Abstract: The present invention provides a method for production or detection of a cardiomyocyte(s) and/or cardiac progenitor cell(s), comprises extracting a cardiomyocyte(s) and/or cardiac progenitor cell(s) from a cell population comprising cardiomyocytes and/or cardiac progenitor cells using as an index VCAM1 positivity.

Abstract: The present invention provides a method for producing a myocardial sheet using a group of cells derived from embryonic stem cells. This method is characterized by mixing Flk/KDR positive cells, cardiomyocytes, endothelial cells, and mural cells, all derived from embryonic stem cells, and culturing the mixed cells. Furthermore, the myocardial sheet can be used as a therapeutic agent for heart diseases since VEGF is released from the sheet.

Abstract: A microwave processing method for processing an object in a processing chamber is probided by using microwaves. The method includes loading the object into the processing chamber in a state where a pressure in the processing chamber is higher than that of an outside environment; discharging O2 gas from the processing chamber by introducing N2 gas into the processing chamber; performing heat treatment on the object by introducing microwaves into the processing chamber from which the O2 gas has been discharged; and cooling the object in a state where the pressure in the chamber is higher than that of the outside environment.

Abstract: An injector includes a housing, a fixed core, a movable core, a valve member, and a resilient member pressing the valve member toward a nozzle hole. An inner peripheral surface of the housing axially guides an outer peripheral surface of the movable core. The inner peripheral surface and the outer peripheral surface define an outer clearance therebetween. The valve member includes a shaft-shaped portion and a stopper portion, which contacts the movable core and has a stopper inclined surface. An outer peripheral surface of the shaft-shaped portion and an inner peripheral surface of an insertion hole of the movable core define an inner clearance therebetween. The stopper inclined surface inclines radially inward of the shaft-shaped portion axially toward the nozzle hole. An axial clearance is formed between the stopper inclined surface and the movable core radially outward of a contact portion between the stopper inclined surface and the movable core.

Abstract: The present invention provides a cardiomyocyte- and/or cardiac progenitor cell-proliferating agent comprising at least one compound selected from the group consisting of: a GSK3? inhibitor, ERK dephosphorylation inhibitor, Raf activator, CaMK2 inhibitor and p38 inhibitor; and a method for proliferating cardiomyocytes and/or cardiac progenitor cells using the agent.

Abstract: A plasma processing apparatus including an essentially cylindrical chamber, which is airtight and grounded. The antenna unit is disposed on top of the chamber. The chamber has a divisible structure formed of an essentially cylindrical housing and a cylindrical chamber wall connected to the housing from above and surrounding a process space. The chamber wall is detachable.

Abstract: The present invention relates to a liquid crystal compound that can be used as a base for injection formulations. The present invention provides an amphipathic compound having the following general formula (I): wherein X and Y each denotes a hydrogen atom or together denote an oxygen atom, n denotes an integer from 0 to 2, m denotes the integer 1 or 2, and R denotes a hydrophilic group generated by removal of one hydroxyl group from any one selected from the group consisting of glycerol, erythritol, pentaerythritol, diglycerol, triglycerol, xylose, sorbitol, ascorbic acid, glucose, galactose, mannose, dipentaerythritol, maltose, mannitol, and xylitol; as well as a base for injection formulations and depot formulation comprising the same.

Abstract: In a plasma processing apparatus that processes a wafer in a process vessel by plasma generated by the supply of a microwave, a transmissive window has, in a center area of its lower surface, a hanging portion made of the same material as a material of the transmissive window. Between an outer peripheral surface of the hanging portion and a sidewall inner surface continuing from a support part, a gap is formed, the gap having a gap length of 0.5 to 10 mm, more preferably 0.5 to 5 mm. The generation of a strong electric field and plasma at a contact point is inhibited and an amount of sputtered particles, radicals, or the like reaching the wafer is also reduced.

Abstract: Provided is an optical unit comprising a shake detecting sensor which is less likely to unnecessarily vibrate even with the optical unit being designed to have a thinner profile. At a first step in the assembly of an optical unit provided with a shake correction mechanism, a module cover is mounted on a fixed body with a spring member therebetween and a movable module driving mechanism is provided between the module cover and the fixed body. At a second step, an image-capturing unit is inserted into the interior of the module cover by way of a fixed-body-side opening portion and a module-cover-side opening portion, and at a third step, a holding member is attached to a module cover.

Abstract: There is provided a plasma processing apparatus capable of stably generating plasma by suppressing oscillation of a plasma potential, and capable of preventing contamination caused by sputtering a facing electrode made of metal. A high frequency bias power is applied to an electrode within a mounting table for mounting a target object thereon. An extended protrusion 60 is formed at an inner peripheral surface of a cover member 27. The extended protrusion 60 is formed toward a plasma generation space S and serves as a facing electrode facing an electrode 7 within a mounting table 5 with the plasma generation space S therebetween. A ratio of a surface area of the facing electrode with respect to that of an electrode for bias (facing electrode surface area/bias electrode area) is in a range of from about 1 to about 5.

Abstract: A substrate processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate. The apparatus includes a gas feed passage configured to supply a process gas into the process container and an exhaust passage configured to exhaust gas from inside the process container. The apparatus further includes a plasma generation mechanism configured to generate plasma of the process gas inside the process container and a metal component to be exposed to plasma inside the process container. The metal component is provided with a silicon film that coats at least a portion thereof to be exposed to plasma and to suffer an intense electric filed generated thereabout.

Abstract: A substrate processing apparatus, for performing a plasma process to a substrate (W) in a processing container held in a vacuum state, has a substrate placing table (5) for placing thereon the substrate (W) in the processing container.

Abstract: Provided is a plasma processing apparatus wherein an electrode embedded in a mounting table is supplied with high frequency power for biasing. A surface, which is exposed to plasma and is of an aluminum cover functioning as an opposite electrode to the electrode of the mounting table, is coated with a protection film, preferably a Y2O3 film. A second portion forming an upper side portion of the processing chamber and a first portion forming a lower side portion of the processing container are provided with an insulating upper liner and an insulating lower liner thicker than the upper liner, respectively. Thus, undesirable short-circuits and abnormal electrical discharge are prevented and stable high-frequency current path is formed.

Abstract: A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes a worktable configured to place the substrate thereon and including a heating element made of silicon carbide and formed in a predetermined pattern; an electric feeder electrode configured to supply electricity to the heating element; and a partition member made of an electrically insulating material and interposed between portions adjacent to each other in the heating element formed in the predetermined pattern.

Abstract: This invention relates to a method for producing cardiomyocytes and/or cardiac progenitor cells, comprising culturing an induced pluripotent stem (iPS) cell or embryonic stem (ES) cell, which has been differentiated into a mesoderm cell, in the presence of cyclosporin-A.

Abstract: An injector includes a housing, a fixed core, a movable core, a valve member, and a resilient member pressing the valve member toward a nozzle hole. An inner peripheral surface of the housing axially guides an outer peripheral surface of the movable core. The inner peripheral surface and the outer peripheral surface define an outer clearance therebetween. The valve member includes a shaft-shaped portion and a stopper portion, which contacts the movable core and has a stopper inclined surface. An outer peripheral surface of the shaft-shaped portion and an inner peripheral surface of an insertion hole of the movable core define an inner clearance therebetween. The stopper inclined surface inclines radially inward of the shaft-shaped portion axially toward the nozzle hole. An axial clearance is formed between the stopper inclined surface and the movable core radially outward of a contact portion between the stopper inclined surface and the movable core.

Abstract: In a plasma oxidation processing apparatus (100) which supplies a high-frequency bias power to an electrode (7) embedded in a stage (5), the interior surface, which is to be exposed to a plasma, of an aluminum lid (27) which functions as an opposite electrode for the stage (5) is coated with a silicon film (48) as a protective film. Positioned adjacent to the silicon film (48), an upper liner (49a) and a thicker lower liner (49b) are provided on the interior surfaces of a second container (3) and a first container (2). This prevents a short circuit or abnormal electrical discharge to the interior surfaces, making it possible to form a proper high-frequency current path and enhance the efficiency of power consumption.

Abstract: A plasma processing apparatus for plasma-processing a target substrate is provided. The plasma processing apparatus includes a metallic processing container forming a processing space in which a plasma process is performed, and a substrate mounting table provided in the processing space to mount a target substrate thereon, a quartz member which shields a sidewall of the metallic processing container from the processing space and whose lower end extends to a position lower than a substrate mounting surface of the substrate mounting table, an annular member which is made of quartz and is provided between a bottom surface of the quartz member and a bottom wall of the metallic processing container to shield the bottom wall of the metallic processing container from the processing space, and a processing gas inlet part for introducing a processing gas into the processing space from a vicinity of an outer periphery of the substrate mounting table.