Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having an arylsulfonate anion structure linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at the position a or ? and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.

Abstract: A bio-electrode composition contains particles having surfaces with an N-carbonyl sulfonamide salt shown by the following general formula (1). R1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms and optionally having an aromatic group, ether group, or ester group, or an arylene group having 6 to 10 carbon atoms. Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and optionally has a fluorine atom. M+ represents an ion selected from the group consisting of lithium, sodium, potassium, and silver ions. This invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and prevents significant reduction in electric conductivity even when wetted with water or dried.

Abstract: The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A resist composition comprises an onium salt of aromatic sulfonic acid having a linkage of two iodized or brominated aromatic groups as the acid generator is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A positive resist composition comprising a base polymer comprising repeat units consisting of a fluorinated carboxylate, fluorinated phenoxide, fluorinated sulfonamide, fluorinated alkoxide, fluorinated 1,3-diketone, fluorinated ?-keto ester or fluorinated imide anion and a nitrogen-containing cation having a tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

Abstract: The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU. The resist composition can form a pattern by using the resist composition. The resist composition comprises a base polymer of sulfonium salt structure having a trifluoromethoxybenzenesulfonamide, difluoromethoxybenzenesulfonamide, trifluoromethoxybenzenesulfonimide or difluoromethoxybenzenesulfonimide anion bonded to its backbone offers a high sensitivity, reduced LWR and improved CDU.

Abstract: The resist composition includes a base polymer and a salt. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

Abstract: An onium salt having the following formula (1) is provided. In formula (1), one of R13 and R14 is a group having a partial structure of the following formula (1a). Q1 to Q3 are each independently a hydrogen atom, a fluorine atom, or a C1-C6 fluorinated saturated hydrocarbyl group, provided that, when both of Q1 and Q2 are a hydrogen atom, Q3 is a fluorine atom or a C1-C6 fluorinated saturated hydrocarbyl group, and the total number of fluorine atoms in Q1 to Q3 is 2 or more.

Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a fluorinated phenol exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

Abstract: The resist composition comprises a quencher in the form of a sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide. The sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide is an effective quencher capable of suppressing acid diffusion. The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU independent of whether it is of positive or negative tone, and a pattern forming process using the same.

Abstract: The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU independent of whether it is of positive or negative tone. The resist composition comprises a sulfonium salt of N-carbonyltrifluoromethoxybenzenesulfonamide, N-carbonyldifluoromethoxybenzenesulfonamide, trifluoromethoxybenzenesulfonimide, and difluoromethoxybenzenesulfonimide as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: The present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when the bio-electrode is wetted with water or dried, and soft and excellent in stretchability and adhesiveness; a bio-electrode including a living body contact layer formed from the bio-electrode composition; and a method for manufacturing the bio-electrode. To solve the above problems, the inventive bio-electrode composition includes an (A) ionic resin, wherein the component (A) contains a resin having a structure selected from the group consisting of an ammonium salt, a lithium salt, a sodium salt, a potassium salt, and a silver salt formed with trifluoromethoxybenzenesulfonamide and/or difluoromethoxybenzenesulfonamide.

Abstract: The resist composition exhibits higher sensitivity and improved LWR or CDU. The resist composition comprises a base polymer containing repeat units (a) containing a substituted or unsubstituted arylsulfonic acid anion bonded to a polymer backbone having a group containing an iodine atom or a bromine atom and an onium cation.

Abstract: A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

Abstract: The present invention is an ultrasound coupling material composition, including: a silicone adhesive (A); and a silicone oil (B) having no crosslinking point, wherein the silicone adhesive (A) is a mixture or condensation-reaction product between: a diorganopolysiloxane (a) having a viscosity at 25° C. of 100,000 mPa·s or more; and a resin composition (b) including an MQ resin and an organic solvent, and the silicone oil (B) having no crosslinking point has a kinematic viscosity at 25° C. within a range of 10 to 100000 mm2/s. This provides: a material that fills roughness on skin to provide high ultrasound transmissibility and sensitivity, has excellent biocompatibility and lightweight, can yield a manufactured ultrasound coupling material film at a low cost, does not considerably decrease the ultrasound transmissibility even with wetted or dried, has softness and excellent flexibility, that causes no residue on the skin after peeling, and causes no rough skin.

Abstract: The resist composition has high sensitivity, improved LWR and CDU, high contrast, excellent resolution. A wide process margin can be obtained by using a sulfonium salt or an iodonium salt containing an arylsulfonic acid anion having an aromatic group substituted with a bromine atom or an iodine atom as an acid generator. The resist composition comprising an acid generator containing an onium salt having the following formula (1).