Abstract: Classification model training and use methods and apparatuses, a device and a medium are provided, which are related to a field of artificial intelligence technology. The training method includes: training a classification model by utilizing a training sample set and adopting an ensemble learning algorithm, to obtain at least one classifier set including at least two base classifiers; and testing the at least one classifier set by utilizing a test sample set, to determine classification performances of respective base classifiers, and determining classification weights of the respective base classifiers according to the classification performances, wherein the classification weights are used for determining weights of classification results of the respective base classifiers during performing a sample classification using the at least one classifier set.

Abstract: The disclosure provides a device for assembling and processing a plate heat exchanger of a power battery, including a cleaning box, and a base platform. The base platform is welded to a bottom of the cleaning box. A water outlet pipe is welded symmetrically through an inside of the base platform obliquely. A power box is provided at a middle of the inside of the base platform. A motor is screwedly provided inside the power box. A top end of a rotating shaft of the motor is penetratingly welded to a bottom end of a rotating plate, and a welding position between the rotating shaft and the rotating plate is sealed. An edge of an upper surface of the rotating plate is welded to a bottom end of a connecting column, and a top end of the connecting column is penetratingly welded to an upper plate.

Abstract: Embodiments of the disclosure provide a data processing method and a data processing apparatus. The method includes: obtaining a target field and a target identifier from a data operation request of a user; determining a storage location of target data in a data table based on the target field and the target identifier, in which the data table is configured to store data of at least two users; and executing an operation logic associated with the data operation request based on the determined storage location.

Abstract: The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.

Abstract: A system for live analysis of testing logs. The system including a memory and a processor configured to execute the instructions to perform operations including receiving a plurality of log entries; processing the plurality of log entries; storing the processed plurality of log entries in a database having an inverted index; receiving a query from a user device; returning test data, metadata, and statistics related to the one or more log entries; displaying the test data, the metadata, and the statistics on a GUI; comparing an exposure ratio to a range, the exposure ratio being based on a first amount of log entries associated with a first test version and a second amount of log entries associated with a second test version; and upon determining the exposure ratio is outside of the range, directing all requests from subsequent test users to a default test version.

Abstract: Provided are a voltage measurement method and apparatus. The method includes following steps: a number j of height values are selected in a vertical direction of a transmission line, a number m of sensors used for measuring, according to a Stark effect, electric field strength of a corresponding spatial position are arranged in sequence at each of j spatial positions of the j heights from the ground, electric field strength values of the corresponding spatial position are measured through the m sensors respectively, and an electric field strength average value of the corresponding spatial position is calculated according to the acquired m electric field strength values, where j and m are positive integers, and the j spatial positions are below the transmission line; a voltage of the transmission line is calculated according to j electric field strength average values.

Abstract: A scanning lidar system includes an external frame, an internal frame attached to the external frame by vibration-isolation mounts, and an electro-optic assembly movably attached to the internal frame and configured to be translated with respect to the internal frame during scanning operation of the scanning lidar system.

Abstract: A three-dimensional mask model that provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Abstract: Methods provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.

Abstract: A three-dimensional mask model that provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Abstract: A three-dimensional imaging system includes a first illumination source configured to project a first fan of light toward an object in a field of view, and a second illumination source configured to project a second fan of light substantially parallel to and spaced apart from the first fan of light. The first illumination source and the second illumination source are further configured to scan the first fan of light and the second fan of light synchronously laterally across the field of view. The three-dimensional imaging system further includes a camera configured to capture a plurality of image frames of the field of view as the first fan of light and the second fan of light are scanned over a plurality of regions the object, and a processor coupled to the camera and configured to construct a three-dimensional image of the object based on the plurality of image frames.

Abstract: A planar modular microfluidic module, system and method for manufacturing such module is provided. The module includes a base layer, and a fluidic layer configured to be attached to and on top of the base layer, whereby the base layer and said fluidic layer configured to create a single basic module, a jacket configured to cover the base module around its lateral sides, in order to provide sturdiness to the basic module and create a jacket covered module. The jacket includes a physical connector configured to enable lateral connection between adjacent modules, the physical connector positioned on at least one lateral side of the jacket covered module, and a fluidic connection port located within said physical connector and configured to enable fluid flow connection between adjacent modules.

Abstract: The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.

Abstract: A scanning lidar system includes a fixed frame, a first platform flexibly attached to the fixed frame, a lens assembly including a first lens and a second lens mounted on the first platform, a second platform flexible attached to the fixed frame, an electro-optic assembly including a first laser source and a first photodetector mounted on the second platform, a drive mechanism mechanically coupled to the first platform and the second platform and configured to translate the first platform and the second platform with respect to the fixed frame, and a controller coupled to the drive mechanism and configured to translate the first platform to a plurality of first positions through the drive mechanism and translate the second platform to a plurality of second positions through the drive mechanism such that a motion of the second platform is substantially opposite to a motion of the first platform.

Abstract: Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.

Abstract: A set of data entries is transferred via a memory mapped interface from an external peripheral device to a processor device and is stored in a shared memory region. Based on a first pointer to the shared memory region, a first process executed by the processor device processes a first group of the data entries. Based on a second pointer to the shared memory region, a second process executed by the processor device processes a second group of the data entries. The second process indicates the second pointer to the first process. The first process indicates a lower one of the first pointer and the second pointer to the peripheral device.

Abstract: Embodiments of the present invention provide a method and apparatus for processing advertisement data, and a storage medium. The method includes: executing the following steps in a browser application: obtaining a jump web page link of delivery data to be loaded, where the jump web page link includes a uniform resource locator of a data delivery platform website and identification information of the delivery data; sending delivery data loading request according to the jump web page link, so as to load and present a web page of the delivery data; detecting a loading completion status of jumping from the jump web page link to an arrival web page link including the identification information; and storing the jump web page link, the arrival web page link, and information about the loading completion status in an association.

Abstract: A lidar system includes a laser source, a photodetector, an emission lens, a receiving lens, and a processor. The laser source is configured to be translated through a plurality of emission locations, and to emit a plurality of laser pulses therefrom. The emission lens is configured to collimate and direct the plurality of laser pulses towards an object. The receiving lens is configured to focus the portion of each of the plurality of laser pulses reflected off of the object to a plurality of detection locations. The photodetector is configured to be translated through the plurality of detection locations, and to detect the portion of each of the plurality of laser pulses. The processor is configured to determine a time of flight for each of the plurality of laser pulses from emission to detection, and construct a three-dimensional image of the object based on the determined time of flight.