Abstract: A plasma processing apparatus is provided for performing plasma processing to a substrate to be processed. The plasma processing apparatus is provided with a processing chamber 2 which forms an inner space 15; a substrate mounting table 3 arranged in the inner space 15 for mounting the substrate W; a processing space forming member 16, which is arranged in the inner space 15, has the inner diameter a1 smaller than the inner diameter a15 of the inner space 15, and partitions a processing space 1 above the substrate mounting table 3 for performing plasma processing; and an exhaust port 6 arranged between an upper end portion 16a of the processing space forming member 16 and an inner wall 15a of the inner space 15 for exhausting gas from the processing space 1.

Abstract: A processing apparatus includes an openable/closable lid disposed on a process container, and an opening/closing mechanism configured to open/close the lid. The opening/closing mechanism includes a hinge structure swingably coupling the lid to one end of the process container, and a drive structure configured to swing the lid. The hinge structure includes a main shaft used as a rotation axis when the lid is swung by the drive structure, and an adjusting shaft located on a distal end side relative to the main shaft, for adjusting an angle of the lid.

Abstract: A plasma processing apparatus including an essentially cylindrical chamber, which is airtight and grounded. The antenna unit is disposed on top of the chamber. The chamber has a divisible structure formed of an essentially cylindrical housing and a cylindrical chamber wall connected to the housing from above and surrounding a process space. The chamber wall is detachable.

Abstract: An ultraviolet screening agent for cosmetics, including polymer-coated metal oxide fine particles produced by coating, with silica as a first layer, the surface of each of at least one kind of metal oxide fine particles selected from the group consisting of zinc oxide fine particles, titanium oxide fine particles, cerium oxide fine particles, zirconium oxide fine particles, and iron oxide fine particles, a primary particle diameter of which fine particles is not smaller than 1 nm and not greater than 100 nm, and coating the outside of the first layer with a polymer as a second layer; and cosmetics using the ultraviolet screening agent.

Abstract: To provide a technique of the differentiation from a primate embryonic stem cell into a vascular cell, and techniques using the same. A method for differentiating a primate embryonic stem cell into a vascular cell, comprising differentiating a primate embryonic stem cell into a VEGFR-2-positive and undifferentiated primate embryonic stem cell marker-negative cell, and if need, further differentiating the resulting cell, a method of the differentiation into a vascular cell, and a vascular cell obtained by the method.

Abstract: A plasma processing apparatus 100 used to execute a specific type of processing such as plasma processing on a workpiece by supplying a processing gas into a chamber 110 while applying high-frequency power to generate plasma includes a stage 108 on which the workpiece is placed and a stage supporting unit 124 that holds the stage 108. Bellows 120 and 122 are disposed above and below the stage supporting unit 124 to support the stage 108 in a horizontal state relative to the chamber 110. Thus, a plasma processing apparatus that does not allow the workpiece stage to become tilted, affords ease of maintenance and is capable of stable processing is provided. In addition, the internal spaces at the bellows 120 and 122 are used as an exhausting pipe to achieve efficient and uniform exhaustion of the chamber 110.

Abstract: A plasma processing apparatus includes a chamber configured to accommodate a target substrate; a plasma generation mechanism configured to generate plasma inside the chamber; a process gas supply mechanism configured to supply a process gas into the chamber; an exhaust mechanism connected to the chamber to exhaust gas from inside the chamber; a table configured to place the target substrate thereon inside the chamber, the table including a table main body and a heating element disposed in the main body to heat the substrate; a support portion that supports the substrate table; a fixing member that fixes the support portion to the chamber; and an electrode configured to supply a power to the heating element, wherein the heating element and the electrode are made of an SiC-containing material, the electrode is fixed to the fixing member, extends through the support portion, and is connected to the heating element at a distal end, and an electrode sheath member made of a quartz-containing insulative material env

Abstract: Gas delivery ports 15 are equidistantly formed at a plurality of positions along the inner wall of the chamber 1 and are connected through gas feed passages 14 to an annular communication passage 13. The annular communication passage 13 is formed of a gap defined by step portions 18 and 19 at the junction between the upper end of a lower chamber 2 and the lower end of an upper plate 27 of a lid unit 30. The annular communication passage 13 serves as a gas distribution device for uniformly distributing and supplying gas to the gas feed passages 14. The annular communication passage 13 is connected to a gas supply source section 16 through gas passages 12 formed at arbitrary positions in the wall of the lower chamber 2 and extending in the vertical direction and gas feed ports 72.

Abstract: A substrate table includes a substrate table main body provided with a heater embedded therein and having an upper surface serving as a heating face for heating a target substrate, and lifter pins inserted in the substrate table main body and configured to be moved up and down. Recessed portions are formed in the heating face of the substrate table main body at positions corresponding to the lifter pins and have a bottom lower than the heating face. Each of the lifter pins includes a lifter pin main body and a head portion formed at a distal end of the lifter pin main body and having a diameter larger than the lifter pin main body, the head portion being formed to correspond to each recessed portion and to be partly accommodated in the recessed portion. The head portion has a head portion upper end for supporting the target substrate and a head portion lower surface opposite to the head portion upper end.

Abstract: In a plasma oxidation treatment apparatus 100, dual plate structure 60 is arranged above a susceptor 2. An upper plate 61 and a lower plate 62 are made of a dielectric material such as quartz, separately arranged in parallel at a prescribed interval, for instance an interval of 5 mm, and have a plurality of through holes 61a, 62a. The two plates are arranged one over another by shifting the positions so that the through hole 62a of the lower plate 62 and the through hole 61a of the upper plate 61 are not overlapped.

Abstract: A refrigerator has a refrigerating cycle sequentially connecting a compressor, a condenser, a drawing mechanism, and evaporator, an accumulator, an inlet temperature sensor and an outlet temperature sensor for detecting the temperatures of the inlet and outlet of the evaporator, and a cooling fan for cooling the compressor. When the difference between the temperature detected by the inlet temperature sensor and the temperature detected by the outlet temperature sensor is a predetermined value or more, the cooling fan is stopped.

Abstract: A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes a worktable configured to place the substrate thereon and including a heating element made of silicon carbide and formed in a predetermined pattern; an electric feeder electrode configured to supply electricity to the heating element; and a partition member made of an electrically insulating material and interposed between portions adjacent to each other in the heating element formed in the predetermined pattern.

Abstract: To provide a method for differentiating primate embryonic stem cells into vascular endothelial cells, and a technique using the method. A method for differentiating primate embryonic stem cells into early developmental vascular endothelial cells comprising differentiating primate embryonic stem cells into vascular endothelial cell parker-positive cell population; the early developmental vascular endothelial cells; a method for producing the vascular endothelial cells; a method for amplifying the vascular endothelial cells; a vascular lesion-therapeutic agent containing the early developmental vascular endothelial cells as an active ingredient; a method for revascularization comprising supplying the early developmental vascular endothelial cells; a method for transplantation comprising transplanting the early developmental vascular endothelial cells; and a method for treatment comprising administering the early developmental vascular endothelial cells in a therapeutically effective dose.

Abstract: To improve processing quality by inhibiting the generation of a strong electric field and high-density plasma, near a contact point between a support part supporting a transmissive window and the transmissive window in a plasma processing apparatus utilizing a microwave. In a plasma processing apparatus that processes a wafer W in a process vessel 2 by plasma generated by the supply of a microwave, a transmissive window 20 has, in a center area of its lower surface, a hanging portion 21 made of the same material as a material of the transmissive window 20. Between an outer peripheral surface 21a of the hanging portion 21 and a sidewall inner surface 5a continuing from a support part 6, a gap d is formed, the gap d having a gap length of 0.5 to 10 mm, more preferably 0.5 to 5 mm. The generation of a strong electric field and plasma at the contact point C is inhibited and an amount of sputtered particles, radicals, or the like reaching the wafer W is also reduced.

Abstract: A processing apparatus includes an openable/closable lid disposed on a process container, and an opening/closing mechanism configured to open/close the lid. The opening/closing mechanism includes a hinge structure swingably coupling the lid to one end of the process container, and a drive structure configured to swing the lid. The hinge structure includes a main shaft used as a rotation axis when the lid is swung by the drive structure, and an adjusting shaft located on a distal end side relative to the main shaft, for adjusting an angle of the lid.