Patents by Inventor Jung Shin

Jung Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9641695
    Abstract: A method for performing policy and charging control (PCC) in a decentralized network architecture includes performing, by a first base station (BS), a procedure of initial network entry of a mobile station (MS), determining, by the first BS, first PCC rules for the MS by using at least one of subscription information and application information regarding the MS, enforcing, by the first BS, control and charging for data communication of the MS based on the first PCC rules, generating second PCC rules to be applied to a second BS and transferring the second PCC rules to the second BS, when detecting a handover of the MS to the second BS, and requesting the MS to connect to the second BS. Other embodiments including a method for performing PCC in the seconds BS, and the first BS and the second BS for performing PCC are disclosed.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: May 2, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Shin Park, Ki-Suk Kweon, Yeong-Moon Son, Antony Franklin
  • Patent number: 9635122
    Abstract: The present invention relates to a wireless communication system and a method for managing a cache server in the wireless communication system, the invention includes a step for checking a regional cache server to transmit contents when a DNS (Domain Name System) request a message for receiving contents acquired from a terminal, and a step for transmitting the contents by the cache server according to a contents request message received from the terminal. These steps can prevent the same data from being transmitted several times through a wireless communication network. Therefore, network usage associated with the service is reduced, and the network can be used more efficiently.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: April 25, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chae Gwon Lim, Jung Je Son, Jung Shin Park, Beom Sik Bae, Sang Soo Jeong
  • Publication number: 20170102624
    Abstract: Lithography methods disclosed herein accommodate shrinking pattern dimensions. An exemplary method includes receiving a pattern to be transferred to a workpiece by a pattern generator. The pattern generator is divided into a first segment set and a second segment set based on the pattern, such that a collective exposure dose from the first segment set and the second segment set satisfies an exposure dose specified by the pattern. The first segment set is offset from the second segment set in a first direction, and segments in the first segment set and segments in the second segment set are offset from each other in a second direction different than the first direction. The method further includes exposing the workpiece according to the first segment set and the second segment set.
    Type: Application
    Filed: December 22, 2016
    Publication date: April 13, 2017
    Inventors: Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Pei-Yi Liu, Shy-Jay Lin
  • Patent number: 9617261
    Abstract: The invention provides novel substituted heterocyclic compounds represented by Formula I and Formula II, or a pharmaceutically acceptable salt, solvate, polymorph, ester, tautomer or prodrug thereof, and a composition comprising these compounds. The compounds provided can be used as inhibitors of MEK and are useful in the treatment of inflammatory diseases, cancer and other hyperproliferative diseases. The invention further provides a method of treatment for inflammatory diseases, cancer and other hyperproliferative diseases in mammals, especially humans.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: April 11, 2017
    Assignee: CMG PHARMACEUTICAL CO., LTD.
    Inventors: Gilnam Lee, Hye Sun Jeon, Ki Joon Jeon, Chul Yun Rhim, Jin Sung Kim, Jeongbeob Seo, Suk Young Cho, Choung Soo Kim, Jung Shin Lee, Eun Kyung Choi, Jung Jin Hwang, Bongcheol Kim
  • Patent number: 9622144
    Abstract: A method for routing data by a Corresponding Mobility Agent (CMA) in a mobile communication system is provided. The method includes managing mobility for a Mobile Station (MS) with a Mobile Access Gateway (MAG), and routing a data packet between a Corresponding Node (CN) and the MS based on a location of the MS, wherein the CMA is mapped to an application server which provides an application service.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: April 11, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Shin Park, Yegin Alper, Dae-Gyun Kim, Won-Il Roh, Yeong-Moon Son
  • Patent number: 9609684
    Abstract: A method for receiving data in a User Equipment (UE) in a mobile content network is provided. The method includes transmitting a request message, which requests a content, to a first Digital Unit (DU), receiving an Internet Protocol (IP)_ADD message, including information of a second DU which caches the content, from the first DU, updating a Stream Control Transmission Protocol (SCTP) connection according to the information of the second DU included in the IP_ADD message, and receiving data from the second DU using the updated SCTP connection.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: March 28, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chul-Ki Lee, Jung-Shin Park, Yeong-Moon Son, Antony Franklin
  • Publication number: 20170082926
    Abstract: The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.
    Type: Application
    Filed: December 6, 2016
    Publication date: March 23, 2017
    Inventors: Burn Jeng Lin, Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang
  • Patent number: 9572765
    Abstract: Disclosed is a composition for preventing hair loss or promoting hair restoration and for enhancing hair health, the composition comprising an active ingredient in the form of soy extract extracted using a C1 to C5 alcohol at a concentration of between 1% and 70% (v/v).
    Type: Grant
    Filed: June 11, 2012
    Date of Patent: February 21, 2017
    Assignee: AMOREPACIFIC CORPORATION
    Inventors: Hee Young Jeon, Seung Hun Kim, Su Kyung Kim, Hyun Jung Shin, Dae Bang Seo
  • Publication number: 20170034735
    Abstract: A 5G or a pre-5G communication system supports a higher data transmission rate than a system after a 4G communication system such as LTE. A transmission device in a wireless communication system according to an embodiment of the present disclosure includes: a control unit that determines a maximum size of data that can be transmitted, based on network information, and determines transmission speeds of multiple transmission control protocol (TCP) connections, based on the size of the data that can be transmitted, respectively; and a communication unit that transmits data to a reception device through the multiple TCP connections based on the transmission speeds.
    Type: Application
    Filed: July 29, 2016
    Publication date: February 2, 2017
    Inventors: Hyungho Lee, Jung Shin Park, Joohyung Lee, Jinsung Lee
  • Publication number: 20170033329
    Abstract: The present invention relates to a composite film and a method of fabricating the same. The present invention provides a highly flexible and pliable composite film capable of preventing interlayer deformation or interlayer exfoliation based on a difference between thermal expansion coefficients. The composite film comprises a first protection layer; and a fabric layer adhered onto the first protection layer via an adhesive layer.
    Type: Application
    Filed: April 9, 2015
    Publication date: February 2, 2017
    Inventors: Lee Hyun Shin, Chang Hyeon Kim, Eun Jung Shin
  • Patent number: 9553213
    Abstract: Disclosed are a solar cell apparatus, and a method of fabricating the same. The solar cell apparatus includes: dummy parts disposed on a support substrate; a plurality of solar cells disposed on the support substrate and disposed between the dummy parts; and a bus bar electrically connected to the solar cells and disposed between the support substrate and the dummy parts. Each of the solar cells and the dummy parts has a back electrode layer, a light absorbing layer, and a front electrode layer sequentially disposed on the support substrate.
    Type: Grant
    Filed: October 17, 2012
    Date of Patent: January 24, 2017
    Assignee: LG INNOTEK CO., LTD.
    Inventor: Min Jung Shin
  • Patent number: 9538628
    Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source that generates charged tin droplets having a trajectory controlled by an electromagnetic field, and an associated method. In some embodiments, the EUV radiation source has a laser that generates a laser beam. A charged fuel droplet generator provides a plurality of charged fuel droplets having a net electrical charge to an EUV source vessel. An electromagnetic field generator generates an electric field and/or a magnetic field. The net electrical charge of the charged fuel droplets causes the electric or magnetic field to generate a force on the charged fuel droplets that controls a trajectory of the charged fuel droplets to intersect the laser beam. By using the electric or magnetic field to control a trajectory of the charged fuel droplets, the EUV system is able to avoid focus issues between the laser beam and the charged fuel droplets.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: January 3, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsiao-Chen Wu, Jaw-Jung Shin
  • Patent number: 9529271
    Abstract: The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S1 to generate an alternating data grid having a second pixel size S2 that is <S1, wherein the pattern generator includes multiple grid segments configured to offset from each other in a first direction; and scanning the pattern generator in a second direction perpendicular to the first direction during the lithography process such that each subsequent segment of the grid segments is controlled to have a time delay relative to a preceding segment of the grid segments.
    Type: Grant
    Filed: May 2, 2016
    Date of Patent: December 27, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Pei-Yi Liu, Shy-Jay Lin
  • Patent number: 9532214
    Abstract: A method for generating a key hierarchy by a MS in a wireless network is provided. The method includes transmitting an authentication request message to a new BS, receiving an authentication response message as a response message to the authentication request message from the new BS, determining whether to perform a full authentication operation with a H3A server based on the authentication response message, performing the full authentication operation or a crypto-handshake operation with the H3A server based on the determining result, after performing the full authentication operation or the crypto-handshake operation, determining whether a first expected signature value received from the new BS is identical to a first expected signature value calculated by the MS, and if the first expected signature value received from the new BS is equal to a first expected signature value calculated by the MS, determining that an authentication for the new BS has succeeded.
    Type: Grant
    Filed: April 15, 2014
    Date of Patent: December 27, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Shin Park, Yegin Alper, Dae-Gyun Kim, Yeong-Moon Son
  • Publication number: 20160366756
    Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source that generates charged tin droplets having a trajectory controlled by an electromagnetic field, and an associated method. In some embodiments, the EUV radiation source has a laser that generates a laser beam. A charged fuel droplet generator provides a plurality of charged fuel droplets having a net electrical charge to an EUV source vessel. An electromagnetic field generator generates an electric field and/or a magnetic field. The net electrical charge of the charged fuel droplets causes the electric or magnetic field to generate a force on the charged fuel droplets that controls a trajectory of the charged fuel droplets to intersect the laser beam. By using the electric or magnetic field to control a trajectory of the charged fuel droplets, the EUV system is able to avoid focus issues between the laser beam and the charged fuel droplets.
    Type: Application
    Filed: June 11, 2015
    Publication date: December 15, 2016
    Inventors: Tsiao-Chen Wu, Jaw-Jung Shin
  • Patent number: 9519225
    Abstract: The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: December 13, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Burn Jeng Lin, Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang
  • Patent number: 9516618
    Abstract: A method for acquiring by a base station (BS) synchronization between BSs in a mobile communication system with a distributed cell structure is provided. The method includes measuring a timing error with other BS as a synchronization target. The method also includes performing a synchronization operation with the other BS using at least one first sub-frame based on the measured timing error, wherein a number of symbols included in a first sub-frame is less than a number of symbols included in a second sub-frame.
    Type: Grant
    Filed: April 21, 2014
    Date of Patent: December 6, 2016
    Assignees: Samsung Electronics Co., Ltd., Industry-Academic Cooperation Foundation, Yonsei-University
    Inventors: Jung-Shin Park, Sang-Hoon Lee, Beom Kwon, Seong-Hyun Kim, Sang-Hoon Lee, Ho-Jae Lee
  • Patent number: 9515983
    Abstract: An apparatus performs a method for managing mobility of a terminal by a Base Station (BS) in a wireless communication system. The method includes receiving information on whether a time for which a terminal had been located at a cell managed by a first BS before the terminal has moved to a cell managed by the BS is equal to or longer than a predetermined threshold. The method also includes controlling data transmission/reception of the terminal by using one of an address allocated to the terminal by the BS or an address allocated to the terminal by a home server according to whether the time for which the terminal had been located at the cell managed by the first BS is equal to or longer than the predetermined threshold.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: December 6, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ki-Suk Kweon, Jung-Shin Park, Yeong-Moon Son, Antony Franklin
  • Publication number: 20160350502
    Abstract: Disclosed is a method of providing a disease co-occurrence probability including (a) receiving a disease network in which respective diseases are shown as nodes and a correlation between diseases is shown as an edge between the nodes and (b) calculating, when at least one disease is given, a probability of an occurrence of another disease in addition to the given disease, the corresponding disease which accompanies the given disease, from the disease network.
    Type: Application
    Filed: October 22, 2015
    Publication date: December 1, 2016
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventor: Hyun Jung SHIN
  • Bag
    Patent number: D777425
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: January 31, 2017
    Assignees: Kia Motors Corporation, Ecojun Company
    Inventors: Yoon Jung Shin, Jun Seo Lee