Patents by Inventor Jun Hatakeyama

Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250044687
    Abstract: The resist composition comprises a quencher in the form of a sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide. The sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide is an effective quencher capable of suppressing acid diffusion. The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU independent of whether it is of positive or negative tone, and a pattern forming process using the same.
    Type: Application
    Filed: July 18, 2024
    Publication date: February 6, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masahiro Fukushima
  • Publication number: 20250032026
    Abstract: The present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when the bio-electrode is wetted with water or dried, and soft and excellent in stretchability and adhesiveness; a bio-electrode including a living body contact layer formed from the bio-electrode composition; and a method for manufacturing the bio-electrode. To solve the above problems, the inventive bio-electrode composition includes an (A) ionic resin, wherein the component (A) contains a resin having a structure selected from the group consisting of an ammonium salt, a lithium salt, a sodium salt, a potassium salt, and a silver salt formed with trifluoromethoxybenzenesulfonamide and/or difluoromethoxybenzenesulfonamide.
    Type: Application
    Filed: July 5, 2024
    Publication date: January 30, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Joe IKEDA, Shiori NONAKA, Koji HASEGAWA
  • Publication number: 20250028243
    Abstract: The resist composition exhibits higher sensitivity and improved LWR or CDU. The resist composition comprises a base polymer containing repeat units (a) containing a substituted or unsubstituted arylsulfonic acid anion bonded to a polymer backbone having a group containing an iodine atom or a bromine atom and an onium cation.
    Type: Application
    Filed: June 27, 2024
    Publication date: January 23, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tomomi Watanabe, Takayuki Fujiwara
  • Patent number: 12204245
    Abstract: A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: January 21, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takeshi Nagata, Chuanwen Lin, Shun Kikuchi
  • Publication number: 20250020999
    Abstract: The resist composition has high sensitivity, improved LWR and CDU, high contrast, excellent resolution. A wide process margin can be obtained by using a sulfonium salt or an iodonium salt containing an arylsulfonic acid anion having an aromatic group substituted with a bromine atom or an iodine atom as an acid generator. The resist composition comprising an acid generator containing an onium salt having the following formula (1).
    Type: Application
    Filed: July 1, 2024
    Publication date: January 16, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masahiro Fukushima, Tomomi Watanabe
  • Publication number: 20250019583
    Abstract: The present invention is an ultrasound coupling material composition, including: a silicone adhesive (A); and a silicone oil (B) having no crosslinking point, wherein the silicone adhesive (A) is a mixture or condensation-reaction product between: a diorganopolysiloxane (a) having a viscosity at 25° C. of 100,000 mPa·s or more; and a resin composition (b) including an MQ resin and an organic solvent, and the silicone oil (B) having no crosslinking point has a kinematic viscosity at 25° C. within a range of 10 to 100000 mm2/s. This provides: a material that fills roughness on skin to provide high ultrasound transmissibility and sensitivity, has excellent biocompatibility and lightweight, can yield a manufactured ultrasound coupling material film at a low cost, does not considerably decrease the ultrasound transmissibility even with wetted or dried, has softness and excellent flexibility, that causes no residue on the skin after peeling, and causes no rough skin.
    Type: Application
    Filed: July 9, 2024
    Publication date: January 16, 2025
    Inventors: Jun HATAKEYAMA, Joe IKEDA, Yasuyoshi KURODA
  • Patent number: 12189292
    Abstract: A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.
    Type: Grant
    Filed: July 12, 2022
    Date of Patent: January 7, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Hiroki Nonaka, Tomomi Watanabe
  • Patent number: 12169360
    Abstract: A resist composition comprising an ammonium salt and fluorine-containing polymer comprising repeat units AU having ammonium salt structure of a carboxylic acid having an iodized or brominated aromatic ring and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: December 17, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 12158127
    Abstract: Provided is an air cleaner including: a first case and a second case each having a case wall; and a flat plate filter element sandwiched between the first case and the second case, wherein the flat plate filter element has an annular sealing portion on a peripheral edge of the flat plate filter element, at least a partial section of a peripheral edge of at least one of the first case or the second case has a flange portion and a guide wall inside the case wall, the flange portion contacts the sealing portion and extends inside at least one of the first case or the second case substantially perpendicular to the case wall from an end of the case wall, and the guide wall extends substantially parallel to the case wall and facing the case wall from an inner end of the flange portion.
    Type: Grant
    Filed: September 20, 2022
    Date of Patent: December 3, 2024
    Assignee: TIGERS POLYMER CORPORATION
    Inventors: Jun Hatakeyama, Akihito Saka
  • Publication number: 20240377733
    Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has improved lithography properties including sensitivity, acid diffusion control, MEF, and LWR when processed by photolithography using high-energy radiation. The resist composition having a high solvent solubility and a high sensitivity and being improved in lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV; and a pattern forming process using the resist composition.
    Type: Application
    Filed: April 24, 2024
    Publication date: November 14, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Jun Hatakeyama
  • Publication number: 20240361691
    Abstract: The present invention is a resist material containing: a repeating unit-a containing at least one iodine atom between a polymer main chain and a carboxylate; and a repeating unit-b, being a sulfonium salt or iodonium salt of a sulfonic acid bonded to a polymer main chain. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; and a patterning process.
    Type: Application
    Filed: April 15, 2024
    Publication date: October 31, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yutaro OTOMO, Jun HATAKEYAMA, Tomomi WATANABE, Tomohiro KOBAYASHI
  • Publication number: 20240361690
    Abstract: The present invention is a resist material containing a repeating unit-a containing a sulfonium salt or iodonium salt of a monovalent aromatic carboxylic acid that is iodinated, is substituted or unsubstituted, and is bonded to a polymer main chain via an ester bond. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; a patterning process; and a monomer to be an ingredient for the resist material.
    Type: Application
    Filed: April 15, 2024
    Publication date: October 31, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Yutaro OTOMO, Tomomi WATANABE, Kazuhiro KATAYAMA
  • Publication number: 20240361692
    Abstract: There is provided a positive resist composition that exhibits higher sensitivity and resolution than those of conventional positive resist compositions, has reduced edge roughness (LWR), has satisfactory dimensional uniformity (CDU), and has a satisfactory pattern profile after exposure, and to provide a pattern forming process. The positive resist composition comprises a base polymer containing repeat units (a) having a sulfonium salt structure or an iodonium salt structure of trihydrocarbylsulfonylmethide acid free of a fluorine atom on a carbon atom bonded to a sulfonyl group.
    Type: Application
    Filed: April 9, 2024
    Publication date: October 31, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Publication number: 20240360069
    Abstract: The present invention is a monomer represented by the following general formula (a)-1M or (a)-2M. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a monomer to be an ingredient for the resist material; a resist composition containing the resist material; and a patterning process.
    Type: Application
    Filed: April 15, 2024
    Publication date: October 31, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yutaro OTOMO, Jun Hatakeyama, Tomomi Watanabe, Tomohiro Kobayashi
  • Patent number: 12131836
    Abstract: A polyurethane contains a weakly acidic functional group having a pKa of 5 to 11. Thus, the present invention provides: a conductive paste composition for forming a stretchable conductive wire which varies slightly in electric conductivity at the time of elongation and shrinkage; and a polyurethane for providing the composition.
    Type: Grant
    Filed: November 3, 2021
    Date of Patent: October 29, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shiori Nonaka, Koji Hasegawa, Osamu Watanabe, Jun Hatakeyama
  • Publication number: 20240341654
    Abstract: The present invention is a bio-electrode, including: a living-body contact layer; and a substrate, wherein the living-body contact layer has a micropillar having a diameter within a range of 0.01 to 500 ?m and a height within a range of 0.1 to 1,000 ?m, and has an ionic polymer (A) as a material, and the component (A) has a repeating unit-a of one or more selected from a fluorosulfonic acid, a fluorosulfonimide, and a fluorosulfonamide, and has a weight-average molecular weight within a range of 1,000 to 500,000. This provides: a bio-electrode that is a thin film and highly transparent, that has high sensitivity to a bio-signal, excellent bio-compatibility, and a lightweight property, that can be manufactured at a low cost, that does not considerably deteriorate the sensitivity to the bio-signal even when being wet, dried, or attached to skin for a long term, and that is comfortable and free from itching, red spots, rash, etc. of the skin; and a method for manufacturing a bio-electrode.
    Type: Application
    Filed: April 22, 2024
    Publication date: October 17, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Patent number: 12117728
    Abstract: A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group (exclusive of iodine or bromine-substituted aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: October 15, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20240337938
    Abstract: A resist composition comprising a base polymer containing repeat units (a) having a salt structure containing a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).
    Type: Application
    Filed: October 17, 2023
    Publication date: October 10, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20240336718
    Abstract: The present invention is a bio-electrode composition includes, as the component (A), a resin which has a urethan bond in a main chain and at least one salt selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with fluorinated alkyl sulfonic acid or fluorinated aryl sulfonic acid in a side chain. This can provide: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when wetted with water or dried, soft, and excellent in stretchability and strength; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Application
    Filed: March 20, 2024
    Publication date: October 10, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Motoaki IWABUCHI, Shiori NONAKA, Joe IKEDA, Koji HASEGAWA
  • Publication number: 20240324929
    Abstract: The present invention is a bio-electrode composition includes, as the component (A), a resin which has a urethan bond in a main chain and at least one salt selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with sulfonamide in a side chain. This can provide: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when wetted with water or dried, soft, and excellent in stretchability and strength; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Application
    Filed: March 18, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun HATAKEYAMA, Joe IKEDA, Shiori NONAKA, Motoaki IWABUCHI, Koji HASEGAWA