Patents by Inventor Jozef Maria Finders

Jozef Maria Finders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10551736
    Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef Maria Finders, Tamara Druzhinina, Emiel Peeters, Sander Frederik Wuister, Christianus Martinus Van Heesch, Eddy Cornelis Antonius Van Der Heijden, Henri Marie Joseph Boots
  • Publication number: 20190204749
    Abstract: A method of tuning a patterning stack, the method including: defining a function that measures how a parameter representing a physical characteristic pertaining to a pattern transferred into a patterning stack on a substrate is affected by change in a patterning stack variable, the patterning stack variable representing a physical characteristic of a material layer of the patterning stack; varying, by a hardware computer system, the patterning stack variable and evaluating, by the hardware computer system, the function with respect to the varied patterning stack variable, until a termination condition is satisfied; and outputting a value of the patterning stack variable when the termination condition is satisfied.
    Type: Application
    Filed: August 2, 2017
    Publication date: July 4, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Jozef Maria FINDERS, Orion Jonathan Pierre MOURAILLE, Anton Bernhard VAN OOSTEN
  • Patent number: 10331042
    Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featur
    Type: Grant
    Filed: September 21, 2016
    Date of Patent: June 25, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
  • Patent number: 10240250
    Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: March 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Margaretha De Ruiter
  • Publication number: 20170336712
    Abstract: A method including obtaining calculated wavefront phase information caused by a three-dimensional topography of a pattern of a lithographic patterning device, and computing, using a computer processor, an imaging effect of the three-dimensional topography of the patterning device pattern based on the calculated wavefront information.
    Type: Application
    Filed: November 24, 2015
    Publication date: November 23, 2017
    Applicant: ASML Netherlands B.V.
    Inventor: Jozef Maria FINDERS
  • Publication number: 20170329231
    Abstract: A method includes measuring a three-dimensional topography of a feature of a pattern of a lithography patterning device and calculating from the measurements wavefront phase information caused by the three-dimensional topography of the pattern.
    Type: Application
    Filed: November 25, 2015
    Publication date: November 16, 2017
    Inventor: Jozef Maria FINDERS
  • Patent number: 9811002
    Abstract: A method of lithography in a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, the method including: determining a dose sensitivity of at least part of the pattern at a plurality of values of a dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose. A computer product including a processor, a memory and a storage device, wherein the storage device at least stores values of, or a function describing, a dose sensitivity of at least part of a lithographic pattern at a plurality of values of dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria Finders
  • Publication number: 20170315441
    Abstract: A method including obtaining wavefront phase information caused by a three-dimensional topography of a pattern of a lithographic patterning device, and based on the wavefront phase information, adjusting a physical parameter of the pattern.
    Type: Application
    Filed: November 26, 2015
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventor: Jozef Maria FINDERS
  • Publication number: 20170285483
    Abstract: A method including, for an illumination by radiation of a pattern of a lithographic patterning device, obtaining calculated wavefront phase information caused by three-dimensional topography of the pattern, and based on the wavefront phase information, adjusting a parameter of the illumination and/or adjusting a parameter of the pattern.
    Type: Application
    Filed: November 25, 2015
    Publication date: October 5, 2017
    Applicant: ASML Netherlands B.V.
    Inventor: Jozef Maria FINDERS
  • Publication number: 20170269480
    Abstract: A method includes measuring properties of a three-dimensional topography of a lithographic patterning device, the patterning device including a pattern and being constructed and arranged to produce a pattern in a cross section of a projection beam of radiation in a lithographic projection system, calculating wavefront phase effects resulting from the measured properties, incorporating the calculated wavefront phase effects into a lithographic model of the lithographic projection system, and determining, based on the lithographic model incorporating the calculated wavefront phase effects, parameters for use in an imaging operation using the lithographic projection system.
    Type: Application
    Filed: November 26, 2015
    Publication date: September 21, 2017
    Inventor: Jozef Maria FINDERS
  • Publication number: 20170010542
    Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featur
    Type: Application
    Filed: September 21, 2016
    Publication date: January 12, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
  • Patent number: 9535341
    Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featur
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: January 3, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
  • Patent number: 9513553
    Abstract: A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: December 6, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine, Jozef Maria Finders, Roelof Koole, Emiel Peeters, Harmeet Singh
  • Patent number: 9513109
    Abstract: A lithographic mask has a substrate substantially transmissive for radiation of a certain wavelength, the substrate having a radiation absorbing material in an arrangement, the arrangement configured to apply a pattern to a cross-section of a radiation beam of the certain wavelength, wherein the absorbing material has a thickness which is substantially equal to the certain wavelength divided by a refractive index of the absorbing material.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: December 6, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria Finders
  • Publication number: 20160179016
    Abstract: A method of lithography in a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, the method including: determining a dose sensitivity of at least part of the pattern at a plurality of values of a dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose. A computer product including a processor, a memory and a storage device, wherein the storage device at least stores values of, or a function describing, a dose sensitivity of at least part of a lithographic pattern at a plurality of values of dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose.
    Type: Application
    Filed: July 1, 2014
    Publication date: June 23, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria FINDERS
  • Patent number: 9285685
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: March 15, 2016
    Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Patent number: 9229324
    Abstract: A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: January 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Harmeet Singh, Vadim Yevgenyevich Banine, Jozef Maria Finders, Sander Frederik Wuister, Roelof Koole, Emiel Peeters
  • Patent number: 9229336
    Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: January 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jozef Maria Finders, Bernardo Kastrup, Sander De Putter
  • Publication number: 20150380299
    Abstract: A method of forming a plurality of regularly spaced lithography features, e.g. contact holes, including: providing a trench on a substrate, the trench having opposing side-walls and a base, with the side-walls having a width therebetween, wherein the trench is formed by photolithography including exposing the substrate using off-axis illumination whereby a modulation is provided to the side-walls of the trench; providing a self-assemblable block copolymer having first and second blocks in the trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in the trench, the layer having first domains of the first block and second domains of the second block; and selectively removing the first domain to form at least one regularly spaced row of lithography features having the second domain along the trench.
    Type: Application
    Filed: February 26, 2014
    Publication date: December 31, 2015
    Inventors: Jozef Maria FINDERS, Sander Frederik WUISTER, Eddy Cornelis Antonius VAN DER HEIJDEN, Henri Marie Joseph BOOTS
  • Patent number: 9170502
    Abstract: A method of optimizing a lithographic process for imaging a pattern, including a plurality of features, onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system to illuminate a patterning device and a controllable projection system to project an image of the patterning device onto the substrate, the method including selecting a feature from the plurality of features, determining an illumination setting for the illumination system to optimize imaging of the selected feature, and determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting.
    Type: Grant
    Filed: October 20, 2011
    Date of Patent: October 27, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria Finders