Abstract: Methods of forming a hard mask capable of implementing an electrode having a high aspect ratio are provided. A molding layer may be formed on a substrate. A sacrificial layer may be formed on the molding layer. First mask patterns may be formed in parallel in the sacrificial layer. After the first mask patterns are formed, second mask patterns, which cross the first mask patterns and are in parallel, may be formed in the sacrificial layer. The first mask patterns and the second mask patterns may have materials more opaque than the sacrificial layer. Upper surfaces of the sacrificial layer, the first mask patterns and the second mask patterns may be exposed at the same horizontal level. The sacrificial layer may be removed. Openings, which pass through the molding layer, may be formed using the first mask patterns and the second mask patterns as etch masks. Electrodes may be formed in the openings.

Abstract: A method of forming semiconductor device includes forming a landing pad, forming a stopping insulating layer on the landing pad, forming a lower molding layer including a first material on the stopping insulating layer, forming an upper molding layer including a second material different from the first material on the lower molding layer, forming a hole vertically passing through the upper molding layer and the lower molding layer and exposing the landing pad, forming a first electrode in the hole, removing the upper molding layer to expose a part of a surface of the first electrode, removing the lower molding layer to expose another part of the surface of the first electrode, forming a capacitor dielectric layer on the exposed parts of the surface of the first electrode, and forming a second electrode on the dielectric layer.

Abstract: A double patterning method of forming a plurality of hole patterns having a small pitch using etch selectivities includes forming a patterning mask pattern defining a preliminary hole exposing an upper surface of a buffer mask layer, an inner spacer exposing the upper surface of the buffer mask layer on an inner wall of the preliminary hole, a buffer mask pattern having a first hole, and a core insulating pattern filling the preliminary hole and the first hole, an outer spacer to expose a first portion of the patterning mask pattern on the exposed portion of the outer side of the inner spacer, and an empty space exposing a first portion of the buffer mask pattern. A second portion of the patterning mask pattern and a second portion of the buffer mask pattern are exposed. A second hole is formed by removing the second portion of the buffer mask pattern.

Abstract: Methods of forming a semiconductor device can be provided by forming a first molding layer on a substrate and forming a first hole through the first molding layer. A second molding layer can be formed on the first molding layer so that the first hole is retained in the first molding layer and a second hole can be formed through the second molding layer to connect with the first hole. A capacitor electrode can be formed in the first and second holes.

Abstract: Provided is a system and method for collecting a document. The system may include an identification information receiver to receive, from a host of a site, identification information of a document of which an update may occur, a collection request transfer unit to transmit a collection request for the document based on the identification information, an update information collector to receive update information of the document from the host, and a search result provider to provide, to the host, a search result extracted from the update information of the document, in response to the search request being received from the host. The system for collecting the document may reduce load of a web site, and may improve accuracy of the document to be collected.

Abstract: A double patterning method of forming a plurality of hole patterns having a small pitch using etch selectivities includes forming a patterning mask pattern defining a preliminary hole exposing an upper surface of a buffer mask layer, an inner spacer exposing the upper surface of the buffer mask layer on an inner wall of the preliminary hole, a buffer mask pattern having a first hole, and a core insulating pattern filling the preliminary hole and the first hole, an outer spacer to expose a first portion of the patterning mask pattern on the exposed portion of the outer side of the inner spacer, and an empty space exposing a first portion of the buffer mask pattern. A second portion of the patterning mask pattern and a second portion of the buffer mask pattern are exposed. A second hole is formed by removing the second portion of the buffer mask pattern.

Abstract: A method of forming semiconductor device includes forming a landing pad, forming a stopping insulating layer on the landing pad, forming a lower molding layer including a first material on the stopping insulating layer, forming an upper molding layer including a second material different from the first material on the lower molding layer, forming a hole vertically passing through the upper molding layer and the lower molding layer and exposing the landing pad, forming a first electrode in the hole, removing the upper molding layer to expose a part of a surface of the first electrode, removing the lower molding layer to expose another part of the surface of the first electrode, forming a capacitor dielectric layer on the exposed parts of the surface of the first electrode, and forming a second electrode on the dielectric layer.

Abstract: According to example embodiments, a roll printing apparatus includes a cleaning device in which a cleaning nozzle unit and a spray nozzle unit are integrated so that both a reverse offset process and a cliche cleaning process may be achieved in the roll printing apparatus. The roll printing apparatus may include a base plate, a blanket roll to transfer an ink material to a cliche and a substrate, a blanket roll supporter located on the base plate to support the blanket roll, a cliche table located on the base plate to fix and move the cliche, a substrate table located on the base plate to fix the substrate, and the cleaning device installed on the base plate to clean the cliche. The cleaning device may include a cleaning nozzle unit to spray a cleaning solution and a spray nozzle unit to spray DIW, which are integrated.

Abstract: Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.

Abstract: In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.

Abstract: The present invention relates to a connection device installed on a top of a canopy tent, comprising: a main body having a hollow interior, a sliding member having an interior with a downwardly protruding cylinder, support poles each having one end hinged to the main body, and the other end connected to a tent pole for standing the tent fabric upright, a joint bar having one end hinged to the sliding member, and the other end having one side hinged to a first connection bar hinged to the support pole and the other side hinged to a second connection bar hinged to the main body; The hollow interior of the main body is equipped with a compression spring and a spring holder. The cylinder of the sliding member is fitted into the hollow interior of the main body from the top of the hollow interior to be movable in the upward and downward directions to set up or taken of the tent canopy.

Abstract: Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.

Abstract: A mobile terminal includes an execution unit to execute tasks, a determination unit to determine whether to manage the executed tasks and to generate a termination processing signal for terminating a first executed tasks if the executed tasks are to be managed, and a control unit to terminate the first executed task according to the termination processing signal generated by the determination unit. A method for managing tasks includes executing tasks, determining whether to manage the executed tasks, generating a termination processing signal for terminating a first executed task according to the determination result, and terminating the first executed task according to the termination processing signal.

Abstract: According to example embodiments, a roll printing apparatus includes a cleaning device in which a cleaning nozzle unit and a spray nozzle unit are integrated so that both a reverse offset process and a cliche cleaning process may be achieved in the roll printing apparatus. The roll printing apparatus may include a base plate, a blanket roll to transfer an ink material to a cliche and a substrate, a blanket roll supporter located on the base plate to support the blanket roll, a cliche table located on the base plate to fix and move the cliche, a substrate table located on the base plate to fix the substrate, and the cleaning device installed on the base plate to clean the cliche. The cleaning device may include a cleaning nozzle unit to spray a cleaning solution and a spray nozzle unit to spray DIW, which are integrated.

Abstract: Provided is a system and method for collecting a document. The system may include an identification information receiver to receive, from a host of a site, identification information of a document of which an update may occur, a collection request transfer unit to transmit a collection request for the document based on the identification information, an update information collector to receive update information of the document from the host, and a search result provider to provide, to the host, a search result extracted from the update information of the document, in response to the search request being received from the host. The system for collecting the document may reduce load of a web site, and may improve accuracy of the document to be collected.

Abstract: According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions.

Abstract: The present invention relates to a canopy tent, comprising: a main body having an outer surface with a plurality of joint rings, and a hollow interior; a sliding member having an outer surface with a plurality of joint rings, and an interior with a downwardly protruding cylinder; a support pole, one end of which is hinged to the joint rings of the main body, and the other end of which is connected to a tent pole for standing the tent fabric upright, and which has a pole connection portion with a joint ring formed at the outer surface thereof; and a joint bar, one end of which is hinged to the joint ring of the sliding member, and the other end of which has one side hinged to a first connection bar hinged to the joint ring of the support pole and the other side hinged to a second connection bar hinged to the joint ring of the main body. The hollow interior of the main body is equipped with a compression spring and a spring holder. The spring holder is coupled to the lower portion of the cylinder.

Abstract: This invention relates to Pulsatillae Radix extract for improving brain functions. More specifically, this invention relates to Pulsatillae Radix extract, its active fractions and a pharmaceutical product and a health food containing the same respectively having a protective activity against neurotoxicity and a growth inhibitory effect induced by beta-amyloid, an anti-oxidizing effect, a neuron proliferating effect and improving memory thereby effective in improving brain functions such as Mild Cognitive Impairment and dementia.

Abstract: An electronic device may include a substrate and a plurality of conductive electrodes on the substrate. Each of the conductive electrodes may have a respective electrode wall extending away from the substrate, and an electrode wall of at least one of the conductive electrodes may include a recessed portion. In addition, an insulating layer may be provided on the electrode wall, and portions of the electrode wall may be free of the insulating layer between the substrate and the insulating layer.

Abstract: A semiconductor memory device includes a semiconductor substrate in which a cell region and a core and peripheral region are defined. The device further comprises isolation layers formed in the semiconductor substrate to define active regions, a first gate electrode structure formed in the cell region and a second gate electrode structure formed in the core and peripheral region. Source and drain regions formed in the active regions on respective sides of each of the gate electrode structures and self-aligned contact pads are formed in the cell region in contact with the source and drain regions. An insulating interlayer is formed on the semiconductor substrate between the self-aligned contact pads, and etch stoppers are formed on the insulating interlayer between the self-aligned contact pads in the cell region.