Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10, —O-L1-CO—O—R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, etc.; and AI? represents an organic anion.

Abstract: Disclosed are a salt represented by formula (1), an acid generator, and a resist composition: wherein Q1, Q2, R1 and R2 each represent a hydrogen atom, a fluorine atom, an alkyl group, etc.; z represents an integer of 0 to 6; X1 represents *—CO—O—, *—O—CO—, etc.; L1 and L2 each represent a single bond or an aliphatic hydrocarbon group; Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group; R3 represents *—O— R10, *—O—CO—R10, etc., and R10 represents an acid-labile group; R4 represents a halogen atom, a haloalkyl group, or a hydrocarbon group; and m4 represents an integer of 0 to 8; and Z+ represent an organic cation.

Abstract: Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition: wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group, R3 represents *—O—R10, *—O—CO—R10, etc., R10 represents an acid-labile group, R4 represents a halogen atom, a haloalkyl group or a hydrocarbon group, the hydrocarbon group may have a substituent, —CH2— included in the haloalkyl group and the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, m4 represents an integer of 0 to 8, and Z+ represents an organic cation.

Abstract: A salt represented by formula (I), a generator and a resist composition: wherein R1 and R2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO2—; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5; and AI? represents an organic anion.

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O—CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5; and AI? represents an organic anion.

Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10, L1 represents an alkanediyl group, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R10 represents an acid-labile group, X1, X2 and X3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5, and AI? represents an organic anion.

Abstract: A salt represented by the formula (I):

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, —CH2— included in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ? m1 + m7 ? 5, 0 ? m2 + m8 ? 4, 0 ? m3 + m9 ? 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X7 represents a single bond, —CH2—, —O—, —S—, etc., and Al— represents an organic anion.

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5, and AI? represents an organic anion.

Abstract: Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition including the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc., A1 and A2 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, —SO2—, etc., X3 and X4 each represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, and AI? represents an organic anion.

Abstract: Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), an acid generator, and a resist composition comprising the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent a hydrocarbon group, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; ml represents an integer of 1 to 5, m2, m4, m5 and m8 represent an integer of 0 to 5, m7 represents an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5; and AI? represents an organic anion.

Abstract: Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A1 represents a single bond or *-A2-CO—O—; A2 and A3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R2 and R3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R4 represents a hydrogen atom, —CH2— in the group may be replaced by —O—, —S—, etc., R2 and R3, or R2, R3 and R4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.

Abstract: Disclosed are a salt represented by formula (I), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R1 and R2 each represent a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R4 and/or a plurality of R5 may be the same or different from each other.

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O-L10-CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4 to R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, etc.; and Al? represents an organic anion.

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same: wherein R1 and R2 each represent a hydroxy group, *—O—R10, *—O-L10-CO—O—R10; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent a hydrocarbon group, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5; and AI? represents an organic anion.

Abstract: Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI? represents an organic anion.

Abstract: A salt represented by formula (I): wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI? represents an organic anion.

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R1, R2 and R3 each represent a hydroxy group, *—O—R10, *—O—CO—O—R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5; and AI? represents an organic anion.

Abstract: A compound represented by the formula (I):

Abstract: Provided are a salt capable of producing a resist pattern with satisfactory line edge roughness (LER), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same: wherein, in formula (I), R4, R3, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 represents an integer of 1 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 5, and m7 represents an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5; and AI? represents an organic anion.