Patents by Inventor KANG CHAO

KANG CHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220375770
    Abstract: A method is provided. The method includes introducing a process gas into an interior space of a processing chamber through a gas inlet port, wherein a substrate is supported within the interior space. The process gas is evacuated from the interior space by a vacuum source through an exhaust port in fluid communication with the interior space of the process chamber. A flow of the process gas is controlled by supporting an exhaust baffle within a flow path of the process gas being evacuated from the interior space through the exhaust port.
    Type: Application
    Filed: July 29, 2022
    Publication date: November 24, 2022
    Inventors: Yu-Liang YEH, Chih-Kang Chao, Bing Kai Huang
  • Publication number: 20220051912
    Abstract: A method is provided. The method includes introducing a process gas into an interior space of a processing chamber through a gas inlet port, wherein a substrate is supported within the interior space. The process gas is evacuated from the interior space by a vacuum source through an exhaust port in fluid communication with the interior space of the process chamber. A flow of the process gas is controlled by supporting an exhaust baffle within a flow path of the process gas being evacuated from the interior space through the exhaust port.
    Type: Application
    Filed: August 12, 2020
    Publication date: February 17, 2022
    Inventors: Yu-Liang YEH, Chih-Kang CHAO, Bing Kai HUANG
  • Publication number: 20200265691
    Abstract: A wireless device has an antenna module, an indicating module, and a control circuit. The antenna module has at least a smart antenna. The indicating module has a plurality of indicating units. The control circuit is coupled to the antenna module and the indicating units for determining at least a parameter between the wireless device and at least a wireless apparatus according to radio signals received from the at least a wireless apparatus via the antenna module, and for controlling operations of the indicating units according to the at least a parameter.
    Type: Application
    Filed: November 19, 2019
    Publication date: August 20, 2020
    Inventors: Fu-Ming Yeh, Yin-Cheng Wang, Chia-Kang Chao, Sin-Liang Chen
  • Patent number: 10618859
    Abstract: The present invention relates generally to methods and systems for removing oxygen from at least one product stream of a hydrocarbon oxidative dehydrogenation process. More specifically, in some embodiments, the oxidative dehydrogenation process is an ethane oxidative dehydrogenation process for producing ethylene, or a mixed alkane oxidative dehydrogenation process for producing ethylene and propylene, among other components.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: April 14, 2020
    Assignee: DAIREN CHEMICAL CORPORATION
    Inventors: Tian-Yuan Lin, Shih-Bo Hung, Yung-Kang Chao
  • Patent number: 10509403
    Abstract: A fire extinguishing device is configured to, in response to a location signal from a fire detector: move to a first reference location; detect a fire and generate a thermal image, and calculate a target direction based on a line of sight and the thermal image; rotate such that the line of sight is aligned with the target direction, and detect the fire and generate a first reference image; move in the target direction to a second reference location, and detect the fire and generate a second reference image; calculate a distance to fire and a height of the fire; move to a location within a predetermined range from the fire, move a tube to a spraying position based on the height of the fire, and discharge an extinguishing agent.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: December 17, 2019
    Inventors: Kang Chao, Yung-Tai Chao
  • Publication number: 20190284116
    Abstract: The present invention relates generally to methods and systems for removing oxygen from at least one product stream of a hydrocarbon oxidative dehydrogenation process. More specifically, in some embodiments, the oxidative dehydrogenation process is an ethane oxidative dehydrogenation process for producing ethylene, or a mixed alkane oxidative dehydrogenation process for producing ethylene and propylene, among other components.
    Type: Application
    Filed: May 15, 2019
    Publication date: September 19, 2019
    Applicant: DAIREN CHEMICAL CORPORATION
    Inventors: Tian-Yuan LIN, Shih-Bo HUNG, Yung-Kang CHAO
  • Patent number: 10322985
    Abstract: The present invention relates generally to methods and systems for removing oxygen from at least one product stream of a hydrocarbon oxidative dehydrogenation process. More specifically, in some embodiments, the oxidative dehydrogenation process is an ethane oxidative dehydrogenation process for producing ethylene.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: June 18, 2019
    Assignee: Dairen Chemical Corporation
    Inventors: Tian-Yuan Lin, Shih-Bo Hung, Yung-Kang Chao
  • Publication number: 20190129428
    Abstract: A fire extinguishing device is configured to, in response to a location signal from a fire detector: move to a first reference location; detect a fire and generate a thermal image, and calculate a target direction based on a line of sight and the thermal image; rotate such that the line of sight is aligned with the target direction, and detect the fire and generate a first reference image; move in the target direction to a second reference location, and detect the fire and generate a second reference image; calculate a distance to fire and a height of the fire; move to a location within a predetermined range from the fire, move a tube to a spraying position based on the height of the fire, and discharge an extinguishing agent.
    Type: Application
    Filed: October 24, 2018
    Publication date: May 2, 2019
    Inventors: Kang CHAO, Yung-Tai CHAO
  • Publication number: 20180310149
    Abstract: A device configuration method for use in a cloud system including a gateway device, a mobile device and a cloud server is provided. The method includes the steps of: establishing a connection between the mobile device and the gateway device through the cloud server; sending, by the gateway device, a notification message to the mobile device through the established connection when detecting that a first device is connected to a connection port; and in response to receiving the notification message, identifying, by the mobile device, the first device according to a first identification information within the notification message and displaying a user interface displaying at least one application corresponding to the first device, obtaining one or more servers corresponding to the at least one application via the user interface and transmitting the obtained services to the gateway device to be configured and performed thereon.
    Type: Application
    Filed: April 18, 2018
    Publication date: October 25, 2018
    Inventors: Chia-Hsun LEE, Chao-Kuang YANG, Cheng-Kang CHAO, Cheng-Hung CHEN, Chi-Hung CHANG
  • Publication number: 20180309652
    Abstract: A method and mobile device determine a data transmission rate of a network applied to the mobile device. The mobile device comprises a first network element and a second network element for connecting to a first network and a second network, respectively. The method includes detecting a plurality of broadcast signals from a plurality of target devices of the first network via the first network element, determining the number of the target devices based on the detected broadcast signals, and determining whether a data transmission rate corresponding to the second network is set to a first data transmission rate or a second data transmission rate adjusted from the first data transmission rate according to a determination of whether the number of the target devices meets a predetermined condition and performing data transmission in the second network with the determined data transmission rate via the second network element.
    Type: Application
    Filed: April 18, 2018
    Publication date: October 25, 2018
    Inventors: Chia-Hsun LEE, Chao-Kuang YANG, Cheng-Kang CHAO, Cheng-Hung CHEN, Chi-Hung CHANG
  • Patent number: 9893150
    Abstract: A semiconductor device and a method of forming the same are disclosed. The semiconductor device includes a substrate, and a source region and a drain region formed in the substrate. The semiconductor device further includes an impurity diffusion stop layer formed in a recess of the substrate between the source region and the drain region, wherein the impurity diffusion stop layer covers bottom and sidewalls of the recess. The semiconductor device further includes a channel layer formed over the impurity diffusion stop layer and in the recess, and a gate stack formed over the channel layer.
    Type: Grant
    Filed: January 22, 2016
    Date of Patent: February 13, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Chieh Chiang, Chih-Kang Chao, Chih-Mu Huang, Ling-Sung Wang, Ru-Shang Hsiao
  • Patent number: 9450014
    Abstract: A die includes a first plurality of edges, and a semiconductor substrate in the die. The semiconductor substrate includes a first portion including a second plurality of edges misaligned with respective ones of the first plurality of edges. The semiconductor substrate further includes a second portion extending from one of the second plurality of edges to one of the first plurality of edges of the die. The second portion includes a first end connected to the one of the second plurality of edges, and a second end having an edge aligned to the one of the first plurality of edges of the die.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: September 20, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-I Cheng, Chih-Mu Huang, Pin Chia Su, Chi-Cherng Jeng, Volume Chien, Chih-Kang Chao
  • Publication number: 20160155806
    Abstract: A semiconductor device and a method of forming the same are disclosed. The semiconductor device includes a substrate, and a source region and a drain region formed in the substrate. The semiconductor device further includes an impurity diffusion stop layer formed in a recess of the substrate between the source region and the drain region, wherein the impurity diffusion stop layer covers bottom and sidewalls of the recess. The semiconductor device further includes a channel layer formed over the impurity diffusion stop layer and in the recess, and a gate stack formed over the channel layer.
    Type: Application
    Filed: January 22, 2016
    Publication date: June 2, 2016
    Inventors: Chen-Chieh Chiang, Chih-Kang Chao, Chih-Mu Huang, Ling-Sung Wang, Ru-Shang Hsiao
  • Patent number: 9246002
    Abstract: A semiconductor device and a method of forming the same are disclosed. The semiconductor device includes a substrate, and a source region and a drain region formed in the substrate. The semiconductor device further includes an impurity diffusion stop layer formed in a recess of the substrate between the source region and the drain region, wherein the impurity diffusion stop layer covers bottom and sidewalls of the recess. The semiconductor device further includes a channel layer formed over the impurity diffusion stop layer and in the recess, and a gate stack formed over the channel layer. The impurity diffusion stop layer substantially prevents impurities of the substrate and the source and drain regions from diffusing into the channel layer.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: January 26, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ru-Shang Hsiao, Ling-Sung Wang, Chih-Mu Huang, Chih-Kang Chao, Chen-Chieh Chiang
  • Patent number: 9240503
    Abstract: A photodiode structure includes a photodiode and a concave reflector disposed below the photodiode. The concave reflector is arranged to reflect incident light from above back toward the photodiode.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: January 19, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Che-Min Lin, Volume Chien, Chih-Kang Chao, Chi-Cherng Jeng, Pin Chia Su, Chih-Mu Huang
  • Publication number: 20150372045
    Abstract: A die includes a first plurality of edges, and a semiconductor substrate in the die. The semiconductor substrate includes a first portion including a second plurality of edges misaligned with respective ones of the first plurality of edges. The semiconductor substrate further includes a second portion extending from one of the second plurality of edges to one of the first plurality of edges of the die. The second portion includes a first end connected to the one of the second plurality of edges, and a second end having an edge aligned to the one of the first plurality of edges of the die.
    Type: Application
    Filed: August 31, 2015
    Publication date: December 24, 2015
    Inventors: I-I Cheng, Chih-Mu Huang, Pin Chia Su, Chi-Cherng Jeng, Volume Chien, Chih-Kang Chao
  • Patent number: 9209304
    Abstract: As will be appreciated in more detail herein, the present disclosure provides for FinFET techniques whereby a FinFET channel region has a particular orientation with respect to the crystalline lattice of the semiconductor device to provide enhanced mobility, compared to conventional FinFETs. In particular, the present disclosure provides FinFETs with a channel region whose lattice includes silicon atoms arranged on (551) lattice plane. In this configuration, the sidewalls of the channel region are particularly smooth at the atomic level, which tends to promote higher carrier mobility and higher device performance than previously achievable.
    Type: Grant
    Filed: February 13, 2014
    Date of Patent: December 8, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ru-Shang Hsiao, Hung Pin Chen, Wei-Barn Chen, Chih-Fu Chang, Chih-Kang Chao, Ling-Sung Wang
  • Publication number: 20150325928
    Abstract: A multiband antenna is disclosed, which comprises: a low-band antenna assembly, a mid-band antenna assembly, a high-band antenna assembly and a bottom panel. In an embodiment, the low-band antenna assembly is composed of a first dipole antenna and a second dipole antenna that are arranged intersecting with each other; the mid-band antenna assembly is composed of a plurality of connecting mid-band antennas; the high-band antenna assembly is composed of a plurality of connecting high-band antennas; the bottom panel is provided for the low-band antenna assembly, the mid-band antenna assembly and the high-band antenna assembly to be disposed thereon in a manner that the low-band antenna assembly is disposed on top of the mid-band antenna assembly and the high-band antenna assembly for enabling the multiband antenna to achieve optimal operation performance without causing the three antenna assemblies to interfere with one another.
    Type: Application
    Filed: July 3, 2014
    Publication date: November 12, 2015
    Inventor: CHIA- KANG CHAO
  • Patent number: 9171759
    Abstract: A semiconductor wafer having a plurality of chip die areas arranged on a wafer in an array, each chip die area including a seal ring area with one or more first sets of polygonal structures. The wafer further comprises scribe line areas between the chip die areas, the scribe line areas including one or more second sets of polygonal structures. The presence of proximate polygonal structures between the scribe line and seal ring areas balance stresses between the chip die areas during wafer dicing operation.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: October 27, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Pin Cheng, Jung-Liang Chien, Chih-Kang Chao, Chi-Cherng Jeng, Hsin-Chi Chen, Ying-Lang Wang
  • Patent number: 9142588
    Abstract: A die includes a first plurality of edges, and a semiconductor substrate in the die. The semiconductor substrate includes a first portion including a second plurality of edges misaligned with respective ones of the first plurality of edges. The semiconductor substrate further includes a second portion extending from one of the second plurality of edges to one of the first plurality of edges of the die. The second portion includes a first end connected to the one of the second plurality of edges, and a second end having an edge aligned to the one of the first plurality of edges of the die.
    Type: Grant
    Filed: October 28, 2014
    Date of Patent: September 22, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-I Cheng, Chih-Mu Huang, Pin Chia Su, Chi-Cherng Jeng, Volume Chien, Chih-Kang Chao