Patents by Inventor Jung Sub Kim

Jung Sub Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140183546
    Abstract: A nitride-based semiconductor light-emitting device includes an n-type nitride-based semiconductor layer, an active layer, a p-type nitride-based semiconductor layer, an ohmic contact layer covering a portion of the p-type nitride-based semiconductor layer upper surface, and a p electrode including a first portion contacting the p-type nitride-based semiconductor layer and a second portion contacting the ohmic contact layer.
    Type: Application
    Filed: August 22, 2013
    Publication date: July 3, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-sub KIM, Jin-sub LEE, Cheol-soo SONE, Kyung-wook HWANG
  • Publication number: 20140042454
    Abstract: A semiconductor light emitting device includes a substrate, a buffer layer disposed on the substrate, the buffer layer comprising aluminum nitride, a composition grading layer disposed on the buffer layer, the composition grading layer comprising first aluminum nitride and second aluminum nitride, a capping layer disposed on the composition grading layer, and a cladding layer disposed on the capping layer. A composition of the first aluminum nitride and a composition of the second aluminum nitride change gradually in an alternating manner.
    Type: Application
    Filed: July 17, 2013
    Publication date: February 13, 2014
    Inventors: Jin Sub LEE, Jung Sub KIM, Cheol Soo SONE
  • Publication number: 20140014897
    Abstract: According to example embodiments, a semiconductor light emitting device including a doped buffer layer includes a substrate and a buffer layer on the substrate. The doping layer may include aluminum nitride (AlN) and the buffer layer may include a doping layer. An n-type nitride semiconductor layer, an active layer, and a p-type nitride semiconductor layer may be on the buffer layer. An n-side electrode may be on the n-type nitride semiconductor layer. A p-side electrode may be on the p-type nitride semiconductor layer.
    Type: Application
    Filed: June 20, 2013
    Publication date: January 16, 2014
    Inventors: Jung-sub KIM, Denis SANNIKOV, Cheol-soo SONE, Jin-sub LEE
  • Publication number: 20140008608
    Abstract: A semiconductor light-emitting device includes a contact layer. The contact layer has the composition ratio of Al elements which varies gradually therein. A region formed by an Al element in the contact layer of the semiconductor light-emitting device may improve light extraction efficiency of the light emitted from an active layer and facilitate a formation of the reflective electrode.
    Type: Application
    Filed: March 14, 2013
    Publication date: January 9, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-Sub KIM, Sung-Won HWANG, Geun-Woo KO, Cheol-Soo SONE, Sung-Hyun SIM, Jin-Sub LEE
  • Publication number: 20130319333
    Abstract: An injector and a material layer deposition chamber including the same. An injector includes: a plurality of independent sections; and a gas inlet and a gas outlet that are provided in each of the plurality of independent sections, wherein gas outlets provided in two adjacent sections are positioned and configured to inject gas in a limited and different direction relative to each other.
    Type: Application
    Filed: June 4, 2013
    Publication date: December 5, 2013
    Inventors: Jin-sub Lee, Min-seok Kim, Jung-sub Kim, Cheol-soo Sone
  • Publication number: 20130307001
    Abstract: An n-type aluminum gallium nitride (AlGaN) thin film and an ultraviolet light emitting device including the same. The ultraviolet light emitting device includes: an aluminum nitride (AlN) buffer layer on a substrate; and an n-type AlGaN layer, an active layer, a p-type AlGaN layer that are sequentially stacked on the AlN buffer layer. A silicon doping density of the n-type AlGaN layer increases with respect to an increasing vertical position of the n-AlGaN layer with reference to the AlN buffer layer.
    Type: Application
    Filed: March 15, 2013
    Publication date: November 21, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin-sub Lee, Jung-sub Kim, Cheol-soo Sone
  • Publication number: 20130252068
    Abstract: Disclosed are a silicon nanostructured material with theoretical storage capacity of energy resulting from electrochemical reaction with lithium improved more than 10 times as compared to the existing graphite material and having superior output characteristics, an electrode including the same, and a secondary battery and an electrochemical capacitor including the electrode as a negative electrode. The physical stability of the electrode active material is improved and an electrode with high performance can be obtained. Since more energy can be stored as compared to the graphite material of the same thickness and high-output performance can be achieved through the nanostructure, energy density can be remarkably improved as compared to the existing lithium-ion battery by about 2 times. An asymmetric lithium-ion secondary battery including the electrode active material is applicable to storage of renewable energy, ubiquitous power source, power supply for machinery and vehicles, or the like.
    Type: Application
    Filed: August 24, 2012
    Publication date: September 26, 2013
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Joong Kee LEE, Won Chang CHOI, Joo Man WOO, Ho Suk CHOI, Jung Sub KIM, Hieu Si NGUYEN, Chairul HUDAYA, A Young KIM, Ji Hun PARK, Sang Ok KIM, Xuyan LIU
  • Patent number: 7807017
    Abstract: An etching apparatus for substrates includes an etching tank including an etching solution, a cassette having a plurality of substrates mounted therein and which is installed inside the etching tank, a porous plate installed on a lower surface of the cassette and a plurality of discharge sections provided in the porous plate corresponding to the substrates and each of the discharge sections having a plurality of discharge ports. The etching apparatus further includes a plurality of first lines connected to the discharge ports respectively, and supplied with a gas to provide bubbles to the substrates through the discharge ports. The first lines are divided into a plurality of groups, and at least one group is supplied with a gas having a pressure different from a pressure of a gas supplied to other groups.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: October 5, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Sub Kim, Dae-Soon Yim, Seung-Lyong Bok
  • Publication number: 20090020503
    Abstract: A substrate etching apparatus includes a chamber in which first and second insulating substrates are received, a blocking shutter, and a first spray head. The first spray head is arranged in the chamber and sprays an etchant toward the first insulating substrate. The blocking shutter surrounds end portions of the first and second substrates and isolates a first area in which the first insulating substrate is positioned from a second area in which the second insulating substrate is positioned.
    Type: Application
    Filed: July 16, 2008
    Publication date: January 22, 2009
    Inventors: Jung-Sub Kim, Seung-Lyong Bok
  • Publication number: 20080017313
    Abstract: An etching apparatus for substrates includes an etching tank including an etching solution, a cassette having a plurality of substrates mounted therein and which is installed inside the etching tanks a porous plate installed on a lower surface of the cassette and a plurality of discharge sections provided in the porous plate corresponding to the substrates and each of the discharge sections having a plurality of discharge ports. The etching apparatus further includes a plurality of first lines connected to the discharge ports respectively, and supplied with a gas to provide bubbles to the substrates through the discharge ports. The first lines are divided into a plurality of groups, and at least one group is supplied with a gas having a pressure different from a pressure of a gas supplied to other groups.
    Type: Application
    Filed: March 20, 2007
    Publication date: January 24, 2008
    Inventors: Jung-Sub KIM, Dae-Soon Yim, Seung-Lyong Bok
  • Patent number: 6791252
    Abstract: Disclosed is a deflection yoke which is so configured that a coil separator and horizontal deflection coils have angular cross sectional shapes and a ferrite core and vertical deflection coils have circular cross sectional shapes to improve deflection sensitivity thereby reducing power consumption.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: September 14, 2004
    Assignee: Samsung Electric-Mechanics Co., Ltd.
    Inventors: Jung Sub Kim, Seoung Chun Kim, Cheong Moon Lee, Hwan Seok Choi
  • Publication number: 20020140337
    Abstract: Disclosed is a deflection yoke which is so configured that a coil separator and horizontal deflection coils have angular cross sectional shapes and a ferrite core and vertical deflection coils have circular cross sectional shapes to improve deflection sensitivity thereby reducing power consumption.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 3, 2002
    Applicant: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jung Sub Kim, Seoung Chun Kim, Cheong Moon Lee, Hwan Seok Choi