuring system for measuring power of a main circuit of incoming feeder and a branch circuit in a distribution panel, cabinet panel, or motor control center. The power measuring system includes a voltage sensing unit for sensing analog voltage of the main circuit and generating main voltage data by converting the sensed analog voltage to digital form, a current sensing unit for generating main current data of the main circuit or sub current data of the branch circuit, and a current data communication unit or voltage data communication unit for transmitting the sensed data or power-related data generated using the sensed data, wherein main circuit power data or branch circuit power data is calculated and displayed or transmitted.