Patents by Inventor Jun Hatakeyama

Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12681388
    Abstract: A resist composition comprising a base polymer comprising repeat units containing a tertiary ester group having a double or triple bond and a halogenated aromatic group exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile having reduced edge roughness or size variation.
    Type: Grant
    Filed: March 24, 2023
    Date of Patent: July 14, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Patent number: 12672812
    Abstract: The present invention is a bio-electrode composition containing an ionic polymer material as a component (A), where the component (A) includes a polymer having: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a nitro group. This provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, is light-weight, can be manufactured at low cost, can control significant reduction in conductivity either when the bio-electrode is soaked in water or dried, and is soft and has excellent stretchability and adhesiveness; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Grant
    Filed: July 1, 2023
    Date of Patent: July 7, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Joe Ikeda
  • Patent number: 12675047
    Abstract: A conductive polymer composition containing: (A) a polyaniline-based conductive polymer having a repeating unit represented by following general formula (1); and (B) polymer having structure represented by following general formula (2). In formulae, each of R1 to R4 represents hydrogen atom, acidic group, hydroxy group, alkoxy group, carboxy group, nitro group, halogen atom, or hydrocarbon group, R5 and R6 each independently represent a hydrogen atom, linear, branched, or cyclic alkyl group having 1-10 carbon atoms or a hydrocarbon group containing a hetero atom, Xa- represents anion, and “a” represents valence. The conductive polymer composition has good filterability and film-formability of flat film on electron beam resist and can be used suitably for antistatic film for electron beam resist writing showing excellent antistatic property in electron beam writing process, and, reducing effect of acid diffused from film to minimum, and also having excellent peelability.
    Type: Grant
    Filed: November 18, 2022
    Date of Patent: July 7, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Nagasawa, Jun Hatakeyama
  • Patent number: 12669748
    Abstract: A resist composition comprising a quencher and an acid generator is provided. The quencher is a compound having a nitro-substituted aromatic moiety-containing acid labile group and a heterocyclic amine structure in its molecule. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: February 28, 2023
    Date of Patent: June 30, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12625429
    Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Grant
    Filed: January 31, 2023
    Date of Patent: May 12, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Publication number: 20260103440
    Abstract: The onium salt has the formula (1). In the formula (1), Xq? is an anion, and the acid (XqH) whose conjugated base is Xq? has a boiling point of lower than 165° C. and a molecular weight of 150 or less. A chemically amplified resist composition comprising the onium salt exhibits a high sensitivity, high resolution, improved lithography properties including EL, LWR, CDU and DOF, and collapse resistance, when processed by lithography using high-energy radiation such as deep UV, EB, or EUV, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: June 24, 2025
    Publication date: April 16, 2026
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Jun Hatakeyama, Yutaro Otomo
  • Patent number: 12596303
    Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of triple bond-bearing tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Grant
    Filed: January 31, 2023
    Date of Patent: April 7, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Patent number: 12578296
    Abstract: The present invention is a bio-electrode including: a substrate having anti-reflective structure for light on at least one side; and (A) an electro-conductive layer having electro-conductive wiring on the opposite side from the side having the anti-reflective structure of the substrate. This provides: a bio-electrode that allows thin, highly transparent, highly sensitive to biological signals, excellent in biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in sensitivity to biological signals even when attached on the skin for a long time and when wetted with water or dried, and comfortable without itching, reddening, nor rash of the skin.
    Type: Grant
    Filed: January 23, 2024
    Date of Patent: March 17, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12554197
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with a salt consisting of an ammonium cation linked to a sulfide group and a fluorinated anion. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Grant
    Filed: November 16, 2022
    Date of Patent: February 17, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Shun Kikuchi, Kousuke Ohyama
  • Patent number: 12523932
    Abstract: A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: April 8, 2022
    Date of Patent: January 13, 2026
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 12498637
    Abstract: A positive resist composition is provided comprising a base polymer comprising repeat units (a) having two triple bonds and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced LWR, and improved CDU is formed therefrom.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: December 16, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Patent number: 12487524
    Abstract: The present invention is a resist material containing a quencher, where the quencher contains a sulfonium salt of a carboxylic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop a quencher that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity, low LWR, and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.
    Type: Grant
    Filed: June 7, 2022
    Date of Patent: December 2, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20250352110
    Abstract: The present invention is a bio-electrode composition includes (A) an ionic resin, wherein the component (A) contains a resin having a structure selected from an ammonium salt, a lithium salt, a sodium salt, and a potassium salt of trissulfonium methide. This provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode, which is excellent in electric conductivity and biocompatibility and lightweight, can be produced at low cost, causes no significant decrease in the electric conductivity even when gets wet from water or when dried, and is soft with excellent stretchability and adhesiveness; a bio-electrode including a living body contact layer formed from the bio-electrode composition; and a method for producing the bio-electrode.
    Type: Application
    Filed: May 8, 2025
    Publication date: November 20, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Masaki OHASHI, Joe IKEDA
  • Publication number: 20250353969
    Abstract: The present invention is a deep eutectic liquid, which is a mixture of a hydrogen bond donor compound and a hydrogen bond acceptor compound, wherein the hydrogen bond donor compound is a compound represented by the following general formula (1) having a structure in which 2 to 100 monomers having a hydroxy group are bonded, the hydrogen bond acceptor compound is a compound containing a monomer having a quaternary ammonium cation represented by the following general formulae (2) to (6) or a quaternary phosphonium cation represented by the following general formula (7), and the deep eutectic liquid is present in a liquid state at 25° C.
    Type: Application
    Filed: May 9, 2025
    Publication date: November 20, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Joe IKEDA, Shiori Nonaka, Jun Hatakeyama
  • Publication number: 20250345035
    Abstract: The present invention is an ultrasonic coupling material composite film to be inserted between an ultrasound probe surface and a skin includes a gel coupling material film made of a gel containing water, and a silicone coupling material film containing a cross-linkable silicone resin and a silicone oil having no cross-linking point. This provides: an ultrasonic coupling material composite film having contradictory properties of adhesiveness and non-adhesiveness, and an ultrasonic inspection method using the composite film.
    Type: Application
    Filed: May 1, 2025
    Publication date: November 13, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Joe IKEDA, Akihiro KOBAYASHI
  • Patent number: 12468225
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with a group having formula (a)-1, (a)-2 or (a)-3. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Grant
    Filed: November 14, 2022
    Date of Patent: November 11, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12468224
    Abstract: A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated ?-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: November 11, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12453501
    Abstract: A bio-electrode composition contains (A) a reaction composite of a monomer having an ionic functional group and a carbon particle. The component (A) contains the carbon particle bonded to the monomer having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: October 28, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12449730
    Abstract: A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated ?-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: October 21, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 12436462
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with a sulfonium salt containing a carboxylate anion having a sulfide group linked thereto. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Grant
    Filed: November 14, 2022
    Date of Patent: October 7, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Kousuke Ohyama, Shun Kikuchi