Abstract: A detection element (1A) having a detection electrode (11A) connected to a surface shape detection unit (2) and a detection electrode (12A) connected to a common potential, and a detection element (1B) having a detection electrode (11B) connected to the surface shape detection unit (2) and a detection electrode (12B) connected to a biometric recognition unit (3) are arranged. The surface shape detection unit (2) outputs a signal representing the three-dimensional pattern of the surface shape corresponding to the contact portion to each detection element on the basis of individual capacitances obtained from the detection elements (1A, 1B). The biometric recognition unit (3) determines whether an object (9) is a living body, on the basis of a signal corresponding to the impedance of the object (9) connected between the detection electrode (12B) of the detection element (1B) and the detection electrode (12A) of the detection element (1A).

Abstract: A first control potential setting means (1) generates a first control potential (N2) which reverses the magnitude relationship with a second control potential (N3) when an input signal (IN) reaches the vicinity of a logical threshold value. A second control potential setting means (2) generates the second control potential (N3) which changes in the same direction as the input signal (IN), in accordance with a change in input signal (IN). An output means (3) includes transistors (Q5, Q6), and generates an output signal (OUT) having a predetermined potential on the basis of the first control potential (N2), the second control potential (N3), and a reset signal (RSET). A reset means (4) turns off the transistor (Q6) while a waveform shaping circuit is in operation.

Abstract: This invention includes an image quality priority level decision processing unit (40) which evaluates the magnitude of an image quality of each of a plurality of first image data formed from biometric images associated with the same target on the basis of a specific index having the relationship of a monotone function with authentication accuracy of biometric authentication, and outputs each of the first image data upon adding a priority level thereto on the basis of the evaluation result, a first image storage (6, 81) unit which stores each of the first image data having a priority level added thereto from the image quality priority level decision processing unit (40), a second image storage unit (8, 61) which stores second image data used for comparison/collation with the first image data, an image collation unit (7) which compares/collates the second image data stored in the second image storage unit (8, 61) with the first image data stored in the first image storage unit (6, 81) and outputs the comparison

Abstract: A method of manufacturing a surface shape recognition sensor. A sacrificial film is formed on an interlevel dielectric to cover a lower electrode while keeping an upper portion of a support electrode exposed. An upper electrode is formed on the sacrificial film and support electrode. The sacrificial film is selectively removed and a protective film is formed on the upper electrode. A photosensitive resin film having photosensitivity is formed on the protective film. A plurality of projections are formed in a region of the protective film above a capacitive detection element. In this manner a plurality of capacitive detection elements each having the lower electrode and upper electrode are formed.

Abstract: A surface shape recognition apparatus includes detection circuit, comparison circuit, storage circuit, and control circuit. The detection circuit electrically detects a surface shape pattern in a partial region of the target collation surface of an object using a plurality of sensor elements and outputs detection data representing the surface shape pattern. The comparison circuit compares the detection data from the detection circuit with predetermined collation data and outputs a comparison result. The storage circuit stores template data representing the surface shape pattern of the entire target collation surface, the template data being obtained from the object in advance.

Abstract: An optical switch device includes at least an optical switch element and driving control circuit. In the optical switch element, a fixed electrode portion is arranged, via a dielectric layer, on a semiconductor substrate on which an integrated circuit is formed. A mirror structure has a plate-shaped movable portion arranged above the fixed electrode portion while opposing the fixed electrode portion. A reflecting portion is formed at least at part of the movable portion to reflect light. A support member is fixed around the fixed electrode portion on the semiconductor substrate via a dielectric layer and supports the mirror structure. The driving control circuit is incorporated in the integrated circuit to drive the optical switch element by applying a predetermined potential to the movable portion and fixed electrode portion.

Abstract: A surface shape recognition sensor of this invention has a surface protective film having a hydrophobic property on an insulating protective film which is made of an insulator and formed to cover a sensor electrode, and includes at least a ground electrode which is formed on the substrate such that the ground electrode is partly exposed on the surfaces of the insulating protective film and surface protective film so as to be insulated/isolated from the sensor electrode and come into contact with the surface of a detection target. This sensor prevents fingerprint residues from easily remaining and improves tamper resistance.

Abstract: A micromachine manufacturing method according to this invention includes at least the movable portion formation step of selectively etching a single-crystal silicon layer by using a movable portion formation mask pattern as a mask, thereby forming on the single-crystal silicon layer a movable portion which is coupled to the surrounding single-crystal silicon layer via a coupling portion on a buried oxide, the movable portion protective film formation step of forming a movable portion protective film on the single-crystal silicon layer so as to cover the movable portion while the movable portion is formed on the buried oxide, and the step of forming a buried protective film which covers the movable portion exposed in the substrate opening and movable portion opening, and the single-crystal silicon layer around the movable portion while the movable portion protective film is formed.

Abstract: A parallel-processing apparatus includes a plurality of cells, variable-delay circuits, a signal output unit, a delay counter, and an accumulation unit. Each cell has a processing circuit for performing arbitrary processing. The variable-delay circuits change the signal propagation delay in accordance with the processing results of the processing circuits. The signal output unit outputs a measurement input signal to the first variable-delay circuit of a variable-delay circuit array. The delay counter receives the measurement input signal output form the signal output unit and a measurement output signal output from the variable-delay circuit array, and obtains the signal propagation delay time of the variable-delay circuit array upon the basis of the measurement input and output signals. The accumulation unit accumulates the processing results of the processing circuits. A parallel processing method is also disclosed.

Abstract: A surface shape recognition sensor includes a plurality of capacitive detection elements, a support electrode, and a protective film. The capacitive detection elements are formed from lower electrodes and a deformable plate-like upper electrode made of a metal. The lower electrodes are insulated and isolated from each other and stationarily laid out on a single plane of an interlevel dielectric formed on a semiconductor substrate. The upper electrode is laid out above the lower electrodes at a predetermined interval and has a plurality of opening portions. The support electrode is laid out around the lower electrodes while being insulated and isolated from the lower electrodes, and formed to be higher than the lower electrodes to support the upper electrode. The protective film is formed on the upper electrode to close the opening portions. The opening portions of the upper electrode are laid out in a region other than regions on a main part of the lower electrode and on the support electrode.

Abstract: A micromachine manufacturing method according to this invention includes at least the movable portion formation step of selectively etching a single-crystal silicon layer by using a movable portion formation mask pattern as a mask, thereby forming on the single-crystal silicon layer a movable portion which is coupled to the surrounding single-crystal silicon layer via a coupling portion on a buried oxide, the movable portion protective film formation step of forming a movable portion protective film on the single-crystal silicon layer so as to cover the movable portion while the movable portion is formed on the buried oxide, and the step of forming a buried protective film which covers the movable portion exposed in the substrate opening and movable portion opening, and the single-crystal silicon layer around the movable portion while the movable portion protective film is formed.

Abstract: In a semiconductor device having a MEMS according to this invention, a plurality of units having movable portions for constituting a MEMS are monolithically mounted on a semiconductor substrate on which an integrated circuit including a driving circuit, sensor circuit, memory, and processor is formed. Each unit has a processor, memory, driving circuit, and sensor circuit.

Abstract: A surface shape recognition apparatus includes a plurality of sensor electrodes, passivation film, capacitance detection circuit, and ground electrode. The sensor electrodes are formed on an interlevel insulator on a substrate and insulated from each other. The passivation film is formed on the interlevel insulator to cover the upper and side surfaces of each sensor electrode. The passivation film is formed from a dielectric material. When a target recognition object comes into contact with the surface of the passivation film, the capacitance detection circuit detects an electrostatic capacitance formed between the sensor electrode and the surface of the target recognition object opposing the sensor electrode. The ground electrode passes static electricity on the surface of the passivation film.

Abstract: The fingerprint recognition apparatus of this invention has a plurality of pixel units. Each pixel unit has a fingerprint sensor circuit including a sensor element for converting a three-dimensional pattern of a skin surface of a finger coming into contact with the element into an electrical signal, and a sensor circuit for processing the electrical signal converted by the sensor element and outputting predetermined data. Each pixel unit also has a fingerprint memory in which user's registered fingerprint data and a recognition circuit for collating the fingerprint data detected by the fingerprint sensor circuit with the registered fingerprint data. A control circuit controls the pixel units and totalizes recognition results.

Abstract: In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.

Abstract: In a method of manufacturing a surface shape recognition sensor, first and second interconnections are formed on a semiconductor substrate. An interlayer dielectric film on the semiconductor substrate covers the interconnections. A first metal film is electrically connected to the interconnections through first and second through holes in the interlayer dielectric film. A first mask pattern on the first metal film covers predetermined first and second regions corresponding to the through holes, respectively. The exposed first metal film is selectively removed to form a sensor electrode and connection electrode film, formed of the first metal film, in the first and second regions, respectively. An insulating passivation film on the interlayer dielectric film covers the sensor electrode and connection electrode film. A third through hole in the passivation film reaches the connection electrode film. A second metal film on the passivation film is in contact with the exposed connection electrode film.

Abstract: A surface shape recognition sensor of this invention has a surface protective film having a hydrophobic property on an insulating protective film which is made of an insulator and formed to cover a sensor electrode, and includes at least a ground electrode which is formed on the substrate such that the ground electrode is partly exposed on the surfaces of the insulating protective film and surface protective film so as to be insulated/isolated from the sensor electrode and come into contact with the surface of a detection target. This sensor prevents fingerprint residues from easily remaining and improves tamper resistance.

Abstract: An optical switch device includes at least an optical switch element and driving control circuit. In the optical switch element, a fixed electrode portion is arranged, via a dielectric layer, on a semiconductor substrate on which an integrated circuit is formed. A mirror structure has a plate-shaped movable portion arranged above the fixed electrode portion while opposing the fixed electrode portion. A reflecting portion is formed at least at part of the movable portion to reflect light. A support member is fixed around the fixed electrode portion on the semiconductor substrate via a dielectric layer and supports the mirror structure. The driving control circuit is incorporated in the integrated circuit to drive the optical switch element by applying a predetermined potential to the movable portion and fixed electrode portion.

Abstract: A surface shape recognition sensor includes a plurality of capacitive detection elements, a support electrode, and a protective film. The capacitive detection elements are formed from lower electrodes and a deformable plate-like upper electrode made of a metal. The lower electrodes are insulated and isolated from each other and stationarily laid out on a single plane of an interlevel dielectric formed on a semiconductor substrate. The upper electrode is laid out above the lower electrodes at a predetermined interval and has a plurality of opening portions. The support electrode is laid out around the lower electrodes while being insulated and isolated from the lower electrodes, and formed to be higher than the lower electrodes to support the upper electrode. The protective film is formed on the upper electrode to close the opening portions. The opening portions of the upper electrode are laid out in a region other than regions on a main part of the lower electrode and on the support electrode.

Abstract: A small shape recognizing capacitive sensor device includes detection elements, sensor circuits, and a correction circuit. The detection elements are arranged adjacent to each other. The sensor circuits are connected to the detection elements, respectively. The correction circuit corrects the output signal level of the sensor circuit. The output signal level correction circuit includes a calibration circuit, calibration reference signal generation circuit, and comparison circuit. The calibration circuit is connected to the output side of the sensor circuit. The calibration reference signal generation circuit generates a calibration reference signal. The comparison circuit compares the output from the sensor circuit with the calibration reference signal and supplies the difference output to the calibration circuit as a control signal.