Abstract: A semiconductor device has a channel layer that is a nitride semiconductor, and a barrier layer that is a layer of another nitride semiconductor with a wider bandgap, in this order. The semiconductor device further has a first protective layer that is a layer of a first insulator, and a second protective layer that is a layer of a second insulator thicker than the first protective layer, on or above the barrier layer. The semiconductor device further has a drain electrode, a source electrode and a gate electrode. The first insulator is more difficult to remove by certain dry etching than the second insulator. At least a portion of the gate electrode is arranged in a through portion that penetrates through the second protective layer. A portion of the first protective layer is arranged under the through portion, or the first protective layer arranged in the through portion.

Abstract: A guide cam device includes a cam groove, a projection, and a restriction member. The cam groove includes: first, second, and third grooves, the second and third grooves branching forward from the first groove; and a locking recess positioned between a forward end of the second groove and a forward end of the third groove. The projection is configured to move forward and backward in the cam groove and enter a locked state upon entering the locking recess. The restriction member is configured to inhibit entry of the projection from the first groove to the third groove and permit the projection to advance from the first groove to the second groove. In response to being pushed by the projection that exits the locking recess and moves backward in the third groove, the restriction member is deformed or moved to enable the projection to move to the first groove.

Abstract: A guide cam device includes a cam groove, a projection, and a restriction member. The cam groove includes: first, second, and third grooves, the second and third grooves branching forward from the first groove; and a locking recess positioned between a forward end of the second groove and a forward end of the third groove. The projection is configured to move forward and backward in the cam groove and enter a locked state upon entering the locking recess. The restriction member is configured to inhibit entry of the projection from the first groove to the third groove and permit the projection to advance from the first groove to the second groove. In response to being pushed by the projection that exits the locking recess and moves backward in the third groove, the restriction member is deformed or moved to enable the projection to move to the first groove.

Abstract: Provided is a lithium secondary battery having excellent charge-discharge cycle performance at high temperatures and having low resistance and high power. A spinel-type lithium manganese oxide including a phosphate, the spinel-type lithium manganese oxide being represented by chemical formula: Li1+XMn2?X?YMYO4 (where 0.02?X?0.20, 0.05?Y?0.30, and M represents Al or Mg), wherein the volume of pores having a size of 0.6 ?m or less is 0.003 cm3/g or more and 0.2 cm3/g or less, and the relative standard deviation of size of secondary particles is 25% or more and 45% or less, a method for producing the spinel-type lithium manganese oxide and applications of the spinel-type lithium manganese oxide.

Abstract: Provided are a spinel-type lithium manganese oxide excellent in terms of charge-discharge performance at high temperatures and a lithium secondary battery excellent in terms of charge-discharge performance at high temperatures. A spinel-type lithium manganese oxide comprising a phosphate, the spinel-type lithium manganese oxide being represented by chemical formula: Li1+xMn2?X?YMYO4 (where 0.02?X?0.20, 0.05?Y?0.30, and M represents Al or Mg), wherein the phosphate has an average particle size of 0.1 ?m or more and 2.0 ?m or less, and primary particles of the spinel-type lithium manganese oxide have an average size of 1.5 ?m or more and 5.0 ?m or less, a method for producing the spinel-type lithium manganese oxide, and applications of the spinel-type lithium manganese oxide.

Abstract: A non-transitory computer-readable storage medium storing an arrangement specifying program that causes at least one computer to execute a process, the process includes acquiring a shape of a container that has a first surface and a second surface orthogonal to the first surface; acquiring a shape of a plurality of articles; and specifying an arrangement position and an arrangement posture of each of the plurality of articles when the plurality of articles is arranged in the container in an arrangement order, by using a bottom left algorithm.

Abstract: A storage medium storing a work plan specifying program that causes a computer to execute a process that includes specifying a certain order under conditions that, in a work line that generates a plurality of objects in the certain order, a certain amount of a material is partially cut from a raw material for each of the plurality of objects, the cut material is processed, the raw material is switched to a next raw material when the raw material lacks, and a changeover is performed to change the settings of the cutting device and the proceeding; and optimizing an objective function that reflects the changeover and an excess amount of each raw material that are determined according to an input order of the plurality of objects to the work line.

Abstract: An information processing device includes one or more processors configured to: by executing single-objective optimization on a first objective function among a plurality of objective functions defined according to feeding orders of a plurality of objects into a work line, specify first feeding orders in which values of the first objective function are better than an initial feeding order, by executing the single-objective optimization on a second objective function, specify second feeding orders in which the values of the second objective function are better than the initial feeding order, and executing multi-objective optimization on the plurality of objective functions by using the first feeding orders and the second feeding orders.

Abstract: A method of producing a molded product, the method including: pressing a mold having a surface including at least one of a concave part or a convex part against a photocurable positive electron beam resist; obtaining a molded product of the positive electron beam resist having a surface including a concave part and a convex part by irradiating the photocurable positive electron beam resist pressed against the resist with light to cure the resist; and partially decomposing the molded product of the positive electron beam resist in a region subjected to irradiation with an electron beam by irradiating the surface of the molded product of the positive electron beam resist with the electron beam.

Abstract: A quality determination method includes: in a quality determination space, mapping a quality of a package product in which a plurality of devices are assembled in accordance with a predetermined design condition, with use of each test result of each of the plurality of devices; and determining a quality of the package product, on a basis of mapping result of the mapping.

Abstract: To provide a moth-eye transfer mold and a method of manufacturing a moth-eye transfer mold that provide a simple and inexpensive manufacturing process. A moth-eye transfer mold 1 is characterized by including a base 10, an underlayer 20 formed on the base 10, and a glassy carbon layer 30 formed on the underlayer 20, the glassy carbon layer 30 has an inverted moth-eye structure RM over a surface 30a, and the inverted moth-eye structure RM is randomly arranged cone-shaped pores.

Abstract: To provide a moth-eye transfer mold and a method of manufacturing a moth-eye transfer mold that provide a simple and inexpensive manufacturing process. A moth-eye transfer mold 1 is characterized by including a base 10, an underlayer 20 formed on the base 10, and a glassy carbon layer 30 formed on the underlayer 20, the glassy carbon layer 30 has an inverted moth-eye structure RM over a surface 30a, and the inverted moth-eye structure RM is randomly arranged cone-shaped pores.

Abstract: A method of diagnosing a pipe includes diagnosing, by a computer, a state of a pipe from an updated model based on change in temperature of the pipe calculated from the model in a case where the pipe is heated in the model obtained by modeling a heat transfer behavior of an inside of the pipe containing deposition by using an equivalent circuit and change in temperature of the pipe measured in a case where the pipe is heated.

Abstract: A thermal analysis device includes a memory and a processor configured to perform estimation of whether a pair of components included in a target product has contact with each other by referring to first information obtained from design information of a product, the first information indicating whether two components have contact with each other, perform determination of a division number of the pair of components in a thermal network model by referring to second information indicating a relationship between a parameter regarding thermal transfer of components and a division number of the components in the thermal network model, perform generation of the thermal network model of the target product on the basis of a result of the estimation and another result of the determination, and perform thermal analysis based on the generated thermal network model of the target product.

Abstract: A quality determination method includes: in a quality determination space, mapping a quality of a package product in which a plurality of devices are assembled in accordance with a predetermined design condition, with use of each test result of each of the plurality of devices; and determining a quality of the package product, on a basis of mapping result of the mapping.

Abstract: An undulator magnet having favorable transportation workability is provided. Specifically, an undulator permanent magnet used for an undulator is provided that generates radiation light by meandering electrons that travel in a first direction, wherein, in the undulator permanent magnet, one end surface in the first direction forms a first connecting surface connected to another undulator permanent magnet, N poles and S poles are alternately arranged in the first direction on one magnetic pole surface in a second direction orthogonal to the first direction, and thus a magnetic flux density distribution having a plurality of peaks is generated, and when the plurality of peaks are represented as the first to m-th peaks Pm (m is an integer of 1 or more) in order from the side of the first connecting surface, a magnitude of the first peak P1 is larger than a magnitude of the third peak P3.

Abstract: An undulator magnet having favorable transportation workability is provided. Specifically, an undulator permanent magnet used for an undulator is provided that generates radiation light by meandering electrons that travel in a first direction, wherein, in the undulator permanent magnet, one end surface in the first direction forms a first connecting surface connected to another undulator permanent magnet, N poles and S poles are alternately arranged in the first direction on one magnetic pole surface in a second direction orthogonal to the first direction, and thus a magnetic flux density distribution having a plurality of peaks is generated, and when the plurality of peaks are represented as the first to m-th peaks Pm (m is an integer of 1 or more) in order from the side of the first connecting surface, a magnitude of the first peak P1 is larger than a magnitude of the third peak P3.

Abstract: A semiconductor device includes: a first semiconductor element; a first substrate provided on the first semiconductor element and including a cavity with reduced pressure; coolant held inside the cavity; a second semiconductor element provided on the first substrate; and a heat spreading member thermally connected to the first substrate and provided with a hole communicated with the cavity.

Abstract: When an operation body is urged upward by a flat spring and is in a return position, a projection disposed on the operation body is held between opposing positioning portions and the position of the operation body in an X-direction is set. When the operation body is pressed at a position away from a central portion of the operation body in the X-direction, the operation body pivots on one of retaining structures downward. At this time, the projection moves away from the opposing positioning portions, and resistance against a pressing operation can thereby be reduced.

Abstract: When an operation body is urged upward by a flat spring and is in a return position, a projection disposed on the operation body is held between opposing positioning portions and the position of the operation body in an X-direction is set. When the operation body is pressed at a position away from a central portion of the operation body in the X-direction, the operation body pivots on one of retaining structures downward. At this time, the projection moves away from the opposing positioning portions, and resistance against a pressing operation can thereby be reduced.