Patents by Inventor Kazuhiko Tsutsumi
Kazuhiko Tsutsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9435703Abstract: A torque sensor includes a magnetism generation portion that rotates together with a first shaft, a rotating magnetic circuit portion that rotates together with a second shaft, a fixed magnetic circuit portion fixed to a housing, a magnetism detector that detects a magnetic flux density guided from the magnetism generation portion to the fixed magnetic circuit portion through the rotating magnetic circuit portion in accordance with torsional deformation of the torsion bar, and a shield disposed between the rotating magnetic circuit portion and the magnetism detector in order to shield the magnetism detector magnetically.Type: GrantFiled: January 31, 2013Date of Patent: September 6, 2016Assignee: KYB CorporationInventors: Hideo Maehara, Ryota Yamada, Kazuhiko Tsutsumi, Takayuki Hayashi
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Publication number: 20150040686Abstract: A torque sensor includes a magnetism generation portion that rotates together with a first shaft, a rotating magnetic circuit portion that rotates together with a second shaft, a fixed magnetic circuit portion fixed to a housing, a magnetism detector that detects a magnetic flux density guided from the magnetism generation portion to the fixed magnetic circuit portion through the rotating magnetic circuit portion in accordance with torsional deformation of the torsion bar, and a shield disposed between the rotating magnetic circuit portion and the magnetism detector in order to shield the magnetism detector magnetically.Type: ApplicationFiled: January 31, 2013Publication date: February 12, 2015Applicant: Kayaba Industry Co., Ltd.Inventors: Hideo Maehara, Ryota Yamada, Kazuhiko Tsutsumi, Takayuki Hayashi
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Patent number: 8783932Abstract: A planar light source device includes a first light source for emitting a first light ray having a punctate spatial luminance distribution; a second light source for emitting a second light ray; a first spatial luminance distribution conversion portion for changing the first light ray to a linear spatial luminance distribution; a second spatial luminance distribution conversion portion for changing a spatial luminance distribution of the first and second light rays to a planar spatial luminance distribution; wherein the first light ray is a laser light; the second light ray has a divergence angle larger than the divergence angle of the first light ray when the first light ray is emitted from the first light source; and a slow-axis direction of the first light ray entering the second spatial luminance distribution conversion portion is parallel to an outgoing direction of the planar light.Type: GrantFiled: April 14, 2011Date of Patent: July 22, 2014Assignee: Mitsubishi Electric CorporationInventors: Rena Nishitani, Tomohiro Sasagawa, Eiji Niikura, Kuniko Kojima, Jun Someya, Hiroaki Sugiura, Kazuhiko Tsutsumi, Akihiro Nagase
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Publication number: 20130033901Abstract: A planar light source device includes a first light source for emitting a first light ray having a punctate spatial luminance distribution; a second light source for emitting a second light ray; a first spatial luminance distribution conversion portion for changing the first light ray to a linear spatial luminance distribution; a second spatial luminance distribution conversion portion for changing a spatial luminance distribution of the first and second light rays to a planar spatial luminance distribution; wherein the first light ray is a laser light; the second light ray has a divergence angle larger than the divergence angle of the first light ray when the first light ray is emitted from the first light source; and a slow-axis direction of the first light ray entering the second spatial luminance distribution conversion portion is parallel to an outgoing direction of the planar light.Type: ApplicationFiled: April 14, 2011Publication date: February 7, 2013Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Rena Nishitani, Tomohiro Sasagawa, Eiji Niikura, Kuniko Kojima, Jun Someya, Hiroaki Sugiura, Kazuhiko Tsutsumi, Akihiro Nagase
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Patent number: 8139157Abstract: A video display apparatus generates luminance information for individual frames of a video signal from histograms of the luminance component of the video signal, and classifies the content of the video signal on the basis of this information. Color saturation information is also generated from color saturation histograms, and scene changes are detected. Video correction parameters and display control parameters are derived from the content classification and color saturation information. The video signal is corrected according to the video correction parameters, and displayed according to the display control parameters. Display characteristics suitable for the video content are thereby obtained. The parameters are changed when a scene change is detected, so that the viewer is not disturbed by the change in video display characteristics.Type: GrantFiled: December 20, 2007Date of Patent: March 20, 2012Assignee: Mitsubishi Electric CorporationInventors: Jun Someya, Kazuo Kyuma, Kazuhiko Tsutsumi, Hiroaki Sugiura, Hironobu Yasui
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Publication number: 20080186413Abstract: A video display apparatus generates luminance information for individual frames of a video signal from histograms of the luminance component of the video signal, and classifies the content of the video signal on the basis of this information. Color saturation information is also generated from color saturation histograms, and scene changes are detected. Video correction parameters and display control parameters are derived from the content classification and color saturation information. The video signal is corrected according to the video correction parameters, and displayed according to the display control parameters. Display characteristics suitable for the video content are thereby obtained. The parameters are changed when a scene change is detected, so that the viewer is not disturbed by the change in video display characteristics.Type: ApplicationFiled: December 20, 2007Publication date: August 7, 2008Inventors: Jun Someya, Kazuo Kyuma, Kazuhiko Tsutsumi, Hiroaki Sugiura, Hironobu Yasui
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Patent number: 7001896Abstract: The present invention provides a pharmaceutical composition for treating diabetes containing 4-diethoxyphosphinoylmethyl-N-(4-bromo-2-cyanophenyl)benzamide, particularly a pharmaceutical composition for treating diabetes that exhibits excellent effects for treating type II diabetes and the prevention of diabetic complications.Type: GrantFiled: September 28, 2001Date of Patent: February 21, 2006Assignees: Otsuka Pharmaceutical Factory, Inc.Inventors: Weidong Yin, Kazuhiko Tsutsumi
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Patent number: 6790340Abstract: An electrochemical etching system has an etching bath for holding an n-type silicon substrate with a first surface of the substrate in contact with hydrofluoric acid, an electrode positioned in the hydrofluoric acid, a power source having a positive pole connected to the silicon substrate and a negative pole connected to the electrode, and an illumination unit having a light source for illumination of a second surface of the silicon substrate. The illumination unit illuminates the second surface of the silicon substrate with an illumination intensity of 10 m W/cm2 or more. A ratio of a maximum illumination to a minimum illumination of the second surface of the silicon substrate is 1.69:1 or less. With the etching system, pores and/or trenches of a certain size and shape can be formed in an entire area of the silicon substrate having a diameter of more than three inches.Type: GrantFiled: December 11, 2001Date of Patent: September 14, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shinichi Izuo, Hiroshi Ohji, Kazuhiko Tsutsumi, Patrick James French
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Patent number: 6759591Abstract: A silicon device includes an insulating substrate having a recess on the surface of the substrate, and a beam-like structure made of silicon on the front surface of the insulating substrate, surrounds the recess. The beam-like structure includes at least one functional section having a supporting section bonded to the insulating substrate and at least one cantilever integral with the supporting section and extending across the recess. The silicon device also includes a frame made of silicon surrounding and spaced from the beam-like structure and on the insulating substrate. The silicon device also includes a conductive film having electrical continuity with the frame and on the surface of the insulating substrate, at least in a portion directly opposite the cantilever. The conductive film prevents the insulating substrate from being charged, thereby significantly suppressing damage of the beam-like structure during dry etching.Type: GrantFiled: February 6, 2003Date of Patent: July 6, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yukihisa Yoshida, Munehito Kumagai, Kazuhiko Tsutsumi
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Patent number: 6736008Abstract: An inertia force sensor with a damper. The damper includes a cantilever for a movable part disposed in a movable electrode protruding therefrom, and a cantilever for a fixed part disposed in a support portion for the movable part or a support portion for the fixed part and protruding therefrom. The damper allows the cantilever for the movable part and the cantilever for the fixed part to contact each other before the movable electrode contacts the support portion for the movable part and the support portion for the fixed part. As a result, it is possible to prevent a stopper from being damaged and to improve the reliability of the sensor.Type: GrantFiled: November 21, 2002Date of Patent: May 18, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Munehito Kumagai, Yukihisa Yoshida, Kazuhiko Tsutsumi
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Publication number: 20040014728Abstract: The present invention provides a pharmaceutical composition for treating diabetes containing 4-diethoxyphosphinoylmethyl-N-(4-bromo-2-cyanophenyl)benzamide, particularly a pharmaceutical composition for treating diabetes that exhibits excellent effects for treating type II diabetes and the prevention of diabetic complications.Type: ApplicationFiled: March 26, 2003Publication date: January 22, 2004Inventors: Weidong Yin, Kazuhiko Tsutsumi
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Patent number: 6675644Abstract: A thermo-sensitive flow rate sensor that comprises a plate-like substrate, a part of which is removed so that a space is provided therein, a diaphragm portion formed like a thin layer above the space in such a manner as to be integral with the plate-like substrate, and a heating element constituted by a thermo-sensitive electrically resistant film formed on the diaphragm. Plural holes penetrating the diaphragm portion are bored in an outer peripheral portion of the heating element. Each of the plurality of holes is shaped in such a way as to have obtuse corner portions or to have substantially no corner portions. The thermo-sensitive flow rate sensor measures the flow rate of a fluid, which is to be measured, according to an amount of heat transferred to the fluid from a part heated by energizing the heating element.Type: GrantFiled: April 12, 1999Date of Patent: January 13, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Tomoya Yamakawa, Masahiro Kawai, Yutaka Ohashi, Yuichi Sakai, Akira Yamashita, Kazuhiko Tsutsumi
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Patent number: 6661221Abstract: A magnetic field sensing element comprises an underlayer formed on a substrate, a giant magnetoresistance element formed on the underlayer for detecting a change in a magnetic field, and an integrated circuit formed on the substrate for carrying out predetermined arithmetic processing based on a change in a magnetic field detected by the giant magnetoresistance element, wherein the giant magnetoresistance element and the integrated circuit are formed on the same surface.Type: GrantFiled: June 5, 2002Date of Patent: December 9, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Motohisa Taguchi, Izuru Shinjo, Yuji Kawano, Tatsuya Fukami, Kazuhiko Tsutsumi, Yuuichi Sakai, Naoki Hiraoka, Yasuyoshi Hatazawa
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Publication number: 20030217597Abstract: An inertia force sensor of the invention is provided with a damper portion. The damper portion includes a cantilever for a movable part disposed in a movable electrode portion so as to protrude therefrom and a cantilever for a fixed part disposed in a support portion for the movable part or a support portion for the fixed part so as to protrude therefrom. The damper portion is formed so that the cantilever for the movable part and the cantilever for the fixed part contact each other before the movable electrode portion contacts the support portion for the movable part and the support portion for the fixed part. As a result, it is possible to prevent a stopper portion from being damaged and improve the reliability of the sensor.Type: ApplicationFiled: November 21, 2002Publication date: November 27, 2003Applicant: Mitsubishi Denki Kabushiki KaishaInventors: Munehito Kumagai, Yukihisa Yoshida, Kazuhiko Tsutsumi
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Publication number: 20030180504Abstract: A silicon device including an insulating substrate having a recess formed on the surface thereof, and a beam-like structure made of silicon formed on the front surface of the insulating substrate to surround the recess. The beam-like structure includes at least one functional section having a supporting section bonded onto the insulating substrate and at least one cantilever formed integrally with the supporting section while extending across the recess. The silicon device also includes a frame made of silicon that surrounds the beam-like structure with a space kept therefrom and is formed onto the insulating substrate. The silicon device also includes a conductive film having electrical continuity with the frame and formed on the surface of the insulating substrate at least in a portion right below the cantilever. The conductive film prevents the insulating substrate from being charged thereby significantly suppressing the damage caused on the beam-like structure during dry etching.Type: ApplicationFiled: February 6, 2003Publication date: September 25, 2003Inventors: Yukihisa Yoshida, Munehito Kumagai, Kazuhiko Tsutsumi
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Patent number: 6619130Abstract: A pressure sensor includes a first diaphragm having a first surface receiving pressure, a first thermal detection section located opposite a central section of the first diaphragm, and a second thermal detection section having little displacement by pressure, and located opposite the first diaphragm The pressure sensor amplifies and outputs a difference between the first thermal detection section for pressure measurement and the second thermal detection section for reference output. Since the diaphragm to which the second thermal detection section is opposed is equal in thickness to the diaphragm to which the first thermal detection section is opposed, pressure can be accurately measured relative to a sudden change in atmospheric temperature.Type: GrantFiled: June 5, 2002Date of Patent: September 16, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Naoki Yutani, Hiroshi Ohji, Kazuhiko Tsutsumi
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Patent number: 6615655Abstract: A flow rate detecting element measuring the flow rates of various fluids, particularly the intake air of an internal combustion engine. The flow rate detecting element has a thin film layer including a support film and a protective film on one surface of a flat substrate, a heating resistance section and a comparative resistance section thermosensitive resistor having patterns and located between the support film and the protective film. The flat substrate has a recess which penetrates the flat substrate in the thickness direction thereof and facing the heating resistance section and the comparative resistance section. A fluid flow passage communicates with the recess which faces the comparative resistance section for fluid flow into the recess. Flow rate or velocity of a fluid can be measured accurately using the heating resistance section according to the fluid temperature reported by the comparative resistance section.Type: GrantFiled: January 17, 2002Date of Patent: September 9, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yuichi Sakai, Akira Yamashita, Motohisa Taguchi, Tomoya Yamakawa, Masahiro Kawai, Kazuhiko Tsutsumi
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Patent number: 6591683Abstract: A pressure sensor includes a diaphragm having a first surface receiving pressure, and a first thermal detection section opposed to a central section of the diaphragm through a spacer and having a thermo-sensitive resistance section, and a second thermal detection section opposed to an end section of the diaphragm and having a thermo-sensitive resistance section, wherein the first thermo-sensitive resistance section and second thermo-sensitive resistance section are connected to independent, adjustable constant-current sources, respectively, and are connected to a differential amplifier which amplifies a difference between (i) a voltage of the first thermal detection section, which detects a displacement quantity of the diaphragm due to pressure change as a displacement quantity of a thermal equilibrium state by the thermal detection section, and (ii) a voltage of the second thermal detection section, which does not change according to pressure. The sensor can measure pressure with high accuracy.Type: GrantFiled: August 9, 2002Date of Patent: July 15, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Naoki Yutani, Hiroshi Ohji, Kazuhiko Tsutsumi
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Patent number: 6528724Abstract: A micro device including an insulating substrate having a recess formed on a surface, and a beam-like silicon structure on the front surface of the insulating substrate surrounding the recess. The beam-like structure includes at least one functional section, and the functional section has a supporting section bonded to the insulating substrate and at least one cantilever integral with the supporting section and extending across the recess. The micro device also has an electrically conductive film electrically connected to the supporting section, on the surface of the recess at least directly under a cantilever. The electrically conductive film prevents the surface of the recess from being positively charged in the dry etching process. Thus, an etching gas having a positive charge is not subjected to electrical repulsion from the recess and does not impinge on the back surface of the silicon substrate, and therefore erosion of the cantilever does not occur.Type: GrantFiled: October 19, 2001Date of Patent: March 4, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yukihisa Yoshida, Martial Chabloz, Jiwei Jiao, Tsukasa Matsuura, Kazuhiko Tsutsumi
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Publication number: 20020153881Abstract: A magnetic field sensing element comprises an underlayer formed on a substrate, a giant magnetoresistance element formed on the underlayer for detecting a change in a magnetic field, and an integrated circuit formed on the substrate for carrying out predetermined arithmetic processing based on a change in a magnetic field detected by the giant magnetoresistance element, wherein the giant magnetoresistance element and the integrated circuit are formed on the same surface.Type: ApplicationFiled: June 5, 2002Publication date: October 24, 2002Applicant: MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Motohisa Taguchi, Izuru Shinjo, Yuji Kawano, Tatsuya Fukami, Kazuhiko Tsutsumi, Yuuichi Sakai, Naoki Hiraoka, Yasuyoshi Hatazawa