Patents by Inventor Jun Hatakeyama

Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220390846
    Abstract: A resist composition comprising a base polymer and an acid generator in the form of a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with a fluorinated cyclic group and a nitro group is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: April 20, 2022
    Publication date: December 8, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 11517236
    Abstract: The present invention provides a bio-electrode composition including a silsesquioxane bonded to an N-carbonyl sulfonamide salt, wherein the N-carbonyl sulfonamide salt is shown by the following general formula (1): wherein R1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms that may have an aromatic group, an ether group, or an ester group, or an arylene group having 6 to 10 carbon atoms; Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms containing at least one fluorine atom; M+ is an ion selected from a lithium ion, a sodium ion, a potassium ion, and a silver ion. This can form a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, and free from large lowering of the electric conductivity even though it is wetted with water or dried.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: December 6, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Yasuyoshi Kuroda
  • Publication number: 20220382149
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: April 21, 2022
    Publication date: December 1, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 11506977
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: November 22, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Patent number: 11506459
    Abstract: A double pipe includes an inner pipe through an interior of which low pressure gaseous cooling medium flows and an outer pipe having the inner pipe in its interior, the outer pipe being configured such that high-pressure liquid cooling medium flows between the inner pipe and the outer pipe, wherein the inner pipe has a plate member that extending in the longitudinal direction so as to partition the interior of the inner pipe into a plurality of chambers. The plate member has a helical shape along the longitudinal direction.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: November 22, 2022
    Assignee: MARELLI CABIN COMFORT JAPAN CORPORATION
    Inventors: Hiroyuki Yoshida, Jun Hatakeyama, Hiroyuki Oono
  • Publication number: 20220363966
    Abstract: A bio-electrode composition contains (A) a silicone bonded to an ionic polymer and having a structure containing a T unit shown by the following general formula (T1): (R0SiO3/2) (T1), the structure excluding a cage-like structure. In the formula, R0 represents a linking group to the ionic polymer. The ionic polymer is a polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity, biocompatibility, stretchability, and adhesion, soft, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried.
    Type: Application
    Filed: March 31, 2022
    Publication date: November 17, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Osamu WATANABE
  • Patent number: 11500289
    Abstract: A positive resist composition comprising a base polymer comprising recurring units having a nitrogen-containing tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: November 15, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 11493843
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: November 8, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20220350243
    Abstract: A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: April 8, 2022
    Publication date: November 3, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 11480875
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: October 25, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20220332957
    Abstract: An object is to obtain a composition capable of: forming a uniform film even by spray coating or even when the composition is applied in the form of ink for inkjet printing; and preventing light emission from a portion other than an ITO electrode surface when the film is mounted on an organic EL device and light is emitted from the device. A conductive polymer composition contains: a composite containing a ?-conjugated polymer (A) and a polymer (B) shown by a general formula (1); H2O (D) for dispersing the composite; a water-soluble organic solvent (C); and a compound (E) shown by a general formula (2). The electric conductivity of a film with a thickness of 20 to 200 nm formed from the conductive polymer composition is less than 1.00E-05 S/cm.
    Type: Application
    Filed: March 22, 2022
    Publication date: October 20, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki NAGASAWA, Jun HATAKEYAMA
  • Patent number: 11460773
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: December 30, 2019
    Date of Patent: October 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • Patent number: 11460772
    Abstract: A positive resist composition comprising a base polymer comprising recurring units containing an optionally substituted amino group and iodine exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: October 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 11453741
    Abstract: The present invention is a stretchable film of a cured product of a resin including: a polymer compound having a urethane bond in the main chain, a repeating unit containing a fluorine atom, and a repeating unit containing a silicon atom. The present invention provides a stretchable film that has excellent stretchability and strength, with the film surface having excellent water repellency, and a method for forming the same.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: September 27, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Joe Ikeda, Shiori Nonaka, Koji Hasegawa
  • Publication number: 20220289895
    Abstract: A silicone polyurethane has a maleimide group at least at a terminal. Thus, the present invention provides: a silicone polyurethane which serves as a material for a stretchable film excellent in stretchability and strength and also in water repellency on the film surface; such a stretchable film; and a method for forming the stretchable film.
    Type: Application
    Filed: February 8, 2022
    Publication date: September 15, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Joe IKEDA
  • Patent number: 11435665
    Abstract: A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: September 6, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Publication number: 20220269171
    Abstract: A positive resist composition is provided comprising a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom.
    Type: Application
    Filed: February 3, 2022
    Publication date: August 25, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun HATAKEYAMA, Masahiro FUKUSHIMA, Naoki ISHIBASHI
  • Publication number: 20220260909
    Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.
    Type: Application
    Filed: February 4, 2022
    Publication date: August 18, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Naoya Inoue, Kenji Funatsu
  • Publication number: 20220260907
    Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of an ammonium salt of a fluorinated carboxylic acid, fluorinated phenol, fluorinated sulfonamide, fluorinated alcohol, fluorinated 1,3-diketone, fluorinated ?-keto ester, or fluorinated imide exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: January 5, 2022
    Publication date: August 18, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 11417842
    Abstract: Provided are a conductive polymer composite and composition which: improve water volatilization efficiency during film formation by incorporating a novel non-doping fluorinated unit in a dopant polymer; also reduce H+ generation by using the non-doping fluorinated unit in place of an acid unit generating extra acids; have good filterability and film formability; and are capable of forming a film having high transparency and good flatness when the film is formed. The conductive polymer composite is a composite containing: (A) a ?-conjugated polymer; and (B) a dopant polymer which is a copolymer containing a repeating unit “a” shown by the following general formula (1) and at least one repeating unit “b” selected from repeating units shown by the following general formulae (2-1) to (2-7).
    Type: Grant
    Filed: February 6, 2020
    Date of Patent: August 16, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Nagasawa, Jun Hatakeyama