Patents by Inventor Kartik Shah

Kartik Shah has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230330187
    Abstract: The disclosure describes the use of compositions comprising ghrelin or ghrelin variant to improve dose intensity, dose frequency, duration of use, reduced toxicity, and/or patient compliance of chemotherapeutic agents.
    Type: Application
    Filed: November 4, 2022
    Publication date: October 19, 2023
    Inventors: Tony REID, Kartik SHAH
  • Publication number: 20230317416
    Abstract: Plasma showerheads with improved gas uniformity are disclosed. One or more embodiment of the disclosure provides a plasma showerhead with angled gas nozzles. Some embodiments of the disclosure have gas nozzles angled by a vertical offset angle and/or a directional offset angle. None of the gas channels and/or the gas nozzles intersect with the plasma regions of the showerhead.
    Type: Application
    Filed: April 1, 2022
    Publication date: October 5, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Chaowei Wang, Kenneth Brian Doering, Hanhong Chen, Kartik Shah, Kevin Griffin, Hao Zhang
  • Publication number: 20230282454
    Abstract: Processing chambers, substrate supports and thermal shields are described. A thermal shield comprises a disc-shaped body having a thickness, an outer diameter with a first edge and a second edge at opposite ends of a diameter of the disc-shaped body, a front surface and a back surface defining the thickness. The front surface has a first longitudinal region comprising the first edge and a second longitudinal region comprising the second edge. Coating one or more of the first longitudinal region or the second longitudinal region with an emissivity material (i.e., emissivity) reduces side to side temperature variation. In some embodiments, processing chambers having the thermal shield described herein consume less power than comparative processing chambers that do not include a thermal shield.
    Type: Application
    Filed: March 2, 2022
    Publication date: September 7, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Youngki Chang, Muhannad Mustafa, Kartik Shah, Dhritiman Subha Kashyap, Dhivanraj Subramanian
  • Patent number: 11732355
    Abstract: The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: August 22, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Vishwas Kumar Pandey, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Agus Sofian Tjandra, Tobin Kaufman-Osborn, Taewan Kim, Hansel Lo
  • Patent number: 11735447
    Abstract: Embodiments disclosed herein include a processing tool for semiconductor processing. In an embodiment, the processing tool comprises a chamber, and a plurality of witness sensors integrated with the chamber. In an embodiment, the processing tool further comprises a drift detection module. In an embodiment, data from the plurality of witness sensors is provided to the drift detection module as input data. In an embodiment, the processing tool further comprises a dashboard for displaying output data from the drift detection module.
    Type: Grant
    Filed: October 20, 2020
    Date of Patent: August 22, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Kartik Santhanam, Kartik Shah, Wolfgang Aderhold, Martin Hilkene, Stephen Moffatt
  • Patent number: 11697875
    Abstract: The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: July 11, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Vishwas Kumar Pandey, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Agus Sofian Tjandra, Tobin Kaufman-Osborn, Taewan Kim, Hansel Lo
  • Publication number: 20230167543
    Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
    Type: Application
    Filed: January 26, 2023
    Publication date: June 1, 2023
    Inventors: Mats LARSSON, Kevin A. PAPKE, Chirag Shaileshbhai KHAIRNAR, Rajasekhar PATIBANDLA, Karthikeyan BALARAMAN, Balamurugan RAMASAMY, Kartik SHAH, Umesh M. KELKAR
  • Publication number: 20230083680
    Abstract: A natural pasta-filata style cheese with improved textural attributes achieved by altering various natural cheesemaking parameters.
    Type: Application
    Filed: November 22, 2022
    Publication date: March 16, 2023
    Inventors: Kartik Shah, Mihir Sainani, Donald J. McMahon
  • Publication number: 20230078565
    Abstract: A natural pasta filata style cheese with improved textural attributes achieved by altering various natural cheesemaking parameters.
    Type: Application
    Filed: November 18, 2022
    Publication date: March 16, 2023
    Inventors: Kartik Shah, Mihir Sainani, Donald J. McMahon
  • Patent number: 11591689
    Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: February 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Mats Larsson, Kevin A. Papke, Chirag Shaileshbhai Khairnar, Rajasekhar Patibandla, Karthikeyan Balaraman, Balamurugan Ramasamy, Kartik Shah, Umesh M. Kelkar
  • Patent number: 11584993
    Abstract: Gas distribution assemblies and methods for providing a flow of gases to a process station are described. The gas distribution assemblies comprise a pumping liner with a showerhead and a gas funnel positioned therein. The pumping liner has an inner wall that slants at a first angle relative to a central axis of the gas distribution assembly so that the inner wall adjacent the bottom wall of the pumping liner is closer to the central axis than the inner wall adjacent the top wall. The gas funnel and pumping liner form a plenum between the outer wall of the gas funnel, a cavity in the bottom wall of the gas funnel and the inner wall of the pumping liner.
    Type: Grant
    Filed: October 19, 2020
    Date of Patent: February 21, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Kenneth Brian Doering, Dhritiman Subha Kashyap, Kartik Shah
  • Patent number: 11586789
    Abstract: Methods, software systems and processes to develop surrogate model-based optimizers for controlling and optimizing flow and pressure of purges between a showerhead and a heater having a substrate support to control non-uniformity inherent in a processing chamber due to geometric configuration and process regimes. The flow optimizer process utilizes experimental data from optimal process space coverage models, generated simulation data and statistical machine learning tools (i.e. regression models and global optimizers) to predict optimal flow rates for any user-specified process regime.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: February 21, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dhritiman Subha Kashyap, Chaowei Wang, Kartik Shah, Kevin Griffin, Karthik Ramanathan, Hanhong Chen, Joseph AuBuchon, Sanjeev Baluja
  • Publication number: 20230031262
    Abstract: Disclosed are methods for mitigating one or more debilitating symptoms of a mTBI for a patient diagnosed with sustained mTBI. These methods comprise administering an effective amount of ghrelin or a variant thereof over multiple consecutive days after the diagnosis of a sustained mTBI.
    Type: Application
    Filed: December 22, 2020
    Publication date: February 2, 2023
    Inventors: Vishal BANSAL, Kartik SHAH, Michael WYAND
  • Publication number: 20230027683
    Abstract: Embodiments described herein generally relate to apparatus for fabricating semiconductor devices. A gas injection apparatus is coupled to a first gas source and a second gas source. Gases from the first gas source and second gas source may remain separated until the gases enter a process volume in a process chamber. A coolant is flowed through a channel in the gas injection apparatus to cool the first gas and the second gas in the gas injection apparatus. The coolant functions to prevent thermal decomposition of the gases by mitigating the influence of thermal radiation from the process chamber. In one embodiment, the channel surrounds a first conduit with the first gas and a second conduit with the second gas.
    Type: Application
    Filed: October 6, 2022
    Publication date: January 26, 2023
    Inventors: Shu-Kwan LAU, Lit Ping LAM, Preetham RAO, Kartik SHAH, Ian ONG, Nyi O. MYO, Brian H. BURROWS
  • Publication number: 20230028054
    Abstract: A gas injector for processing a substrate includes a body having an inlet connectable to a gas source that is configured to provide a gas flow in a first direction into the inlet when processing a substrate on a substrate support disposed within a processing volume of a processing chamber, and an a gas injection channel formed in the body. The gas injection channel is in fluid communication with the inlet and configured to deliver the gas flow to an inlet of the processing chamber. The gas injection channel has a first interior surface and a second interior surface that are parallel to a second direction and a third direction. The second and third directions are misaligned with a center of the substrate, and are at an angle to the first direction towards a first edge of the substrate support.
    Type: Application
    Filed: September 30, 2022
    Publication date: January 26, 2023
    Inventors: Eric Kihara SHONO, Vishwas Kumar PANDEY, Christopher S. OLSEN, Kartik SHAH, Hansel LO, Tobin KAUFMAN-OSBORN, Rene GEORGE, Lara HAWRYLCHAK, Erika HANSEN
  • Publication number: 20230008986
    Abstract: Gas injector with a vacuum channel having an inlet opening in the front face and an outlet opening in the back face of the injector are described. The vacuum channel comprises a first leg extending a first length from the inlet opening in the front face at a first angle relative to the front face and a second leg extending a second length from the first leg to the outlet opening in the back face at a second angle relative to the front face. Processing chambers and methods of use comprising a plurality of processing regions bounded around an outer peripheral edge by one or more vacuum channel. A first processing region has a first vacuum channel with a first outer diameter and a second processing region has a second vacuum channel with a second outer diameter, the first outer diameter being less than the second outer diameter.
    Type: Application
    Filed: July 11, 2022
    Publication date: January 12, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Prahallad Iyengar, Sanjeev Baluja, Kartik Shah, Chaowei Wang, Janisht Golcha, Eric J. Hoffmann, Joseph AuBuchon, Ashutosh Agarwal, Lin Sun, Cong Trinh
  • Patent number: 11549183
    Abstract: Provided are gas distribution apparatus with a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region; a first inlet in fluid communication with the center region of the gas volume, the inlet having an inside and an outside; and a mixer disposed on the inside of the inlet to increase gas flow temperature. Also provided are processing chamber apparatus and methods of depositing a film.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: January 10, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Ashutosh Agarwal, Sanjeev Baluja, Dhritiman Subha Kashyap, Kartik Shah, Yanjun Xia
  • Publication number: 20230000098
    Abstract: The invention relates to a method of making natural cheese with a flavor ferment to tune flavor attributes.
    Type: Application
    Filed: September 6, 2022
    Publication date: January 5, 2023
    Inventors: Mihir Sainani, Kartik Shah, Eva-Maria Düsterhöft, Willem Johannes Marie Engels
  • Publication number: 20220411927
    Abstract: Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.
    Type: Application
    Filed: September 9, 2020
    Publication date: December 29, 2022
    Inventors: Vishwas Kumar PANDEY, Christopher OLSEN, Rene GEORGE, Eric SHONO, Lara HAWRYLCHAK, Erika HANSEN, Tobin KAUFMAN-OSBORN, Hansel LO, Kartik SHAH
  • Patent number: 11529592
    Abstract: Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.
    Type: Grant
    Filed: July 1, 2021
    Date of Patent: December 20, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Sairaju Tallavarjula, Kailash Pradhan, Rene George, Johanes F. Swenberg, Stephen Moffatt