Patents by Inventor Kartik Shah
Kartik Shah has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11584993Abstract: Gas distribution assemblies and methods for providing a flow of gases to a process station are described. The gas distribution assemblies comprise a pumping liner with a showerhead and a gas funnel positioned therein. The pumping liner has an inner wall that slants at a first angle relative to a central axis of the gas distribution assembly so that the inner wall adjacent the bottom wall of the pumping liner is closer to the central axis than the inner wall adjacent the top wall. The gas funnel and pumping liner form a plenum between the outer wall of the gas funnel, a cavity in the bottom wall of the gas funnel and the inner wall of the pumping liner.Type: GrantFiled: October 19, 2020Date of Patent: February 21, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Jared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Kenneth Brian Doering, Dhritiman Subha Kashyap, Kartik Shah
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Patent number: 11586789Abstract: Methods, software systems and processes to develop surrogate model-based optimizers for controlling and optimizing flow and pressure of purges between a showerhead and a heater having a substrate support to control non-uniformity inherent in a processing chamber due to geometric configuration and process regimes. The flow optimizer process utilizes experimental data from optimal process space coverage models, generated simulation data and statistical machine learning tools (i.e. regression models and global optimizers) to predict optimal flow rates for any user-specified process regime.Type: GrantFiled: April 7, 2021Date of Patent: February 21, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Dhritiman Subha Kashyap, Chaowei Wang, Kartik Shah, Kevin Griffin, Karthik Ramanathan, Hanhong Chen, Joseph AuBuchon, Sanjeev Baluja
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Publication number: 20230031262Abstract: Disclosed are methods for mitigating one or more debilitating symptoms of a mTBI for a patient diagnosed with sustained mTBI. These methods comprise administering an effective amount of ghrelin or a variant thereof over multiple consecutive days after the diagnosis of a sustained mTBI.Type: ApplicationFiled: December 22, 2020Publication date: February 2, 2023Inventors: Vishal BANSAL, Kartik SHAH, Michael WYAND
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Publication number: 20230028054Abstract: A gas injector for processing a substrate includes a body having an inlet connectable to a gas source that is configured to provide a gas flow in a first direction into the inlet when processing a substrate on a substrate support disposed within a processing volume of a processing chamber, and an a gas injection channel formed in the body. The gas injection channel is in fluid communication with the inlet and configured to deliver the gas flow to an inlet of the processing chamber. The gas injection channel has a first interior surface and a second interior surface that are parallel to a second direction and a third direction. The second and third directions are misaligned with a center of the substrate, and are at an angle to the first direction towards a first edge of the substrate support.Type: ApplicationFiled: September 30, 2022Publication date: January 26, 2023Inventors: Eric Kihara SHONO, Vishwas Kumar PANDEY, Christopher S. OLSEN, Kartik SHAH, Hansel LO, Tobin KAUFMAN-OSBORN, Rene GEORGE, Lara HAWRYLCHAK, Erika HANSEN
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Publication number: 20230027683Abstract: Embodiments described herein generally relate to apparatus for fabricating semiconductor devices. A gas injection apparatus is coupled to a first gas source and a second gas source. Gases from the first gas source and second gas source may remain separated until the gases enter a process volume in a process chamber. A coolant is flowed through a channel in the gas injection apparatus to cool the first gas and the second gas in the gas injection apparatus. The coolant functions to prevent thermal decomposition of the gases by mitigating the influence of thermal radiation from the process chamber. In one embodiment, the channel surrounds a first conduit with the first gas and a second conduit with the second gas.Type: ApplicationFiled: October 6, 2022Publication date: January 26, 2023Inventors: Shu-Kwan LAU, Lit Ping LAM, Preetham RAO, Kartik SHAH, Ian ONG, Nyi O. MYO, Brian H. BURROWS
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Publication number: 20230008986Abstract: Gas injector with a vacuum channel having an inlet opening in the front face and an outlet opening in the back face of the injector are described. The vacuum channel comprises a first leg extending a first length from the inlet opening in the front face at a first angle relative to the front face and a second leg extending a second length from the first leg to the outlet opening in the back face at a second angle relative to the front face. Processing chambers and methods of use comprising a plurality of processing regions bounded around an outer peripheral edge by one or more vacuum channel. A first processing region has a first vacuum channel with a first outer diameter and a second processing region has a second vacuum channel with a second outer diameter, the first outer diameter being less than the second outer diameter.Type: ApplicationFiled: July 11, 2022Publication date: January 12, 2023Applicant: Applied Materials, Inc.Inventors: Prahallad Iyengar, Sanjeev Baluja, Kartik Shah, Chaowei Wang, Janisht Golcha, Eric J. Hoffmann, Joseph AuBuchon, Ashutosh Agarwal, Lin Sun, Cong Trinh
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Patent number: 11549183Abstract: Provided are gas distribution apparatus with a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region; a first inlet in fluid communication with the center region of the gas volume, the inlet having an inside and an outside; and a mixer disposed on the inside of the inlet to increase gas flow temperature. Also provided are processing chamber apparatus and methods of depositing a film.Type: GrantFiled: May 18, 2020Date of Patent: January 10, 2023Assignee: Applied Materials, Inc.Inventors: Ashutosh Agarwal, Sanjeev Baluja, Dhritiman Subha Kashyap, Kartik Shah, Yanjun Xia
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Publication number: 20230000098Abstract: The invention relates to a method of making natural cheese with a flavor ferment to tune flavor attributes.Type: ApplicationFiled: September 6, 2022Publication date: January 5, 2023Inventors: Mihir Sainani, Kartik Shah, Eva-Maria Düsterhöft, Willem Johannes Marie Engels
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Publication number: 20220411927Abstract: Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.Type: ApplicationFiled: September 9, 2020Publication date: December 29, 2022Inventors: Vishwas Kumar PANDEY, Christopher OLSEN, Rene GEORGE, Eric SHONO, Lara HAWRYLCHAK, Erika HANSEN, Tobin KAUFMAN-OSBORN, Hansel LO, Kartik SHAH
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Patent number: 11529592Abstract: Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.Type: GrantFiled: July 1, 2021Date of Patent: December 20, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Sairaju Tallavarjula, Kailash Pradhan, Rene George, Johanes F. Swenberg, Stephen Moffatt
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Patent number: 11515129Abstract: An example semiconductor processing system may include a chamber body having sidewalls and a base. The processing system may also include a substrate support extending through the base of the chamber body. The substrate support may include a support platen configured to support a semiconductor substrate, and a shaft coupled with the support platen. The processing system may further include a plate coupled with the shaft of the substrate support. The plate may have an emissivity greater than 0.5. In some embodiments, the plate may include a radiation shied disposed proximate the support platen. In some embodiments, the plate may include a pumping plate disposed proximate the base of the chamber body. In some embodiments, the emissivity of the plate may range between about 0.5 and about 0.95.Type: GrantFiled: December 3, 2019Date of Patent: November 29, 2022Assignee: Applied Materials, Inc.Inventors: Elizabeth Neville, Satish Radhakrishnan, Kartik Shah, Vinay Prabhakar, Venkata Sharat Chandra Parimi, Sungwon Ha
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Patent number: 11510416Abstract: A natural pasta filata style cheese with improved textural attributes achieved by altering various natural cheeses raking parameters.Type: GrantFiled: February 18, 2021Date of Patent: November 29, 2022Assignee: Sargento Foods Inc.Inventors: Kartik Shah, Mihir Sainani, Donald J. McMahon
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Patent number: 11501954Abstract: Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first side, and a flow assembly disposed in the first side. The flow assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the processing chamber. The flow divider includes a crescent shaped first side, a top, and a bottom. The processing chamber also includes a distributed pumping structure located adjacent to the second side. The flow assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux.Type: GrantFiled: May 19, 2021Date of Patent: November 15, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Vishwas Kumar Pandey, Kartik Shah, Christopher S. Olsen, Agus Sofian Tjandra, Hansel Lo, Eric Kihara Shono, Hemantha Raju
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Patent number: 11492704Abstract: Embodiments described herein generally relate to apparatus for fabricating semiconductor devices. A gas injection apparatus is coupled to a first gas source and a second gas source. Gases from the first gas source and second gas source may remain separated until the gases enter a process volume in a process chamber. A coolant is flowed through a channel in the gas injection apparatus to cool the first gas and the second gas in the gas injection apparatus. The coolant functions to prevent thermal decomposition of the gases by mitigating the influence of thermal radiation from the process chamber. In one embodiment, the channel surrounds a first conduit with the first gas and a second conduit with the second gas.Type: GrantFiled: August 13, 2019Date of Patent: November 8, 2022Assignee: Applied Materials, Inc.Inventors: Shu-Kwan Lau, Lit Ping Lam, Preetham Rao, Kartik Shah, Ian Ong, Nyi O. Myo, Brian H. Burrows
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Patent number: 11486038Abstract: A gas injector for processing a substrate includes a body having an inlet connectable to a gas source that is configured to provide a gas flow in a first direction into the inlet when processing a substrate on a substrate support disposed within a processing volume of a processing chamber, and an a gas injection channel formed in the body. The gas injection channel is in fluid communication with the inlet and configured to deliver the gas flow to an inlet of the processing chamber. The gas injection channel has a first interior surface and a second interior surface that are parallel to a second direction and a third direction. The second and third directions do not intersect a center of the substrate, and are at an angle to the first direction towards a first edge of the substrate support.Type: GrantFiled: January 29, 2020Date of Patent: November 1, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Eric Kihara Shono, Vishwas Kumar Pandey, Christopher S. Olsen, Kartik Shah, Hansel Lo, Tobin Kaufman-Osborn, Rene George, Lara Hawrylchak, Erika Hansen
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Publication number: 20220334569Abstract: A method including receiving, by a processing device, a first selection of at least one of a first fabrication process or first manufacturing equipment to perform manufacturing operations of the first fabrication process. The method can further include inputting the first selection into a digital replica of the first manufacturing equipment wherein the digital replica outputs physical conditions of the first fabrication process. The method may further include determining environmental resource usage data indicative of a first environmental resource consumption of the first fabrication process run on the first manufacturing equipment based on the physical conditions of the first fabrication process. The processing device may further determine a modification to the first fabrication process that reduces the environmental resource consumption of the first fabrication process run on the first manufacturing equipment.Type: ApplicationFiled: April 14, 2021Publication date: October 20, 2022Inventors: Ala Moradian, Elizabeth Neville, Umesh Madhav Kelkar, Mark R. Denome, Prashanth Kothnur, Karthik Ramanathan, Kartik Shah, Orlando Trejo, Sergey Meirovich
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Publication number: 20220327262Abstract: Methods, software systems and processes to develop surrogate model-based optimizers for controlling and optimizing flow and pressure of purges between a showerhead and a heater having a substrate support to control non-uniformity inherent in a processing chamber due to geometric configuration and process regimes. The flow optimizer process utilizes experimental data from optimal process space coverage models, generated simulation data and statistical machine learning tools (i.e. regression models and global optimizers) to predict optimal flow rates for any user-specified process regime.Type: ApplicationFiled: April 7, 2021Publication date: October 13, 2022Applicant: Applied Materials, Inc.Inventors: Dhritiman Subha Kashyap, Chaowei Wang, Kartik Shah, Kevin Griffin, Karthik Ramanathan, Hanhong Chen, Joseph AuBuchon, Sanjeev Baluja
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Publication number: 20220312553Abstract: A heater assembly having a backside purge gap formed between a top plate and a heater of the heater assembly, the top plate having a top plate wall. The top plate wall having an upper portion, a middle portion and a lower portion, the middle portion forming an incline relative to the top portion.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Applicant: Applied Materials, Inc.Inventors: Dhritiman Subha Kashyap, Amit Rajendra Sherekar, Kartik Shah, Ashutosh Agarwal, Eric J. Hoffmann, Sanjeev Baluja, Vijay D. Parkhe
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Publication number: 20220245307Abstract: Embodiments described herein include processes for generating a hybrid model for modeling processes in semiconductor processing equipment. In a particular embodiment, method of creating a hybrid machine learning model comprises identifying a first set of cases spanning a first range of process and/or hardware parameters, and running experiments in a lab for the first set of cases. The method may further comprise compiling experimental outputs from the experiments, and running physics based simulations for the first set of cases. In an embodiment, the method may further comprise compiling model outputs from the simulations, and correlating the model outputs with the experimental outputs with a machine learning algorithm to provide the hybrid machine learning model.Type: ApplicationFiled: February 3, 2021Publication date: August 4, 2022Inventors: Prashanth Kothnur, Karthik Ramanathan, Ajit Balakrishna, Kartik Shah, Umesh Kelkar, Vishwas Pandey, Prasoon Shukla, Sushil Arun Samant
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Publication number: 20220119948Abstract: Gas distribution assemblies and methods for providing a flow of gases to a process station are described. The gas distribution assemblies comprise a pumping liner with a showerhead and a gas funnel positioned therein. The pumping liner has an inner wall that slants at a first angle relative to a central axis of the gas distribution assembly so that the inner wall adjacent the bottom wall of the pumping liner is closer to the central axis than the inner wall adjacent the top wall. The gas funnel and pumping liner form a plenum between the outer wall of the gas funnel, a cavity in the bottom wall of the gas funnel and the inner wall of the pumping liner.Type: ApplicationFiled: October 19, 2020Publication date: April 21, 2022Applicant: Applied Materials, Inc.Inventors: Jared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Kenneth Brian Doering, Dhritiman Subha Kashyap, Kartik Shah