Patents by Inventor Jung Woo Choi

Jung Woo Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250066925
    Abstract: A method of manufacturing interior parts for a vehicle includes: forming a first plating layer on a surface of an injection molded product through electroless plating; printing a symbol part on the first plating layer; partially removing the first plating layer to a size corresponding to the symbol part from a rear surface of the injection molded product; forming a second plating layer on the first plating layer; and removing the symbol part and the first plating layer from the surface of the injection molded product on which the second plating layer is formed.
    Type: Application
    Filed: December 15, 2023
    Publication date: February 27, 2025
    Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION, BS TECHNICS CO.,LTD., ALPS ELECTRIC KOREA CO.,LTD.
    Inventors: Young Ju Lee, Kwang Pyo Cho, Hong Sik Chang, Seung Sik Han, Young Jai Im, Jun Sik Kim, Young Do Kim, Jung Sik Choi, Tae Kyoung Jung, In Ho Park, Seon Dong Kim, Dae Woo Park
  • Patent number: 12237185
    Abstract: A laser machining apparatus includes, a processing chamber, a window disposed in a surface of the processing chamber, a substrate carrier disposed inside the processing chamber and facing the window, a laser irradiator which irradiates a laser onto the substrate carrier through the window, a protector supplier disposed on a side of the processing chamber, a protector retriever disposed on an opposite side of the processing chamber opposite to the side of the processing chamber, and a protector which connects the protector supplier with the protector retriever, where at least a portion of the protector is disposed between the substrate carrier and the window in the processing chamber.
    Type: Grant
    Filed: January 31, 2022
    Date of Patent: February 25, 2025
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Heung Yeol Na, Tae Hun Kim, Jung Woo Choi
  • Publication number: 20250054974
    Abstract: The present invention relates to a positive electrode active material having improved electrical characteristics by adjusting an aspect ratio gradient of primary particles included in a secondary particle, a positive electrode including the positive electrode active material, and a lithium secondary battery using the positive electrode.
    Type: Application
    Filed: October 30, 2024
    Publication date: February 13, 2025
    Applicant: ECOPRO BM CO., LTD.
    Inventors: Moon Ho CHOI, Seung Woo CHOI, Jun Won SUH, Jin Kyeong YUN, Jung Han LEE, Gwang Seok CHOE, Joong Ho BAE, Du Yeol KIM
  • Patent number: 12225240
    Abstract: The present invention relates to an image encoding/decoding method and apparatus. An image encoding method according to the present invention may comprise generating a transform block by performing at least one of transform and quantization; grouping at least one coefficient included in the transform block into at least one coefficient group (CG); scanning at least one coefficient included in the coefficient group; and encoding the at least one coefficient.
    Type: Grant
    Filed: November 20, 2023
    Date of Patent: February 11, 2025
    Assignees: Electronics and Telecommunications Research Institute, Industry Academy Cooperation Foundation of Sejong University
    Inventors: Sung Chang Lim, Jung Won Kang, Hyun Suk Ko, Jin Ho Lee, Dong San Jun, Ha Hyun Lee, Seung Hyun Cho, Hui Yong Kim, Jin Soo Choi, Yung Lyul Lee, Jun Woo Choi
  • Patent number: 12225222
    Abstract: The present invention relates to an image encoding/decoding method and device. The image decoding method according to the present invention comprises the steps of: decoding a prediction mode index; determining whether the prediction mode index indicates function-based intra prediction; inducing a parameter (s) for generating a function, when the prediction mode index indicates the function-based intra prediction; generating the function on the basis of the induced parameter (s); and performing intra prediction by using the generated function.
    Type: Grant
    Filed: September 26, 2022
    Date of Patent: February 11, 2025
    Assignee: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Seung Hyun Cho, Jung Won Kang, Hyun Suk Ko, Sung Chang Lim, Jin Ho Lee, Ha Hyun Lee, Dong San Jun, Hui Yong Kim, Byeung Woo Jeon, Nam Uk Kim, Seung Su Jeon, Jin Soo Choi
  • Publication number: 20250039804
    Abstract: An operation method of an IAB node in a communication system may comprise: measuring a power difference between a first signal received from a first node and a second signal received from a second node; controlling a transmit power of each of the first node and the second node based on the power difference; generating scheduling information for allowing the first node and the second node to simultaneously transmit signals; transmitting the scheduling information to the first node and the second node; and receiving signals that the first node and the second node simultaneously transmit according to the scheduling information by using the transmit power.
    Type: Application
    Filed: October 16, 2024
    Publication date: January 30, 2025
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Jun Hyeong KIM, Seon Ae KIM, IL GYU KIM, Go San NOH, Hee Sang CHUNG, Dae Soon CHO, Sung Woo CHOI, Seung Nam CHOI, Jung Pil CHOI
  • Publication number: 20250022426
    Abstract: A source driver includes a pin to which a first voltage or a second voltage is applied; an output multiplexer configured to select a data voltage and a black grayscale voltage of pixel data; and a controller configured to control a voltage level of the black grayscale voltage differently depending on the voltage applied to the pin.
    Type: Application
    Filed: July 1, 2024
    Publication date: January 16, 2025
    Applicant: LX SEMICON CO., LTD.
    Inventors: Jun Young OH, Min Young JEONG, Yong Woo CHOI, Jung Bae YUN
  • Patent number: 12136653
    Abstract: In a silicon carbide wafer in an embodiment, in the photoluminescence signal intensity spectrum obtained after irradiating a laser on one surface of the silicon carbide wafer, the number of peak signals having an intensity more than 1.2 times the average signal intensity of the spectrum is 1/cm2 or less.
    Type: Grant
    Filed: March 11, 2022
    Date of Patent: November 5, 2024
    Assignee: SENIC Inc.
    Inventors: Jung Woo Choi, Jong Hwi Park, Jung-Gyu Kim, Jung Doo Seo, Kap-Ryeol Ku
  • Publication number: 20240340609
    Abstract: A method and apparatus for generating late reverberation are provided. The method includes generating a reverberation parameter required to generate late reverberation based on an early room impulse response, outputting late reverberation based on the reverberation parameter, and outputting a room impulse response based on the early room impulse response and the late reverberation.
    Type: Application
    Filed: February 13, 2024
    Publication date: October 10, 2024
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Jung-Woo CHOI, Jae-hyoun YOO, Kyeongok KANG, Soo Young PARK, Yong Ju LEE, Dae Young JANG, Young Ho JEONG, Seongrae KIM
  • Publication number: 20240258667
    Abstract: A battery pack and a method of manufacturing the same are provided. The battery pack includes a battery module in which a drain hole is formed in a bottom surface thereof, a plate disposed on a top surface of the battery module, a heat dissipation body provided between the battery module and the plate, and a blocking part provided between the battery module and the plate to prevent the heat dissipation body from being introduced into the drain hole.
    Type: Application
    Filed: December 5, 2022
    Publication date: August 1, 2024
    Inventors: Jeong Hoon Park, Jung Woo Choi
  • Patent number: 12037704
    Abstract: Disclosed are a silicon carbide wafer and a method of manufacturing the same. The silicon carbide wafer includes an upper surface and a lower surface, the upper surface includes a first target region, the first target region being within 85% of a radius of the upper surface based on a center of the upper surface, a first peak omega angle measured at intervals of 15 mm in a first direction in the first target region is within ?1° to +1° based on a peak omega angle measured at the center of the upper surface, and the first direction is a [1-100] direction and a direction passing through the center of the upper surface.
    Type: Grant
    Filed: November 4, 2022
    Date of Patent: July 16, 2024
    Assignee: SENIC INC.
    Inventors: Myung Ok Kyun, Kap Ryeol Ku, Jung Gyu Kim, Jung Woo Choi, Jung Doo Seo, Jong Hwi Park
  • Patent number: 11969917
    Abstract: A silicon carbide wafer manufacturing method includes: a bending measuring step of measuring a first edge having the greatest degree of a bending at one surface of a silicon carbide ingot having one surface; a cutting start step of starting a cutting at a second edge having a distance of r×a along an edge of the one surface from the first edge in a direction parallel to or with a predetermined off angle with respect to the one surface through the wire saw, a cutting speed being decreased to a first cutting speed in the cutting start step; a cutting proceeding step in which the first cutting speed is substantially constant within a variation of about ±5% of the first cutting speed; and a finish step in which the cutting speed is increased from the first cutting speed and the cutting of the silicon carbide ingot is completed.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: April 30, 2024
    Assignee: SENIC Inc.
    Inventors: Jung-Gyu Kim, Kap-Ryeol Ku, Jung Doo Seo, Jung Woo Choi, Jong Hwi Park
  • Patent number: 11939698
    Abstract: A wafer manufacturing method, an epitaxial wafer manufacturing method, and a wafer and epitaxial wafer manufactured thereby, are provided. The wafer manufacturing method enables the manufacture of a wafer with a low density of micropipe defects and minimum numbers of particles and scratches. The epitaxial wafer manufacturing method enables the manufacture of an epitaxial wafer that has low densities of defects such as downfall, triangular, and carrot defects, exhibits excellent device characteristics, and improves the yield of devices.
    Type: Grant
    Filed: November 3, 2020
    Date of Patent: March 26, 2024
    Assignee: SENIC INC.
    Inventors: Jong Hwi Park, Jung-Gyu Kim, Eun Su Yang, Byung Kyu Jang, Jung Woo Choi, Yeon Sik Lee, Sang Ki Ko, Kap-Ryeol Ku
  • Publication number: 20240076799
    Abstract: A wafer manufacturing method, an epitaxial wafer manufacturing method, and a wafer and epitaxial wafer manufactured thereby, are provided. The wafer manufacturing method enables the manufacture of a wafer with a low density of micropipe defects and minimum numbers of particles and scratches. The epitaxial wafer manufacturing method enables the manufacture of an epitaxial wafer that has low densities of defects such as downfall, triangular, and carrot defects, exhibits excellent device characteristics, and improves the yield of devices.
    Type: Application
    Filed: November 1, 2023
    Publication date: March 7, 2024
    Applicant: SENIC INC.
    Inventors: Jong Hwi PARK, Jung-Gyu KIM, Eun Su YANG, Byung Kyu JANG, Jung Woo CHOI, Yeon Sik LEE, Sang Ki KO, Kap-Ryeol KU
  • Publication number: 20240080320
    Abstract: A server according to an embodiment includes a processor configured to receive a friend add request for a target account from a user terminal accessed with a user account; based on one of the user account and the target account being a protected account, transmit an approval request for the friend add request to a protector account connected to the protected account; and based on receiving a reply to the approval request from the protector terminal, add the target account to a friend list of the user account.
    Type: Application
    Filed: April 27, 2023
    Publication date: March 7, 2024
    Inventors: You Jin KIM, Jung Woo CHOI, Jenog Ryeol CHOI, Joong Seon KIM, Hong Chan YUN, Ju Ho CHUNG, Do Hyun YOUN, Hyung Min KIM, Hyun Ok CHOI, Chun Ho KIM, Soo Beom KIM, Min Jeong KIM, Chang Oh HEO, Eun Soo HEO
  • Patent number: 11919375
    Abstract: The present disclosure relates to a vehicle door coupling device, and more specifically, to a vehicle door coupling device for mechanically coupling together a first member having a first hole and a second member having a second hole at a position corresponding to the first hole.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: March 5, 2024
    Assignee: KWANGJIN CO., LTD.
    Inventors: Jung Woo Choi, Kwan Yong Lee
  • Patent number: 11862685
    Abstract: The wafer having a retardation distribution measured with a light having a wavelength of 520 nm, wherein an average value of the retardation is 38 nm or less, wherein the wafer comprises a micropipe, and wherein a density of the micropipe is 1.5/cm2 or less, is disclosed.
    Type: Grant
    Filed: February 4, 2022
    Date of Patent: January 2, 2024
    Assignee: SENIC INC.
    Inventors: Jong Hwi Park, Kap-Ryeol Ku, Jung-Gyu Kim, Jung Woo Choi, Myung-Ok Kyun
  • Patent number: 11859305
    Abstract: A method of growing a semi-insulating SiC single crystal ingot, the method comprising the steps of: (1) placing a dopant coated with silicon carbide (SiC) and a carbon-based material into a reaction vessel containing a seed crystal fixed thereto; and (2) growing a SiC single crystal on the seed crystal, thereby yielding a high-quality semi-insulating SiC single crystal ingot with a uniform thickness-based doping concentration. In addition, another embodiment relates to a method of growing a semi-insulating silicon carbide single crystal ingot, the method comprising the steps of: (a) placing in a reaction vessel, a composition comprising a carbon-containing polymer resin, a solvent, a dopant, and silicon carbide (SiC); (b) solidifying the composition; and (c) growing a SiC single crystal ingot on a seed crystal fixed to the reaction vessel, thereby yielding a high-quality semi-insulating SiC single crystal ingot with a uniform thickness-based doping concentration.
    Type: Grant
    Filed: February 16, 2023
    Date of Patent: January 2, 2024
    Assignee: SENIC Inc.
    Inventors: Jung Woo Choi, Jung-Gyu Kim, Kap-Ryeol Ku, Sang Ki Ko, Byung Kyu Jang
  • Patent number: 11856678
    Abstract: Example embodiments relate to a method of measurement, an apparatus for measurement, and an ingot growing system that measure properties relating an induction heating characteristic of a graphite article. The method of measurement comprises an arranging step of arranging a graphite article to the coil comprising a winded conducting wire; and a measuring step of applying power for measurement to the coil through means of measurement connected electronically to the coil, and measuring electromagnetic properties induced in the coil. The method of measurement and the like measure electromagnetic properties of graphite articles like an ingot growing container, and an insulating material, and provide data required for selecting so that further enhanced reproducibility for growth of an ingot can be secured.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: December 26, 2023
    Assignee: SENIC INC.
    Inventors: Eun Su Yang, Jong Hwi Park, Jung Woo Choi, Byung Kyu Jang, Sang Ki Ko, Jongmin Shim, Kap-Ryeol Ku, Jung-Gyu Kim
  • Patent number: 11846038
    Abstract: A method of growing a semi-insulating SiC single crystal ingot, the method comprising the steps of: (1) placing a dopant coated with silicon carbide (SiC) and a carbon-based material into a reaction vessel containing a seed crystal fixed thereto; and (2) growing a SiC single crystal on the seed crystal, thereby yielding a high-quality semi-insulating SiC single crystal ingot with a uniform thickness-based doping concentration. In addition, another embodiment relates to a method of growing a semi-insulating silicon carbide single crystal ingot, the method comprising the steps of: (a) placing in a reaction vessel, a composition comprising a carbon-containing polymer resin, a solvent, a dopant, and silicon carbide (SiC); (b) solidifying the composition; and (c) growing a SiC single crystal ingot on a seed crystal fixed to the reaction vessel, thereby yielding a high-quality semi-insulating SiC single crystal ingot with a uniform thickness-based doping concentration.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: December 19, 2023
    Assignee: SENIC Inc.
    Inventors: Jung Woo Choi, Jung-Gyu Kim, Kap-Ryeol Ku, Sang Ki Ko, Byung Kyu Jang