Abstract: Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing illumination source and projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

Abstract: A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

Abstract: The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(?, f )=P0+f2·Pb with a threshold of T+V? for contours, where P0 represents image intensity at nominal focus, f represents the defocus value relative to the nominal focus, ? represents the exposure change, V represents the scaling of exposure change, and parameter “Pb” represents second order derivative images.

Abstract: Techniques are described to configure a cache line structure based on attributes of a draw call and access direction of a texture. Attributes of textures (e.g., texture format and filter type), samplers, and shaders used by the draw call can be considered to determine the line size of a cache. Access direction can be considered to reduce the number of lines that are used to store texels required by a sample request.

Abstract: The present invention provides a multicolor signal light and a controlling method thereof. The multicolor signal light includes: a multicolor layer, comprising a plurality of lights being capable of lighting multicolor lights and arranged in a certain pattern; a single control signal line for receiving a control signal from a controller outside; a processor for controlling the multicolor layer to light in a different mode and in a different color according to the control signal received by the single control signal line; and power supply terminals for receiving power supply voltage from outside.

Abstract: The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Abstract: The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Abstract: Provided are a wireless network adapter and a configuration method of same. A wireless network adapter comprises: a self-configuration portion, used to configure the wireless network adapter as an access point adapter, and generate access information of a wireless network access point; a cable connection portion, connected to a second wireless network adapter, and used to transmit the access information to the second wireless network adapter and receive an acknowledgment message from the second wireless network adapter; and a wireless transceiver, connected to the second wireless network adapter.

Abstract: A method and an apparatus for processing an authentication request message in a social network are provided. To improve the inefficiency of existing technology in processing user authentication and request to establish social relationship as well as inadequacy of parameters available for said authentication, the disclosed method includes a social network server detecting an authentication request message sent by a first client to a second client requesting to establish a social relationship with the second client. The social network server obtains information social attributes that are common to the first client and the second client, forwards the authentication request message, and sends the obtained information of common social attributes to the second client. The social attribute information is used by the second client to decide whether or not to authenticate the authentication request message.

Abstract: The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.

Abstract: Various techniques are provided to facilitate the identification of devices, such as smart light bulbs, ceiling fans, security systems, garage doors, and other devices whose functions may be automated or controlled remotely. Identification is done through visible light using existing light sources on target devices and existing image sensors on control devices. In one example, a user may point the camera sensor on their mobile phone at a smart light bulb. This light bulb is turning on and off faster than the human eye can detect, and it is sending a coded message that can be received and decoded by the camera sensor on the mobile phone. The light bulb is identified by the mobile phone, and the user may choose to turn the light on or off through the mobile phone's connection through a data network to the smart light bulb.

Abstract: Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.

Abstract: The invention relates to MicroBlog field, and provides method, apparatus and terminal for page refreshing. The method includes: outputting a preset animation interface when a page refreshing operation is performed, wherein the preset animation interface comprising a preset logo, moving cursors, and a refresh progress bar, and the moving cursors move to the refresh progress bar starting from the preset logo; calculating and outputting current length of the refresh progress bar when it is detected that the moving cursors arrive at the refresh progress bar; and outputting pulled refresh information when the current length of the refresh progress bar equals to width of the preset animation interface. The invention can enable a user to get better sense of experience when a preset animation interface is output upon page refreshing.

Abstract: The present invention relates to methods and systems for designing gauge patterns that are extremely sensitive to parameter variation, and thus robust against random and repetitive measurement errors in calibration of a lithographic process utilized to image a target design having a plurality of features. The method may include identifying most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD (or other lithography response parameter) changes against lithography process parameter variations, such as wavefront aberration parameter variation. The method may also include designing gauges which have more than one test patterns, such that a combined response of the gauge can be tailored to generate a certain response to wavefront-related or other lithographic process parameters. The sensitivity against parameter variation leads to robust performance against random measurement error and/or any other measurement error.

Abstract: A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

Abstract: A communication converter for connecting automation devices having different operating voltages to a host computer, including an interface component and a transceiver component coupled to the interface component, the interface component being connected on the input side via a host connector to a host interface of the host computer and the transceiver component being connected via a device connector to a device interface of the automation device, and a voltage transformer, which on the input side is connected via the host interface to an operating voltage and on the output side to a voltage supply line of the device interface. So the communication converter can communicate with devices having different interface standards, the converter has a first current/voltage measuring unit, a second current/voltage measuring unit, and a switching device.

Abstract: A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.

Abstract: A method and an apparatus for processing an authentication request message in a social network are provided. To improve the inefficiency of existing technology in processing user authentication and request to establish social relationship as well as inadequacy of parameters available for said authentication, the disclosed method includes a social network server detecting an authentication request message sent by a first client to a second client requesting to establish a social relationship with the second client. The social network server obtains information social attributes that are common to the first client and the second client, forwards the authentication request message, and sends the obtained information of common social attributes to the second client. The social attribute information is used by the second client to decide whether or not to authenticate the authentication request message.