Patents by Inventor Jun Hatakeyama

Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10996378
    Abstract: The present invention is an antireflective film, including: a support base, and a pattern composed of a photoresist material formed on the support base, the index at a point closer to the support base. The present invention provides an antireflective film that is able to give antireflection effect to decrease the reflection of light, a method of producing the same, and an eyeglass type display.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: May 4, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20210116808
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) containing an imide group having an iodized aromatic group bonded thereto and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation.
    Type: Application
    Filed: October 2, 2020
    Publication date: April 22, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Patent number: 10968175
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating a brominated benzene-containing sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: April 6, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Daisuke Domon
  • Publication number: 20210096285
    Abstract: An antireflective film including: a support base, and a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base. The photoresist material contains a polymer compound having an aromatic group, and the polymer compound includes at least one of: (i) a repeating unit having a cyclopentadienyl complex structure, (ii) a repeating unit having a naphthalene structure, and (iii) a repeating unit having a naphthalene structure and/or a fluorene structure. The repeating units having a naphthalene structure may include one of the following units: The disclosed antireflective film shows an antireflection effect to decrease the reflection of light. A method of producing the antireflective film, and an eyeglass type display including the antireflective film are disclosed.
    Type: Application
    Filed: December 4, 2020
    Publication date: April 1, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Publication number: 20210080828
    Abstract: A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10950364
    Abstract: The present invention provides a bio-electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer contains a resin layer and particles dispersed in the resin layer, the particles being coated with gold, platinum, silver, or alloy of these metals; a thickness of the resin layer is equal to or thinner than an average particle size of the particles; the resin layer contains a silicon-containing resin and a non-silicon-containing resin; and the silicon-containing resin is localized in the direction of a surface of the resin layer. The bio-electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, can be manufactured at low cost, and can combine repellency of the resin layer surface and adhesion properties of the resin layer to particles.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: March 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi
  • Patent number: 10948822
    Abstract: A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: March 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masahiro Fukushima
  • Publication number: 20210063879
    Abstract: A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from a carboxylic acid having an iodized or brominated hydrocarbyl group and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
    Type: Application
    Filed: August 4, 2020
    Publication date: March 4, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10934463
    Abstract: The present invention provides an adhesive film including a resin having a silsesquioxane in a side chain and a urethane bond in a main chain, together with a method for forming the same. The inventive adhesive film has excellent stretchability and strength, with the film surface having higher adhesion and thinner film thickness.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: March 2, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Keisuke Niida, Koji Hasegawa
  • Publication number: 20210055652
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 19, 2020
    Publication date: February 25, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210048748
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: July 21, 2020
    Publication date: February 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210048746
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 11, 2020
    Publication date: February 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Publication number: 20210048747
    Abstract: A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.
    Type: Application
    Filed: July 16, 2020
    Publication date: February 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10915021
    Abstract: A monomer having formula (A) is provided. RA is H, methyl or trifluoromethyl, X1 is a single bond, ether, ester or amide bond, Ra is a C1-C20 monovalent hydrocarbon group, Rb is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1?n+m?4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: February 9, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Koji Hasegawa, Jun Hatakeyama
  • Publication number: 20210033969
    Abstract: A chemically amplified resist composition comprising a quencher containing an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group exclusive of an iodized or brominated aromatic ring and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.
    Type: Application
    Filed: July 2, 2020
    Publication date: February 4, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20210033970
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: July 2, 2020
    Publication date: February 4, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210033971
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.
    Type: Application
    Filed: July 30, 2020
    Publication date: February 4, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10901120
    Abstract: A transparent antireflective lamination film including: a first film composed of a first material having a first refractive index; a second film having a refractive index lower than the first film laminated on the first film, including a pattern composed of a second material having a second refractive index lower than the first refractive index formed in a film composed of the first material; and at least one layer of film laminated on the second film, at least one layer of film including: a film including the pattern composed of the second material having larger area than in the second film, and/or a film including a pattern composed of a material having a refractive index lower than the second refractive index, wherein the refractive index of each film is decreasing toward the upper side from the first film in the antireflective lamination film.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: January 26, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20210015384
    Abstract: The present invention provides a biological electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer includes a resin layer and particles dispersed in the resin layer, the particles being coated with gold, silver, or platinum, and a thickness of the resin layer is equal to or thinner than an average particle size of the particles. The biological electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, and can be manufactured at low cost.
    Type: Application
    Filed: October 2, 2020
    Publication date: January 21, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Motoaki IWABUCHI
  • Publication number: 20210003917
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: July 1, 2020
    Publication date: January 7, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama