Patents by Inventor Jozef Maria Finders
Jozef Maria Finders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8416394Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam.Type: GrantFiled: June 14, 2011Date of Patent: April 9, 2013Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Patent number: 8300212Abstract: A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.Type: GrantFiled: April 14, 2010Date of Patent: October 30, 2012Assignee: ASML Netherlands B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
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Publication number: 20120200838Abstract: A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.Type: ApplicationFiled: April 13, 2012Publication date: August 9, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
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Publication number: 20120194797Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.Type: ApplicationFiled: January 26, 2012Publication date: August 2, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Jozef Maria FINDERS, Bernardo Kastrup, Sander De Putter
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Publication number: 20120182534Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam.Type: ApplicationFiled: June 14, 2011Publication date: July 19, 2012Applicant: ASML NETHERLANDS B.V.Inventor: Jozef Maria FINDERS
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Patent number: 8178263Abstract: A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.Type: GrantFiled: November 24, 2009Date of Patent: May 15, 2012Assignee: ASML Netherlands B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
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Publication number: 20120099091Abstract: A method of optimizing a lithographic process for imaging a pattern, including a plurality of features, onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system to illuminate a patterning device and a controllable projection system to project an image of the patterning device onto the substrate, the method including selecting a feature from the plurality of features, determining an illumination setting for the illumination system to optimize imaging of the selected feature, and determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting.Type: ApplicationFiled: October 20, 2011Publication date: April 26, 2012Applicant: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Patent number: 8164741Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.Type: GrantFiled: May 9, 2011Date of Patent: April 24, 2012Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Patent number: 8142964Abstract: In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the second exposure process includes at least one localized adjustment to at least one feature thereof to compensate for scattering effects of the developed resist pattern that is present when the second exposure is performed.Type: GrantFiled: July 8, 2009Date of Patent: March 27, 2012Assignee: ASML Netherlands B.V.Inventors: Sander De Putter, Jozef Maria Finders, Bertus Johan Vleeming
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Publication number: 20110211182Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.Type: ApplicationFiled: May 9, 2011Publication date: September 1, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Jozef Maria FINDERS
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Publication number: 20110211181Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: May 6, 2011Publication date: September 1, 2011Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 7982856Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam.Type: GrantFiled: June 19, 2009Date of Patent: July 19, 2011Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Patent number: 7961296Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.Type: GrantFiled: June 1, 2009Date of Patent: June 14, 2011Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Patent number: 7961293Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: March 17, 2008Date of Patent: June 14, 2011Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hebertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Publication number: 20100310836Abstract: A lithographic method includes exposing a first layer of material to a radiation beam to form a first pattern feature in the first layer, the first pattern feature having sidewalls, and a focal property of the radiation beam being controlled to control a sidewall angle of the sidewalls; providing a second layer of material over the first pattern feature to provide a coating on sidewalls of the first pattern; removing a portion of the second layer, leaving a coating of the second layer of material on sidewalls of the first pattern; removing the first pattern formed from the first layer, leaving on the substrate at least a part of the second layer that formed a coating on sidewalls of that first pattern, the part of the second layer left forming second pattern features in locations adjacent to the locations of sidewalls of the removed first pattern feature.Type: ApplicationFiled: April 15, 2010Publication date: December 9, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Pioter Nikolski, Jozef Maria Finders, Remco Jochem Sebastiaan Groenendijk
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Patent number: 7824842Abstract: A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi dense spaces that are printed in interlaced position with respect to each other, using positive tone resist. Each of the exposures is executed after applying a relative space-width widening to the spaces of two corresponding mask patterns of semi dense spaces. A factor representative for the space-width widening has a value between 1 and 3, thereby reducing mask error factor and line edge roughness.Type: GrantFiled: October 5, 2005Date of Patent: November 2, 2010Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Publication number: 20100265479Abstract: A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.Type: ApplicationFiled: April 14, 2010Publication date: October 21, 2010Applicant: ASML Netherlands B.V.Inventors: Laurentius Cornelius DE WINTER, Jozef Maria Finders
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Patent number: 7811746Abstract: A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi-dense spaces that are printed in interlaced position with respect to each other, using positive tone resist. Each of the exposures is executed after applying a relative space-width widening to the spaces of two corresponding patterning device patterns of semi-dense spaces. A factor representative for the space-width widening has a value between 1 and 3, thereby reducing mask error factor and line edge roughness.Type: GrantFiled: September 27, 2006Date of Patent: October 12, 2010Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders
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Publication number: 20100161099Abstract: Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.Type: ApplicationFiled: December 8, 2009Publication date: June 24, 2010Applicant: ASML Netherlands B.V.Inventors: Everhardus Cornelis Mos, Mircea Dusa, Jozef Maria Finders, Christianus Gerardus Maria De Mol, Scott Anderson Middlebrooks, Dongzi Wangli
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Patent number: RE43643Abstract: A lithographic manufacturing process is disclosed in which first information of a lithographic transfer function of a first lithographic projection apparatus is obtained. The information is compared with second information of a reference lithographic transfer function (e.g. of a second lithographic projection apparatus). The difference between the first and second information is calculated. Then, the change of machine settings for the first lithographic projection apparatus, needed to minimize the difference, is calculated and applied to the first lithographic projection apparatus. In an exemplary application, a match between the first and second lithographic projection apparatus of any pitch-dependency of feature errors is improved.Type: GrantFiled: September 21, 2006Date of Patent: September 11, 2012Assignee: ASML Netherlands B.V.Inventor: Jozef Maria Finders