Patents by Inventor Jun Hatakeyama

Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12013639
    Abstract: A positive resist material contains a base polymer containing: a repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond; and a repeating unit having an acid generator shown by any of the following formulae (b1) to (b3). Thus, the present invention provides: a positive resist material having higher sensitivity than conventional positive resist materials, and smaller dimensional variation; and a patterning process using this inventive positive resist material.
    Type: Grant
    Filed: July 15, 2021
    Date of Patent: June 18, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Naoki Ishibashi, Masayoshi Sagehashi
  • Publication number: 20240192591
    Abstract: A resist composition comprising an acid generator containing a sulfonium salt containing a sulfonic acid anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having formula (1).
    Type: Application
    Filed: October 17, 2023
    Publication date: June 13, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20240192596
    Abstract: A chemically amplified resist composition is provided comprising (A) a polymer adapted to increase its solubility in an aqueous alkaline under the action of an acid, the polymer comprising repeat units, represented by the formula (A1), and repeat units, represented by the formula (B1), and lacking repeat units adapted to generate an acid upon exposure, and (B) a photoacid generator represented by the formula (PAG-a) or (PAG-b) which generates an acid under the action of KrF excimer laser, ArF excimer laser, electron beams or extreme ultraviolet radiation.
    Type: Application
    Filed: October 4, 2023
    Publication date: June 13, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Jun Hatakeyama, Naoki Ishibashi
  • Patent number: 12001139
    Abstract: A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: July 21, 2021
    Date of Patent: June 4, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Tomomi Watanabe
  • Patent number: 11998339
    Abstract: A bio-electrode composition contains: (A) a polymer compound containing a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and (B) a silicone compound having a polyglycerin structure. This bio-electrode composition is able to form a living body contact layer for a bio-electrode which enable quick signal collection after attachment to skin.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: June 4, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Joe Ikeda, Koji Hasegawa, Yasuyoshi Kuroda
  • Publication number: 20240176235
    Abstract: A resist composition comprising a quencher containing a sulfonium salt composed of a C5-C20 aromatic carboxylic acid anion substituted with a halogen atom or a halogen atom-containing group and a sulfonium cation having the following formula (1).
    Type: Application
    Filed: September 21, 2023
    Publication date: May 30, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Takayuki Fujiwara, Yuki Suda
  • Publication number: 20240176238
    Abstract: A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: October 20, 2023
    Publication date: May 30, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • Patent number: 11994799
    Abstract: A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.
    Type: Grant
    Filed: July 14, 2022
    Date of Patent: May 28, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20240168378
    Abstract: A positive resist material containing a compound having two or more urethane groups and having a carboxy group and a sulfonium salt or iodonium salt of a sulfonic acid, the carboxy group being substituted with an acid-labile group and being bonded to a first urethane group via a first linking group, and the sulfonium salt or iodonium salt being bonded to a second urethane group directly or via a second linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.
    Type: Application
    Filed: October 16, 2023
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Publication number: 20240168379
    Abstract: The present invention is a positive resist material containing a compound having two or more urethane groups and having two or more carboxy groups that are each substituted with an acid-labile group and are bonded to the urethane groups via a linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.
    Type: Application
    Filed: October 16, 2023
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Publication number: 20240168382
    Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).
    Type: Application
    Filed: September 20, 2023
    Publication date: May 23, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • Publication number: 20240160101
    Abstract: A resist composition comprising a sulfonium salt composed of a sulfonate anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having the formula (1) exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Application
    Filed: September 20, 2023
    Publication date: May 16, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • Patent number: 11965095
    Abstract: A bio-electrode composition contains (A) an ionic polymer material. The component (A) is a polymer compound containing: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a side chain with a radical-polymerizable double bond in a structure selected from the group consisting of (meth)acrylate, vinyl ether, and styrene. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode to enable signal collection immediately after attachment to skin and prevention of residue on the skin after peeling from the skin; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: April 23, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Osamu Watanabe, Joe Ikeda, Koji Hasegawa
  • Publication number: 20240126168
    Abstract: An onium salt type monomer having the following formula (a1) or (a2).
    Type: Application
    Filed: September 12, 2023
    Publication date: April 18, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Jun Hatakeyama, Masaki Ohashi
  • Publication number: 20240118615
    Abstract: A resist composition comprising a polymer or polymer-bound photoacid generator is provided, the polymer comprising repeat units derived from a sulfonium or iodonium salt having a urethane, thiourethane or urea bond in a linker between a polymerizable unsaturated bond and a fluorosulfonic acid site. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: August 3, 2023
    Publication date: April 11, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tomomi Watanabe
  • Publication number: 20240118610
    Abstract: A resist composition contains an acid generator which is a sulfonium or iodonium salt containing a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site which are linked by a linker. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: August 14, 2023
    Publication date: April 11, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tomomi Watanabe
  • Patent number: 11953832
    Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a substituted or unsubstituted salicylic acid exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: January 7, 2022
    Date of Patent: April 9, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Publication number: 20240111212
    Abstract: A resist composition comprising a polymer is provided, the polymer comprising photo-decomposable repeat units derived from a sulfonium salt having a polymerizable unsaturated bond, a sulfonium cation site, and a link therebetween, the link having a urethane bond, thiourethane bond or urea bond. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: August 15, 2023
    Publication date: April 4, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tomomi Watanabe
  • Patent number: 11926766
    Abstract: A bio-electrode composition contains (A) a silicone bonded to an ionic polymer and having a structure containing a T unit shown by the following general formula (T1): (R0SiO3/2) (T1), the structure excluding a cage-like structure. In the formula, R0 represents a linking group to the ionic polymer. The ionic polymer is a polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity, biocompatibility, stretchability, and adhesion, soft, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried.
    Type: Grant
    Filed: March 31, 2022
    Date of Patent: March 12, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe
  • Patent number: 11914294
    Abstract: A positive resist composition comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by an acid labile group in the form of a tertiary hydrocarbon group containing a nitrogen atom and aromatic group exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: February 27, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama