Abstract: The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A resist composition comprises an onium salt of aromatic sulfonic acid having a linkage of two iodized or brominated aromatic groups as the acid generator is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A positive resist composition comprising a base polymer comprising repeat units consisting of a fluorinated carboxylate, fluorinated phenoxide, fluorinated sulfonamide, fluorinated alkoxide, fluorinated 1,3-diketone, fluorinated ?-keto ester or fluorinated imide anion and a nitrogen-containing cation having a tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

Abstract: The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU. The resist composition can form a pattern by using the resist composition. The resist composition comprises a base polymer of sulfonium salt structure having a trifluoromethoxybenzenesulfonamide, difluoromethoxybenzenesulfonamide, trifluoromethoxybenzenesulfonimide or difluoromethoxybenzenesulfonimide anion bonded to its backbone offers a high sensitivity, reduced LWR and improved CDU.

Abstract: The resist composition includes a base polymer and a salt. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

Abstract: An onium salt having the following formula (1) is provided. In formula (1), one of R13 and R14 is a group having a partial structure of the following formula (1a). Q1 to Q3 are each independently a hydrogen atom, a fluorine atom, or a C1-C6 fluorinated saturated hydrocarbyl group, provided that, when both of Q1 and Q2 are a hydrogen atom, Q3 is a fluorine atom or a C1-C6 fluorinated saturated hydrocarbyl group, and the total number of fluorine atoms in Q1 to Q3 is 2 or more.

Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a fluorinated phenol exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

Abstract: The resist composition comprises a quencher in the form of a sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide. The sulfonium salt of trifluoromethoxybenzenesulfonamide or difluoromethoxybenzenesulfonamide is an effective quencher capable of suppressing acid diffusion. The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU independent of whether it is of positive or negative tone, and a pattern forming process using the same.

Abstract: The resist composition exhibits a high sensitivity, reduced LWR, and improved CDU independent of whether it is of positive or negative tone. The resist composition comprises a sulfonium salt of N-carbonyltrifluoromethoxybenzenesulfonamide, N-carbonyldifluoromethoxybenzenesulfonamide, trifluoromethoxybenzenesulfonimide, and difluoromethoxybenzenesulfonimide as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: The present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when the bio-electrode is wetted with water or dried, and soft and excellent in stretchability and adhesiveness; a bio-electrode including a living body contact layer formed from the bio-electrode composition; and a method for manufacturing the bio-electrode. To solve the above problems, the inventive bio-electrode composition includes an (A) ionic resin, wherein the component (A) contains a resin having a structure selected from the group consisting of an ammonium salt, a lithium salt, a sodium salt, a potassium salt, and a silver salt formed with trifluoromethoxybenzenesulfonamide and/or difluoromethoxybenzenesulfonamide.

Abstract: The resist composition exhibits higher sensitivity and improved LWR or CDU. The resist composition comprises a base polymer containing repeat units (a) containing a substituted or unsubstituted arylsulfonic acid anion bonded to a polymer backbone having a group containing an iodine atom or a bromine atom and an onium cation.

Abstract: A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

Abstract: The present invention is an ultrasound coupling material composition, including: a silicone adhesive (A); and a silicone oil (B) having no crosslinking point, wherein the silicone adhesive (A) is a mixture or condensation-reaction product between: a diorganopolysiloxane (a) having a viscosity at 25° C. of 100,000 mPa·s or more; and a resin composition (b) including an MQ resin and an organic solvent, and the silicone oil (B) having no crosslinking point has a kinematic viscosity at 25° C. within a range of 10 to 100000 mm2/s. This provides: a material that fills roughness on skin to provide high ultrasound transmissibility and sensitivity, has excellent biocompatibility and lightweight, can yield a manufactured ultrasound coupling material film at a low cost, does not considerably decrease the ultrasound transmissibility even with wetted or dried, has softness and excellent flexibility, that causes no residue on the skin after peeling, and causes no rough skin.

Abstract: The resist composition has high sensitivity, improved LWR and CDU, high contrast, excellent resolution. A wide process margin can be obtained by using a sulfonium salt or an iodonium salt containing an arylsulfonic acid anion having an aromatic group substituted with a bromine atom or an iodine atom as an acid generator. The resist composition comprising an acid generator containing an onium salt having the following formula (1).

Abstract: A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: A resist composition comprising an ammonium salt and fluorine-containing polymer comprising repeat units AU having ammonium salt structure of a carboxylic acid having an iodized or brominated aromatic ring and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.

Abstract: Provided is an air cleaner including: a first case and a second case each having a case wall; and a flat plate filter element sandwiched between the first case and the second case, wherein the flat plate filter element has an annular sealing portion on a peripheral edge of the flat plate filter element, at least a partial section of a peripheral edge of at least one of the first case or the second case has a flange portion and a guide wall inside the case wall, the flange portion contacts the sealing portion and extends inside at least one of the first case or the second case substantially perpendicular to the case wall from an end of the case wall, and the guide wall extends substantially parallel to the case wall and facing the case wall from an inner end of the flange portion.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has improved lithography properties including sensitivity, acid diffusion control, MEF, and LWR when processed by photolithography using high-energy radiation. The resist composition having a high solvent solubility and a high sensitivity and being improved in lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV; and a pattern forming process using the resist composition.

Abstract: The present invention is a resist material containing: a repeating unit-a containing at least one iodine atom between a polymer main chain and a carboxylate; and a repeating unit-b, being a sulfonium salt or iodonium salt of a sulfonic acid bonded to a polymer main chain. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; and a patterning process.

Abstract: There is provided a positive resist composition that exhibits higher sensitivity and resolution than those of conventional positive resist compositions, has reduced edge roughness (LWR), has satisfactory dimensional uniformity (CDU), and has a satisfactory pattern profile after exposure, and to provide a pattern forming process. The positive resist composition comprises a base polymer containing repeat units (a) having a sulfonium salt structure or an iodonium salt structure of trihydrocarbylsulfonylmethide acid free of a fluorine atom on a carbon atom bonded to a sulfonyl group.