Patents by Inventor Katsuhiro Komuro

Katsuhiro Komuro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11429025
    Abstract: A salt represented by formula (I), a quencher, and a resist composition including the same: wherein R1, R2, R3 and R4 each represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; and m1, m2, m3 and m4 represent an integer of 0 to 4. When m1 is 2 or more, a plurality of R1 may be the same or different from each other. When m2 is 2 or more, a plurality of R2 may be the same or different from each other. When m3 is 2 or more, a plurality of R3 may be the same or different from each other. When m4 is 2 or more, a plurality of R4 may be the same or different from each other.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: August 30, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Yuki Takahashi, Koji Ichikawa
  • Patent number: 11385542
    Abstract: A salt is represented by formula (I). In formula (I), R1, R2 and R3 each independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other, m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of R2 may be the same or different from each other, and m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of R3 may be the same or different from each other.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: July 12, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Yuki Takahashi, Koji Ichikawa
  • Publication number: 20220011667
    Abstract: Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent I or F, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X1, X2 and X3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, at least one of m1, m2, m3 represents an integer of 1 or more, X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—, and AI? represents an organic anion.
    Type: Application
    Filed: June 22, 2021
    Publication date: January 13, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20220011668
    Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10, —O-L1-CO—O—R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, etc.; and AI? represents an organic anion.
    Type: Application
    Filed: June 28, 2021
    Publication date: January 13, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20210387944
    Abstract: A salt represented by formula (I), a generator and a resist composition: wherein R1 and R2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO2?; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5; and AI? represents an organic anion.
    Type: Application
    Filed: May 3, 2021
    Publication date: December 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20210371377
    Abstract: A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R1, R2 and R3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X1 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—.
    Type: Application
    Filed: May 3, 2021
    Publication date: December 2, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20210371376
    Abstract: A salt represented by formula (I): wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI? represents an organic anion.
    Type: Application
    Filed: May 18, 2021
    Publication date: December 2, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Jun OGUMA, Koji ICHIKAWA
  • Publication number: 20210341836
    Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10, L1 represents an alkanediyl group, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R10 represents an acid-labile group, X1, X2 and X3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5, and AI? represents an organic anion.
    Type: Application
    Filed: April 16, 2021
    Publication date: November 4, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Takashi NAKAKOJI, Koji ICHIKAWA
  • Publication number: 20210063874
    Abstract: Disclosed are a salt represented by formula (1), a quencher, and a resist composition including the same: wherein R1, R2, R3 and R4 each represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; and m1, m2, m3 and m4 represent an integer of 0 to 4. When m1 is 2 or more, a plurality of R1 may be the same or different from each other. When m2 is 2 or more, a plurality of R2 may be the same or different from each other. When m3 is 2 or more, a plurality of R3 may be the same or different from each other. When m4 is 2 or more, a plurality of R4 may be the same or different from each other.
    Type: Application
    Filed: August 27, 2020
    Publication date: March 4, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20210063875
    Abstract: Disclosed are a salt represented by formula (I), a quencher, and a resist composition including the same:
    Type: Application
    Filed: August 27, 2020
    Publication date: March 4, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Patent number: 10915022
    Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: February 9, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Shingo Fujita, Koji Ichikawa
  • Publication number: 20200385343
    Abstract: Disclosed are a salt represented by formula (1), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R1 and R2 each represent a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R4 and/or a plurality of R5 may be the same or different from each other.
    Type: Application
    Filed: June 2, 2020
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20200387069
    Abstract: Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same: wherein R1, R2 and R3 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, m1, m2 and m3 represent an integer of 0 to 4, and when m1, m2 and/or m3 are 2 or more, a plurality of R1, a plurality of R2 and/or a plurality of R3 may be the same or different from each other, and X1 represents —CO—, —SO— or —SO2—.
    Type: Application
    Filed: June 2, 2020
    Publication date: December 10, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20200363720
    Abstract: Disclosed are a salt represented by formula (I) and a resist composition including the same:
    Type: Application
    Filed: May 14, 2020
    Publication date: November 19, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20200308095
    Abstract: Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A1 represents a single bond or *-A2-CO—O—; A2 and A3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R2 and R3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R4 represents a hydrogen atom, —CH2— in the group may be replaced by —O—, —S—, etc., R2 and R3, or R2, R3 and R4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.
    Type: Application
    Filed: March 23, 2020
    Publication date: October 1, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • Publication number: 20200159116
    Abstract: A salt is represented by formula (I). In formula (I), R1, R2 and R3 each independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other, m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of R2 may be the same or different from each other, and m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of R3 may be the same or different from each other.
    Type: Application
    Filed: November 15, 2019
    Publication date: May 21, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA
  • Publication number: 20190107778
    Abstract: A salt represented by the formula (I):
    Type: Application
    Filed: October 2, 2018
    Publication date: April 11, 2019
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Katsuhiro Komuro, Yuki Takahashi, Koji Ichikawa
  • Publication number: 20180373149
    Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
    Type: Application
    Filed: June 20, 2018
    Publication date: December 27, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Shingo FUJITA, Koji ICHIKAWA
  • Publication number: 20180373146
    Abstract: A compound represented by the formula (I):
    Type: Application
    Filed: June 21, 2018
    Publication date: December 27, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Katsuhiro KOMURO, Koji ICHIKAWA
  • Patent number: 8588975
    Abstract: It is determined whether the first tool identification information that is output from a robot control device, and that indicates a present tool and the second tool identification information for detecting and identifying a tool attached to the robot are unequal to each other. The position coordinates of the taught reference point in an actual space of the robot occurring at the time when the unequalness therebetween is first detected are set as reference coordinates, and a region that contains the reference coordinates is set as a predetermined region. If the position coordinates of the taught reference point have come to exist outside the predetermined region during a period during which it is determined that the foregoing two pieces of information are unequal, an emergency stop signal for causing the robot to be in a safe state is output.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: November 19, 2013
    Assignee: JTEKT Corporation
    Inventors: Katsuhiro Komuro, Toshio Aono