Patents by Inventor Karl Heinz Schuster
Karl Heinz Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10606078Abstract: An optical element for a display device that can be placed on the head of a user and generate an image as a virtual image. The optical element having a first part, which comprises an optically effective structure, and a second part connected to one another by an adhesive composition comprising a ultra material. The first part material comprises one or more cycloolefin polymers, the first and third material are different from one another, and the second part material and third material in each case comprise at least one organic polymer. The refractive index differences for at least one wavelength between 380 nm and 800 am between the first and the second material and between the second and the third material are in each case ?0.02. The method of producing the optical element and the display device comprising the optical element are also provided.Type: GrantFiled: February 3, 2016Date of Patent: March 31, 2020Assignee: TOOZ TECHNOLOGIES GMBHInventor: Karl-Heinz Schuster
-
Patent number: 10345710Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: GrantFiled: August 29, 2016Date of Patent: July 9, 2019Assignee: Carl Zeiss SMT GmbHInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
-
Patent number: 10337850Abstract: A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). The measurement arrangement furthermore includes a reflective optical element (30) that back-reflects the reference wave (28) and a capture device (36) that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (28), in each case after a further diffraction at the diffractive optical element in a capture plane (48).Type: GrantFiled: November 22, 2017Date of Patent: July 2, 2019Assignee: CARL ZEISS SMT GMBHInventors: Jochen Hetzler, Sebastian Fuchs, Hans-Michael Stiepan, Karl-Heinz Schuster
-
Publication number: 20180106591Abstract: A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). The measurement arrangement furthermore includes a reflective optical element (30) that back-reflects the reference wave (28) and a capture device (36) that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (28), in each case after a further diffraction at the diffractive optical element in a capture plane (48).Type: ApplicationFiled: November 22, 2017Publication date: April 19, 2018Inventors: Jochen HETZLER, Sebastian FUCHS, Hans-Michael STIEPAN, Karl-Heinz SCHUSTER
-
Publication number: 20180031839Abstract: An optical element for a display device that can be placed on the head of a user and generate an image as a virtual image. The optical element having a first part, which comprises an optically effective structure, and a second part connected to one another by an adhesive composition comprising a ultra material. The first part material comprises one or more cycloolefin polymers, the first and third material are different from one another, and the second part material and third material in each case comprise at least one organic polymer. The refractive index differences for at least one wavelength between 380 nm and 800 am between the first and the second material and between the second and the third material are in each case ?0.02. The method of producing the optical element and the display device comprising the optical element are also provided.Type: ApplicationFiled: February 3, 2016Publication date: February 1, 2018Applicant: Carl Zeiss Smart Optics GmbHInventor: Karl-Heinz Schuster
-
Publication number: 20170082930Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: ApplicationFiled: August 29, 2016Publication date: March 23, 2017Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
-
Patent number: 9436095Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: GrantFiled: November 20, 2012Date of Patent: September 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
-
Publication number: 20160161852Abstract: A mirror for a microlithographic projection exposure apparatus and a method for processing a mirror. The mirror includes an optically effective surface, a mirror substrate and a multiple layer system configured to reflect electromagnetic radiation with an operational wavelength of the projection exposure apparatus which is incident on the optically effective surface. The multiple layer system has a plurality of reflection layer stacks (16a, 16b, 16c, 26a, 26b), between each of which a respective separation layer (15a, 15b, 15c, 25a, 25b) is arranged. This separation layer is produced from a material which has a melting temperature that is at least 80° C. but less than 300° C.Type: ApplicationFiled: January 13, 2016Publication date: June 9, 2016Inventors: Karl-Heinz SCHUSTER, Boris BITTNER, Norbert WABRA, Sonja SCHNEIDER, Ricarda SCHNEIDER, Hendrik WAGNER, Christian WALD, Walter PAULS, Holger SCHMIDT
-
Publication number: 20160131980Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.Type: ApplicationFiled: September 14, 2015Publication date: May 12, 2016Inventors: Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski
-
Patent number: 8786849Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.Type: GrantFiled: June 7, 2013Date of Patent: July 22, 2014Assignee: Carl Zeiss SMT GmbHInventors: Thomas Korb, Christian Hettich, Michael Layh, Ulrich Wegmann, Karl-Heinz Schuster, Matthias Manger
-
Publication number: 20130271749Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.Type: ApplicationFiled: June 7, 2013Publication date: October 17, 2013Inventors: Thomas KORB, Christian HETTICH, Michael LAYH, Ulrich WEGMANN, Karl-Heinz SCHUSTER, Matthias MANGER
-
Patent number: 8330935Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: GrantFiled: February 9, 2010Date of Patent: December 11, 2012Assignee: Carl Zeiss SMT GmbHInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
-
Patent number: 8325426Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: GrantFiled: June 9, 2011Date of Patent: December 4, 2012Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Patent number: 8068279Abstract: The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.Type: GrantFiled: March 13, 2007Date of Patent: November 29, 2011Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Juergen Hartmaier, Manfred Maul, Dieter Schmerek, Detlev Mueller, Otto Hahnemann, Frank Marianek, Gundula Weiss, Damian Fiolka
-
Patent number: 8049973Abstract: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.Type: GrantFiled: May 7, 2010Date of Patent: November 1, 2011Assignee: Carl Zeiss SMT GmbHInventor: Karl-Heinz Schuster
-
Publication number: 20110235013Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: ApplicationFiled: June 9, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Patent number: 8023104Abstract: Microlithographic projection exposure apparatuses, as well as related components, subsystems and methods are disclosed.Type: GrantFiled: January 9, 2008Date of Patent: September 20, 2011Assignee: Carl Zeiss SMT GmbHInventor: Karl-Heinz Schuster
-
Patent number: 7982969Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: GrantFiled: December 9, 2008Date of Patent: July 19, 2011Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Patent number: RE42570Abstract: An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The cutouts in the mirrors (B1, B2) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (27, 33). The position of the entry and exit pupils can be corrected with aspherical lens surfaces (12, 48, 53) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces (66, 78) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces (172, 173) form additional correction possibilities.Type: GrantFiled: October 7, 2005Date of Patent: July 26, 2011Assignee: Carl Zeiss SMT GmbHInventor: Karl Heinz Schuster
-
Patent number: RE44216Abstract: An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.Type: GrantFiled: October 23, 2009Date of Patent: May 14, 2013Assignee: Carl Zeiss SMS GmbHInventors: Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl, Wolfgang Harnisch, Norbert Rosenkranz, Ulrich Matejka